US20060016528A1 - Copper-based alloy and method of manufacturing same - Google Patents

Copper-based alloy and method of manufacturing same Download PDF

Info

Publication number
US20060016528A1
US20060016528A1 US11/169,760 US16976005A US2006016528A1 US 20060016528 A1 US20060016528 A1 US 20060016528A1 US 16976005 A US16976005 A US 16976005A US 2006016528 A1 US2006016528 A1 US 2006016528A1
Authority
US
United States
Prior art keywords
ray diffraction
diffraction intensity
plane
copper
based alloy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US11/169,760
Other languages
English (en)
Inventor
Kouichi Hatakeyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dowa Metaltech Co Ltd
Original Assignee
Dowa Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dowa Mining Co Ltd filed Critical Dowa Mining Co Ltd
Assigned to DOWA MINING CO., LTD. reassignment DOWA MINING CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: HATAKEYAMA, KOUICHI
Publication of US20060016528A1 publication Critical patent/US20060016528A1/en
Assigned to DOWA HOLDINGS CO., LTD. reassignment DOWA HOLDINGS CO., LTD. CHANGE OF NAME (SEE DOCUMENT FOR DETAILS). Assignors: DOWA MINING CO., LTD.
Assigned to DOWA METALTECH CO., LTD. reassignment DOWA METALTECH CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: DOWA HOLDINGS CO., LTD.
Priority to US12/230,498 priority Critical patent/US8293039B2/en
Abandoned legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/02Alloys based on copper with tin as the next major constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/04Alloys based on copper with zinc as the next major constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/06Alloys based on copper with nickel or cobalt as the next major constituent

