TWI386266B - 雷射處理的方法和設備 - Google Patents
雷射處理的方法和設備 Download PDFInfo
- Publication number
- TWI386266B TWI386266B TW096115445A TW96115445A TWI386266B TW I386266 B TWI386266 B TW I386266B TW 096115445 A TW096115445 A TW 096115445A TW 96115445 A TW96115445 A TW 96115445A TW I386266 B TWI386266 B TW I386266B
- Authority
- TW
- Taiwan
- Prior art keywords
- workpiece
- laser beam
- laser
- processing
- beam path
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/067—Dividing the beam into multiple beams, e.g. multi-focusing
- B23K26/0673—Dividing the beam into multiple beams, e.g. multi-focusing into independently operating sub-beams, e.g. beam multiplexing to provide laser beams for several stations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
- H10P95/90—Thermal treatments, e.g. annealing or sintering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/035—Aligning the laser beam
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/04—Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
- B23K26/042—Automatically aligning the laser beam
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/70—Auxiliary operations or equipment
- B23K26/702—Auxiliary equipment
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W99/00—Subject matter not provided for in other groups of this subclass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic materials other than metals or composite materials
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0008—Apparatus or processes for manufacturing printed circuits for aligning or positioning of tools relative to the circuit board
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0097—Processing two or more printed circuits simultaneously, e.g. made from a common substrate, or temporarily stacked circuit boards
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/01—Manufacture or treatment
- H10W70/05—Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
- H10W70/093—Connecting or disconnecting other interconnections thereto or therefrom, e.g. connecting bond wires or bumps
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Laser Beam Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/417,269 US7834293B2 (en) | 2006-05-02 | 2006-05-02 | Method and apparatus for laser processing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200800457A TW200800457A (en) | 2008-01-01 |
| TWI386266B true TWI386266B (zh) | 2013-02-21 |
Family
ID=38660278
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW096115445A TWI386266B (zh) | 2006-05-02 | 2007-05-01 | 雷射處理的方法和設備 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US7834293B2 (https=) |
| JP (3) | JP2009535222A (https=) |
| KR (2) | KR20140146666A (https=) |
| CN (1) | CN101432857B (https=) |
| DE (1) | DE112007001065T5 (https=) |
| GB (1) | GB2451782A (https=) |
| TW (1) | TWI386266B (https=) |
| WO (1) | WO2007130986A1 (https=) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102007012815B4 (de) * | 2007-03-16 | 2024-06-06 | Dmg Mori Ultrasonic Lasertec Gmbh | Verfahren und Vorrichtung zur Bildung eines Gesenks |
