TWI558210B - A semiconductor device, a solid-state imaging device, and a camera system - Google Patents

A semiconductor device, a solid-state imaging device, and a camera system Download PDF

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Publication number
TWI558210B
TWI558210B TW101137337A TW101137337A TWI558210B TW I558210 B TWI558210 B TW I558210B TW 101137337 A TW101137337 A TW 101137337A TW 101137337 A TW101137337 A TW 101137337A TW I558210 B TWI558210 B TW I558210B
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TW
Taiwan
Prior art keywords
wafer
signal
comparator
pixel
perforation
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TW101137337A
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English (en)
Chinese (zh)
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TW201320739A (zh
Inventor
長井利明
小關賢
植野洋介
鈴木敦史
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新力股份有限公司
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    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/60Noise processing, e.g. detecting, correcting, reducing or removing noise
    • H04N25/65Noise processing, e.g. detecting, correcting, reducing or removing noise applied to reset noise, e.g. KTC noise related to CMOS structures by techniques other than CDS
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03MCODING; DECODING; CODE CONVERSION IN GENERAL
    • H03M1/00Analogue/digital conversion; Digital/analogue conversion
    • H03M1/06Continuously compensating for, or preventing, undesired influence of physical parameters
    • H03M1/08Continuously compensating for, or preventing, undesired influence of physical parameters of noise
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03MCODING; DECODING; CODE CONVERSION IN GENERAL
    • H03M1/00Analogue/digital conversion; Digital/analogue conversion
    • H03M1/06Continuously compensating for, or preventing, undesired influence of physical parameters
    • H03M1/08Continuously compensating for, or preventing, undesired influence of physical parameters of noise
    • H03M1/0863Continuously compensating for, or preventing, undesired influence of physical parameters of noise of switching transients, e.g. glitches
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03MCODING; DECODING; CODE CONVERSION IN GENERAL
    • H03M1/00Analogue/digital conversion; Digital/analogue conversion
    • H03M1/12Analogue/digital converters
    • H03M1/1205Multiplexed conversion systems
    • H03M1/123Simultaneous, i.e. using one converter per channel but with common control or reference circuits for multiple converters
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03MCODING; DECODING; CODE CONVERSION IN GENERAL
    • H03M1/00Analogue/digital conversion; Digital/analogue conversion
    • H03M1/12Analogue/digital converters
    • H03M1/50Analogue/digital converters with intermediate conversion to time interval
    • H03M1/56Input signal compared with linear ramp
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/50Constructional details
    • H04N23/54Mounting of pick-up tubes, electronic image sensors, deviation or focusing coils
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/60Noise processing, e.g. detecting, correcting, reducing or removing noise
    • H04N25/62Detection or reduction of noise due to excess charges produced by the exposure, e.g. smear, blooming, ghost image, crosstalk or leakage between pixels
    • H04N25/621Detection or reduction of noise due to excess charges produced by the exposure, e.g. smear, blooming, ghost image, crosstalk or leakage between pixels for the control of blooming
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/71Charge-coupled device [CCD] sensors; Charge-transfer registers specially adapted for CCD sensors
    • H04N25/75Circuitry for providing, modifying or processing image signals from the pixel array
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/76Addressed sensors, e.g. MOS or CMOS sensors
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/76Addressed sensors, e.g. MOS or CMOS sensors
    • H04N25/77Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components
    • H04N25/778Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components comprising amplifiers shared between a plurality of pixels, i.e. at least one part of the amplifier must be on the sensor array itself
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/76Addressed sensors, e.g. MOS or CMOS sensors
    • H04N25/78Readout circuits for addressed sensors, e.g. output amplifiers or A/D converters
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • H10F39/18Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/803Pixels having integrated switching, control, storage or amplification elements
    • H10F39/8037Pixels having integrated switching, control, storage or amplification elements the integrated elements comprising a transistor
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/804Containers or encapsulations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/809Constructional details of image sensors of hybrid image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/811Interconnections
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Theoretical Computer Science (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Analogue/Digital Conversion (AREA)
TW101137337A 2011-10-21 2012-10-09 A semiconductor device, a solid-state imaging device, and a camera system TWI558210B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011232282A JP6056126B2 (ja) 2011-10-21 2011-10-21 固体撮像装置およびカメラシステム

Publications (2)