Definitions

  • This invention relates to a copper-based alloy that has a superior balance of conductivity, tensile strength and bending workability and to a method of manufacturing same, and more specifically to a copper-based alloy for use in consumer products, for example, for forming blanks for narrow-pitch connectors for use in telecommunications, blanks for automotive harness connectors, blanks for semiconductor lead frames and blanks for compact switches and relays and the like and a method of manufacturing same.
  • pins are used for supplying power, so the material used for them must have a reduced conductor resistance, namely a high conductivity, and thus the development of copper alloys to replace low-conductivity brass and phosphor bronze has become an urgent task.
  • both strength/springiness and flexibility are indispensable at the time of the press-molding of pins, but making the molding size narrower and thinner becomes more necessary from a different standpoint than that up until now.
  • the connectors mounted in automotive electronics must be made lighter and space-saving by making the connectors more compact, so for example, the width of a box-shaped female connector has been reduced from 2.3 mm, which was the mainstream ten years ago, to 0.64 mm at present.
  • high conductivity is required in the same manner as for portable electronics.
  • Precipitation strengthening of materials is one example of a method of increasing the conductivity while also obtaining high strength and high springiness, but if precipitation strengthening is used, deterioration of the ductility and bending workability of the material is ordinarily not negligible, and when it is attempted to avoid this, the control of the amount of elements added and the working and heat treatment processes required to control the size and distribution of precipitates becomes complex and as a result the manufacturing costs become higher (as in patent document JP2000-80428A, for example).
  • the state of stress on the convex surface of a bend at the time of bending varies depending on the width/thickness ratio W/t (the ratio of the test piece width W to the sheet thickness t) from tension in a single axis to surface-strain tension, so it is mandatory to improve the bending workability in consideration of the surface-strain tension accompanying the deterioration of bending workability.
  • An object of the present invention is therefore to control the crystal orientation of the material and thus provide a copper-based alloy that has a superior balance of conductivity, tensile strength and bending workability. and a method of manufacturing same.
  • the present invention provides a copper-based alloy with improved bending workability and a method of manufacturing same by taking copper-based alloys and performing x-ray diffraction focusing primarily on the ND plane (the surface of sheet material; referred to in the present invention as the ND plane), and controlling the strength in specific directions among the crystal orientations thus obtained.
  • the x-ray diffraction intensity referred to here indicates the integrated intensity in a crystal orientation of the material as measured by the x-ray diffraction method, for example.
  • the present invention provides:
  • the present invention provides a copper-based alloy that has a superior balance of conductivity, tensile strength, 0.2% yield strength, springiness, hardness and bendability and is suitable for use in connectors, switches, relays and the like, and thus satisfies the demand for material that can be made into thinner sheet and finer wire in response to recent high-density mounting in consumer electronics, telecommunications equipment and automotive components.
  • the present invention is able to improve remarkably the bending workability of high strength/high springiness copper based alloy.
  • the present invention achieves improved bending workability of copper-based alloys by, with particular attention to the material surface, performing x-ray diffraction and controlling the strength in specific directions among the orientations thus obtained.
  • the material must have good uniform elongation, namely a large n value, but thin sheets of tempered copper alloy for use in connectors are required to have high strength and high springiness at the time of terminal formation and mounting, and as a result the uniform elongation is small or roughly 1/10 of that of fully annealed material, so this effect cannot be expected. Accordingly, the only method left in order to improve bending workability is to disperse the wrinkle-shaped surface roughness patterns as finely as possible. When the surface is observed upon varying the amount of bending deformation, as the precursor stage to wrinkles, large numbers of fine indentations and step-like patterns occur at intervals generally on the order of the grain size.
  • the grain boundaries take the role of material defects that become opportunities for constriction or necking. With increased amounts of deformation, portions of them become linked in the direction of the bending axis while elongating into wrinkles that are roughly parallel to the bending axis. When the period and amplitude of these wrinkles are observed, the width of the convex portions of the wrinkles is equivalent to a plurality of grains, so how readily they grow is thought to depend on the large number of microscopic indentations and steps that is present.
  • Cu-based polycrystalline materials with the FCC (face-centered cubic) structure have a combination of slip planes ⁇ 111 ⁇ and slip directions ⁇ 110> (where ⁇ ⁇ indicates all equivalent planes, and ⁇ > indicates all equivalent directions (orientations)), or namely they have twelve ⁇ 111 ⁇ 110> slip systems, with one or more slip systems becoming active at the time of deformation.
  • the ⁇ 100 ⁇ plane is the cubic orientation ⁇ 100 ⁇ 100>, and this group of orientations is well known as a component that decreases the r value which is the plastic strain ratio, thus, it is easy to make the strain in the thickness direction.
  • the critical shear stress is equal in those slip systems that are active under conditions in which the stress is acting from tension in a single axis to surface-strain tension in each individually oriented grain, and moreover thickness stress readily occurs.
  • the x-ray diffraction intensities (or simply the diffraction intensities) of the ⁇ 110 ⁇ plane, ⁇ 111 ⁇ plane, ⁇ 311 ⁇ plane and ⁇ 100 ⁇ plane are represented by I ⁇ 220 ⁇ , I ⁇ 111 ⁇ , I ⁇ 311 ⁇ and I ⁇ 200 ⁇ , respectively.
  • the range of constituents in the composition of the copper-based alloy according to the present invention is defined to be: Ni, Sn, P and also at least one or more elements selected from a group consisting of Zn, Si, Fe, Co, Mg, Ti, Cr, Zr and Al in a total amount of 0.01-30 wt. % with the remainder being Cu and unavoidable impurities.
  • This composition is adopted because it maintains the balance among conductivity, tensile strength and 0.2% yield strength of the material and further increases the bending workability.
  • the total amount of the Ni, Sn, P and also at least one or more elements selected from a group consisting of Zn, Si, Fe, Co, Mg, Ti, Cr, Zr and Al is less than 0.01 wt. %, while the conductivity increases, satisfactory tensile strength, 0.2% proof tress and other properties are difficult to obtain. In addition, while the tensile strength and 0.2% proof tress can be increased by raising the percent reduction to 98%, the bending workability deteriorates greatly. On the other hand, if the total amount of the Ni, Sn, P and also at least one or more elements selected from a group consisting of Zn, Si, Fe, Co, Mg, Ti, Cr, Zr and Al exceeds 30 wt. %, although the tensile strength and 0.2% yield strength can be increased, the conductivity is lowered and the bending workability also deteriorates.
  • the range of constituents in the composition of the copper-based alloy according to the present invention is defined to be a copper-based alloy containing: Ni, Sn, P and also at least one or more elements selected from a group consisting of Zn, Si, Fe, Co, Mg, Ti, Cr, Zr and Al in a total amount of 0.01-30 wt. % with the remainder being Cu and unavoidable impurities.
  • the range of constituents in the composition is defined not as above but rather as containing Ni: 0.01-4.0 wt. %, Sn: 0.01-10 wt. % and P: 0.01-0.20 wt. % and also at least one or more elements selected from a group consisting of Zn, Si, Fe, Co, Mg, Ti, Cr, Zr and Al in a total amount of 0.01-30 wt.
  • Ni, Sn, P and also at least one or more elements selected from a group consisting of Zn, Si, Fe, Co, Mg, Ti, Cr, Zr and Al is read as “at least one or more elements selected from a group consisting of Zn, Si, Fe, Co, Mg, Ti, Cr, Zr and Al.”
  • Sn is a mandatory element for achieving both bending workability and strength and elasticity.
  • Sn When Sn is in solid solution within a Cu matrix, it can greatly reduce the degree of concentration of the ⁇ 100 ⁇ planes that affects bending workability, and moreover it increases the degree of concentration of the ⁇ 110 ⁇ planes and ⁇ 311 ⁇ planes in combination with working and heat treatment, and furthermore it can make the grains having ⁇ 100 ⁇ planes fine and uniformly distributed, and as a result the bending workability can be increased. In addition, it can increase the strength and elasticity at the same time. However, if the Sn content is less than 0.01 wt. %, then these meritorious effects are not sufficiently obtained but on the other hand if the Sn content exceeds 10 wt.
  • the Sn content is set as 0.01-10 wt. %, preferably 0.3-3.0 wt. % or more preferably 0.5-2.0 wt. %.
