WO2011093079A1 - 金属樹脂複合体 - Google Patents
金属樹脂複合体 Download PDFInfo
- Publication number
- WO2011093079A1 WO2011093079A1 PCT/JP2011/000450 JP2011000450W WO2011093079A1 WO 2011093079 A1 WO2011093079 A1 WO 2011093079A1 JP 2011000450 W JP2011000450 W JP 2011000450W WO 2011093079 A1 WO2011093079 A1 WO 2011093079A1
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- WIPO (PCT)
- Prior art keywords
- metal
- resin
- group
- resin composite
- bis
- Prior art date
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- 239000000805 composite resin Substances 0.000 title claims abstract description 51
- 229910052751 metal Inorganic materials 0.000 claims abstract description 118
- 239000002184 metal Substances 0.000 claims abstract description 118
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- 239000011342 resin composition Substances 0.000 claims abstract description 71
- 229920006015 heat resistant resin Polymers 0.000 claims abstract description 46
- 229920005989 resin Polymers 0.000 claims abstract description 37
- 239000011347 resin Substances 0.000 claims abstract description 37
- 238000002156 mixing Methods 0.000 claims abstract description 11
- -1 ethylene, propylene, 1-butene Chemical class 0.000 claims description 81
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- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 claims description 23
- 239000000178 monomer Substances 0.000 claims description 10
- WSSSPWUEQFSQQG-UHFFFAOYSA-N 4-methyl-1-pentene Chemical compound CC(C)CC=C WSSSPWUEQFSQQG-UHFFFAOYSA-N 0.000 claims description 8
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- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 3
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Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
- C08L101/12—Compositions of unspecified macromolecular compounds characterised by physical features, e.g. anisotropy, viscosity or electrical conductivity
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/28—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
- B32B27/285—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polyethers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/34—Layered products comprising a layer of synthetic resin comprising polyamides
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- C08L71/08—Polyethers derived from hydroxy compounds or from their metallic derivatives
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
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- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/0373—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement containing additives, e.g. fillers
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- C08J2423/06—Polyethene
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- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
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- H05K1/0213—Electrical arrangements not otherwise provided for
- H05K1/0237—High frequency adaptations
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
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- H05K2201/0206—Materials
- H05K2201/0212—Resin particles
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/022—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
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- Y10T428/31681—Next to polyester, polyamide or polyimide [e.g., alkyd, glue, or nylon, etc.]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10T428/31678—Of metal
- Y10T428/31692—Next to addition polymer from unsaturated monomers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10T428/31696—Including polyene monomers [e.g., butadiene, etc.]
Definitions
- the present invention relates to a metal resin composite.
- plastic materials are widely used in electronic devices and electronic parts such as circuit boards as insulating members that require high reliability because they have characteristics such as high insulation, dimensional stability, and easy moldability. .
- the frequency of electrical signals has been increased.
- the transmission loss of an electric signal is proportional to the product of frequency, relative permittivity, and dielectric loss tangent. Therefore, the higher the frequency of the electric signal used, the larger the transmission loss.
- a plastic material having a low dielectric constant and a low dielectric loss tangent is required.
- the dielectric constant depends on the type of material, it has been proposed to select a plastic material having a low dielectric constant.
- low dielectric constant plastic materials include olefin resins such as polyethylene (PE) and fluororesins such as polytetrafluoroethylene (PTFE).
- PE polyethylene
- PTFE polytetrafluoroethylene
- the fluororesin has sufficient heat resistance but has poor molding processability, and the olefin resin has a problem of low heat resistance of 100 ° C. or less.
- polyimides have high heat resistance among plastic materials, but many of them are known to have a high dielectric constant. For this reason, various methods for reducing the dielectric constant of polyimide have been proposed. For example, a method for reducing the dielectric constant of polyimide by introducing a fluorine group into the polyimide skeleton has been proposed. However, when too many fluorine groups are introduced into the polyimide skeleton, there is a problem that when used as a printed wiring board, the adhesion to the Cu wiring material is lowered or the solvent resistance is lowered.
- introduction of a bulky skeleton impairs packing between polyimide main chains, resulting in a problem that mechanical strength is reduced and a coefficient of thermal expansion is increased.
- a plastic material used for a circuit board or the like is required to have a low thermal expansion coefficient so as to minimize the difference in thermal expansion coefficient from the Cu wiring material in order to reduce dimensional change.
- the plastic material as a whole has a low dielectric constant by including many holes having a low dielectric constant.
- plastic porosity by dissolving a gas such as nitrogen or carbon dioxide in a polymer under high pressure, the pressure is rapidly released and heated to near the glass transition temperature or softening point of the polymer. A method of making it porous is known.
- a preform is formed by mixing with a heat-resistant polymer and a thermally decomposable polymer, and then heated and fired at a temperature higher than the decomposition temperature of the degradable polymer to decompose and remove the degradable polymer.
- a method for obtaining a porous body has been proposed (see, for example, Patent Document 5).
- JP 2003-201362 A JP 2000-154273 A Japanese Patent No. 3115215 Japanese Patent Laid-Open No. 2002-3636 Japanese Unexamined Patent Publication No. 63-278934
- the present invention has been made in view of such circumstances, and provides a heat-resistant resin composition having a low dielectric constant or dielectric loss tangent and a low thermal expansion coefficient; and a metal resin composite containing the same. The purpose is to provide.
- the present inventors have not only reduced the dielectric constant of the heat-resistant resin by adding specific polyolefin particles to a heat-resistant resin such as polyimide, but also dispersed the resin by adding polyolefin particles. It has been found that the increase in the coefficient of thermal expansion can be minimized.
- the present invention has been made based on such findings.
- the polyolefin particle (B) is a polymer including a structural unit derived from at least one monomer selected from the group consisting of ethylene, propylene, 1-butene and 4-methyl-1-pentene.
- [6] The metal resin composite according to any one of [1] to [5], wherein the polyolefin particle (B) has a polar group.
- the polar group is selected from the group consisting of hydroxyl group, carboxyl group, amino group, amide group, imide group, ether group, urethane group, urea group, phosphoric acid group, sulfonic acid group and carboxylic anhydride group.
- the metal resin composite according to [6] which is at least one functional group.
- a dielectric loss tangent of the heat resistant resin (A) at a frequency of 1 MHz is 0.001 or more, and a dielectric loss tangent of the resin composition is lower than a dielectric loss tangent of the heat resistant resin (A).
- the metal is a metal layer, and the metal resin composite is a metal laminate in which the metal layer and the resin layer (I) are laminated directly or via an intermediate layer. 1]-[11] The metal resin composite according to any one of [11].
- the metal is a metal wire, and the metal resin composite is a metal coated body in which an outer peripheral surface of the metal wire is coated with the resin layer (I) directly or via an intermediate layer. , [1] to [11].
- a heat-resistant resin composition having a low dielectric constant or dielectric loss tangent and a low thermal expansion coefficient.
- the transmission loss of an electric signal can be reduced in the metal resin composite including the layer (resin layer (I)) made of the resin composition.
- the metal-resin composite of the present invention has a metal and a resin layer (I) in contact with the surface directly or through an intermediate layer.
- the intermediate layer can be, for example, an adhesive layer.
- the metal resin composite of the present invention may further include a layer other than the metal, the resin layer (I), and the intermediate layer (for example, a resin layer other than the resin layer (I)).
- Metals can function as conductors. Although a metal in particular is not restrict
- the metal may be a metal layer or a metal wire.
- the metal layer may be a metal foil, a metal plate, or the like.
- the resin layer (I) can function as an insulating layer that insulates the metal from others.
- the resin layer (I) is formed from a resin composition containing a continuous phase of the heat resistant resin (A) and a dispersed phase obtained from the polyolefin particles (B).
- the dispersed phase obtained from the polyolefin particles (B) in the resin composition can be, for example, an aggregate or melt of the added polyolefin particles (B).
- the heat resistant resin (A) is preferably a resin having a glass transition temperature of 150 ° C. or higher from the viewpoint of increasing the heat resistance of the resin composition and decreasing the thermal expansion coefficient.
- Such a heat-resistant resin (A) usually has a higher dielectric constant and dielectric loss tangent than polyolefin. Therefore, the relative dielectric constant of the heat-resistant resin (A) at a frequency of 1 MHz is usually 2.3 or more. The dielectric loss tangent of the heat resistant resin (A) at a frequency of 1 MHz is usually 0.001 or more.
- heat resistant resin (A) examples include polyimide, polyamideimide, polyphenylene ether, polyphenylene sulfide, polyether, polyether ketone, polyether ether ketone, polyethylene terephthalate, polycarbonate, liquid crystal polymer, epoxy resin, polyether. Sulfones and phenol resins are included.
- the liquid crystal polymer is a polymer exhibiting liquid crystallinity in a solution state or a molten state, and is preferably a thermotropic liquid crystal polymer exhibiting liquid crystallinity in a molten state from the viewpoint of excellent mechanical strength and heat resistance.
- polyimide is more preferable from the viewpoint of particularly excellent heat resistance and dimensional stability.
- the polyimide is preferably a polyimide having a structural unit represented by the general formula (1).
- m is an integer of 1 or more.
- a polyimide having a relatively large aromatic ring in the molecule and having a rigid molecular structure has high heat resistance and a low thermal expansion coefficient.
- a in the general formula (1) is selected from divalent groups represented by the following formula.
