JP2005243710A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2005243710A5 JP2005243710A5 JP2004048174A JP2004048174A JP2005243710A5 JP 2005243710 A5 JP2005243710 A5 JP 2005243710A5 JP 2004048174 A JP2004048174 A JP 2004048174A JP 2004048174 A JP2004048174 A JP 2004048174A JP 2005243710 A5 JP2005243710 A5 JP 2005243710A5
- Authority
- JP
- Japan
- Prior art keywords
- measurement
- measurement point
- substrate
- pattern surface
- reticle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000005259 measurement Methods 0.000 claims 34
- 230000003287 optical effect Effects 0.000 claims 11
- 239000000758 substrate Substances 0.000 claims 11
- 238000004519 manufacturing process Methods 0.000 claims 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004048174A JP2005243710A (ja) | 2004-02-24 | 2004-02-24 | 露光装置及びその制御方法、デバイス製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004048174A JP2005243710A (ja) | 2004-02-24 | 2004-02-24 | 露光装置及びその制御方法、デバイス製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005243710A JP2005243710A (ja) | 2005-09-08 |
JP2005243710A5 true JP2005243710A5 (fr) | 2007-04-12 |
Family
ID=35025155
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004048174A Withdrawn JP2005243710A (ja) | 2004-02-24 | 2004-02-24 | 露光装置及びその制御方法、デバイス製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2005243710A (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7853067B2 (en) | 2006-10-27 | 2010-12-14 | Asml Holding N.V. | Systems and methods for lithographic reticle inspection |
JP2017139339A (ja) * | 2016-02-04 | 2017-08-10 | 株式会社アドバンテスト | 露光装置 |
CN111180378B (zh) * | 2019-12-31 | 2023-12-29 | 中芯集成电路(宁波)有限公司 | 一种检测晶舟内晶圆斜插的方法及装置 |
-
2004
- 2004-02-24 JP JP2004048174A patent/JP2005243710A/ja not_active Withdrawn
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW201118513A (en) | Position calibration of alignment heads in a multi-head alignment system | |
TW512428B (en) | Stage apparatus, measurement apparatus and measurement method, and exposure apparatus and exposure method | |
TW200840988A (en) | A method of measurement, an inspection apparatus and a lithographic apparatus | |
TW200905157A (en) | Measuring method, exposure method, and device fabricating method | |
JP6678251B2 (ja) | 投影露光装置および方法 | |
JP2005129674A5 (fr) | ||
JP2011060919A5 (fr) | ||
US7209215B2 (en) | Exposure apparatus and method | |
KR970016827A (ko) | 노광 방법 및 노광 장치 | |
JP6521223B2 (ja) | リソグラフィ装置の管理方法及び装置、並びに露光方法及びシステム | |
JP2012507173A5 (fr) | ||
TW200830365A (en) | Lithographic apparatus and method | |
JP2009182253A5 (fr) | ||
JP2008098311A5 (fr) | ||
TW201107900A (en) | Lithographic apparatus and device manufacturing method | |
JP2010103476A (ja) | 位置合わせ装置及び露光装置 | |
TWI526791B (zh) | 曝光設備及裝置製造方法 | |
JP7369529B2 (ja) | 露光装置およびアライメント方法 | |
JP2008140794A5 (fr) | ||
JP2011238788A5 (fr) | ||
JP2009094256A5 (fr) | ||
JP2005243710A5 (fr) | ||
JP2009104024A (ja) | 露光マスク、フォーカス測定方法及びパターン形成方法 | |
JP2009117556A5 (fr) | ||
JP2005175383A5 (fr) |