  • Ni When Ni is in solid solution within a Cu matrix, it increases the strength, elasticity and solderability, and moreover, forms a compound with P or Si in some cases and precipitates out, thus increasing the electrical conductivity and increasing the strength and elasticity. In addition, it is an element that also contributes to improving the heat resistance and stress relaxation characteristics. However, if the Ni content is less than 0.01 wt. %, then these meritorious effects are not sufficiently obtained but on the other hand if the Ni content exceeds 4.0 wt. %, then the drop in electrical conductivity becomes marked even in the co-presence of P or Si in certain cases and this would be disadvantageous from an economic standpoint. Accordingly, the Ni content is set as 0.01-4.0 wt. % or preferably 0.5-3.0 wt. %.
  • the P acts as a deoxidizer in the melt during melting and casting and also forms a compound with Ni or in some cases Fe or Mg or Co, thus increasing the electrical conductivity and increasing the strength and elasticity.
  • the P content is set as 0.01-0.20 wt. % or preferably 0.03-0.10 wt. %.
  • Zn When in solid solution within a Cu matrix, Zn has the effect of increasing the strength and elasticity and enhancing the melt deoxidizing effect, and also has the effect of reducing the dissolved oxygen elements in the Cu matrix, and also has the effect of increasing the solder weatherability and migration resistance.
  • the Zn content is set as 0.01-30 wt. %, more preferably 0.01-10 wt. % and even more preferably 0.03-3.0 wt. %.
  • Si When co-present with Ni, Si forms a compound and precipitates out into the Cu matrix, and thus has the effect of increasing strength and elasticity without greatly decreasing the electrical conductivity. If the Si content is less than 0.01 wt. %, then these meritorious effects are not sufficiently obtained but on the other hand if the Si content exceeds 1.0 wt. %, then the hot workability drops markedly. Accordingly, the Si content is set as 0.01-1.0 wt. %.
  • the content of one or two or more of the aforementioned elements is preferably 0.01-3.0 wt. %.
  • oxygen content is set to 20 ppm or less.
  • the material according to the present invention can be manufactured by the following process. Namely, take an ingot of a copper-based alloy having the indicated elemental composition, and perform cold rolling and annealing until the prescribed sheet thickness is obtained, and then perform a combination of cold rolling at a percent reduction Z that satisfies the above Formula (1) followed by low-temperature annealing performed at a temperature below the recrystallization temperature, to obtain material of the desired sheet thickness.
  • the ingot When homogenization annealing or hot rolling is performed in advance before cold-rolling the ingot, this has the meritorious effect of removing micro or macro segregations of the solute elements that occurred during casting, thus homogenizing the solute element distribution, and in particular, performing hot rolling can make the crystal orientations of the ingot random and make the grains fine and uniform, and moreover this is economically advantageous because the percent rolling reduction can be greatly increased. Accordingly, it is preferable for the ingot to be subjected to at least one of homogenization annealing or hot rolling in advance prior to cold rolling.
  • the homogenization annealing and hot rolling should preferably be performed at 750° C.-900° C. for 30 minutes to 2 hours.
  • Z 100 ⁇ 10 X ⁇ Y (1)
  • Z is the percent cold reduction (%)
  • X is the Sn content (wt. %) among the various elements
  • Y is the total content (wt. %) of all elements other than Sn and Cu.
  • Z is the percent cold reduction (%)
  • X is the Sn content (wt. %) among the various elements
  • Y is the total content (wt. %) of all elements other than Sn and Cu.
  • the percent cold reduction Z (%) is set as given in Formula (1) because performing cold rolling at a percent reduction that satisfies Formula (1) for each of the added elements reduces the ⁇ 100 ⁇ planes that may become the starting points of surface wrinkles during bending deformation in the ND plane, and also simultaneously suppresses the degree of concentration of ⁇ 110 ⁇ planes, ⁇ 111 ⁇ planes and ⁇ 311 ⁇ planes, and particularly the ⁇ 110 ⁇ planes that cause deterioration of bending workability in the surface-strain tensile stress state, and thus suppresses the deterioration of bending workability.
  • the S ND at this time is such that S ND ⁇ 0.05.
  • the limitation as given in Formula (2) is made because, when cold rolling is performed with a percent reduction in a range that satisfies Formula (2), variations in the degrees of concentration of the ⁇ 100 ⁇ planes, ⁇ 110 ⁇ planes, ⁇ 111 ⁇ planes and ⁇ 311 ⁇ planes are small and stable.
  • the S ND at this time is such that it satisfies the relation 0.05 ⁇ S ND ⁇ 0.15.
  • the tensile strength and 0.2% yield strength are improved, while good strength, 0.2% yield strength and bending workability that typically have a tradeoff relationship are both achieved.
  • the low-temperature annealing conditions at this time are that annealing be performed preferably at a temperature 50-250° C. below the recrystallization temperature of the copper-based alloy for 30 minutes to 2 hours, for example, at a temperature of 250-350° C. for 30 minutes to 1 hour, but even outside of these conditions, the desired characteristics can be achieved with temperature and time combinations that apply roughly the same amount of heat to the material.
  • the material according to the present invention can be manufactured by the following process. Namely, take an ingot of a copper-based alloy having the indicated elemental composition, and perform a combination process of cold rolling followed by annealing at least one or more times, and then perform intermediate rolling, which is a rolling process before the final cold rolling process, thereby making the x-ray diffraction intensity ratio of the sheet surface S ND such that 0.05 ⁇ S ND ⁇ 0.15, and thereafter perform annealing to obtain sheet with a grain size of 20 ⁇ m or less, and then performing the final cold rolling and low-temperature annealing at a temperature below the recrystallization temperature.
  • the ingot When homogenization annealing or hot rolling is performed in advance before cold-rolling the ingot, this has the meritorious effect of removing micro or macro segregations in the solute elements that occurred during casting, thus homogenizing the solute element distribution, and in particular, performing hot rolling can make the crystal orientations of the ingot random and make the grains fine and uniform, and moreover this is economically advantageous because the percent rolling reduction can be greatly increased. Accordingly, it is preferable for the ingot to be subjected to at least one of homogenization annealing or hot rolling in advance prior to cold rolling.
  • the homogenization annealing and hot rolling should preferably be performed at 750° C.-900° C. for 30 minutes to 2 hours.
  • the combination process of cold rolling (preferably cold rolling to 50-90% reduction, and more preferably 55-85% reduction) followed by annealing is performed at least one or more times, and then the intermediate rolling, which is a rolling process before the final cold rolling process, is performed, thereafter the x-ray diffraction intensity ratio of the sheet surface S ND is preferably 0.05 ⁇ S ND ⁇ 0.15. If 0.05 ⁇ S ND ⁇ 0.15, then in the annealing performed immediately thereafter the grain distribution becomes uniform if the annealing is performed above the recrystallization temperature.
  • the temperature and time of the annealing are controlled (preferably to 400-700° C. and 0.5 minutes to 10 hours) so that the grain size becomes 20 ⁇ m or less after the annealing, the sheet obtained from the combination of the final cold rolling and annealing below the recrystallization temperature has improved bending workability while maintaining high strength.
  • the characteristics with superior balance are a conductivity of 25.0% IACS or greater, or preferably 35.0% IACS or greater, a tensile strength of 560 N/mm 2 or greater, or preferably 580 N/mm 2 or greater, a 0.2% yield strength of 550 N/mm 2 or greater, or preferably 570 N/mm 2 or greater, a spring deflection limit of 400 N/mm 2 or greater, or preferably 460 N/mm 2 or greater, a Vickers hardness of 180 or preferably 190 or greater, and a bending workability (180° bendability R/t) of 1.0 or less, preferably 0.5 or less or even more preferably 0.
  • Copper-based alloys numbered 1-15 with their chemical compositions (wt. %) presented in Table 1 were melted in an Ar atmosphere and cast into 40 40 100 (mm) ingots using a carbon ingot mold.
  • the ingots thus obtained were cut into 40 40 20 (mm) slices and then subjected to homogenization heat treatment at 900° C. for one hour. Thereafter, the slices were hot-rolled from a sheet thickness of 20 mm to 6.0 mm and then water-quenched and pickled after rolling.
  • the details of the conditions for the respective sheets numbered 1-15 thus obtained are presented below.
  • Invention Example No. 1 was cold-rolled from a thickness of 6.0 mm to 2.5 mm and heat-treated at 550° C. for one hour. Thereafter, it was cold-rolled from a thickness of 2.5 mm to 1.2 mm and heat-treated at 500° C. for one hour. The sheet thus obtained was given a finish cold-rolling from a thickness of 1.2 mm to 0.2 mm and then heat-treated for one hour at 300° C., which is below the recrystallization temperature.
  • Invention Example No. 2 was cold-rolled from a thickness of 6.0 mm to 2.5 mm and heat-treated at 550° C. for one hour. Thereafter, it was cold-rolled from a thickness of 2.5 mm to 0.8 mm and heat-treated at 500° C. for one hour. The sheet thus obtained was given a finish cold-rolling from a thickness of 0.8 mm to 0.2 mm and then heat-treated for one hour at 300° C., which is below the recrystallization temperature.