- X 1 to X 6 in the following formulas represent a single bond, —O—, —S—, —CO—, —COO—, —C (CH 3 ) 2 —, —C (CF 3 ) 2 —, —SO, respectively. 2 -or -NHCO-.
- X 1 to X 6 contained in a plurality of A may be the same as or different from each other.
- R 1 , R 2 , R 3 and R 4 in the following formulas may be the same or different from each other, and each independently represents a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms.
- a in the general formula (1) may be a divalent group derived from an aromatic diamine.
- aromatic diamines include m-phenylene diamine, o-phenylene diamine, p-phenylene diamine, 3,3′-diaminodiphenyl ether, 3,4′-diaminodiphenyl ether, 4,4′-diaminodiphenyl ether, 3,3 '-Diaminodiphenyl sulfide, 3,4'-diaminodiphenyl sulfide, 4,4'-diaminodiphenyl sulfide, 3,3'-diaminodiphenyl sulfone, 3,4'-diaminodiphenyl sulfone, 4,4'-diaminodiphenyl sulfone 3,3'-diaminobenzophenone, 3,3'-diaminodiphenylmethane, 3,4'-diamin
- a in the general formula (1) may include a divalent group derived from another aliphatic diamine other than the divalent group derived from the aromatic diamine compound.
- Examples of other aliphatic diamines include 1,3-bis (3-aminopropyl) tetramethyldisiloxane, 1,3-bis (4-aminobutyl) tetramethyldisiloxane, ⁇ , ⁇ -bis (3- Aminopropyl) polydimethylsiloxane, ⁇ , ⁇ -bis (3-aminobutyl) polydimethylsiloxane, bis (aminomethyl) ether, 1,2-bis (aminomethoxy) ethane, bis [(2-aminomethoxy) ethyl] Ether, 1,2-bis [(2-aminomethoxy) ethoxy] ethane, bis (2-aminoethyl) ether, 1,2-bis (2-aminoethoxy) ethane, bis [2- (2-aminoethoxy) Ethyl] ether, bis [2- (2-aminoethoxy) ethoxy] ethane, bis (3
- B in the general formula (1) is selected from tetravalent groups represented by the following formula.
- Y 1 to Y 6 in the following formulas represent a single bond, —O—, —S—, —CO—, —COO—, —C (CH 3 ) 2 —, —C (CF 3 ) 2 —, —SO, respectively. 2 -or -NHCO-.
- Y 1 to Y 6 contained in a plurality of B may be the same as or different from each other.
- B in the general formula (1) may be a tetravalent group derived from an aromatic tetracarboxylic dianhydride.
- aromatic tetracarboxylic dianhydrides include pyromellitic dianhydride, merophanic dianhydride, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, 2,3,3 ′.
- B in the general formula (1) includes a tetravalent group derived from another tetracarboxylic dianhydride other than the tetravalent group derived from the aromatic tetracarboxylic dianhydride. Also good.
- Examples of other tetracarboxylic dianhydrides include ethylenetetracarboxylic dianhydride, butanetetracarboxylic dianhydride, cyclopentanetetracarboxylic dianhydride, 1,1-bis (2,3-dicarboxyl Phenyl) ethane dianhydride, 1,1-bis (3,4-dicarboxyphenyl) ethane dianhydride, 1,2-bis (2,3-dicarboxyphenyl) ethane dianhydride, 1,2-bis (3,4-dicarboxyphenyl) ethane dianhydride, 1,2,5,6-naphthalenetetracarboxylic dianhydride, 3,4,9,10-perylenetetracarboxylic dianhydride, 2,3, 6,7-anthracenetetracarboxylic dianhydride, 1,2,7,8-phenanthrenetetracarboxylic dianhydride and the like are included.
- Tetracarboxylic dianhydrides in which some or all of the hydrogen atoms on the aromatic ring of these other tetracarboxylic dianhydrides are substituted with a fluoro group or a trifluoromethyl group may be used. These may be used alone or in combination of two or more.
- the weight average molecular weight of the polyimide is preferably 5.0 ⁇ 10 3 to 5.0 ⁇ 10 5 .
- the weight average molecular weight of the polyimide can be measured by gel permeation chromatography (GPC).
- a polyimide having a structural unit represented by the general formula (1) can be obtained by heating and imidizing a polyamic acid containing a structural unit represented by the following general formula (2).
- A, B and m in the general formula (2) are the same as A, B and m in the general formula (1), respectively.
- the polyamic acid is obtained, for example, by subjecting a diamine represented by the following general formula (2A) to a polycondensation reaction with a tetracarboxylic dianhydride represented by the following general formula (2B).
- M1: M2 0.000 to 0.999: 1.00 (M1: number of moles of tetracarboxylic dianhydride, M2: number of moles of diamine). It is preferable to do so.
- M1: M2 is preferably 0.92 to 0.995: 1.00, more preferably 0.95 to 0.995: 1.00, and 0.97 to 0.995: 1. More preferably, it is 00. This is because the polyamic acid is amine-terminated.
- polyolefin particle (B) Since the polyolefin particle (B) has a low dielectric constant and dielectric loss tangent, the dielectric constant of the resin composition can be lowered by adding it to the heat resistant resin (A).
- Such polyolefin particles (B) are made of a homopolymer or copolymer containing a monomer selected from hydrocarbons having 2 to 20 carbon atoms. Of the hydrocarbons having 2 to 20 carbon atoms, hydrocarbons having 2 to 10 carbon atoms are preferable.
- hydrocarbons having 2 to 20 carbon atoms examples include ethylene, propylene, 1-butene, 1-hexene, 1-heptene, 1-octene, 1-decene, 1-tetradecene, 1-hexadecene, 1-heptadecene, -Octadecene, 4-methyl-1-pentene, 1-eicosene and the like are included, and ethylene, propylene, 1-butene, 4-methyl-1-pentene and the like are preferable. These may be used alone or in combination of two or more.
- the weight average molecular weight of the polyolefin is preferably 5.0 ⁇ 10 2 to 1.0 ⁇ 10 7 .
- the weight average molecular weight of the polyolefin can be measured by gel permeation chromatography (GPC).
- the relative dielectric constant of the polyolefin at a frequency of 1 MHz is preferably 3.0 or less. This is because if the relative dielectric constant exceeds 3.0, it is difficult to obtain the effect of reducing the relative dielectric constant of the resin composition.
- the dielectric loss tangent of polyolefin at a frequency of 1 MHz is preferably 0.005 or less.
- the average particle size of the polyolefin particles (B) added as a raw material is preferably as small as possible, and is 100 ⁇ m or less, preferably 0.001 to 50 ⁇ m, more preferably 0.01 to 20 ⁇ m.
- the average particle diameter of the polyolefin particles (B) within the above range, the dispersibility in the heat-resistant resin (A) such as polyimide can be enhanced.
- Polyolefin particles (B) can be obtained by a known method.
- a method for obtaining polyolefin fine particles by pulverizing polyolefin a method for obtaining polyolefin fine particles by directly polymerizing an olefin monomer using a fine solid olefin polymerization catalyst whose shape is controlled; prepared by an emulsification method
- examples thereof include a method of drying an aqueous dispersion of polyolefin fine particles to obtain polyolefin fine particles.
- Examples of a method for producing an aqueous dispersion of polyolefin include a drum emulsification method in which polyolefin, water and an emulsifier are mixed together and emulsified; a pulverization method in which a polyolefin previously pulverized is added to water together with the emulsifier and dispersed.
- a solvent substitution method in which the organic solvent is removed after mixing the polyolefin, emulsifier, and water dissolved in the organic solvent; a homomixer method and a phase inversion method in which the polyolefin, water, and the emulsifier are emulsified with a homomixer.
- heat-resistant resins (A) such as polyimide have polarity, it is difficult to uniformly disperse nonpolar polyolefin particles in the heat-resistant resin (A) such as polyimide. If the polyolefin particles (B) cannot be uniformly dispersed in the heat resistant resin (A), it is difficult to obtain a sufficient effect of suppressing an increase in the thermal expansion coefficient. Furthermore, if the polyolefin particles (B) cannot be uniformly dispersed in the heat resistant resin (A), phase separation occurs and the surface smoothness of the coating film tends to decrease. A circuit board using a film with low surface smoothness tends to increase transmission loss. For these reasons, it is preferable to uniformly disperse the polyolefin particles (B) in the heat-resistant resin (A) such as polyimide. For this purpose, the polyolefin particles (B) preferably have a polar group.
- the polar group is, for example, a hydroxyl group, a carboxyl group, an amino group, an amide group, an imide group, an ether group, a urethane group, a urea group, a phosphoric acid group, a sulfonic acid group, or a carboxylic acid anhydride group, preferably a hydroxyl group or a carboxyl group. Groups and carboxylic anhydride groups.
- the polyolefin particles (B) having such a polar group have high dispersibility with respect to the heat-resistant resin (A) such as polyimide.
- the polar group content is preferably 1.0 ⁇ 10 ⁇ 5 to 1.0 ⁇ 10 2 mol / kg, and preferably 1.0 ⁇ 10 ⁇ 3 to 1.0 ⁇ 10 1 mol / kg. Is more preferable.
- the content of the polar group is the number of moles (number of moles) of the polar group with respect to the weight (kg) of the polyolefin particles.