| US7947919B2 (en) * | 2008-03-04 | 2011-05-24 | Universal Laser Systems, Inc. | Laser-based material processing exhaust systems and methods for using such systems |
| US8024060B2 (en) * | 2008-06-16 | 2011-09-20 | Electro Scientific Industries, Inc. | Method for defining safe zones in laser machining systems |
| WO2010048733A1 (en) * | 2008-10-29 | 2010-05-06 | Oerlikon Solar Ip Ag, Trübbach | Method for dividing a semiconductor film formed on a substrate into plural regions by multiple laser beam irradiation |
| KR101448444B1 (ko) * | 2010-06-10 | 2014-10-15 | 에스티에스반도체통신 주식회사 | 무선 신호 검사 기능을 가지는 비아 홀 가공용 레이저 장치 및 그 가공 방법 |
| US8263899B2 (en) * | 2010-07-01 | 2012-09-11 | Sunpower Corporation | High throughput solar cell ablation system |
| SG11201402324VA (en) * | 2011-11-16 | 2014-06-27 | Applied Materials Inc | Laser scribing systems, apparatus, and methods |
| CN103600171B (zh) * | 2013-04-28 | 2015-12-09 | 宝山钢铁股份有限公司 | 一种金属板上下料及切割的方法及系统 |
| CN103600170B (zh) * | 2013-04-28 | 2015-08-26 | 宝山钢铁股份有限公司 | 一种纵向金属板上下料与切割方法及其系统 |
| US10618131B2 (en) * | 2014-06-05 | 2020-04-14 | Nlight, Inc. | Laser patterning skew correction |
| KR102781391B1 (ko) | 2015-09-09 | 2025-03-17 | 일렉트로 싸이언티픽 인더스트리이즈 인코포레이티드 | 작업물들을 레이저 가공하기 위한 레이저 가공 장치, 방법들 및 관련된 배열들 |
| CN108367389B (zh) | 2015-11-23 | 2020-07-28 | 恩耐公司 | 激光加工方法和装置 |
| JP6382901B2 (ja) * | 2016-09-29 | 2018-08-29 | ファナック株式会社 | レーザー加工システム |
| CN110139727B (zh) | 2016-12-30 | 2022-04-05 | 伊雷克托科学工业股份有限公司 | 用于延长镭射处理设备中的光学器件生命期的方法和系统 |
| JP6844901B2 (ja) * | 2017-05-26 | 2021-03-17 | 株式会社ディスコ | レーザ加工装置及びレーザ加工方法 |
| KR20250039487A (ko) | 2018-06-05 | 2025-03-20 | 일렉트로 싸이언티픽 인더스트리이즈 인코포레이티드 | 레이저 가공 장치, 그 작동 방법 및 이를 사용한 작업물 가공 방법 |
| DE102018119313B4 (de) * | 2018-08-08 | 2023-03-30 | Rogers Germany Gmbh | Verfahren zum Bearbeiten eines Metall-Keramik-Substrats und Anlage zum Durchführen des Verfahrens |
| KR102122778B1 (ko) * | 2018-10-10 | 2020-06-15 | (주)성현 테크놀로지 | 레이저 및 드릴을 이용한 미세 홀 가공방법 |
| TWI843784B (zh) | 2019-01-31 | 2024-06-01 | 美商伊雷克托科學工業股份有限公司 | 雷射加工設備、與設備一起使用的控制器及非暫時性電腦可讀取媒體 |
| WO2020251782A1 (en) | 2019-06-10 | 2020-12-17 | Electro Scientific Industries, Inc. | Laser processing apparatus, methods of operating the same, and methods of processing workpieces using the same |
| CN110899998A (zh) * | 2019-11-29 | 2020-03-24 | 上海精测半导体技术有限公司 | 一种激光切割设备以及校准方法 |
| KR102429862B1 (ko) * | 2019-12-12 | 2022-08-05 | 두원포토닉스 주식회사 | 이종파장의 레이저 빔을 이용한 레이저 가공 장치 및 그 방법 |
| JP7575971B2 (ja) * | 2021-03-09 | 2024-10-30 | Jswアクティナシステム株式会社 | レーザ照射装置、レーザ照射方法、及び有機elディスプレイの製造方法 |
| CN113618262B (zh) * | 2021-10-12 | 2021-12-14 | 江油星联电子科技有限公司 | 一种铝基印制电路板用开料装置 |
| CN116072583B (zh) | 2023-02-13 | 2024-01-30 | 无锡星微科技有限公司 | 一种基于视觉的晶圆预对准平台以及对准方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1996011769A1 (en) * | 1994-10-18 | 1996-04-25 | Laser Machining, Inc. | Double x-y table system for use with a fixed beam laser system |