  • Invention Example No. 3 was cold-rolled from a thickness of 6.0 mm to 2.5 mm and heat-treated at 550° C. for one hour. Thereafter, it was cold-rolled from a thickness of 2.5 mm to 1.0 mm and heat-treated at 500° C. for one hour. The sheet thus obtained was given a finish cold-rolling from a thickness of 1.0 mm to 0.2 mm and then heat-treated for one hour at 300° C., which is below the recrystallization temperature.
  • Invention Example No. 4 was cold-rolled from a thickness of 6.0 mm to 2.5 mm and heat-treated at 550° C. for one hour. Thereafter, it was cold-rolled from a thickness of 2.5 mm to 1.2 mm and heat-treated at 500° C. for one hour. The sheet thus obtained was given a finish cold-rolling from a thickness of 1.2 mm to 0.2 mm and then heat-treated for one hour at 300° C., which is below the recrystallization temperature.
  • Invention Example No. 5 was cold-rolled from a thickness of 6.0 mm to 2.5 mm and heat-treated at 550° C. for one hour. Thereafter, it was cold-rolled from a thickness of 2.5 mm to 1.0 mm and heat-treated at 500° C. for one hour. The sheet thus obtained was given a finish cold-rolling from a thickness of 1.0 mm to 0.2 mm and then heat-treated for one hour at 300° C., which is below the recrystallization temperature.
  • Invention Example No. 6 was cold-rolled from a thickness of 6.0 mm to 2.5 mm and heat-treated at 550° C. for one hour. Thereafter, it was cold-rolled from a thickness of 2.5 mm to 1.2 mm and heat-treated at 500° C. for one hour. The sheet thus obtained was given a finish cold-rolling from a thickness of 1.2 mm to 0.2 mm and then heat-treated for one hour at 300° C., which is below the recrystallization temperature.
  • Invention Example No. 7 was cold-rolled from a thickness of 6.0 mm to 2.5 mm and heat-treated at 550° C. for one hour. Thereafter, it was cold-rolled from a thickness of 2.5 mm to 0.6 mm and heat-treated at 500° C. for one hour. The sheet thus obtained was given a finish cold-rolling from a thickness of 0.6 mm to 0.2 mm and then heat-treated for one hour at 300° C., which is below the recrystallization temperature.
  • Invention Example No. 8 was cold-rolled from a thickness of 6.0 mm to 2.5 mm and heat-treated at 550° C. for one hour. Thereafter, it was cold-rolled from a thickness of 2.5 mm to 0.6 mm and heat-treated at 500° C. for one hour. The sheet thus obtained was given a finish cold-rolling from a thickness of 0.6 mm to 0.2 mm and then heat-treated for one hour at 300° C., which is below the recrystallization temperature.
  • Invention Examples No. 9-10 were cold-rolled from a thickness of 6.0 mm to 2.5 mm and heat-treated at 550° C. for one hour. Thereafter, they were cold-rolled from a thickness of 2.5 mm to 0.8 mm and heat-treated at 500° C. for one hour. The sheets thus obtained were given a finish cold-rolling from a thickness of 0.8 mm to 0.2 mm and then heat-treated for one hour at 300° C., which is below the recrystallization temperature.
  • Comparative Example No. 11 was cold-rolled from a thickness of 6.0 mm to 2.5 mm and heat-treated at 550° C. for one hour. Thereafter, it was cold-rolled from a thickness of 2.5 mm to 0.3 mm and heat-treated at 500° C. for one hour. The sheet thus obtained was given a finish cold-rolling from a thickness of 0.3 mm to 0.2 mm and then heat-treated for one hour at 300° C., which is below the recrystallization temperature.
  • Comparative Example No. 12 was cold-rolled from a thickness of 6.0 mm to 1.0 mm and heat-treated at 550° C. for one hour. Thereafter, it was cold-rolled from a thickness of 1.0 mm to 0.6 mm and heat-treated at 500° C. for one hour. The sheet thus obtained was given a finish cold-rolling from a thickness of 0.6 mm to 0.2 mm and then heat-treated for one hour at 300° C., which is below the recrystallization temperature.
  • Comparative Example No. 13 was cold-rolled from a thickness of 6.0 mm to 0.5 mm and heat-treated at 600° C. for one hour.
  • the sheet thus obtained was given a finish cold-rolling from a thickness of 0.5 mm to 0.2 mm and then heat-treated for one hour at 300° C., which is below the recrystallization temperature.
  • Comparative Example No. 14 was cold-rolled from a thickness of 6.0 mm to 2.5 mm and heat-treated at 550° C. for one hour.
  • the sheet thus obtained was given a finish cold-rolling from a thickness of 2.5 mm to 0.2 mm and then heat-treated for one hour at 250° C., which is below the recrystallization temperature.
  • Comparative Example No. 15 was cold-rolled from a thickness of 6.0 mm to 2.5 mm and heat-treated at 550° C. for one hour. The sheet thus obtained was given a finish cold-rolling from a thickness of 2.5 mm to 0.2 mm and then heat-treated for one hour at 350° C., which is below the recrystallization temperature.
  • Thickness Percent Percent Thickness after reduction in Thickness reduction Low- after rough Rough intermediate intermediate Finish after finish in finish temperature
  • Chemical composition wt.
  • Examples No. 1-10 obtained as described above had an average grain size of 6-10 ⁇ m after the 500° C. 1 hour heat treatment before the final cold rolling, and this was below 20 ⁇ m, and when x-ray diffraction of the sheet surface (ND plane) was performed prior to this heat treatment and the S ND was measured, it was found to be 0.06-0.10, or within the range 0.05 ⁇ S ND ⁇ 0.15.
  • the x-ray diffraction intensity measurement conditions are as follows.
  • X-ray tube Cu
  • tube voltage 40 kV
  • tube current 30 mA
  • sampling interval 0.020°
  • monochromator used specimen holder: Al
  • x-ray diffraction intensity measurement conditions are not limited to the conditions above, but rather they can be modified appropriately depending on the type of sample.
  • the grain size is calculated in the present invention based on the JIS H 0501 standard for grains observed on the sample surface (rolled surface) using an optical microscope at a magnification of 200.
  • the samples No. 1-15 thus obtained each had dispersed and precipitated Ni—P compounds, but first these samples No. 1-15 were evaluated by measuring the S ND . Then their conductivity, tensile strength and 180° bendability were evaluated. The conductivity and tensile strength were evaluated by measurements based on the JIS H 0505 and JIS Z 2241 standards, respectively. In addition, the bendability was evaluated based on a 180° bend test (JIS H 3110), where a 10-mm wide test piece is blanked in a direction parallel to the rolling direction and the bend inside radius R and sheet thickness t are measured to find the ratio R/t, and the test pieces thus obtained are evaluated based on the smallest value of R/t at which no cracks occurred on the surface of the bend.
  • JIS H 3110 180° bend test
  • Alloys No. 1-10 according to the present invention have an S ND prior to the finish annealing of 0.06-0.10, so this satisfies the condition 0.05 ⁇ S ND ⁇ 0.15, and the grain size after the subsequent annealing is 6-10 ⁇ m, so this satisfies the condition of being less than 20 ⁇ m, and the final sheet also has an S ND of 0.06-0.11, so this satisfies the condition 0.05 ⁇ S ND ⁇ 0.15, and they had superior bending workability and had a superior balance of conductivity and tensile strength.
  • Comparative Example No. 11 had a finish rolling percent reduction after the finish annealing that did not satisfy the lower limit of Formula (2), and while its bending workability was satisfactory, its tensile strength was 490 N/mm 2 which was inferior to the tensile strength of Examples No. 1-10 according to the present invention.
  • Comparative Examples No. 12 and 13 have a grain size after final annealing in excess of 20 ⁇ m, and their tensile strength was low at 540 N/mm 2 and their bending workability was also inferior.
  • Comparative Examples No. 14 and 15 have a finish rolling percent reduction after the finish annealing that did not satisfy the upper limit of Formula (2), and while No. 14 exhibited a high value of 645 N/mm 2 for its tensile strength, its bending workability is inferior.
  • No. 15 was aiming for improved bending workability by increasing the low-temperature annealing temperature by 100° C. over that of No. 14, but the bending workability was not improved as much as one would think and the tensile strength dropped to 565 N/mm 2 .
  • Alloy No. 3 according to the present invention presented in Table 1 of Example 1 (with a sheet thickness of 0.20 mm) and a commercial phosphor bronze alloy (C5191, grade H, sheet thickness 0.20 mm: 6.5 wt. % Sn, 0.2 wt. % P, remainder Cu) were subjected to an evaluation of their conductivity, tensile strength, 0.2% yield strength, springiness, Vickers hardness and bending workability.
  • the measurement of the conductivity, tensile strength, 0.2% yield strength, spring reflection limit and Vickers hardness were performed according to the JIS H 0505, JIS Z 2241, JIS H 3130 and JIS Z 2241 standards, respectively.
  • the bending workability was evaluated based on a 180° bend test (JIS H 3110), where a 10-mm wide test piece is blanked in a direction parallel to the rolling direction and the bend inside radius R and sheet thickness t are measured to find the ratio R/t, and the test pieces thus obtained are evaluated based on the smallest value of R/t at which no cracks occurred on the surface of the bend.
  • the results are presented in Table 3.
  • the copper-based alloy according to the present invention can be used in narrow-pitch connectors for use in telecommunications, automotive harness connectors, semiconductor lead frames and compact switches and relays and the like.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Conductive Materials (AREA)
US11/169,760 2004-07-01 2005-06-30 Copper-based alloy and method of manufacturing same Abandoned US20060016528A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US12/230,498 US8293039B2 (en) 2004-07-01 2008-08-29 Method of manufacturing copper-based alloy sheet