- the content of the polar group is adjusted to the blending amount of the polar group-containing compound when graft-modifying the polyolefin particles, or when the polyolefin group contains two or more kinds of polyolefin, and has a polar group and a polyolefin having no polar group It can be adjusted by adjusting the blending ratio of the polyolefin or the blending ratio of the polyolefin having many polar groups and the polyolefin having few polar groups.
- the polyolefin having a polar group can be obtained by a method of graft-modifying polyolefin with a polar group-containing compound.
- Graft modification of polyolefin is a method in which a mixture of polyolefin and a polar group-containing compound is reacted in a molten state in the presence or absence of a radical polymerization initiator (such as by a kneading extruder); polyolefin and polar group-containing compound Is dissolved in a good solvent and reacted in the presence of a radical polymerization initiator.
- a radical polymerization initiator such as by a kneading extruder
- the polar group-containing compound may be a compound having at least a carbon-carbon unsaturated bond (for example, a carbon-carbon double bond) and a polar group in the molecule.
- polar group-containing compounds include unsaturated carboxylic acids, unsaturated carboxylic acid derivatives, unsaturated epoxy compounds, unsaturated alcohols, unsaturated amines, unsaturated isocyanate esters, and the like.
- unsaturated carboxylic acids include (meth) acrylic acid, maleic acid, fumaric acid, tetrahydrophthalic acid, itaconic acid, citraconic acid, crotonic acid, isocrotonic acid, norbornene dicarboxylic acid, and bicyclo [2,2,1] Hept-2-ene-5,6-dicarboxylic acid and the like are included.
- unsaturated carboxylic acid derivatives include derivatives of these acid anhydrides, acid halides, amides, imides and esters.
- Examples of these include maleenyl chloride, maleenylimide, maleic anhydride, itaconic anhydride, citraconic anhydride, tetrahydrophthalic anhydride, bicyclo [2,2,1] hept-2-ene-5,6-dicarboxylic anhydride object; Dimethyl maleate, monomethyl maleate, diethyl maleate, diethyl fumarate, dimethyl itaconate, diethyl citraconic acid, dimethyl tetrahydrophthalate, dimethyl bicyclo [2,2,1] hept-2-ene-5,6-dicarboxylate ; Hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 2-hydroxy-3-phenoxy-propyl (meth) acrylate, 3-chloro-2-hydroxypropyl (meth) Acrylate, glycerin mono (meth) acrylate, pentaeryth
- unsaturated epoxy compounds include glycidyl acrylate, glycidyl methacrylate; Maleic acid, fumaric acid, crotonic acid, tetrahydrophthalic acid, itaconic acid, citraconic acid, endo-cis-bicyclo [2.2.1] hept-5-ene-2,3-dicarboxylic acid (Nadic acid TM ), endo Monoalkyl glycidyl esters and diglycidyl of dicarboxylic acids such as cis-bicyclo [2.2.1] hept-5-ene-2-methyl-2,3-dicarboxylic acid (methylnadic acid TM ) and allyl succinic acid Esters (carbon number of alkyl group contained in monoalkyl glycidyl ester is 1 to 12); monoalkyl glycidyl ester and diglycidyl ester of tricarboxylic acid such as butenetricarboxylic acid (carbon of alkyl
- unsaturated alcohols include 10-undecen-1-ol, 1-octene-3-ol, 2-methanol norbornene, hydroxystyrene, hydroxyethyl vinyl ether, hydroxybutyl vinyl ether, N-methylol acrylamide, 2- (meth) Acroyloxyethyl acid phosphate, glycerol monoallyl ether, allyl alcohol, allyloxyethanol, 2-butene-1,4-diol, glycerol monoalcohol and the like are included.
- unsaturated amines include aminoethyl (meth) acrylate, propylaminoethyl (meth) acrylate, dimethylaminoethyl methacrylate, aminopropyl (meth) acrylate, phenylaminoethyl methacrylate, and cyclohexylaminoethyl methacrylate.
- Alkyl ester derivatives of (meth) acrylic acid such as Vinylamine derivatives such as N-vinyldiethylamine and N-acetylvinylamine; Allylamine derivatives such as allylamine, methacrylamine, N-methylacrylamine, N, N-dimethylacrylamide and N, N-dimethylaminopropylacrylamide; Acrylamide derivatives such as acrylamide and N-methylacrylamide; aminostyrenes such as p-aminostyrene; Examples include 6-aminohexyl succinimide and 2-aminoethyl succinimide.
- Examples of the polyolefin having a polar group include an olefin block copolymer having a polar group, which is obtained by a method described in JP-A No. 2001-348413.
- the olefin-based block copolymer having a polar group is prepared by 1) preparing a polyolefin having a terminal group 13 element bonded thereto, 2) chain polymerization such as a ring-opening polymerization reaction of a cyclic monomer in the presence of the polyolefin.
- It can be produced through a step of performing a reaction, and if necessary, 3) converting a terminal of a segment obtained by a chain polymerization reaction of a cyclic monomer into a polar group or introducing a polar group at a terminal.
- the polyolefin having a group 13 element bonded to the terminal in 1) can be obtained, for example, by polymerizing an olefin monomer in the presence of an organometallic catalyst containing a group 13 element.
- the organometallic catalyst containing a Group 13 element can be an organoaluminum or an organoboron compound.
- Examples of the cyclic monomer in 2) include lactone, lactam, 2-oxazoline, cyclic ether and the like.
- Examples of polar groups in 3) include the aforementioned polar groups.
- the olefin block copolymer having a polar group can be represented by the following formula (3). PO-f-R- (X) n -h (3)
- F in the formula (3) is a linker residue that connects the group 13 element and R in the polyolefin to which the group 13 element is bonded.
- f may be an ether bond, an ester bond, an amide bond, or the like.
- R in the formula (3) is a segment obtained by a chain polymerization reaction of a cyclic monomer.
- h represents the polar group described above;
- (X) n represents a linker that connects the segment R and the polar group h.
- X constituting the linker is not particularly limited, and includes an ester bond, an amide bond, an imide bond, a urethane bond, a urea bond, a silyl ether bond, a carbonyl bond, and the like.
- the polyolefin particles (B) having a polar group can be obtained by subjecting the polyolefin particles to a surface hydrophilic treatment by a dry process.
- the surface hydrophilization treatment may be any surface treatment that can impart a polar group, and examples thereof include corona treatment, plasma treatment, electron beam irradiation, and UV ozone treatment.
- the content of the polyolefin particles (B) in the resin composition is preferably 5 to 200 parts by weight, preferably 10 to 100 parts by weight, with respect to 100 parts by weight of the heat resistant resin (A). Is more preferable.
- the content of the polyolefin particles (B) is less than the above range, it is difficult to obtain the effect of reducing the dielectric constant of the resin composition.
- the heat resistance of the resin composition is likely to be reduced (heat This is because the expansion coefficient tends to be high).
- the resin composition may contain an inorganic filler etc. as needed.
- inorganic fillers include silica, alumina, titanium oxide, magnesium oxide, aluminum hydroxide, magnesium hydroxide, basic magnesium carbonate, dolomite, calcium sulfate, potassium titanate, barium sulfate, calcium sulfite, talc, clay, mica , Glass flakes, glass beads, calcium silicate, montmorillonite, bentonite, molybdenum sulfide and the like, preferably silica.
- the average particle size of the inorganic filler is preferably 0.1 to 60 ⁇ m, more preferably 0.5 to 30 ⁇ m.
- the resin composition may contain various additives such as a flame retardant, a heat stabilizer, an oxidation stabilizer, and a light-resistant stabilizer as necessary.
- a resin composition having a phase obtained from polyolefin particles may have reduced flame retardancy compared to a resin not containing polyolefin particles. Therefore, it is preferable that the resin composition which comprises resin layer (I) further contains a flame retardant.
- the flame retardant examples include an organic halogen flame retardant; a combination of an organic halogen flame retardant and one or more selected from the group consisting of antimony oxide, zinc borate, zinc stannate and iron oxide; Flame retardants; Combinations of organic phosphorus flame retardants and silicone compounds; Combinations of inorganic phosphorus such as red phosphorus, organopolysiloxanes and organometallic compounds; Hindered amine flame retardants; Magnesium hydroxide, alumina, calcium borate, low melting point glass, etc. Inorganic flame retardants are included. These may be used alone or in combination of two or more.
- organic halogen flame retardants include at least one compound selected from the group consisting of halogenated bisphenol compounds, halogenated epoxy compounds, and halogenated triazine compounds.
- the halogen atom contained in the organic halogen flame retardant is at least one of bromine and chlorine in order to effectively enhance the flame retardancy of the resin.
- halogenated bisphenol compounds include tetrabromobisphenol A, dibromobisphenol A, tetrachlorobisphenol A, dichlorobisphenol A, tetrabromobisphenol F, dibromobisphenol F, tetrachlorobisphenol F, dichlorobisphenol F, tetrabromo.
- Bisphenol S, dibromobisphenol S, tetrachlorobisphenol S, dichlorobisphenol S and the like are included.
- the organic phosphorus flame retardant is preferably at least one of the group consisting of a phosphate compound, a phosphine compound, a phosphinate compound, a phosphine oxide compound and a phosphazene compound.
