WO2010093210A3 - 광활성 화합물 및 이를 포함하는 감광성 수지 조성물 - Google Patents
광활성 화합물 및 이를 포함하는 감광성 수지 조성물 Download PDFInfo
- Publication number
- WO2010093210A3 WO2010093210A3 PCT/KR2010/000923 KR2010000923W WO2010093210A3 WO 2010093210 A3 WO2010093210 A3 WO 2010093210A3 KR 2010000923 W KR2010000923 W KR 2010000923W WO 2010093210 A3 WO2010093210 A3 WO 2010093210A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- resin composition
- photosensitive resin
- photoactive compound
- composition containing
- same
- Prior art date
Links
- 150000001875 compounds Chemical class 0.000 title abstract 4
- 239000011342 resin composition Substances 0.000 title abstract 4
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical group OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 abstract 2
- 238000010521 absorption reaction Methods 0.000 abstract 1
- 239000011230 binding agent Substances 0.000 abstract 1
- 239000004973 liquid crystal related substance Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 abstract 1
- 238000002161 passivation Methods 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 abstract 1
- 125000006850 spacer group Chemical group 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/553—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having one nitrogen atom as the only ring hetero atom
- C07F9/572—Five-membered rings
- C07F9/5728—Five-membered rings condensed with carbocyclic rings or carbocyclic ring systems
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
- C07D209/82—Carbazoles; Hydrogenated carbazoles
- C07D209/88—Carbazoles; Hydrogenated carbazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the ring system
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/127—Spectral sensitizer containing
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- Molecular Biology (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/147,342 US8168369B2 (en) | 2009-02-13 | 2010-02-12 | Photoactive compound and photosensitive resin composition containing the same |
JP2011545307A JP5435596B2 (ja) | 2009-02-13 | 2010-02-12 | 光活性化合物及びそれを含む感光性樹脂組成物 |
CN2010800079456A CN102317863B (zh) | 2009-02-13 | 2010-02-12 | 光活性化合物和含有该化合物的光敏树脂组合物 |
EP10741427.8A EP2397903B1 (en) | 2009-02-13 | 2010-02-12 | Photoactive compound and photosensitive resin composition containing the same |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20090011700 | 2009-02-13 | ||
KR10-2009-0011700 | 2009-02-13 | ||
KR1020100013227A KR101077214B1 (ko) | 2009-02-13 | 2010-02-12 | 광활성 화합물 및 이를 포함하는 감광성 수지 조성물 |
KR10-2010-0013227 | 2010-02-12 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2010093210A2 WO2010093210A2 (ko) | 2010-08-19 |
WO2010093210A3 true WO2010093210A3 (ko) | 2010-12-02 |
Family
ID=42757580
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2010/000923 WO2010093210A2 (ko) | 2009-02-13 | 2010-02-12 | 광활성 화합물 및 이를 포함하는 감광성 수지 조성물 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8168369B2 (ko) |
EP (1) | EP2397903B1 (ko) |
JP (1) | JP5435596B2 (ko) |
KR (1) | KR101077214B1 (ko) |
CN (1) | CN102317863B (ko) |
WO (1) | WO2010093210A2 (ko) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2009081483A1 (ja) * | 2007-12-25 | 2011-05-06 | 株式会社Adeka | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
JP5640722B2 (ja) * | 2010-02-05 | 2014-12-17 | Jsr株式会社 | 新規化合物及びそれを含有する感放射線性組成物 |
JP5598351B2 (ja) * | 2010-02-16 | 2014-10-01 | 信越化学工業株式会社 | 電子線用又はeuv用化学増幅ポジ型レジスト組成物及びパターン形成方法 |
JP5713477B2 (ja) * | 2011-08-04 | 2015-05-07 | エルジー・ケム・リミテッド | 光活性化合物およびこれを含む感光性樹脂組成物 |
WO2013084283A1 (ja) | 2011-12-05 | 2013-06-13 | 日立化成株式会社 | タッチパネル用電極の保護膜の形成方法、感光性樹脂組成物及び感光性エレメント |
WO2013084282A1 (ja) | 2011-12-05 | 2013-06-13 | 日立化成株式会社 | 樹脂硬化膜パターンの形成方法、感光性樹脂組成物及び感光性エレメント |
JP5890297B2 (ja) * | 2011-12-22 | 2016-03-22 | 東京応化工業株式会社 | 感光性樹脂組成物、それを用いたカラーフィルタ及び表示装置、オキシムエステル化合物、並びに光重合開始剤 |
KR102005532B1 (ko) * | 2012-02-01 | 2019-07-30 | 닛산 가가쿠 가부시키가이샤 | 복소환을 포함하는 공중합 수지를 포함하는 레지스트 하층막 형성 조성물 |