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004195984A JP4660735B2 (ja) 2004-07-01 2004-07-01 銅基合金板材の製造方法
JPJP2004-195984 2004-07-01

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/230,498 Division US8293039B2 (en) 2004-07-01 2008-08-29 Method of manufacturing copper-based alloy sheet

Publications (1)

Publication Number Publication Date
US20060016528A1 true US20060016528A1 (en) 2006-01-26

Family

ID=35134477

Family Applications (2)

Application Number Title Priority Date Filing Date
US11/169,760 Abandoned US20060016528A1 (en) 2004-07-01 2005-06-30 Copper-based alloy and method of manufacturing same
US12/230,498 Active 2028-06-24 US8293039B2 (en) 2004-07-01 2008-08-29 Method of manufacturing copper-based alloy sheet

Family Applications After (1)

Application Number Title Priority Date Filing Date
US12/230,498 Active 2028-06-24 US8293039B2 (en) 2004-07-01 2008-08-29 Method of manufacturing copper-based alloy sheet

Country Status (4)

Country Link
US (2) US20060016528A1 (zh)
EP (1) EP1612285B1 (zh)
JP (1) JP4660735B2 (zh)
CN (1) CN100567531C (zh)

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060186544A1 (en) * 2005-02-18 2006-08-24 Mk Electron Co., Ltd. Copper bonding wire for semiconductor packaging
US20070140433A1 (en) * 2005-11-25 2007-06-21 Kabushiki Kaisha Toshiba Rotation anode X-ray tube
US20090224379A1 (en) * 2008-03-07 2009-09-10 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel Ltd.) Copper alloy sheet and qfn package
US20090320964A1 (en) * 2003-03-03 2009-12-31 Mitsubishi Shindoh Co., Ltd. Heat resistance copper alloy materials
US20110056596A1 (en) * 2007-12-21 2011-03-10 Mitsubishi Shindoh Co., Ltd. High strength and high thermal conductivity copper alloy tube and method for producing the same
US20110100676A1 (en) * 2008-02-26 2011-05-05 Mitsubishi Shindoh Co., Ltd. High strength and high conductivity copper alloy rod or wire
US20110174417A1 (en) * 2008-03-28 2011-07-21 Mitsubishi Shindoh Co., Ltd. High strength and high conductivity copper alloy pipe, rod, or wire
US20110206941A1 (en) * 2008-10-31 2011-08-25 Sundwiger Messingwerk Gmbh & Co. Kg Copper-tin alloy, composite material and use thereof
US20110223056A1 (en) * 2007-08-07 2011-09-15 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) Copper alloy sheet
KR20150023874A (ko) * 2012-07-26 2015-03-05 미쓰비시덴키 가부시키가이샤 구리 합금 및 그의 제조 방법
CN105779808A (zh) * 2014-12-16 2016-07-20 北京有色金属研究总院 一种动力电池用高粘附性铜合金箔材及其加工方法
US9455058B2 (en) 2009-01-09 2016-09-27 Mitsubishi Shindoh Co., Ltd. High-strength and high-electrical conductivity copper alloy rolled sheet and method of manufacturing the same
US20170051385A1 (en) * 2014-03-04 2017-02-23 Otto Fuchs Kommanditgesellschaft Aluminium Bronze Alloy, Method for the Production Thereof and Product Made from Aluminium Bronze
US20180245183A1 (en) * 2015-09-09 2018-08-30 Mitsubishi Materials Corporation Copper alloy for electronic and electric device, component for electronic and electric device, terminal, and bus bar
US10311991B2 (en) 2009-01-09 2019-06-04 Mitsubishi Shindoh Co., Ltd. High-strength and high-electrical conductivity copper alloy rolled sheet and method of manufacturing the same
US20190316228A1 (en) * 2018-04-16 2019-10-17 University Of Virginia Patent Foundation Antimicrobial, hypoallergenic, and tarnish-resistant cu-based alloy and related methods thereof
US11017914B2 (en) * 2016-02-05 2021-05-25 Sumitomo Electric Industries, Ltd. Covered electric wire, terminal-fitted electric wire, copper alloy wire, and copper alloy stranded wire
CN113106293A (zh) * 2021-03-25 2021-07-13 北京科技大学 一种低钴含量高强中导Cu-Ni-Co-Si系合金及其制备工艺
US11613794B2 (en) 2017-10-30 2023-03-28 Mitsubishi Materials Corporation Superconductivity stabilizing material, superconducting wire and superconducting coil