- phosphate compounds include trimethyl phosphate, triethyl phosphate, tributyl phosphate, trioctyl phosphate, triphenyl phosphate, tricresyl phosphate, trixylyl phosphate, cresyl diphenyl phosphate, xylyl diphenyl phosphate, tolyl dixyl phosphate, tris ( Phosphate esters such as (norylphenyl) phosphate and (2-ethylhexyl) diphenylphosphate; Hydroxyl group-containing phosphate esters such as resorcinol diphenyl phosphate and hydroquinone diphenyl phosphate; Resorcinol bis (diphenyl phosphate), hydroquinone bis (diphenyl phosphate), bisphenol-A bis (diphenyl phosphate), bisphenol-S bis (diphenyl phosphate), resorcinol bis (dixyl phosphate),
- Examples of the phosphine compound include trilauryl phosphine, triphenyl phosphine, and tolyl phosphine.
- the phosphinate compound is represented by the following general formula (4).
- a and B each independently represent a linear or branched alkyl group having 1 to 6 carbon atoms or an aryl group.
- M represents at least one metal atom selected from the group consisting of Mg, Ca, Al, Sb, Sn, Ge, Ti, Zn, Fe, Zr, Ce, Bi, Sr, Mn, Li, Na, and K.
- m represents an integer of 1 to 4.
- phosphinate compound examples include aluminum diethylphosphinate and magnesium diethylphosphinate.
- Examples of the phosphine oxide compound include triphenylphosphine oxide and tolylphosphine oxide.
- phosphazene compounds include hexaphenoxycyclotriphosphazene, monophenoxypentakis (4-cyanophenoxy) cyclotriphosphazene, diphenoxytetrakis (4-cyanophenoxy) cyclotriphosphazene, triphenoxytris (4-cyanophenoxy) cyclo Triphosphazene, tetraphenoxybis (4-cyanophenoxy) cyclotriphosphazene, pentaphenoxy (4-cyanophenoxy) cyclotriphosphazene, monophenoxypentakis (4-methoxyphenoxy) cyclotriphosphazene, diphenoxytetrakis (4-methoxyphenoxy) ) Cyclotriphosphazene, triphenoxytris (4-methoxyphenoxy) cyclotriphosphazene, tetraphenoxybis (4-methoxyphen Xyl) cyclotriphosphazene, pentaphenoxy (4-methoxyphenoxy) cyclotriphosphazene
- heat stabilizers and oxidation stabilizers examples include Irganox and Irgafos manufactured by Ciba Specialty Chemicals.
- light resistant stabilizer examples include TINUVIN and CHIMASSORB manufactured by Ciba Specialty Chemicals.
- the resin composition corresponding to higher frequency is required to have a low dielectric constant (or relative dielectric constant) or a low dielectric loss tangent.
- the relative dielectric constant is the ratio of the dielectric constant ⁇ of the medium to the dielectric constant ⁇ 0 of vacuum.
- the resin composition contains polyolefin particles having a low dielectric constant, the dielectric constant and dielectric loss tangent are low.
- the relative dielectric constant of the resin composition at a frequency of 1 MHz is preferably 3.3 or less, and more preferably 3.0 or less.
- the dielectric loss tangent of the resin composition at a frequency of 1 MHz is preferably 0.01 or less, and more preferably 0.008 or less. If the dielectric loss tangent exceeds 0.01, transmission loss may increase.
- the relative dielectric constant and dielectric loss tangent of the resin composition may be measured by the following procedure. 1) A film (thickness 30 ⁇ m) made of the resin composition is prepared. A conductive paste is applied to both sides of the film and dried to obtain a film with electrodes (thickness 20 to 30 ⁇ m). 2) The capacitance (C p ) and conductance (G) at 25 ° C., humidity 50%, measurement frequency 1 MHz of the film with electrode obtained in 1) above are measured by the capacitance method.
- the dispersibility with respect to the heat resistant resin (A) of polyolefin particle (B) is improved by reducing the average particle diameter of the polyolefin particle to add, or providing a polar group to the polyolefin particle to add. ing. For this reason, in the obtained resin composition, the dispersed phase of the fine polyolefin is uniformly dispersed.
- the average particle size of the dispersed phase obtained from the polyolefin particles (B) in the resin composition is preferably 100 ⁇ m or less, more preferably 0.001 to 50 ⁇ m, and 0.01 to 20 ⁇ m. Is more preferable.
- the average particle diameter of the dispersed phase obtained from the polyolefin particles (B) can be measured by, for example, TEM observation of a cross section of a film made of the resin composition containing the dispersed phase.
- the resin composition has a low thermal expansion coefficient.
- the reason why the increase in the thermal expansion coefficient of the resin composition is suppressed despite the high thermal expansion coefficient of the polyolefin is not necessarily clear, but it is assumed that the polyolefin is well dispersed. Is done.
- the resin layer (I) is configured.
- the thermal expansion coefficient of the resin composition is preferably 60 ppm / ° C. or less, and more preferably 50 ppm / ° C. or less.
- the thermal expansion coefficient of the resin composition is 100 ° C. to 200 ° C. in a dry air atmosphere using a thermal analyzer TMA50 (manufactured by Shimadzu Corporation) when the resin composition is a film having a thickness of 30 ⁇ m. It is determined by measuring in the range of ° C.
- the resin composition includes, for example, a method of melt-kneading a heat resistant resin (A) and polyolefin particles (B); a monomer constituting the heat resistant resin (A) or a precursor of the heat resistant resin (A), and a polyolefin. After mixing with the particles (B), it is obtained by a polymerization reaction method or the like.
- the resin composition includes 1) a step of preparing a polyamic acid varnish, 2) a step of adding polyolefin particles (B) to the polyamic acid varnish, and stirring the varnish; And 3) a step of imidizing the obtained polyamic acid varnish by heating.
- the polyamic acid varnish in 1) contains polyamic acid and preferably a solvent.
- the resin solids concentration in the polyamic acid varnish is preferably 1 to 40% by weight, and more preferably 10 to 30% by weight. This is for appropriately controlling the conditions of stirring described later.
- the solvent is not particularly limited, but is preferably an aprotic polar solvent, and more preferably an aprotic amide solvent.
- aprotic amide solvents include N, N-dimethylformamide, N, N-dimethylacetamide, N, N-diethylacetamide, N-methyl-2-pyrrolidone, and 1,3-dimethyl-2-imidazo Lysinone etc. are included. These solvents may be used alone or in combination of two or more.
- solvents may be further included as necessary.
- examples of other solvents are benzene, toluene, o-xylene, m-xylene, p-xylene, o-chlorotoluene, m-chlorotoluene, p-chlorotoluene, o-bromotoluene, m-bromotoluene, p -Bromotoluene, chlorobenzene, bromobenzene, methanol, ethanol, n-propanol, isopropyl alcohol, n-butanol and the like are included.
- the polyolefin particles (B) are added to the polyamic acid varnish and stirred to disperse the polyolefin particles (B) in the polyamic acid varnish.
- Stirring may be normal stirring using a stirring blade or the like, or stirring using a rotation / revolution mixer or the like.
- the polyolefin particles (B) to be added may be the particles themselves or a dispersion dispersed in a solvent.
- the polyolefin particles having no polar group are difficult to disperse in the polyamic acid varnish (having polarity). That is, in the present invention, it is important to control the dispersion state so that the polyolefin particles (B) are uniformly dispersed in the polyamic acid varnish without agglomeration.
- the dispersion state of the polyolefin particles (B) is determined by adding a polar group to the added polyolefin particles (B), or by adding the average particle diameter, concentration, and dispersion solvent of the added polyolefin particles (B). It can be controlled by appropriately selecting, adjusting the shear strength of stirring, or the like.
- the average particle size of the added polyolefin particles (B) is preferably as small as possible in order to improve dispersibility. However, if the particle size is too small, the particles are likely to aggregate. More preferably, it is 50 ⁇ m, more preferably 0.01 to 20 ⁇ m. Moreover, in order to improve the dispersibility with respect to a polyamic acid varnish, it is preferable that the dispersion solvent of the polyolefin particle (B) added is a solvent with high compatibility with the solvent contained in a polyamic acid varnish.
- the dispersion state of the polyolefin particles in the resin composition can be observed by, for example, TEM observation of a cross section of a film obtained from the resin composition.
- the viscosity of the polyamic acid varnish to which the polyolefin particles (B) are added is not particularly limited, but from the viewpoint of easy control of the coating thickness, 1 It is preferably in the range of -2.0 ⁇ 10 5 mPa ⁇ s.
- the heating temperature is, for example, about 100 to 400 ° C.
- the heating time is, for example, about 3 minutes to 12 hours.
- the polyamic acid is imidized at atmospheric pressure, but it may also be performed under pressure.
- the atmosphere for imidization is not particularly limited, but is usually air, nitrogen, helium, neon, argon, or the like, preferably nitrogen or argon which is an inert gas.
- the metal resin composite of the present invention may be a metal laminate in which the metal layer and the layer obtained from the resin composition are laminated directly or via an intermediate layer. And a metal coated body in which the outer peripheral surface of the metal wire is coated with a layer obtained from the resin composition described above directly or through an intermediate layer.
- the thickness of the metal layer in the metal laminate is preferably 2 ⁇ m or more and 150 ⁇ m or less, more preferably 3 ⁇ m or more and 50 ⁇ m or less.
- the thermal expansion coefficient of copper is about 17 ppm / K.
- the thickness of the insulating layer (layer made of the resin composition) in the metal laminate is preferably 0.1 ⁇ m or more and 100 ⁇ m or less, and more preferably 0.5 ⁇ m or more and 50 ⁇ m or less.