Publication Number Publication Date
TW201320739A TW201320739A (zh) 2013-05-16
TWI558210B true TWI558210B (zh) 2016-11-11

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TW101137337A TWI558210B (zh) 2011-10-21 2012-10-09 A semiconductor device, a solid-state imaging device, and a camera system

Country Status (8)

Country Link
US (7) US9350929B2 (enExample)
EP (3) EP2750375A4 (enExample)
JP (1) JP6056126B2 (enExample)
KR (6) KR101925229B1 (enExample)
CN (4) CN104054328B (enExample)
DE (1) DE202012013524U1 (enExample)
TW (1) TWI558210B (enExample)
WO (1) WO2013057903A1 (enExample)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5980080B2 (ja) * 2012-10-02 2016-08-31 キヤノン株式会社 光電変換装置、撮像システム、光電変換装置の検査方法および撮像システムの製造方法
WO2015111371A1 (ja) * 2014-01-22 2015-07-30 パナソニックIpマネジメント株式会社 固体撮像装置及び撮像装置
TWI648986B (zh) * 2014-04-15 2019-01-21 日商新力股份有限公司 攝像元件、電子機器
US10044954B2 (en) 2014-07-25 2018-08-07 Sony Corporation Solid-state imaging device, AD converter, and electronic apparatus
WO2016027677A1 (ja) * 2014-08-18 2016-02-25 株式会社 日立メディコ アナログ-デジタル変換システム、x線ct装置および医用画像撮影装置
TWI669964B (zh) * 2015-04-06 2019-08-21 日商新力股份有限公司 Solid-state imaging device, electronic device, and AD conversion device
JP6492991B2 (ja) 2015-06-08 2019-04-03 株式会社リコー 固体撮像装置
US9881949B2 (en) * 2015-06-17 2018-01-30 Taiwan Semiconductor Manufacturing Company Ltd. Sensing device, image sensing system and method thereof
WO2017057291A1 (ja) * 2015-10-01 2017-04-06 オリンパス株式会社 撮像素子、内視鏡、及び内視鏡システム
US9588240B1 (en) * 2015-10-27 2017-03-07 General Electric Company Digital readout architecture for four side buttable digital X-ray detector
TW201725900A (zh) * 2016-01-06 2017-07-16 原相科技股份有限公司 影像感測器及使用其的影像擷取裝置
US9986185B2 (en) * 2016-03-09 2018-05-29 Ricoh Company, Ltd. Semiconductor integrated circuit and image capturing apparatus
TWI754696B (zh) * 2016-12-14 2022-02-11 日商索尼半導體解決方案公司 固體攝像元件及電子機器
US9825645B1 (en) * 2016-12-22 2017-11-21 Infineon Technologies Ag Self-oscillating dual-slope integrating quantizer for sigma delta modulators
US9967505B1 (en) * 2017-04-13 2018-05-08 Omnivision Technologies, Inc. Comparators for double ramp analog to digital converter
US10431608B2 (en) * 2017-04-13 2019-10-01 Omnivision Technologies, Inc. Dual conversion gain high dynamic range readout for comparator of double ramp analog to digital converter
US10181858B1 (en) * 2017-11-30 2019-01-15 National Instruments Corporation Auto-zero algorithm for reducing measurement noise in analog-to-digital systems over a wide range of sampling rates
WO2019130963A1 (ja) * 2017-12-26 2019-07-04 ソニーセミコンダクタソリューションズ株式会社 固体撮像素子、コンパレータ、及び、電子機器
US10530380B2 (en) * 2018-04-27 2020-01-07 Raytheon Company Massively parallel three dimensional per pixel single slope analog to digital converter
JP2021184510A (ja) * 2018-08-31 2021-12-02 ソニーセミコンダクタソリューションズ株式会社 固体撮像装置およびその駆動方法、並びに電子機器
CN109151349B (zh) * 2018-09-10 2020-06-05 中国科学院高能物理研究所 全信息读出的像素单元电路及全信息读出方法
JP2020068369A (ja) * 2018-10-18 2020-04-30 キヤノン株式会社 半導体装置、半導体メモリ、光電変換装置、移動体、光電変換装置の製造方法、および半導体メモリの製造方法
JP7365775B2 (ja) * 2019-02-21 2023-10-20 ソニーセミコンダクタソリューションズ株式会社 固体撮像素子
US10924701B2 (en) * 2019-07-18 2021-02-16 Omnivision Technologies, Inc. Column amplifier reset circuit with comparator
CN112399104B (zh) * 2019-08-14 2023-06-16 天津大学青岛海洋技术研究院 一种全局曝光低噪声高速三维传感器锁相像素及读出方式
JP7603379B2 (ja) * 2020-03-30 2024-12-20 ブリルニクス シンガポール プライベート リミテッド 固体撮像装置、固体撮像装置の製造方法、および電子機器
US11240454B2 (en) * 2020-04-29 2022-02-01 Omnivision Technologies, Inc. Hybrid CMOS image sensor with event driven sensing
US11595030B2 (en) * 2020-05-05 2023-02-28 Omnivision Technologies, Inc. Ramp generator providing high resolution fine gain including fractional divider with delta-sigma modulator
JP7277429B2 (ja) * 2020-12-24 2023-05-19 キヤノン株式会社 光電変換装置、光電変換システム、移動体、半導体基板
JP7532274B2 (ja) 2021-01-29 2024-08-13 キオクシア株式会社 半導体記憶装置
JP2022119632A (ja) * 2021-02-04 2022-08-17 キヤノン株式会社 光電変換装置、光電変換システムおよび移動体
CN115171607B (zh) 2022-09-06 2023-01-31 惠科股份有限公司 像素电路、显示面板及显示装置
CN117294968B (zh) * 2023-08-01 2024-05-07 脉冲视觉(北京)科技有限公司 信号处理电路和电子设备
JP2025045862A (ja) * 2023-09-20 2025-04-02 株式会社東芝 固体撮像装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011083722A1 (ja) * 2010-01-08 2011-07-14 ソニー株式会社 半導体装置、固体撮像装置、およびカメラシステム

