WO2014141816A1 - 成膜マスクの製造方法 - Google Patents
成膜マスクの製造方法 Download PDFInfo
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- WO2014141816A1 WO2014141816A1 PCT/JP2014/053614 JP2014053614W WO2014141816A1 WO 2014141816 A1 WO2014141816 A1 WO 2014141816A1 JP 2014053614 W JP2014053614 W JP 2014053614W WO 2014141816 A1 WO2014141816 A1 WO 2014141816A1
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- Prior art keywords
- mask
- mesh
- mask sheet
- frame
- film
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/10—Removing layers, or parts of layers, mechanically or chemically
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2310/00—Treatment by energy or chemical effects
- B32B2310/08—Treatment by energy or chemical effects by wave energy or particle radiation
- B32B2310/0806—Treatment by energy or chemical effects by wave energy or particle radiation using electromagnetic radiation
- B32B2310/0843—Treatment by energy or chemical effects by wave energy or particle radiation using electromagnetic radiation using laser
Definitions
- the present invention relates to a method of manufacturing a film forming mask having a structure in which a mask sheet having a plurality of opening patterns is stretched and fixed to a frame-shaped metal frame, and in particular, uniform tension is applied over the entire surface of the mask sheet.
- the present invention relates to a method of manufacturing a film formation mask that can be fixed to a frame.
- a metal sheet is etched using a resist mask to form a plurality of opening patterns penetrating, and then the metal sheet is stretched on the periphery of the metal sheet.
- a frame-shaped metal frame is spot-welded (see, for example, Patent Document 1).
- the metal sheet is directly fixed to the frame while being pulled in four directions, so that uniform tension is applied to the entire surface of the metal sheet. It was difficult to do. Therefore, depending on how the tension is applied to the metal sheet, there is a problem that the metal sheet may be wrinkled or bent, or a metal part between adjacent opening patterns may be broken, or the formed opening pattern may be deformed. It was.
- an object of the present invention is to provide a method for manufacturing a film forming mask that can cope with such problems and can be fixed to a frame by applying a uniform tension over the entire surface of the mask sheet.
- a method of manufacturing a film formation mask according to the first invention is a method of manufacturing a film formation mask having a structure in which a mask sheet having a plurality of opening patterns is stretched and fixed to a frame-shaped metal frame.
- a first step of bonding a peripheral edge of the mask sheet to a mesh of synthetic fiber to which a certain tension is applied, and a film forming effective area having a size including the plurality of opening patterns of the mask sheet A second step of cutting out the portion of the mesh corresponding to the above, a third step of joining and fixing the frame from the opposite side of the mesh to the peripheral edge of the mask sheet, and removing the mesh from the mask sheet And a fourth step.
- a method for manufacturing a film forming mask having a structure in which a mask sheet having a plurality of opening patterns is stretched and fixed to a frame-shaped metal frame.
- the film side of the mask member is the mesh side, the first step of adhering the peripheral edge of the film, and the film formation effective region having a size including the plurality of through holes of the mask member
- a second step of excising the mesh portion and a third step of joining and fixing the frame to the peripheral edge of the magnetic metal member of the mask member from the side opposite to the mesh.
- a fifth step is the mesh side, the first step of adhering the peripheral edge of the film, and the film formation effective region having a size including the plurality of through holes of the mask member
- a second step of excising the mesh portion and a third step of joining and fixing the frame to the peripheral edge of the magnetic metal member of the mask member from the side opposite to the mesh.
- the mask sheet or the mask member is fixed to the frame in a stretched state via the mesh of synthetic fiber, so that uniform tension is applied over the entire surface of the mask sheet or the mask member. be able to. Therefore, there is no possibility that the mask sheet or the mask member is wrinkled or bent, or the formed opening pattern is not deformed. Therefore, the formation position accuracy of the opening pattern can be improved.
- FIG. 1 It is sectional drawing which shows embodiment of the manufacturing method of the film-forming mask by this invention, and shows the joining process to the flame
- FIG. 1 is a sectional view showing an embodiment of a method for manufacturing a film formation mask according to the present invention and showing a process of bonding a mask sheet to a frame.