- the metal laminate of the present invention has an insulating layer obtained from a resin composition having a low dielectric constant and high heat resistance. Therefore, the metal laminate of the present invention is preferably used as various circuit boards, particularly as a high-frequency circuit board.
- Such a circuit board is, for example, 1) a method of thermocompression bonding a sheet obtained from the above resin composition and a metal foil; 2) a conductor layer is sputtered on the sheet obtained from the above resin composition. 3) A method of forming by vapor deposition or the like; 3) A method of applying a varnish of the resin composition described above to a metal foil and curing it.
- the sheet obtained from the resin composition is obtained by applying a varnish on a supporting substrate, drying, heat treatment, and the like, and then peeling the sheet from the supporting substrate.
- the means for applying the varnish is not particularly limited, and examples thereof include a spin coater, a spray coater, and a bar coater.
- the thickness of the sheet obtained from the resin composition is preferably about 0.1 to 200 ⁇ m from the viewpoint of being used as a circuit board.
- the thermocompression bonding temperature is not less than the glass transition temperature of the resin composition, specifically about 130 to 300 ° C., although it depends on the combination of the resin composition and the metal foil.
- the circuit board of the present invention has an insulating layer having high heat resistance and low dielectric constant, an electronic component having a high-frequency circuit, for example, a built-in antenna for a mobile phone, an in-vehicle radar antenna for home use, It can be widely applied to various applications using high frequency such as high-speed wireless communication.
- the thickness of the insulating layer (layer made of the resin composition) in the metal coating can be about 0.05 to 5 mm, although it depends on the diameter of the metal wire and the required insulation.
- the metal wire is coated with an insulating layer made of a resin composition having a low dielectric constant and high heat resistance.
- the metal coating body of this invention is preferably used as electric wires, such as various cables and a cord, for example.
- Such an electric wire can be obtained by, for example, a method of extrusion coating (extrusion molding) the resin composition on the outer peripheral surface of a metal wire, a method of injection molding, or the like.
- the resin composition constituting the resin layer (I) in the metal resin composite has a low relative dielectric constant and high heat resistance. Therefore, the resin composition can be preferably used as a low dielectric constant insulating material (such as a low dielectric constant insulating base material, an insulating layer, or an insulating coating material).
- a low dielectric constant insulating material such as a low dielectric constant insulating base material, an insulating layer, or an insulating coating material.
- Example 1 Preparation of polyamic acid A
- a vessel equipped with a stirrer and a nitrogen introduction tube was charged with 20.55 g of PDA and 301 g of NMP as a solvent, and the temperature of the solution was raised to 50 ° C. to dissolve the PDA. Stir until After the temperature of the solution was lowered to room temperature, 55.34 g of BPDA was added over about 30 minutes, 129 g of NMP was further added, and the mixture was stirred for 20 hours to obtain a polyamic acid A varnish.
- the obtained varnish had a solid content of polyamic acid A of 15% by weight and a logarithmic viscosity of 1.3 dl / g.
- polyimide A / PO1 composite film Preparation of polyimide A / PO1 composite film
- the obtained polyamic acid A / PO1 mixed solution was applied on a glass plate with a baker applicator so that the dry film thickness was about 30 ⁇ m, and then in an inert oven under a nitrogen atmosphere. It was dried at 300 ° C. for 120 minutes.
- the glass plate in which the coating film was formed was immersed in the water of the temperature of about 40 degreeC, and the coating film was peeled from the glass plate, and the polyimide A / PO1 composite film with a thickness of 30 micrometers was obtained.
- Example 2 A polyimide A / PO1 composite film was obtained in the same manner as in Example 1 except that the addition amount of the polyethylene particles PO1 was changed as shown in Table 1.
- Example 4 A polyimide A / PO2 composite film was obtained in the same manner as in Example 1 except that the PO1 / DMAc dispersion of Example 1 was changed to a PO2 / DMAc dispersion.
- Example 5 Preparation of polyamic acid A / PO2 / flame retardant composite film
- 50 g of varnish of polyamic acid A 9 g of a PO2 / DMAc dispersion with a solid content concentration of 25% by weight, and triphenoxytris (4- Cyanophenoxy) cyclotriphosphazene (Fushimi Pharmaceutical, Rabitol FP-300) 1.5 g was added and mixed using a kneader to prepare a polyamic acid A / PO2 / flame retardant mixture.
- a polyimide A / PO 2 / flame retardant composite film was obtained in the same manner as in Example 1.
- Example 6 Preparation of polyamic acid B 24.03 g of ODA and 139.5 g of DMAc as a solvent were charged in a container equipped with a stirrer and a nitrogen introduction tube, and stirred until ODA was dissolved. Next, 25.78 g of PMDA was added to this solution over about 30 minutes, 103.7 g of DMAc was further added, and the mixture was stirred for 20 hours to obtain a polyamic acid B varnish. The obtained varnish had a solid content of polyamic acid B of 17% by weight and a logarithmic viscosity of 1.2 dl / g.
- Example 2 In the same manner as in Example 1, except that the obtained polyamic acid B varnish was mixed with a PO1 / DMAc dispersion so that the amount ratio of polyamic acid B / PO1 was as shown in Table 2. A PO1 mixture was prepared. A polyimide B / PO1 composite film was obtained in the same manner as in Example 1.
- Example 7 In the same manner as in Example 1, except that the obtained polyamic acid B varnish was mixed with a PO3 / DMAc dispersion so that the amount ratio of polyamic acid B / PO3 was as shown in Table 2. A PO3 mixture was prepared. A polyimide B / PO3 composite film was obtained in the same manner as in Example 1.
- NMP NMP was added as a solvent to a container equipped with another stirrer and a nitrogen introduction tube, 19.62 g of PDA was added, and the mixture was stirred and dissolved at 20 to 30 ° C. Thereafter, 37.0 g of BPDA and 11.06 g of PMDA were further added, and the raw material adhering to the inside of the flask was washed off with 10.0 g of NMP, heated to 50 to 60 ° C. and stirred for about 4 hours. The varnish was obtained.
- the obtained varnish of polyamic acid C had a polyamic acid C content of 20% by weight and an E-type viscosity at 25 ° C. of 30000 mPa ⁇ s.
- Example 3 A polyimide film was obtained in the same manner as in Example 8 except that the polyethylene particles PO2 and the flame retardant were not added.
- Example 9 Preparation of polyamic acid D 212 g of DABP was dissolved in 1230 g of DMAc in a vessel equipped with a stirrer, a reflux condenser, and a nitrogen introduction tube. Under a nitrogen atmosphere, 316 g of BTDA was added to this solution and stirred at 10 ° C. for 24 hours to obtain a varnish of polyimide acid D.
- This polyamic acid D varnish was diluted with DMAc to 15.0 wt%, and the viscosity was adjusted to 200 mPa ⁇ s at 25 ° C.
- polyamic acid E 292 g of APB and 321 g of BTDA were weighed, added to 3743 g of DMAc, and stirred at 23 ° C. for 4 hours to obtain a polyamic acid E varnish.
- the solid content concentration of the varnish of the polyamic acid E was 15% by weight.
- the viscosity of the varnish of the polyamic acid E was 500 mPa ⁇ s.
- An electrolytic copper foil having a thickness of 12 ⁇ m was prepared as a metal foil.
- a polyamic acid D varnish was uniformly cast on the surface of the electrolytic copper foil by a roll coater so that the thickness after imidization was about 1 ⁇ m, and then dried at 100 ° C. for 4 minutes. As a result, a first polyamic acid D layer was formed.
- the polyamic acid C / PO2 / flame retardant mixed solution prepared in Example 8 is uniformly cast on the surface of the obtained polyamic acid D layer by a die coater so that the thickness after imidization is about 10 ⁇ m. After coating, it was dried at 130 ° C. for 4 minutes. As a result, a second polyamic acid C ′ layer was formed.
- the varnish of polyamic acid E is uniformly cast and applied by a roll coater so that the thickness after imidization is about 2 ⁇ m, and then dried at 100 ° C. for 4 minutes. It was. As a result, a third polyamic acid E layer was formed.
- each polyamic acid layer on the copper foil was dried at 200 ° C. for 4 minutes, and then further heated for 3 minutes in a nitrogen atmosphere (oxygen concentration of 0.5 vol% or less) at 380 ° C. to be imidized.
- a single-sided metal laminate having a single polyimide layer was obtained.
- another single-sided metal laminate was produced.
- the polyimide layers of the two obtained single-sided metal laminates were bonded to each other, and were subjected to hot pressing for 4 hours under the conditions of a press pressure of 2 MPa and a temperature of 320 ° C. using a press machine to obtain a double-sided metal laminate. Thereafter, the electrolytic copper foil of the double-sided metal laminate was removed by etching, and various measurements were performed using the obtained resin laminate film.
- Example 4 A double-sided metal laminate was obtained in the same manner as in Example 9, except that the polyamic acid C layer obtained by applying a varnish of polyamic acid C was used instead of the second polyamic acid C ′ layer. Thereafter, the electrolytic copper foil of the double-sided metal laminate was removed by etching, and various measurements were performed using the obtained resin laminate film.
- the polyimide / polyolefin composite films obtained in Examples 1 to 8, the polyimide films obtained in Comparative Examples 1 to 3, and the resin laminated films constituting the metal laminates obtained in Example 9 and Comparative Example 4, The thermal expansion coefficient, thermal deformation temperature, dielectric properties (relative dielectric constant and dielectric loss tangent), tensile strength, tensile elastic modulus, surface roughness and flame retardancy were measured as follows. Moreover, the dispersion state of the dispersed phase obtained from the polyethylene particles in the polyimide / polyolefin composite film obtained in Example 1 was observed as follows.