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4792849A (en) * 1987-08-04 1988-12-20 Telaction Corporation Digital interactive communication system
US6456326B2 (en) * 1994-01-28 2002-09-24 California Institute Of Technology Single chip camera device having double sampling operation
JP2001339643A (ja) * 2000-05-30 2001-12-07 Nec Corp 固体撮像装置用黒レベル発生回路及び固体撮像装置
WO2004007287A2 (en) * 2002-07-16 2004-01-22 The Charles Stark Draper Laboratory, Inc. Integrated inertial stellar attitude sensor
JP2006020171A (ja) * 2004-07-02 2006-01-19 Fujitsu Ltd 差動型コンパレータ、アナログ・デジタル変換装置、撮像装置
JP4816457B2 (ja) * 2004-09-02 2011-11-16 ソニー株式会社 撮像装置及び撮像結果の出力方法
CN100576557C (zh) * 2004-11-26 2009-12-30 株式会社半导体能源研究所 半导体器件及其制造方法
TW201101476A (en) 2005-06-02 2011-01-01 Sony Corp Semiconductor image sensor module and method of manufacturing the same
CN101228631A (zh) * 2005-06-02 2008-07-23 索尼株式会社 半导体图像传感器模块及其制造方法
JP4858388B2 (ja) * 2007-09-28 2012-01-18 ソニー株式会社 固体撮像装置、駆動制御方法、および撮像装置
TWI399088B (zh) * 2007-10-12 2013-06-11 Sony Corp 資料處理器,固態成像裝置,成像裝置,及電子設備
JP5372382B2 (ja) * 2008-01-09 2013-12-18 ピーエスフォー ルクスコ エスエイアールエル 半導体装置
JP5223343B2 (ja) 2008-01-10 2013-06-26 株式会社ニコン 固体撮像素子
JP2009212162A (ja) * 2008-02-29 2009-09-17 Fujifilm Corp 放射線検出器
JP5173503B2 (ja) * 2008-03-14 2013-04-03 キヤノン株式会社 撮像装置及び撮像システム
JP5269456B2 (ja) * 2008-03-26 2013-08-21 株式会社東芝 イメージセンサおよびその駆動方法
JP5407264B2 (ja) 2008-10-09 2014-02-05 ソニー株式会社 固体撮像素子およびカメラシステム
TWI618412B (zh) * 2008-12-16 2018-03-11 邰祐南 雜訊消除影像感測器
JP5029624B2 (ja) 2009-01-15 2012-09-19 ソニー株式会社 固体撮像装置及び電子機器
US8625012B2 (en) * 2009-02-05 2014-01-07 The Hong Kong University Of Science And Technology Apparatus and method for improving dynamic range and linearity of CMOS image sensor
JP5985136B2 (ja) * 2009-03-19 2016-09-06 ソニー株式会社 半導体装置とその製造方法、及び電子機器
EP2234387B8 (en) * 2009-03-24 2012-05-23 Sony Corporation Solid-state imaging device, driving method of solid-state imaging device, and electronic apparatus
JP4941490B2 (ja) * 2009-03-24 2012-05-30 ソニー株式会社 固体撮像装置、及び電子機器
JP5083272B2 (ja) * 2009-05-07 2012-11-28 ソニー株式会社 半導体モジュール
JP5558801B2 (ja) 2009-12-18 2014-07-23 キヤノン株式会社 固体撮像装置
JP5853351B2 (ja) * 2010-03-25 2016-02-09 ソニー株式会社 半導体装置、半導体装置の製造方法、及び電子機器
JP5696513B2 (ja) * 2011-02-08 2015-04-08 ソニー株式会社 固体撮像装置とその製造方法、及び電子機器
JP5791571B2 (ja) * 2011-08-02 2015-10-07 キヤノン株式会社 撮像素子及び撮像装置
CN103268045B (zh) * 2012-09-24 2016-08-10 厦门天马微电子有限公司 Tft阵列基板及其制作方法、液晶显示设备
JP6217458B2 (ja) * 2014-03-03 2017-10-25 ソニー株式会社 半導体装置およびその製造方法、並びに電子機器
EP3101812B1 (en) * 2015-06-05 2022-10-26 Cmosis Bvba In-pixel differential transconductance amplifier for adc and image sensor architecture
KR102500813B1 (ko) * 2015-09-24 2023-02-17 삼성전자주식회사 반도체 소자 및 이의 제조 방법
US10334196B2 (en) * 2016-01-25 2019-06-25 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011083722A1 (ja) * 2010-01-08 2011-07-14 ソニー株式会社 半導体装置、固体撮像装置、およびカメラシステム