- This method of manufacturing a film forming mask is a method for manufacturing a film forming mask having a structure in which a mask sheet having a plurality of opening patterns is stretched and fixed to a frame-like metal frame.
- the mask sheet is a metal mask sheet 4 in which a plurality of opening patterns 5 are formed by etching a sheet-like magnetic metal material such as Invar using a resist mask. The case will be described.
- the mesh 1 is predetermined in all directions by sandwiching the four edges of the mesh 1 of a square synthetic fiber made of polyester or the like with clips 2 respectively. Pull with a certain tension. At this time, the mesh 1 is given a uniform tension over the entire surface due to its own stretchability.
- the end surface of the support frame 3 made of, for example, aluminum (Al) is abutted against one surface (the lower surface in the figure) of the mesh 1 and supported from above the mesh 1.
- An adhesive is applied to the end surface of the frame 3, and the mesh 1 is bonded to the end surface of the support frame 3 by the adhesive soaked through the mesh 1.
- the mesh 1 is cut along the outer peripheral edge of the support frame 3 to form the mesh 1 fixed to the support frame 3 in a stretched state.
- the metal mask sheet 4 is arranged at the center of the mesh 1 inside the support frame 3, and along the edge of the metal mask sheet 4. Then, an adhesive is applied from above the mesh 1, and the peripheral portion of the metal mask sheet 4 is bonded to the mesh 1 with an adhesive material soaked through the mesh 1. This completes the first step.
- the metal mask sheet 4 may be bonded to the front side of the mesh 1. In this case, the support frame 3 to which the mesh 1 is bonded may be turned upside down in the same manner as described above.
- the size of the plurality of opening patterns 5 (see FIG. 2) formed in the metal mask sheet 4 is enclosed by broken lines in FIG.
- a portion of the mesh 1 along the peripheral edge portion of the film forming effective region 6 is cut off and removed by, for example, a cutter.
- tensile_strength provided to the mesh 1 moves to the metal mask sheet 4, and the metal mask sheet
- seat 4 is pulled by the equal tension
- the end face of the frame 7 such as Invar or Invar alloy is abutted against the peripheral edge of the metal mask sheet 4 from the side opposite to the mesh 1.
- the position of the frame 7 relative to the metal mask sheet 4 may be adjusted by observing the edge of the metal mask sheet 4 and the edge of the frame 7 with a camera.
- the inside of the support frame 3 is set so that the distance between the opening patterns 5 becomes a predetermined distance.
- the mesh 1 may be expanded and contracted by sandwiching the portion of the mesh 1 outside the metal mask sheet 4 with another clip (not shown) to adjust the magnitude of the tension.
- the metal mask sheet 4 and the frame 7 are spot-welded by irradiating the peripheral edge of the metal mask sheet 4 with laser light L. Thereby, the metal mask sheet 4 is fixed to the frame 7 in a state where a uniform tension is applied over the entire surface.
- the joint is loosened by the heat during film formation, and the metal mask sheet 4 is deformed, There is no possibility that the formed film is contaminated by the outgas generation.
- the mesh 1 is cut along the outer periphery of the metal mask sheet 4 with a cutter or the like, for example, and the mesh 1 is removed from the metal mask sheet 4.
- the metal mask sheet 4 is formed by irradiating the mesh 1 with the laser beam applied to the bonded portion between the mesh 1 and the metal mask sheet 4 or softening the adhesive by applying an appropriate temperature to the bonded portion.
- the mesh 1 may be removed. As a result, a film formation mask in which the metal mask sheet 4 is stretched with a uniform tension and fixed to the frame 7 is obtained.
- the mask sheet is the metal mask sheet 4
- the mask sheet is a resin having a plurality of opening patterns 5 and transmitting visible light such as polyimide.
- the composite mask sheet 11 may be used.
- the film 8 side is the mesh 1 side, and the peripheral edge of the film 8 is bonded to the mesh 1 in the same manner as described above.
- the frame 7 is joined and fixed to the peripheral edge of the magnetic metal member 10 from the side opposite to the mesh 1 in the same manner as described above.
