WO2008078686A1 - オキシムエステル化合物及び該化合物を含有する光重合開始剤 - Google Patents

オキシムエステル化合物及び該化合物を含有する光重合開始剤 Download PDF

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Publication number
WO2008078686A1
WO2008078686A1 PCT/JP2007/074668 JP2007074668W WO2008078686A1 WO 2008078686 A1 WO2008078686 A1 WO 2008078686A1 JP 2007074668 W JP2007074668 W JP 2007074668W WO 2008078686 A1 WO2008078686 A1 WO 2008078686A1
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WIPO (PCT)
Prior art keywords
independently represent
compound
carbon atoms
conr12r13
cor11
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PCT/JP2007/074668
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English (en)
French (fr)
Inventor
Daisuke Sawamoto
Koichi Kimijima
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Adeka Corporation
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Publication date
Application filed by Adeka Corporation filed Critical Adeka Corporation
Priority to US12/513,473 priority Critical patent/US8133656B2/en
Priority to EP07859948.7A priority patent/EP2128132B1/en
Priority to JP2008551083A priority patent/JP5179379B2/ja
Priority to CN2007800403335A priority patent/CN101528682B/zh
Publication of WO2008078686A1 publication Critical patent/WO2008078686A1/ja

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/46—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms
    • C07C323/47—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms to oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32—Oximes
    • C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
    • C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
    • C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/62—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
    • C07C323/63—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton the carbon skeleton being further substituted by nitrogen atoms, not being part of nitro or nitroso groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C391/00—Compounds containing selenium
    • C07C391/02—Compounds containing selenium having selenium atoms bound to carbon atoms of six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C07D209/88—Carbazoles; Hydrogenated carbazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the ring system
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/02—Ortho- or ortho- and peri-condensed systems
    • C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
    • C07C2603/06—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members
    • C07C2603/10—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings
    • C07C2603/12—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings only one five-membered ring
    • C07C2603/18—Fluorenes; Hydrogenated fluorenes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/02—Ortho- or ortho- and peri-condensed systems
    • C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
    • C07C2603/22—Ortho- or ortho- and peri-condensed systems containing three rings containing only six-membered rings
    • C07C2603/24—Anthracenes; Hydrogenated anthracenes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing

Abstract

下記一般式（Ｉ）で表されるオキシムエステル化合物。 （式中、Ｒ1及びＲ2は、それぞれ独立に、Ｒ11、ＯＲ11、ＣＯＲ11、ＳＲ11、ＣＯＮＲ12Ｒ13又はＣＮを表し、Ｒ11、Ｒ12及びＲ13は、それぞれ独立に、水素原子、炭素原子数１～２０のアルキル基、炭素原子数６～３０のアリール基、炭素原子数７～３０のアリールアルキル基又は炭素原子数２～２０の複素環基を表し、Ｒ3及びＲ4は、それぞれ独立に、Ｒ11、ＯＲ11、ＳＲ11、ＣＯＲ11、ＣＯＮＲ12Ｒ13、ＮＲ12ＣＯＲ11、ＯＣＯＲ11、ＣＯＯＲ11、ＳＣＯＲ11、ＯＣＳＲ11、ＣＯＳＲ11、ＣＳＯＲ11、ＣＮ、ハロゲン原子又は水酸基を表し、ａ及びｂは、それぞれ独立に、０～４である。Ｘは、酸素原子、硫黄原子、セレン原子、ＣＲ31Ｒ32、ＣＯ、ＮＲ33又はＰＲ34を表し、Ｒ31、Ｒ32、Ｒ33及びＲ34は、それぞれ独立に、Ｒ11、ＯＲ11、ＣＯＲ11、ＳＲ11、ＣＯＮＲ12Ｒ13又はＣＮを表す。）
PCT/JP2007/074668 2006-12-27 2007-12-21 オキシムエステル化合物及び該化合物を含有する光重合開始剤 WO2008078686A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US12/513,473 US8133656B2 (en) 2006-12-27 2007-12-21 Oxime ester compound and photopolymerization initiator containing the same
EP07859948.7A EP2128132B1 (en) 2006-12-27 2007-12-21 Oxime ester compound and photopolymerization initiator containing the same
JP2008551083A JP5179379B2 (ja) 2006-12-27 2007-12-21 オキシムエステル化合物及び該化合物を含有する光重合開始剤
CN2007800403335A CN101528682B (zh) 2006-12-27 2007-12-21 肟酯化合物和含有该化合物的光聚合引发剂