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4680765B2 (ja) 2005-12-22 2011-05-11 株式会社神戸製鋼所 耐応力緩和特性に優れた銅合金
JP4157898B2 (ja) * 2006-10-02 2008-10-01 株式会社神戸製鋼所 プレス打ち抜き性に優れた電気電子部品用銅合金板
KR101158113B1 (ko) * 2006-10-02 2012-06-19 가부시키가이샤 고베 세이코쇼 전기 전자 부품용 동 합금판
US20080190523A1 (en) * 2007-02-13 2008-08-14 Weilin Gao Cu-Ni-Si-based copper alloy sheet material and method of manufacturing same
JP5075438B2 (ja) * 2007-03-20 2012-11-21 Dowaメタルテック株式会社 Cu−Ni−Sn−P系銅合金板材およびその製造法
JP4981748B2 (ja) * 2007-05-31 2012-07-25 古河電気工業株式会社 電気・電子機器用銅合金
US8287669B2 (en) 2007-05-31 2012-10-16 The Furukawa Electric Co., Ltd. Copper alloy for electric and electronic equipments
DE102007029991B4 (de) * 2007-06-28 2013-08-01 Wieland-Werke Ag Kupfer-Zink-Legierung, Verfahren zur Herstellung und Verwendung
JP4466688B2 (ja) * 2007-07-11 2010-05-26 日立電線株式会社 圧延銅箔
KR101203437B1 (ko) 2007-09-27 2012-11-21 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 열간 가공성이 우수한 고강도 고도전성 구리 합금
WO2009049201A1 (en) * 2007-10-10 2009-04-16 Gbc Metals, Llc Copper tin nickel phosphorus alloys with improved strength and formability
JP5291494B2 (ja) * 2008-09-30 2013-09-18 株式会社神戸製鋼所 高強度高耐熱性銅合金板
ES2649557T3 (es) * 2009-07-10 2018-01-12 Luvata Franklin, Inc. Aleación de cobre para tubo intercambiador de calor
KR101603393B1 (ko) * 2011-05-02 2016-03-14 후루카와 덴키 고교 가부시키가이샤 구리합금 판재 및 그의 제조방법
JP6050588B2 (ja) * 2012-01-11 2016-12-21 住友電気工業株式会社 銅合金線
US10663294B2 (en) 2012-02-03 2020-05-26 Eagle View Technologies, Inc. Systems and methods for estimation of building wall area and producing a wall estimation report
JP5802150B2 (ja) * 2012-02-24 2015-10-28 株式会社神戸製鋼所 銅合金
CN102758100B (zh) * 2012-07-18 2014-03-19 宁波兴业盛泰集团有限公司 一种高强高弹锌白铜合金及其加工方法
JP2014077182A (ja) * 2012-10-12 2014-05-01 Sh Copper Products Corp 圧延銅箔
CN102983081B (zh) * 2012-11-07 2014-12-31 江苏威纳德照明科技有限公司 一种由集成电路组成的半导体器件的制造方法
TWI486970B (zh) * 2013-01-29 2015-06-01 Tung Han Chuang 銅基合金線材及其製造方法
JP5647703B2 (ja) * 2013-02-14 2015-01-07 Dowaメタルテック株式会社 高強度Cu−Ni−Co−Si系銅合金板材およびその製造法並びに通電部品
DE102013007274B4 (de) * 2013-04-26 2020-01-16 Wieland-Werke Ag Konstruktionsteil aus einer Kupfergusslegierung
JP6080009B2 (ja) * 2013-05-13 2017-02-15 国立大学法人茨城大学 半導体集積回路装置及びその製造方法、並びに該半導体集積回路装置に使用する低抵抗率銅配線の探索方法
JP5453565B1 (ja) * 2013-06-13 2014-03-26 Jx日鉱日石金属株式会社 導電性及び曲げたわみ係数に優れる銅合金板
DE102014014239B4 (de) * 2014-09-25 2024-04-11 Wieland-Werke Ag Elektrisches Verbindungselement
CN104294082A (zh) * 2014-11-03 2015-01-21 宁波博威合金材料股份有限公司 一种黄铜合金
CN104831115A (zh) * 2015-04-27 2015-08-12 宁波博威合金材料股份有限公司 含锰黄铜合金及其制备方法
CN105039777B (zh) * 2015-05-05 2018-04-24 宁波博威合金材料股份有限公司 一种可切削加工黄铜合金及制备方法
CN105088006A (zh) * 2015-09-02 2015-11-25 宁波兴业盛泰集团有限公司 一种低成本、耐应力松弛铜合金引线框架材料及其制备方法
CN106636729A (zh) * 2016-10-05 2017-05-10 宁波兴业盛泰集团有限公司 一种动力电池连接器用多元铜合金板带材及其制备方法
KR102648370B1 (ko) * 2017-02-04 2024-03-15 마테리온 코포레이션 구리-니켈-주석 합금
CN107400796B (zh) * 2017-06-22 2019-04-30 安徽晋源铜业有限公司 一种耐高温高强无铍铜导线及其制备方法
CN107974574B (zh) * 2017-12-08 2020-05-26 宁波兴业盛泰集团有限公司 一种耐应力松弛的复杂黄铜合金及其制备方法
CN109022900B (zh) * 2018-08-17 2020-05-08 宁波博威合金材料股份有限公司 一种综合性能优异的铜合金及其应用
CN109266877B (zh) * 2018-11-01 2019-11-08 福建紫金铜业有限公司 一种高性能铜合金的制备方法
CN111411258B (zh) * 2020-05-26 2021-07-23 江西理工大学 具有高强度和高电导率的Cu-Sn合金超细线材及其制备方法
CN113913642B (zh) * 2021-09-26 2022-07-05 宁波博威合金板带有限公司 一种铜合金带材及其制备方法
CN114196851B (zh) * 2021-12-20 2022-10-21 有研工程技术研究院有限公司 一种高强度导电铜合金材料及其制备方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020108685A1 (en) * 2000-12-18 2002-08-15 Dowa Mining Co., Ltd. Copper-base alloys having improved punching properties on press and a process for producing them