- Thermal expansion coefficient of the obtained film was measured in the range of 100 ° C to 200 ° C under a dry air atmosphere using a thermal analyzer TMA50 series (manufactured by Shimadzu Corporation).
- thermomechanical analyzer TMA-50, manufactured by Shimadzu Corporation
- a constant load 14 g for the cross-sectional area of 1 mm 2 of the film
- the thermal deformation temperature was determined by a tensile method for measuring elongation (shrinkage) when the temperature was changed from 30 to 450 ° C.
- the temperature at which the elongation of the film greatly increased was defined as the heat distortion temperature.
- Example 1-5 and Comparative Example 1 are shown in Table 1; the results obtained in Examples 6-7 and Comparative Example 2 are shown in Table 2; the results obtained in Example 8 and Comparative Example 3 Table 3 shows the results obtained in Example 9 and Comparative Example 4.
- the polyimide / polyolefin composite films of Examples 1 to 8 blended with polyolefin particles had a relative dielectric constant and a dielectric loss tangent that corresponded to each example, compared to the polyimides of Comparative Examples 1 to 3 not blended with polyolefin particles. It turns out that it is low. Also, depending on the blending amount of the polyolefin particles, the polyimide / polyolefin composite films of Examples 1 to 8 blended with polyolefin particles were the same as the corresponding polyimide films of Comparative Examples 1 to 3 that did not blend with polyolefin particles. It can be seen that it has a low coefficient of thermal expansion.
- the resin laminated film in the metal laminate of Example 9 blended with polyolefin particles has both a relative dielectric constant and a dielectric loss tangent as compared to the resin laminate film in the metal laminate of Comparative Example 4 not blended with polyolefin particles. It turns out that it is low. Moreover, it turns out that the resin laminated film in the metal laminated body of Example 9 has a low thermal expansion coefficient comparable as the resin laminated film in the corresponding metal laminated body of the comparative example 4 which did not mix
- thermal expansion coefficient of polyethylene alone is usually as high as about 100 to 200 ppm / K, it has been found that the increase in the thermal expansion coefficient is surprisingly small even when a relatively large amount of polyethylene particles is blended. .
- the thermal expansion coefficient of the film of Example 6 using polyethylene particles having polar groups is higher than that of the film of Example 7 using polyethylene particles having no polar groups. It turns out that it is low. This is considered to be because the film of Example 6 has higher dispersibility of the phase obtained from polyethylene than the film of Example 7.
- the film of Example 6 using polyethylene particles having a polar group has a ten-point average roughness (Rz) on the film surface lower than the film of Example 7 using polyethylene particles having no polar group.
- Rz ten-point average roughness
- Examples 4 and 5 and Comparative Example 1 are compared. It can be seen that the film of Example 4 containing polyethylene particles has lower flame retardancy than the film of Comparative Example 1 containing no polyethylene particles. However, the film of Example 5 containing polyethylene particles and containing a flame retardant is more flame retardant in the flame retardant evaluation (UL94VTM combustion test) than the film of Example 4 containing polyethylene particles and no flame retardant. (VTM-0) was observed.
- a polyolefin dispersed phase having an average particle size of 0.3 to 10 ⁇ m is dispersed in the continuous phase of the polyimide resin (A). It was confirmed that Thereby, it turned out that the dispersed phase of polyolefin is disperse
- a heat-resistant resin composition having a low dielectric constant or dielectric loss tangent and a low thermal expansion coefficient can be provided.
- the metal resin composite which has the layer (resin layer (I)) which consists of a resin composition is used preferably for various circuit boards (especially high frequency circuit board) and various electric wires.
- the circuit board of the present invention can be widely applied to various applications using high frequencies, such as a built-in antenna of a mobile phone, an antenna of a vehicle-mounted radar, and a high-speed wireless communication for home use.
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Abstract
Description
[1] 金属と、前記金属と直接または中間層を介して接する樹脂層(I)とを有する金属樹脂複合体であって、前記樹脂層(I)は、周波数1MHzにおける比誘電率が2.3以上である耐熱性樹脂(A)と、平均粒子径が100μm以下のポリオレフィン粒子(B)とを混合して得られる樹脂組成物から得られ、前記樹脂組成物は、前記耐熱性樹脂(A)の連続相と、前記ポリオレフィン粒子(B)から得られる分散相とを有し、かつ前記樹脂組成物の比誘電率は、前記耐熱性樹脂(A)よりも低い、金属樹脂複合体。