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006-351995 2006-12-27
JP2006351995 2006-12-27

Publications (1)

Publication Number Publication Date
WO2008078686A1 true WO2008078686A1 (ja) 2008-07-03

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Country Status (7)

Country Link
US (1) US8133656B2 (ja)
EP (1) EP2128132B1 (ja)
JP (1) JP5179379B2 (ja)
KR (1) KR101471644B1 (ja)
CN (1) CN101528682B (ja)
TW (1) TWI411598B (ja)
WO (1) WO2008078686A1 (ja)

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WO2008078678A1 (ja) 2006-12-27 2008-07-03 Adeka Corporation オキシムエステル化合物及び該化合物を含有する光重合開始剤
JP2010085929A (ja) * 2008-10-02 2010-04-15 Jsr Corp 感放射線性樹脂組成物および液晶表示素子用スペーサーとその製造法
JP2010150215A (ja) * 2008-12-26 2010-07-08 Toyo Ink Mfg Co Ltd 光重合開始剤、重合性組成物、および重合物の製造方法
CN101840155A (zh) * 2009-03-16 2010-09-22 东友精细化工有限公司 短波长激光曝光装置用着色感光性树脂组合物、采用其的滤色片和液晶显示装置
JP2010215575A (ja) * 2009-03-18 2010-09-30 Toyo Ink Mfg Co Ltd 新規オキシムエステル化合物およびそれを含んでなるラジカル重合開始剤および重合性組成物およびそれを用いたネガ型レジストおよびそれを用いた画像パターン形成方法
WO2010093210A3 (ko) * 2009-02-13 2010-12-02 주식회사 엘지화학 광활성 화합물 및 이를 포함하는 감광성 수지 조성물
JP2011080036A (ja) * 2009-09-08 2011-04-21 Nippon Steel Chem Co Ltd 光重合開始剤及び感光性組成物
CN102086171A (zh) * 2009-11-27 2011-06-08 株式会社艾迪科 肟酯化合物及含有该化合物的光聚合引发剂
EP2433927A1 (en) * 2009-05-19 2012-03-28 Changzhou Tronly New Electronic Materials Co., Ltd Ketoxime ester photoinitiator
KR20140075588A (ko) 2012-12-11 2014-06-19 제이에스알 가부시끼가이샤 감방사선성 수지 조성물, 표시 소자용 경화막, 표시 소자용 경화막의 형성 방법 및 표시 소자
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
WO2015108386A1 (ko) 2014-01-17 2015-07-23 주식회사 삼양사 신규한 β-옥심에스테르 플루오렌 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
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WO2016192611A1 (zh) * 2015-06-03 2016-12-08 江苏和成新材料有限公司 肟酯类化合物及其合成方法及应用
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CN102439089B (zh) * 2010-06-28 2015-05-06 株式会社艾迪科 固化性树脂组合物
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US8828644B2 (en) * 2012-02-01 2014-09-09 Lg Chem, Ltd. Compound, photosensitive composition comprising the same and photosensitive material
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Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6121104A (ja) * 1984-07-10 1986-01-29 Adeka Argus Chem Co Ltd 光重合開始剤
US5019482A (en) 1987-08-12 1991-05-28 Asahi Kasei Kogyo Kabushiki Kaisha Polymer/oxime ester/coumarin compound photosensitive composition
DE19928742A1 (de) 1998-06-26 1999-12-30 Ciba Sc Holding Ag Neue O-Acyloxim-Photostarter
DE10061947A1 (de) 1999-12-15 2001-06-21 Ciba Sc Holding Ag Oximester-Photostarter
WO2004050653A2 (en) 2002-12-03 2004-06-17 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators with heteroaromatic groups
JP2004534797A (ja) * 2001-06-11 2004-11-18 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド 組み合わされた構造を有するオキシムエステルの光開始剤
JP2005128483A (ja) * 2003-06-10 2005-05-19 Mitsubishi Chemicals Corp 光重合性組成物、カラーフィルター及び液晶表示装置
WO2006018405A1 (en) 2004-08-18 2006-02-23 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators
EP1826200A2 (en) 2006-02-24 2007-08-29 FUJIFILM Corporation Oxime derivative, photopolymerisable composition, colour filter and process for producing the same