FR2990944A1 (fr) | 2012-05-23 | 2013-11-29 | Oreal | Procede de coloration des fibres keratiniques comprenant un colorant /pigment, un compose photoactif, et une source lumineuse |
KR101403775B1 (ko) * | 2012-05-30 | 2014-06-03 | 주식회사 엘지화학 | 광활성 화합물 및 이를 포함하는 감광성 수지 조성물 |
KR101489067B1 (ko) | 2012-05-30 | 2015-02-04 | 주식회사 엘지화학 | 광활성 화합물 및 이를 포함하는 감광성 수지 조성물 |
KR101384478B1 (ko) * | 2012-05-31 | 2014-04-10 | 주식회사 엘지화학 | 광활성 화합물 및 이를 포함하는 감광성 수지 조성물 |
JP5890337B2 (ja) * | 2013-02-13 | 2016-03-22 | 東京応化工業株式会社 | 感放射線性樹脂組成物、絶縁膜、及び表示装置 |
JP6177587B2 (ja) * | 2013-05-27 | 2017-08-09 | 株式会社Adeka | 紫外線吸収剤及び新規なカルバゾール化合物 |
JP5890355B2 (ja) * | 2013-07-31 | 2016-03-22 | 東京応化工業株式会社 | 感光性樹脂組成物 |
JP2015041104A (ja) * | 2013-08-22 | 2015-03-02 | 東友ファインケム株式会社 | 着色感光性樹脂組成物、これを含むカラーフィルタおよび表示装置 |
KR101768658B1 (ko) * | 2016-01-27 | 2017-08-17 | (주)켐이 | 카바졸 유도체, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
CN108475019B (zh) * | 2016-03-29 | 2022-02-11 | 株式会社艾迪科 | 黑色感光性树脂组合物 |
CN107325206B (zh) * | 2016-04-12 | 2018-12-18 | 常州强力先端电子材料有限公司 | 一种含硝基咔唑肟酯类光引发剂及其制备方法和应用 |
KR101968747B1 (ko) * | 2017-07-25 | 2019-04-12 | (주)켐이 | 카바졸 유도체, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
CN107474068A (zh) * | 2017-09-01 | 2017-12-15 | 南京法恩化学有限公司 | 一种光引发剂咔唑肟酯的制备方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006516246A (ja) * | 2002-12-03 | 2006-06-29 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | ヘテロ芳香族基を有するオキシムエステル光開始剤 |
US20080096115A1 (en) * | 2004-08-18 | 2008-04-24 | Junichi Tanabe | Oxime Ester Photoinitiators |
US7381842B2 (en) * | 1999-12-15 | 2008-06-03 | Ciba Specialty Chemicals Corporation | Oxime ester photoinitiators |
WO2008078686A1 (ja) * | 2006-12-27 | 2008-07-03 | Adeka Corporation | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0792615A (ja) * | 1993-09-24 | 1995-04-07 | Fuji Photo Film Co Ltd | ハロゲン化銀写真感光材料 |
JP2007072035A (ja) * | 2005-09-06 | 2007-03-22 | Tokyo Ohka Kogyo Co Ltd | 感光性組成物 |
EP2172455B1 (en) * | 2005-12-01 | 2011-01-19 | Basf Se | Oxime ester photoinitiators |
JP4893299B2 (ja) * | 2006-12-27 | 2012-03-07 | 三菱化学株式会社 | ホログラム記録層形成用組成物、並びにそれを用いたホログラム記録材料及びホログラム光記録媒体 |
WO2008078678A1 (ja) * | 2006-12-27 | 2008-07-03 | Adeka Corporation | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
-
2010
- 2010-02-12 CN CN2010800079456A patent/CN102317863B/zh active Active
- 2010-02-12 KR KR1020100013227A patent/KR101077214B1/ko active IP Right Grant
- 2010-02-12 EP EP10741427.8A patent/EP2397903B1/en active Active
- 2010-02-12 JP JP2011545307A patent/JP5435596B2/ja active Active
- 2010-02-12 WO PCT/KR2010/000923 patent/WO2010093210A2/ko active Application Filing
- 2010-02-12 US US13/147,342 patent/US8168369B2/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7381842B2 (en) * | 1999-12-15 | 2008-06-03 | Ciba Specialty Chemicals Corporation | Oxime ester photoinitiators |
JP2006516246A (ja) * | 2002-12-03 | 2006-06-29 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | ヘテロ芳香族基を有するオキシムエステル光開始剤 |
US20080096115A1 (en) * | 2004-08-18 | 2008-04-24 | Junichi Tanabe | Oxime Ester Photoinitiators |
WO2008078686A1 (ja) * | 2006-12-27 | 2008-07-03 | Adeka Corporation | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
Non-Patent Citations (1)
Title |
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See also references of EP2397903A4 * |
Also Published As
Publication number | Publication date |
---|---|
JP5435596B2 (ja) | 2014-03-05 |
EP2397903A4 (en) | 2012-08-22 |
CN102317863B (zh) | 2013-11-20 |
KR101077214B1 (ko) | 2011-10-27 |
EP2397903A2 (en) | 2011-12-21 |
EP2397903B1 (en) | 2014-07-30 |
JP2012514636A (ja) | 2012-06-28 |
KR20100092904A (ko) | 2010-08-23 |
US20110318692A1 (en) | 2011-12-29 |
WO2010093210A2 (ko) | 2010-08-19 |
US8168369B2 (en) | 2012-05-01 |
CN102317863A (zh) | 2012-01-11 |
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