[2] 前記耐熱性樹脂(A)が、ポリイミド、ポリアミドイミド、液晶ポリマーおよびポリフェニレンエーテルからなる群から選ばれる少なくとも1種である、[1]に記載の金属樹脂複合体。
[3] 前記耐熱性樹脂(A)が、ポリイミドである、[1]または[2]に記載の金属樹脂複合体。
[4] 前記樹脂組成物の、周波数1MHzにおける比誘電率が3.3以下である、[1]~[3]のいずれかに記載の金属樹脂複合体。
[5] 前記ポリオレフィン粒子(B)が、エチレン、プロピレン、1-ブテンおよび4-メチル-1-ペンテンからなる群より選ばれる少なくとも1種類のモノマーから導かれる構成単位を含む重合体である、[1]~[4]のいずれかに記載の金属樹脂複合体。
[6] 前記ポリオレフィン粒子(B)が、極性基を有する、[1]~[5]のいずれかに記載の金属樹脂複合体。
[7] 前記極性基が、水酸基、カルボキシル基、アミノ基、アミド基、イミド基、エーテル基、ウレタン基、尿素基、リン酸基、スルホン酸基およびカルボン酸無水物基からなる群より選ばれる少なくとも1種類の官能基である、[6]に記載の金属樹脂複合体。
[8] 前記ポリオレフィン粒子(B)が、コロナ処理、プラズマ処理、電子線照射またはUVオゾン処理が施されている、[1]~[7]のいずれかに記載の金属樹脂複合体。
[9] 前記樹脂組成物は、100重量部の前記耐熱性樹脂(A)に対して、5重量部以上200重量部以下の前記ポリオレフィン粒子(B)を含む、[1]~[8]のいずれかに記載の金属樹脂複合体。
[10] 前記樹脂組成物は、難燃剤をさらに含む、[1]~[9]のいずれかに記載の金属樹脂複合体。
[11] 前記耐熱性樹脂(A)の周波数1MHzにおける誘電正接が0.001以上であり、かつ前記樹脂組成物の誘電正接は、前記耐熱性樹脂(A)の誘電正接よりも低い、[1]~[10]のいずれかに記載の金属樹脂複合体。
[12] 前記金属は、金属層であって、前記金属樹脂複合体は、前記金属層と、前記樹脂層(I)とが直接または中間層を介して積層された金属積層体である、[1]~[11]のいずれかに記載の金属樹脂複合体。
[13] 前記積層体は、回路用基板である、[12]に記載の金属樹脂複合体。
[14] 前記積層体は、高周波回路用基板である、[12]または[13]に記載の金属樹脂複合体。
[15] 前記金属は、金属線であって、前記金属樹脂複合体は、前記金属線の外周面が、直接または中間層を介して前記樹脂層(I)により被覆された金属被覆体である、[1]~[11]のいずれかに記載の金属樹脂複合体。
[16] 前記被覆体は、電線である、[15]に記載の金属樹脂複合体。
本発明の金属樹脂複合体は、金属と、その表面に直接または中間層を介して接する樹脂層(I)と、を有する。中間層は、例えば接着層などでありうる。金属および樹脂層(I)は、それぞれ複数あってもよい。本発明の金属樹脂複合体は、金属、樹脂層(I)および中間層以外の他の層(例えば、前記樹脂層(I)以外の樹脂層など)をさらに含んでもよい。
金属は、導体として機能しうる。金属は、特に制限されないが、銅、銅合金、アルミニウム、ニッケル、金、銀およびステンレス等の金属が挙げられる。なかでも、高い導電性を得られる観点から、銅または銅合金が好ましい。金属は、金属層であっても、金属線であってもよい。金属層は、金属箔、金属板等であってよい。
樹脂層(I)は、前記金属を他から絶縁する絶縁層として機能しうる。樹脂層(I)は、耐熱性樹脂(A)の連続相と、ポリオレフィン粒子(B)から得られる分散相とを含む樹脂組成物から形成される。樹脂組成物における、ポリオレフィン粒子(B)から得られる分散相は、例えば添加されたポリオレフィン粒子(B)の凝集物または溶融物等でありうる。
耐熱性樹脂(A)は、樹脂組成物の耐熱性を高くし、熱膨張係数を低くする観点から、ガラス転移温度が150℃以上の樹脂が好ましい。
ポリオレフィン粒子(B)は、誘電率や誘電正接が低いことから、耐熱性樹脂(A)に添加することで、樹脂組成物の誘電率を低くすることができる。このようなポリオレフィン粒子(B)は、炭素数2~20の炭化水素から選ばれるモノマーを含む単独重合体または共重合体からなる。炭素数2~20の炭化水素のうち、炭素数2~10の炭化水素が好ましい。
マレイン酸ジメチル、マレイン酸モノメチル、マレイン酸ジエチル、フマル酸ジエチル、イタコン酸ジメチル、シトラコン酸ジエチル、テトラヒドロフタル酸ジメチル、ビシクロ[2,2,1]ヘプト-2-エン-5,6-ジカルボン酸ジメチル;
ヒドロキシエチル(メタ)アクリレート、2-ヒドロキシプロピル(メタ)アクリレート、3-ヒドロキシプロピル(メタ)アクリレート、2-ヒドロキシ-3-フェノキシ-プロピル(メタ)アクリレート、3-クロロ-2-ヒドロキシプロピル(メタ)アクリレート、グリセリンモノ(メタ)アクリレート、ペンタエリスリトールモノ(メタ)アクリレート、トリメチロールプロパンモノ(メタ)アクリレート、テトラメチロールエタンモノ(メタ)アクリレート、ブタンジオールモノ(メタ)アクリレート、ポリエチレングリコールモノ(メタ)アクリレート、2-(6-ヒドロキシヘキサノイルオキシ)エチルアクリレートなどの(メタ)アクリル酸エステル;
グリシジル(メタ)アクリレート;
(メタ)アクリル酸アミノエチルおよび(メタ)アクリル酸アミノプロピル等が含まれる。これらのうち、好ましくは(メタ)アクリル酸、無水マレイン酸、ヒドロキシエチル(メタ)アクリレート、グリシジル(メタ)アクリレートおよび(メタ)アクリル酸アミノプロピルである。
マレイン酸、フマル酸、クロトン酸、テトラヒドロフタル酸、イタコン酸、シトラコン酸、エンド-シス-ビシクロ[2.2.1]ヘプト-5-エン-2,3-ジカルボン酸(ナジック酸TM)、エンド-シス-ビシクロ[2.2.1]ヘプト-5-エン-2-メチル-2,3-ジカルボン酸(メチルナジック酸TM)、およびアリルコハク酸等のジカルボン酸の、モノアルキルグリシジルエステルおよびジグリシジルエステル(モノアルキルグリシジルエステルに含まれるアルキル基の炭素数は1~12である);ブテントリカルボン酸等のトリカルボン酸のモノアルキルグリシジルエステルおよびジグリシジルエステル(モノアルキルグリシジルエステルに含まれるアルキル基の炭素数は1~12である);
p-スチレンカルボン酸のアルキルグリシジルエステル、アリルグリシジルエーテル、2-メチルアリルグリシジルエーテル、スチレン-p-グリシジルエーテル、3,4-エポキシ-1-ブテン、3,4-エポキシ-3-メチル-1-ブテン、3,4-エポキシ-1-ペンテン、3,4-エポキシ-3-メチル-1-ペンテン、5,6-エポキシ-1-ヘキセンおよびビニルシクロヘキセンモノオキシド等が含まれる。
N-ビニルジエチルアミンおよびN-アセチルビニルアミンなどのビニルアミン系誘導体類;
アリルアミン、メタクリルアミン、N-メチルアクリルアミン、N,N-ジメチルアクリルアミドおよびN,N-ジメチルアミノプロピルアクリルアミド等のアリルアミン系誘導体;
アクリルアミドおよびN-メチルアクリルアミド等のアクリルアミド系誘導体;
p-アミノスチレン等のアミノスチレン類;
6-アミノヘキシルコハク酸イミドおよび2-アミノエチルコハク酸イミド等が含まれる。
PO-f-R-(X)n-h …(3)
樹脂組成物には、耐熱性や放熱性等を高めるなどの観点で、必要に応じて、無機フィラー等が含まれてもよい。無機フィラーの例には、シリカ、アルミナ、酸化チタン、酸化マグネシウム、水酸化アルミニウム、水酸化マグネシウム、塩基性炭酸マグネシウム、ドロマイト、硫酸カルシウム、チタン酸カリウム、硫酸バリウム、亜硫酸カルシウム、タルク、クレー、マイカ、ガラスフレーク、ガラスビーズ、ケイ酸カルシウム、モンモリロナイト、ベントナイトおよび硫化モリブデン等が含まれ、好ましくはシリカである。無機フィラーの平均粒径は、好ましくは0.1~60μmであり、より好ましくは0.5~30μmである。
レゾルシノールジフェニルホスフェートおよびハイドロキノンジフェニルホスフェート等の水酸基含有リン酸エステル;
レゾルシノールビス(ジフェニルホスフェート)、ハイドロキノンビス(ジフェニルホスフェート)、ビスフェノール-Aビス(ジフェニルホスフェート)、ビスフェノール-Sビス(ジフェニルホスフェート)、レゾルシノールビス(ジキシリルホスフェート)、ハイドロキノンビス(ジキシリルホスフェート)、ビスフェノール-Aビス(ジトリルホスフェート)、ビフェノール-Aビス(ジキシリルホスフェート)およびビスフェノール-Sビス(ジキシリルホスフェート)等の縮合リン酸エステル化合物等が含まれる。
1)樹脂組成物からなるフィルム(厚さ30μm)を用意する。このフィルムの両面に導電ペーストを塗布・乾燥して、電極(厚み20~30μm)付きフィルムを得る。
2)前記1)で得られた電極付きフィルムの、25℃、湿度50%、測定周波数1MHzにおける静電容量(Cp)とコンダクタンス(G)を、静電容量法により測定する。
3)前記2)で得られた静電容量(Cp)とコンダクタンス(G)の値を、下式に代入することで、測定周波数1MHzにおける比誘電率(εr)と誘電正接(tanδ)を算出する。
本発明の金属樹脂複合体は、前述の金属層と、前述の樹脂組成物から得られる層とが直接または中間層を介して積層された金属積層体であってもよいし;前述の金属線の外周面が、前述の樹脂組成物から得られる層で直接または中間層を介して被覆された金属被覆体であってもよい。
DMAc :N,N-ジメチルアセトアミド
NMP :N-メチル-2-ピロリドン(2)ポリイミド樹脂(A)の構成成分
ジアミン
PDA :p-フェニレンジアミン
ODA :4,4'-ジアミノジフェニルエーテル
APB :1,3-ビス(3-アミノフェノキシ)ベンゼン
DABP :3,3’-ジアミノベンゾフェノン
m-BP :4,4’-ビス(3-アミノフェノキシ)ビフェニル
酸二無水物
BPDA :3,3',4,4'-ビフェニルテトラカルボン酸二無水物
PMDA :ピロメリット酸二無水物
BTDA :3,3’,4,4’-ベンゾフェノンテトラカルボン酸二無水物(3)ポリオレフィン粒子(B)
PO1 :ポリエチレン粒子(平均粒子径6μm、極性基の種類:マレイン酸から誘導される基、極性基の含有量:0.03mol/kg)
PO2 :エチレン-ブテン共重合体粒子(平均粒子径4μm、極性基の種類:マレイン酸から誘導される基、極性基の含有量:0.03mol/kg)
PO3 :ポリエチレン粒子(平均粒子径10μm、極性基なし)
ポリアミド酸Aの調製
撹拌機および窒素導入管を備えた容器に、20.55gのPDAと、溶媒としての301gのNMPとを装入し、溶液の温度を50℃に昇温してPDAが溶解するまで撹拌した。溶液の温度を室温まで下げた後、55.34gのBPDAを約30分かけて投入し、129gのNMPをさらに加えて、20時間攪拌してポリアミド酸Aのワニスを得た。得られたワニスは、ポリアミド酸Aの固形分の含有率が15重量%であり、対数粘度は1.3dl/gであった。