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
3D System Integration, 2009. 3DIC 2009. IEEE International Conference on 28-30 Sept. 2009 *

Also Published As

Publication number Publication date
US20180124340A1 (en) 2018-05-03
US9350929B2 (en) 2016-05-24
EP4429119A3 (en) 2025-01-22
US10027912B2 (en) 2018-07-17
KR101750606B1 (ko) 2017-06-23
CN106851143B (zh) 2019-11-19
KR20170044762A (ko) 2017-04-25
CN104054328B (zh) 2018-05-11
KR20200067928A (ko) 2020-06-12
US9736409B2 (en) 2017-08-15
US20170134678A1 (en) 2017-05-11
EP2750375A1 (en) 2014-07-02
EP4429119A2 (en) 2024-09-11
TW201320739A (zh) 2013-05-16
CN106851143A (zh) 2017-06-13
KR101925229B1 (ko) 2018-12-04
US20170134679A1 (en) 2017-05-11
KR102013092B1 (ko) 2019-08-21
KR20190096452A (ko) 2019-08-19
CN107104668B (zh) 2021-11-16
KR20140072096A (ko) 2014-06-12
US20170006243A1 (en) 2017-01-05
CN104054328A (zh) 2014-09-17
KR20170044761A (ko) 2017-04-25
JP2013090304A (ja) 2013-05-13
US10554912B2 (en) 2020-02-04
DE202012013524U1 (de) 2017-07-13
EP3328072A3 (en) 2019-01-02
US9838626B2 (en) 2017-12-05
KR20180108915A (ko) 2018-10-04
US9509933B2 (en) 2016-11-29
US20160227145A1 (en) 2016-08-04
US9654708B2 (en) 2017-05-16
CN107135360A (zh) 2017-09-05
KR101925228B1 (ko) 2018-12-04
CN107104668A (zh) 2017-08-29
EP3328072A2 (en) 2018-05-30
US20140232916A1 (en) 2014-08-21
US20170288691A1 (en) 2017-10-05
EP2750375A4 (en) 2015-06-03
JP6056126B2 (ja) 2017-01-11
WO2013057903A1 (ja) 2013-04-25

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