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001302871A (ja) 2000-04-25 2001-10-31 Taiyo Ink Mfg Ltd 光硬化性・熱硬化性樹脂組成物とこれを用いて形成したソルダーレジスト皮膜や樹脂絶縁層を有するプリント配線板
EP1857276A3 (en) * 2002-09-30 2007-12-05 FUJIFILM Corporation Planographic printing plate precursor
TW200714651A (en) 2002-10-28 2007-04-16 Mitsubishi Chem Corp Photopolymerization composition and color filter using the same
JP2005242280A (ja) 2003-04-24 2005-09-08 Sumitomo Chemical Co Ltd 黒色感光性樹脂組成物
JP4595374B2 (ja) 2003-04-24 2010-12-08 住友化学株式会社 黒色感光性樹脂組成物
JP3754065B2 (ja) 2003-06-10 2006-03-08 三菱化学株式会社 光重合性組成物及びこれを用いたカラーフィルター
JP5140903B2 (ja) 2004-07-02 2013-02-13 三菱化学株式会社 着色樹脂組成物、カラーフィルタ及び液晶表示装置
WO2009081483A1 (ja) * 2007-12-25 2009-07-02 Adeka Corporation オキシムエステル化合物及び該化合物を含有する光重合開始剤

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6121104A (ja) * 1984-07-10 1986-01-29 Adeka Argus Chem Co Ltd 光重合開始剤
US5019482A (en) 1987-08-12 1991-05-28 Asahi Kasei Kogyo Kabushiki Kaisha Polymer/oxime ester/coumarin compound photosensitive composition
DE19928742A1 (de) 1998-06-26 1999-12-30 Ciba Sc Holding Ag Neue O-Acyloxim-Photostarter
JP2000080068A (ja) * 1998-06-26 2000-03-21 Ciba Specialty Chem Holding Inc 新規ｏ―アシルオキシム光開始剤
DE10061947A1 (de) 1999-12-15 2001-06-21 Ciba Sc Holding Ag Oximester-Photostarter
JP2004534797A (ja) * 2001-06-11 2004-11-18 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド 組み合わされた構造を有するオキシムエステルの光開始剤
WO2004050653A2 (en) 2002-12-03 2004-06-17 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators with heteroaromatic groups
JP2005128483A (ja) * 2003-06-10 2005-05-19 Mitsubishi Chemicals Corp 光重合性組成物、カラーフィルター及び液晶表示装置
WO2006018405A1 (en) 2004-08-18 2006-02-23 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators
EP1826200A2 (en) 2006-02-24 2007-08-29 FUJIFILM Corporation Oxime derivative, photopolymerisable composition, colour filter and process for producing the same

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP2128132A4

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* Cited by examiner, † Cited by third party
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US8168369B2 (en) 2009-02-13 2012-05-01 Lg Chem, Ltd. Photoactive compound and photosensitive resin composition containing the same
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KR101077214B1 (ko) 2009-02-13 2011-10-27 주식회사 엘지화학 광활성 화합물 및 이를 포함하는 감광성 수지 조성물
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EP2128132A4 (en) 2012-04-25
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US8133656B2 (en) 2012-03-13
KR20090093933A (ko) 2009-09-02
TWI411598B (zh) 2013-10-11
KR101471644B1 (ko) 2014-12-10
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