- the composite mask sheet 11 can be formed as follows. That is, for example, a polyimide resin solution is applied to one surface of a sheet-like magnetic metal member 10 such as Invar having a thickness of about 30 ⁇ m to 50 ⁇ m, and then dried to a thickness of about 10 ⁇ m to 30 ⁇ m. Film 8 is formed. Next, after applying a photoresist to the other surface of the magnetic metal member 10 and exposing the photoresist using a photomask, the photoresist is developed and a resist having an opening corresponding to the through hole 9 to be formed. A mask is formed. Next, the magnetic metal member 10 is etched using the resist mask, and a through hole 9 reaching the film 8 is formed in the magnetic metal member 10. Subsequently, the opening pattern 5 is formed by irradiating the portion of the film 8 in the through hole 9 with a laser beam.
- a polyimide resin solution is applied to one surface of a sheet-like magnetic metal member 10 such as Invar having a thickness of about 30 ⁇ m
- the composite mask sheet 11 may be formed as follows. That is, after forming an underlayer of a conductive metal such as nickel on the resin film 8 with a thickness of about 50 nm, a photoresist is applied on the underlayer, and the photoresist is patterned by a known technique. Then, an island pattern having the same shape as the through hole 9 is formed at a position corresponding to the through hole 9. Next, the magnetic metal member 10 is formed on the outer portion of the island pattern by electroplating. Subsequently, after removing the island pattern, the underlayer existing under the island pattern is removed by etching to form the through hole 9. Then, the opening pattern 5 is formed by irradiating the portion of the film 8 in the through hole 9 with laser light in the same manner as described above.
- a photoresist is applied on the underlayer, and the photoresist is patterned by a known technique. Then, an island pattern having the same shape as the through hole 9 is formed at a position corresponding to the through hole 9. Next, the
- the first to fourth steps are performed before the opening pattern 5 is formed on the film 8 in the through hole 9 of the magnetic metal member 10 instead of the mask sheet.
- the mask member 12 as shown in FIG. 4 may be used.
- the peripheral portion of the film 8 is bonded to the one side with the film 8 side of the mask member 12 having a structure in which the resin film 8 is in close contact as the mesh 1 side.
- the portion of the mesh 1 corresponding to the film forming effective area having a size including the plurality of through holes 9 of the mask member 12 is cut out.
- the frame 7 is joined and fixed to the periphery of the magnetic metal member 10 of the mask member 12 from the side opposite to the mesh 1. Then, the mesh 1 is removed from the mask member 12.
- the fifth step of forming the opening pattern 5 by irradiating the portion of the film 8 corresponding to the opening pattern 5 in the through hole 9 of the magnetic metal member 10 with the laser beam is further executed.
- the opening pattern 5 is formed by irradiating the mask member 12 that is stretched with equal tension and fixed to the frame 7 by irradiating the laser beam, so that the formation position accuracy of the opening pattern 5 can be further improved.
- the present invention is not limited to this, and the clip 2 can be used without fixing the mesh 1 to the support frame 3.