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63312932A (ja) * 1987-06-15 1988-12-21 Mitsubishi Electric Corp ジグザグ・インライン・パッケ−ジ用銅基合金
JP2844120B2 (ja) * 1990-10-17 1999-01-06 同和鉱業株式会社 コネクタ用銅基合金の製造法
JP3550233B2 (ja) * 1995-10-09 2004-08-04 同和鉱業株式会社 高強度高導電性銅基合金の製造法
US5882442A (en) * 1995-10-20 1999-03-16 Olin Corporation Iron modified phosphor-bronze
US5820701A (en) * 1996-11-07 1998-10-13 Waterbury Rolling Mills, Inc. Copper alloy and process for obtaining same
US6254702B1 (en) * 1997-02-18 2001-07-03 Dowa Mining Co., Ltd. Copper base alloys and terminals using the same
US6132528A (en) * 1997-04-18 2000-10-17 Olin Corporation Iron modified tin brass
JP3733548B2 (ja) * 1998-05-19 2006-01-11 同和鉱業株式会社 耐応力緩和特性に優れた銅基合金の製造方法
JP2000080428A (ja) 1998-08-31 2000-03-21 Kobe Steel Ltd 曲げ加工性が優れた銅合金板
US6471792B1 (en) * 1998-11-16 2002-10-29 Olin Corporation Stress relaxation resistant brass
JP2000256814A (ja) * 1999-03-03 2000-09-19 Sumitomo Metal Mining Co Ltd 端子用銅基合金条の製造方法
JP4009981B2 (ja) * 1999-11-29 2007-11-21 Dowaホールディングス株式会社 プレス加工性に優れた銅基合金板
JP4396874B2 (ja) * 2000-03-17 2010-01-13 住友金属鉱山株式会社 端子用銅基合金条の製造方法
JP4393663B2 (ja) * 2000-03-17 2010-01-06 住友金属鉱山株式会社 端子用銅基合金条およびその製造方法
US20030029532A1 (en) * 2001-05-24 2003-02-13 Olin Corporation Nickel containing high copper alloy
JP4615794B2 (ja) * 2001-09-27 2011-01-19 清峰金属工業株式会社 コネクター用銅基合金板の製造方法
CN1327016C (zh) * 2002-05-14 2007-07-18 同和矿业株式会社 具有改善的冲压冲制性能的铜基合金及其制备方法
JP3807387B2 (ja) * 2003-07-31 2006-08-09 日立電線株式会社 端子・コネクタ用銅合金及びその製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020108685A1 (en) * 2000-12-18 2002-08-15 Dowa Mining Co., Ltd. Copper-base alloys having improved punching properties on press and a process for producing them
US6699337B2 (en) * 2000-12-18 2004-03-02 Dowa Mining Co., Ltd. Copper-base alloys having improved punching properties on press and a process for producing them