プラスチック製の容器に、ポリアミド酸Aのワニス50gと、固形分濃度25重量%のPO1/DMAc分散液12gを投入し、混練機を用いて混ぜ合わせることにより、ポリアミド酸A/PO1混合液を調製した。
得られたポリアミド酸A/PO1混合液を、ガラス板上に、乾燥膜厚が約30μmとなるようにベーカーアプリケーターで塗布した後、イナートオーブンで、窒素雰囲気下、300℃で120分間乾燥させた。このようにして塗膜が形成されたガラス板を、温度約40℃の水に浸漬して塗膜をガラス板から剥離することにより、厚さ30μmのポリイミドA/PO1複合フィルムを得た。
ポリエチレン粒子PO1の添加量を、表1に示されるように変更した以外は、実施例1と同様にして、ポリイミドA/PO1複合フィルムを得た。
実施例1のPO1/DMAc分散液を、PO2/DMAc分散液とした以外は実施例1と同様にしてポリイミドA/PO2複合フィルムを得た。
ポリアミド酸A/PO2/難燃剤複合フィルムの作製
プラスチック製の容器に、ポリアミド酸Aのワニス50gと、固形分濃度25重量%のPO2/DMAc分散液9gと、難燃剤としてトリフェノキシトリス(4-シアノフェノキシ)シクロトリホスファゼン(伏見製薬製、ラビトルFP-300)1.5gとを投入し、混練機を用いて混ぜ合わせることにより、ポリアミド酸A/PO2/難燃剤混合液を調製した。この混合液を用いて、実施例1と同様にしてポリイミドA/PO2/難燃剤複合フィルムを得た。
撹拌機および窒素導入管を備えた容器に、24.03gのODAと、溶媒として139.5gのDMAcを装入し、ODAが溶解するまで撹拌した。次いで、この溶液に、25.78gのPMDAを約30分かけて投入し、さらに103.7gのDMAcを加えて、20時間攪拌してポリアミド酸Bのワニスを得た。得られたワニスは、ポリアミド酸Bの固形分の含有量が17重量%であり、対数粘度は1.2dl/gであった。
得られたポリアミド酸Bのワニスに、ポリアミド酸B/PO3の量比が表2に示されるようになるようにPO3/DMAc分散液を混合した以外は実施例1と同様にしてポリアミド酸B/PO3混合液を調製した。そして、実施例1と同様の方法で、ポリイミドB/PO3複合フィルムを得た。
ポリアミド酸Cの調製
撹拌機および窒素導入管を備えた容器に、溶媒として261.0gのDMAcを加え、これに20.44gのODAと、16.12gのm-BPとをさらに加えて、20~30℃で撹拌して溶解させた。次いで、30.84gのPMDAを加え、11.0gのDMAcでフラスコ内部に付着した原料を洗い落とし、50~60℃に加熱し約1時間撹拌を行った。その後、0.44gのPMDAをさらに加えて、60℃に温度を保ちながら約4時間撹拌を行い、ポリアミド酸C1のワニスを得た。
プラスチック製の容器に、ポリアミド酸Cのワニス36.2gと、エチレン-ブテン共重合体粒子PO2を2g、難燃剤としてホスフィン酸アルミニウム塩(クラリアントジャパン株式会社製、Exolit OP935)0.75gとを投入し、混練機を用いて混ぜ合わせることにより、ポリアミド酸C/PO2/難燃剤混合液を調製した。この混合液を用いて、実施例1と同様にしてポリイミドC/PO2/難燃剤複合フィルムを得た。
ポリエチレン粒子PO1を添加しなかった以外は、実施例1と同様にして、ポリイミドフィルムを得た。
ポリエチレン粒子PO1を添加しなかった以外は、実施例6と同様にして、ポリイミドフィルムを得た。
ポリエチレン粒子PO2および難燃剤を添加しなかった以外は、実施例8と同様にして、ポリイミドフィルムを得た。
ポリアミド酸Dの調製
撹拌機、還流冷却機および窒素導入管を備えた容器で、212gのDABPを1230gのDMAcに溶解させた。この溶液に、窒素雰囲気下において、316gのBTDAを添加し、10℃で24時間撹拌してポリイミド酸Dのワニスを得た。このポリアミド酸Dのワニスを、DMAcで15.0重量%まで希釈し、25℃において粘度を200mPa・sに調節した。
292gのAPBと、321gのBTDAとをそれぞれ秤量し、それらを3743gのDMAc中に添加し、23℃において4時間攪拌してポリアミド酸Eのワニスを得た。ポリアミド酸Eのワニスの固形分濃度は15重量%であった。また、ポリアミド酸Eのワニスの粘度は500mPa・sであった。
金属箔として、厚さ12μmの電解銅箔を準備した。この電解銅箔の表面に、ポリアミド酸Dのワニスを、ロールコーターにより、イミド化後の厚みが約1μmになるように均一に流延塗布した後、100℃で4分間乾燥させた。これにより、第1層目のポリアミド酸D層を形成した。
第2層目のポリアミド酸C’層の代わりに、ポリアミド酸Cのワニスを塗布して得られるポリアミド酸C層とした以外は、実施例9と同様にして両面金属積層体を得た。その後、両面金属積層体の電解銅箔をエッチング除去し、得られた樹脂積層フィルムを用いて各種測定を行った。
得られたフィルムの熱膨張係数を、熱分析装置TMA50シリーズ(島津製作所株式会社製)を用いて、乾燥空気雰囲気下、100℃~200℃の範囲で測定した。
熱機械分析計(TMA-50、島津製作所製)を用いて、フィルム(厚み約30μm、長さ20mm)の両端に一定荷重(フィルムの断面積1mm2に対し14g)をかけて、温度を30~450℃に変化させた際の伸び(縮み)を測定する引っ張り法により熱変形温度を求めた。この際、フィルムの伸びが大きく上昇する時の温度を、熱変形温度とした。
得られたフィルムの両面に、導電ペーストを塗布することにより、厚み20~30μmの電極を形成した。導電ペーストの成分は銀とした。このフィルム上に形成した電極に、横河ヒューレット・パッカード(株)製のHP4294A プレシジョン・インピーダンス・アナライザを用いて電流を流して、温度23℃、湿度50%環境下でのポリイミドフィルムの静電容量(Cp)およびコンダクタンス(G)を測定した。得られた値を下式に代入することで、測定周波数1MHzにおける比誘電率(εr)、および誘電正接(tanδ)を算出した。
得られたフィルムの、23℃における引張強度および引張弾性率を、島津製作所社製小型卓上試験機 EZTestを用いて測定した。
触針式表面形状測定装置(商品名「DEKTAK3」、日本真空技術社製)を用いて、フィルムの10点平均粗さ(Rz)を計測した。
得られたフィルムを、ASTM D4804に準拠するUL94VTM燃焼試験に供し、上記試験法で規定される難燃性等級を得た。難燃性等級の判定基準を満たさないもの(難燃性が認められないもの)は「×」とした。難燃性等級には、VTM-0、VTM-1およびVTM-2の3つがあり、この順に難燃性が高いことを示す。
実施例1のポリイミド/ポリオレフィン複合フィルムについて、ポリエチレン粒子PO1の分散状態をTEMにより観察した。具体的には、ポリイミド/ポリオレフィン複合フィルムを切断して得られた断面を、透過型電子顕微鏡(TEM)により3000倍で観察することにより断面TEM像を得た。実施例1のポリイミド/ポリオレフィン複合フィルムの断面TEM写真を図1に示す。
Claims (16)
- 金属と、前記金属と直接または中間層を介して接する樹脂層(I)と、を有する金属樹脂複合体であって、
前記樹脂層(I)は、
周波数1MHzにおける比誘電率が2.3以上である耐熱性樹脂(A)と、平均粒子径が100μm以下のポリオレフィン粒子(B)とを混合して得られる樹脂組成物から得られ、
前記樹脂組成物は、
前記耐熱性樹脂(A)の連続相と、前記ポリオレフィン粒子(B)から得られる分散相とを有し、かつ
前記樹脂組成物の比誘電率は、前記耐熱性樹脂(A)よりも低い、金属樹脂複合体。 - 前記耐熱性樹脂(A)が、ポリイミド、ポリアミドイミド、液晶ポリマーおよびポリフェニレンエーテルからなる群から選ばれる少なくとも1種である、請求項1に記載の金属樹脂複合体。
- 前記耐熱性樹脂(A)が、ポリイミドである、請求項1または2に記載の金属樹脂複合体。
- 前記樹脂組成物の、周波数1MHzにおける比誘電率が3.3以下である、請求項1~3のいずれか一項に記載の金属樹脂複合体。
- 前記ポリオレフィン粒子(B)が、エチレン、プロピレン、1-ブテンおよび4-メチル-1-ペンテンからなる群より選ばれる少なくとも1種類のモノマーから導かれる構成単位を含む重合体である、請求項1~4のいずれか一項に記載の金属樹脂複合体。
- 前記ポリオレフィン粒子(B)が、極性基を有する、請求項1~5のいずれか一項に記載の金属樹脂複合体。
- 前記極性基が、水酸基、カルボキシル基、アミノ基、アミド基、イミド基、エーテル基、ウレタン基、尿素基、リン酸基、スルホン酸基およびカルボン酸無水物基からなる群より選ばれる少なくとも1種類の官能基である、請求項6に記載の金属樹脂複合体。
- 前記ポリオレフィン粒子(B)が、コロナ処理、プラズマ処理、電子線照射またはUVオゾン処理が施されている、請求項1~7のいずれか一項に記載の金属樹脂複合体。
- 前記樹脂組成物は、100重量部の前記耐熱性樹脂(A)に対して、5重量部以上200重量部以下の前記ポリオレフィン粒子(B)を含む、請求項1~8のいずれか一項に記載の金属樹脂複合体。
- 前記樹脂組成物は、難燃剤をさらに含む、請求項1~9のいずれか一項に記載の金属樹脂複合体。
- 前記耐熱性樹脂(A)の周波数1MHzにおける誘電正接が、0.001以上であり、かつ前記樹脂組成物の誘電正接が、前記耐熱性樹脂(A)の誘電正接よりも低い、請求項1~10のいずれか一項に記載の金属樹脂複合体。
- 前記金属は、金属層であって、
前記金属樹脂複合体は、前記金属層と、前記樹脂層(I)とが直接または中間層を介して積層された金属積層体である、請求項1~11のいずれか一項に記載の金属樹脂複合体。 - 前記金属積層体は、回路用基板である、請求項12に記載の金属樹脂複合体。
- 前記金属積層体は、高周波回路用基板である、請求項12に記載の金属樹脂複合体。
- 前記金属は、金属線であって、
前記金属樹脂複合体は、前記金属線の外周面が、直接または中間層を介して前記樹脂層(I)により被覆された金属被覆体である、請求項1~11のいずれか一項に記載の金属樹脂複合体。 - 前記金属被覆体は、電線である、請求項15に記載の金属樹脂複合体。
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JP2011551765A JPWO2011093079A1 (ja) | 2010-01-28 | 2011-01-27 | 金属樹脂複合体 |
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KR20120112657A (ko) | 2012-10-11 |
TW201134654A (en) | 2011-10-16 |
JPWO2011093079A1 (ja) | 2013-05-30 |
US20120301718A1 (en) | 2012-11-29 |
CN102741352A (zh) | 2012-10-17 |
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