- the mask sheet or the mask member 12 may be bonded to the mesh 1 in a state where the mesh 1 is sandwiched and stretched in all directions, and the second and subsequent steps may be performed.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Printing Plates And Materials Therefor (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
- Laser Beam Processing (AREA)
Abstract
Description
4…メタルマスクシート
5…開口パターン
6…成膜有効領域
7…フレーム
8…フィルム
9…貫通孔
10…磁性金属部材
11…複合型マスクシート
12…マスク用部材
Claims (5)
- 複数の開口パターンを形成したマスクシートを架張して枠状の金属フレームに固定した構造の成膜マスクの製造方法であって、
一定の張力がかけられた合成繊維のメッシュに前記マスクシートの周縁部を接着する第1ステップと、
前記マスクシートの前記複数の開口パターンを内包する大きさの成膜有効領域に対応した前記メッシュの部分を切除する第2ステップと、
前記マスクシートの周縁部に前記メッシュとは反対側から前記フレームを接合して固定する第3ステップと、
前記メッシュを前記マスクシートから除去する第4ステップと、
を行うことを特徴とする成膜マスクの製造方法。 - 前記マスクシートは、前記複数の開口パターンを形成した磁性金属材料からなるメタルマスクシートであることを特徴とする請求項1記載の成膜マスクの製造方法。
- 前記マスクシートは、前記複数の開口パターンを設けた樹脂製フィルムと、少なくとも一つの前記開口パターンを内包する大きさの複数の貫通孔を設けたシート状の磁性金属部材とを密接させた構造の複合型マスクシートであり、
前記第1ステップにおいては、前記フィルム側を前記メッシュ側として前記メッシュに前記フィルムの周縁部を接着し、
前記第3ステップにおいては、前記磁性金属部材の周縁部に前記メッシュとは反対側から前記フレームを接合して固定する、
ことを特徴とする請求項1記載の成膜マスクの製造方法。 - 複数の開口パターンを形成したマスクシートを架張して枠状の金属フレームに固定した構造の成膜マスクの製造方法であって、
一定の張力がかけられた合成繊維のメッシュに、少なくとも一つの前記開口パターンを内包する大きさの複数の貫通孔を設けたシート状の磁性金属部材の一面に、樹脂製フィルムを密接させた構造のマスク用部材の前記フィルム側を前記メッシュ側として、前記フィルムの周縁部を接着する第1ステップと、
前記マスク用部材の前記複数の貫通孔を内包する大きさの成膜有効領域に対応した前記メッシュの部分を切除する第2ステップと、
前記マスク用部材の前記磁性金属部材の周縁部に前記メッシュとは反対側から前記フレームを接合して固定する第3ステップと、
前記メッシュを前記マスク用部材から除去する第4ステップと、
前記磁性金属部材の前記貫通孔内の前記開口パターンに対応した前記フィルムの部分にレーザ光を照射して前記開口パターンを形成する第5ステップと、
を行うことを特徴とする成膜マスクの製造方法。 - 前記マスクシート又は前記マスク用部材と前記フレームとの接合は、スポット溶接により行うことを特徴とする請求項1~4のいずれか1項に記載の成膜マスクの製造方法。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201480014059.4A CN105051243B (zh) | 2013-03-15 | 2014-02-17 | 成膜掩模的制造方法 |
KR1020157025380A KR102183116B1 (ko) | 2013-03-15 | 2014-02-17 | 성막 마스크의 제조 방법 |
US14/853,934 US10195838B2 (en) | 2013-03-15 | 2015-09-14 | Method for producing deposition mask |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2013053207A JP6142196B2 (ja) | 2013-03-15 | 2013-03-15 | 蒸着マスクの製造方法 |
JP2013-053207 | 2013-03-15 |
Related Child Applications (1)
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US14/853,934 Continuation US10195838B2 (en) | 2013-03-15 | 2015-09-14 | Method for producing deposition mask |
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WO2014141816A1 true WO2014141816A1 (ja) | 2014-09-18 |
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PCT/JP2014/053614 WO2014141816A1 (ja) | 2013-03-15 | 2014-02-17 | 成膜マスクの製造方法 |
Country Status (6)
Country | Link |
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US (1) | US10195838B2 (ja) |
JP (1) | JP6142196B2 (ja) |
KR (1) | KR102183116B1 (ja) |
CN (1) | CN105051243B (ja) |
TW (1) | TWI612159B (ja) |
WO (1) | WO2014141816A1 (ja) |
Cited By (1)
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WO2019171455A1 (ja) * | 2018-03-06 | 2019-09-12 | シャープ株式会社 | 蒸着マスクの製造方法 |