Cited By (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10266917B2 (en) 2003-03-03 2019-04-23 Mitsubishi Shindoh Co., Ltd. Heat resistance copper alloy materials
US20090320964A1 (en) * 2003-03-03 2009-12-31 Mitsubishi Shindoh Co., Ltd. Heat resistance copper alloy materials
US20060186544A1 (en) * 2005-02-18 2006-08-24 Mk Electron Co., Ltd. Copper bonding wire for semiconductor packaging
US20070140433A1 (en) * 2005-11-25 2007-06-21 Kabushiki Kaisha Toshiba Rotation anode X-ray tube
US7983395B2 (en) * 2005-11-25 2011-07-19 Kabushiki Kaisha Toshiba Rotation anode X-ray tube
US20110223056A1 (en) * 2007-08-07 2011-09-15 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) Copper alloy sheet
US20110056596A1 (en) * 2007-12-21 2011-03-10 Mitsubishi Shindoh Co., Ltd. High strength and high thermal conductivity copper alloy tube and method for producing the same
US8986471B2 (en) 2007-12-21 2015-03-24 Mitsubishi Shindoh Co., Ltd. High strength and high thermal conductivity copper alloy tube and method for producing the same
US10163539B2 (en) 2008-02-26 2018-12-25 Mitsubishi Shindoh Co., Ltd. High strength and high conductivity copper alloy rod or wire
US20110100676A1 (en) * 2008-02-26 2011-05-05 Mitsubishi Shindoh Co., Ltd. High strength and high conductivity copper alloy rod or wire
US9512506B2 (en) 2008-02-26 2016-12-06 Mitsubishi Shindoh Co., Ltd. High strength and high conductivity copper alloy rod or wire
US20090224379A1 (en) * 2008-03-07 2009-09-10 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel Ltd.) Copper alloy sheet and qfn package
US7928541B2 (en) * 2008-03-07 2011-04-19 Kobe Steel, Ltd. Copper alloy sheet and QFN package
US20110174417A1 (en) * 2008-03-28 2011-07-21 Mitsubishi Shindoh Co., Ltd. High strength and high conductivity copper alloy pipe, rod, or wire
US9163300B2 (en) * 2008-03-28 2015-10-20 Mitsubishi Shindoh Co., Ltd. High strength and high conductivity copper alloy pipe, rod, or wire
US20110206941A1 (en) * 2008-10-31 2011-08-25 Sundwiger Messingwerk Gmbh & Co. Kg Copper-tin alloy, composite material and use thereof
US10311991B2 (en) 2009-01-09 2019-06-04 Mitsubishi Shindoh Co., Ltd. High-strength and high-electrical conductivity copper alloy rolled sheet and method of manufacturing the same
US9455058B2 (en) 2009-01-09 2016-09-27 Mitsubishi Shindoh Co., Ltd. High-strength and high-electrical conductivity copper alloy rolled sheet and method of manufacturing the same
US10002684B2 (en) 2012-07-26 2018-06-19 Ngk Insulators, Ltd. Copper alloy and method for manufacturing the same
KR101715532B1 (ko) 2012-07-26 2017-03-10 엔지케이 인슐레이터 엘티디 구리 합금 및 그의 제조 방법
KR20150023874A (ko) * 2012-07-26 2015-03-05 미쓰비시덴키 가부시키가이샤 구리 합금 및 그의 제조 방법
US20170051385A1 (en) * 2014-03-04 2017-02-23 Otto Fuchs Kommanditgesellschaft Aluminium Bronze Alloy, Method for the Production Thereof and Product Made from Aluminium Bronze
US10280497B2 (en) * 2014-03-04 2019-05-07 Otto Fuchs Kommanditgesellschaft Aluminium bronze alloy, method for the production thereof and product made from aluminium bronze
CN105779808A (zh) * 2014-12-16 2016-07-20 北京有色金属研究总院 一种动力电池用高粘附性铜合金箔材及其加工方法
US20180245183A1 (en) * 2015-09-09 2018-08-30 Mitsubishi Materials Corporation Copper alloy for electronic and electric device, component for electronic and electric device, terminal, and bus bar
US11017914B2 (en) * 2016-02-05 2021-05-25 Sumitomo Electric Industries, Ltd. Covered electric wire, terminal-fitted electric wire, copper alloy wire, and copper alloy stranded wire
US11613794B2 (en) 2017-10-30 2023-03-28 Mitsubishi Materials Corporation Superconductivity stabilizing material, superconducting wire and superconducting coil
US20190316228A1 (en) * 2018-04-16 2019-10-17 University Of Virginia Patent Foundation Antimicrobial, hypoallergenic, and tarnish-resistant cu-based alloy and related methods thereof
US11155899B2 (en) * 2018-04-16 2021-10-26 University Of Virginia Patent Foundation Antimicrobial, hypoallergenic, and tarnish-resistant Cu-based alloy and related methods thereof
CN113106293A (zh) * 2021-03-25 2021-07-13 北京科技大学 一种低钴含量高强中导Cu-Ni-Co-Si系合金及其制备工艺
CN113106293B (zh) * 2021-03-25 2022-04-22 北京科技大学 一种低钴含量高强中导Cu-Ni-Co-Si系合金及其制备工艺

Also Published As

Publication number Publication date
EP1612285A1 (en) 2006-01-04
CN100567531C (zh) 2009-12-09
CN1800426A (zh) 2006-07-12
US20090014102A1 (en) 2009-01-15
US8293039B2 (en) 2012-10-23
EP1612285B1 (en) 2020-03-25
JP2006016667A (ja) 2006-01-19
JP4660735B2 (ja) 2011-03-30

Similar Documents

Publication Publication Date Title
US8293039B2 (en) Method of manufacturing copper-based alloy sheet
KR100876051B1 (ko) 굽힘 가공성을 구비한 전기 전자 부품용 구리 합금판
KR101667812B1 (ko) 구리 합금 플레이트 및 그 제조 방법
EP2957646B1 (en) High-strength cu-ni-co-si base copper alloy sheet, process for producing same, and current-carrying component
JP4937815B2 (ja) 電子材料用Cu−Ni−Si−Co系銅合金及びその製造方法
KR101935987B1 (ko) 구리합금 판재, 구리합금 판재로 이루어지는 커넥터, 및 구리합금 판재의 제조방법
US20130056116A1 (en) Copper alloy for electronic device, method of producing copper alloy for electronic device, and copper alloy rolled material for electronic device
JP3962751B2 (ja) 曲げ加工性を備えた電気電子部品用銅合金板
US20020108685A1 (en) Copper-base alloys having improved punching properties on press and a process for producing them
JP4494258B2 (ja) 銅合金およびその製造方法
EP2248921A1 (en) Copper alloy material for electric/electronic component and method for manufacturing the copper alloy material
EP2728025A2 (en) Cu-Ni-Co-Si based copper alloy sheet material and method for producing the same
US20110259480A1 (en) Copper alloy material
JP4959141B2 (ja) 高強度銅合金
JP4177104B2 (ja) 曲げ加工性に優れた高強度銅合金及びその製造方法及びそれを用いた端子・コネクタ
JPH0841612A (ja) 銅合金およびその製造方法
JP2008266787A (ja) 銅合金材およびその製造方法
WO2005116282A1 (en) Copper alloy
EP2940166B1 (en) Copper alloy for electrical and electronic equipment, copper alloy thin sheet for electrical and electronic equipment, and conductive part and terminal for electrical and electronic equipment
EP3020838A1 (en) Copper alloy for electronic and electrical equipment, copper alloy thin sheet for electronic and electrical equipment, and conductive component for electronic and electrical equipment, terminal
JP4887851B2 (ja) Ni−Sn−P系銅合金
US20110038753A1 (en) Copper alloy sheet material
JP2010270355A (ja) 銅合金板材およびその製造方法
JP5468798B2 (ja) 銅合金板材
US7090732B2 (en) High-mechanical strength copper alloy

Legal Events

Date Code Title Description
AS Assignment

Owner name: DOWA MINING CO., LTD., JAPAN

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:HATAKEYAMA, KOUICHI;REEL/FRAME:016627/0855

Effective date: 20050630

AS Assignment

Owner name: DOWA HOLDINGS CO., LTD., JAPAN

Free format text: CHANGE OF NAME;ASSIGNOR:DOWA MINING CO., LTD.;REEL/FRAME:020121/0161

Effective date: 20061002

Owner name: DOWA HOLDINGS CO., LTD.,JAPAN

Free format text: CHANGE OF NAME;ASSIGNOR:DOWA MINING CO., LTD.;REEL/FRAME:020121/0161

Effective date: 20061002

AS Assignment

Owner name: DOWA METALTECH CO., LTD., JAPAN

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:DOWA HOLDINGS CO., LTD.;REEL/FRAME:020354/0632

Effective date: 20071121

STCB Information on status: application discontinuation

Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION