WO2003065428B1 - Systeme de reglage d'etat de formation d'images, procede d'insolation, appareil d'exposition, programme, et support d'enregistrement d'information - Google Patents
Systeme de reglage d'etat de formation d'images, procede d'insolation, appareil d'exposition, programme, et support d'enregistrement d'informationInfo
- Publication number
- WO2003065428B1 WO2003065428B1 PCT/JP2003/000833 JP0300833W WO03065428B1 WO 2003065428 B1 WO2003065428 B1 WO 2003065428B1 JP 0300833 W JP0300833 W JP 0300833W WO 03065428 B1 WO03065428 B1 WO 03065428B1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- information
- optical system
- projection optical
- exposure apparatus
- wavefront aberration
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
- G03B21/18—Fire preventing or extinguishing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
- G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
- G03F7/706—Aberration measurement
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020047011623A KR100927560B1 (ko) | 2002-01-29 | 2003-01-29 | 이미지 형성 상태 조정 시스템, 노광 방법 및 노광 장치, 그리고 프로그램 및 정보 기록 매체 |
JP2003564921A JP4415674B2 (ja) | 2002-01-29 | 2003-01-29 | 像形成状態調整システム、露光方法及び露光装置、並びにプログラム及び情報記録媒体 |
EP03734875A EP1478010A4 (fr) | 2002-01-29 | 2003-01-29 | Systeme de reglage d'etat de formation d'images, procede d'insolation, appareil d'exposition, programme, et support d'enregistrement d'information |
US10/901,209 US7230682B2 (en) | 2002-01-29 | 2004-07-29 | Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium |
US11/736,134 US7391497B2 (en) | 2002-01-29 | 2007-04-17 | Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium |
US11/736,177 US7405803B2 (en) | 2002-01-29 | 2007-04-17 | Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002-020712 | 2002-01-29 | ||
JP2002020712 | 2002-01-29 | ||
JP2002158954 | 2002-05-31 | ||
JP2002-158954 | 2002-05-31 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/901,209 Continuation US7230682B2 (en) | 2002-01-29 | 2004-07-29 | Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003065428A1 WO2003065428A1 (fr) | 2003-08-07 |
WO2003065428B1 true WO2003065428B1 (fr) | 2004-05-13 |
Family
ID=27667443
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2003/000833 WO2003065428A1 (fr) | 2002-01-29 | 2003-01-29 | Systeme de reglage d'etat de formation d'images, procede d'insolation, appareil d'exposition, programme, et support d'enregistrement d'information |
Country Status (7)
Country | Link |
---|---|
US (3) | US7230682B2 (fr) |
EP (1) | EP1478010A4 (fr) |
JP (1) | JP4415674B2 (fr) |
KR (1) | KR100927560B1 (fr) |
CN (1) | CN100345252C (fr) |
TW (1) | TWI223132B (fr) |
WO (1) | WO2003065428A1 (fr) |
Cited By (1)
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---|---|---|---|---|
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Cited By (2)
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US8854632B2 (en) | 2006-02-21 | 2014-10-07 | Nikon Corporation | Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method |
US9423705B2 (en) | 2006-02-21 | 2016-08-23 | Nikon Corporation | Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method |
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US7230682B2 (en) | 2007-06-12 |
US20050206850A1 (en) | 2005-09-22 |
TW200401961A (en) | 2004-02-01 |
TWI223132B (en) | 2004-11-01 |
US20070188727A1 (en) | 2007-08-16 |
JPWO2003065428A1 (ja) | 2005-05-26 |
US7405803B2 (en) | 2008-07-29 |
CN1625798A (zh) | 2005-06-08 |
JP4415674B2 (ja) | 2010-02-17 |
WO2003065428A1 (fr) | 2003-08-07 |
EP1478010A4 (fr) | 2007-12-12 |
KR20040086306A (ko) | 2004-10-08 |
US20070188726A1 (en) | 2007-08-16 |
CN100345252C (zh) | 2007-10-24 |
KR100927560B1 (ko) | 2009-11-23 |
EP1478010A1 (fr) | 2004-11-17 |
US7391497B2 (en) | 2008-06-24 |
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