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CN103882375B (zh) * | 2014-03-12 | 2016-03-09 | 京东方科技集团股份有限公司 | 一种掩膜板及其制作方法 |
DE112016003224T5 (de) | 2015-07-17 | 2018-04-19 | Toppan Printing Co., Ltd. | Metallmaskensubstrat für dampfabscheidung, metallmaske für dampfabscheidung, herstellungsverfahren für metallmaskensubstrat für dampfabscheidung und herstellungsverfahren für metallmaske für dampfabscheidung |
KR102401484B1 (ko) * | 2015-08-31 | 2022-05-25 | 삼성디스플레이 주식회사 | 마스크 조립체, 표시 장치의 제조장치 및 표시 장치의 제조 방법 |
CN105220110A (zh) * | 2015-10-20 | 2016-01-06 | 昆山允升吉光电科技有限公司 | 一种蒸镀用复合磁性掩模板的制作方法 |
JP6720564B2 (ja) * | 2016-02-12 | 2020-07-08 | 大日本印刷株式会社 | 蒸着マスクおよび蒸着マスクの製造方法 |
WO2018025835A1 (ja) * | 2016-08-05 | 2018-02-08 | 凸版印刷株式会社 | 蒸着用メタルマスク、蒸着用メタルマスクの製造方法、および、表示装置の製造方法 |
CN113463017A (zh) * | 2016-09-30 | 2021-10-01 | 大日本印刷株式会社 | 框架一体式的蒸镀掩模及其制备体和制造方法、蒸镀图案形成方法 |
KR20180083459A (ko) * | 2017-01-12 | 2018-07-23 | 삼성디스플레이 주식회사 | 증착용 마스크 어셈블리 |
KR102280187B1 (ko) * | 2017-05-31 | 2021-07-22 | 주식회사 오럼머티리얼 | 프레임 일체형 마스크의 제조 방법 |
CN107385391A (zh) * | 2017-07-14 | 2017-11-24 | 京东方科技集团股份有限公司 | 掩膜板、oled显示基板及其制作方法、显示装置 |
CN107740040B (zh) * | 2017-09-08 | 2019-09-24 | 上海天马有机发光显示技术有限公司 | 掩膜版组件及蒸镀装置 |
CN107815642A (zh) * | 2017-12-13 | 2018-03-20 | 唐军 | 高精密掩膜版 |
CN110055492B (zh) * | 2019-04-09 | 2021-03-23 | Tcl华星光电技术有限公司 | 一种掩膜片成形结构 |
KR20210032586A (ko) * | 2019-09-16 | 2021-03-25 | 삼성디스플레이 주식회사 | 증착 마스크, 증착 마스크의 제조 방법 |
KR20220091647A (ko) * | 2020-12-23 | 2022-07-01 | 삼성디스플레이 주식회사 | 마스크 어셈블리의 제작 방법 |
KR20220113588A (ko) * | 2021-02-05 | 2022-08-16 | 삼성디스플레이 주식회사 | 마스크 및 이의 제조 방법 |
KR102597712B1 (ko) * | 2021-04-01 | 2023-11-03 | (주)세우인코퍼레이션 | Oled 마스크 조립체의 제조 방법 |
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2013
- 2013-03-15 JP JP2013053207A patent/JP6142196B2/ja active Active
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2014
- 2014-02-17 WO PCT/JP2014/053614 patent/WO2014141816A1/ja active Application Filing
- 2014-02-17 KR KR1020157025380A patent/KR102183116B1/ko active IP Right Grant
- 2014-02-17 CN CN201480014059.4A patent/CN105051243B/zh active Active
- 2014-02-24 TW TW103106023A patent/TWI612159B/zh not_active IP Right Cessation
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2015
- 2015-09-14 US US14/853,934 patent/US10195838B2/en not_active Expired - Fee Related
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WO2019171455A1 (ja) * | 2018-03-06 | 2019-09-12 | シャープ株式会社 | 蒸着マスクの製造方法 |
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US20160001542A1 (en) | 2016-01-07 |
US10195838B2 (en) | 2019-02-05 |
JP2014177682A (ja) | 2014-09-25 |
TW201446986A (zh) | 2014-12-16 |
KR20150132169A (ko) | 2015-11-25 |
CN105051243A (zh) | 2015-11-11 |
TWI612159B (zh) | 2018-01-21 |
KR102183116B1 (ko) | 2020-11-25 |
JP6142196B2 (ja) | 2017-06-07 |
CN105051243B (zh) | 2017-06-23 |
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