| US6340806B1 (en) * | 1999-12-28 | 2002-01-22 | General Scanning Inc. | Energy-efficient method and system for processing target material using an amplified, wavelength-shifted pulse train |
| US20060138097A1 (en) * | 1996-11-20 | 2006-06-29 | Ibiden Co., Ltd. | Laser machining apparatus, and apparatus and method for manufacturing a multilayered printed wiring board |
Family Cites Families (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60210390A (ja) * | 1984-04-05 | 1985-10-22 | Kokusan Denki Co Ltd | レ−ザ加工方法及び装置 |
| JPS61125712A (ja) * | 1984-11-26 | 1986-06-13 | Matsushita Electric Works Ltd | 多層印刷配線板の孔穿設法 |
| JPS61172003A (ja) * | 1985-01-28 | 1986-08-02 | Hitachi Ltd | プリント基板パタ−ン検査装置 |
| JPS62144890A (ja) * | 1985-12-20 | 1987-06-29 | Mitsubishi Electric Corp | レ−ザ裁断機 |
| DE3743902A1 (de) * | 1986-12-26 | 1988-07-07 | Mitsubishi Electric Corp | Laserbearbeitungsvorrichtung |
| US5111406A (en) * | 1990-01-05 | 1992-05-05 | Nicolet Instrument Corporation | Method for determining drill target locations in a multilayer board panel |
| JP2578035B2 (ja) * | 1991-08-28 | 1997-02-05 | 日本写真印刷株式会社 | 基板位置決め方法 |
| JPH0620899A (ja) | 1992-07-01 | 1994-01-28 | Nikon Corp | 薄膜除去装置 |
| JP3253784B2 (ja) * | 1993-12-17 | 2002-02-04 | 日立ビアメカニクス株式会社 | 多層プリント基板の内層パターン位置検出方法および穴明け加工方法並びにその装置 |
| US5841099A (en) | 1994-07-18 | 1998-11-24 | Electro Scientific Industries, Inc. | Method employing UV laser pulses of varied energy density to form depthwise self-limiting blind vias in multilayered targets |
| JP3077539B2 (ja) * | 1994-12-22 | 2000-08-14 | 松下電器産業株式会社 | レーザ加工方法 |
| JPH08290282A (ja) * | 1995-04-21 | 1996-11-05 | Sanyo Mach Works Ltd | レーザ溶接装置 |
| JPH1058173A (ja) * | 1996-08-27 | 1998-03-03 | Nikon Corp | レーザ加工装置 |
| US5948291A (en) * | 1997-04-29 | 1999-09-07 | General Scanning, Inc. | Laser beam distributor and computer program for controlling the same |
| EP0927597B1 (en) * | 1997-11-03 | 2000-09-06 | RAINER S.r.l. | Machine for cutting sheet metal and similar |
| JPH11221690A (ja) * | 1998-02-09 | 1999-08-17 | Mitsubishi Electric Corp | レーザ加工装置およびレーザ加工方法 |
| EP0937532B1 (en) * | 1998-02-19 | 2002-11-06 | M J Technologies Limited | Laser drilling with optical feedback |
| JP3364464B2 (ja) * | 2000-01-18 | 2003-01-08 | 川崎重工業株式会社 | 自動加工装置 |
| WO2001074529A2 (en) | 2000-03-30 | 2001-10-11 | Electro Scientific Industries, Inc. | Laser system and method for single pass micromachining of multilayer workpieces |
| JP2002011588A (ja) * | 2000-06-28 | 2002-01-15 | Sumitomo Heavy Ind Ltd | レーザドリル加工機及びレーザを用いた加工方法 |
| JP4132014B2 (ja) | 2001-03-28 | 2008-08-13 | 凸版印刷株式会社 | レーザ加工装置及び加工方法 |
| JP3855684B2 (ja) * | 2001-06-05 | 2006-12-13 | 松下電器産業株式会社 | レーザ加工装置およびレーザ加工方法 |
| JP2003112278A (ja) | 2001-09-28 | 2003-04-15 | Matsushita Electric Ind Co Ltd | 加工装置及びその加工方法 |
| WO2003080283A1 (en) * | 2002-03-26 | 2003-10-02 | Mitsubishi Denki Kabushiki Kaisha | Laser beam positioning device for laser machining, apparatus |
| JP4143334B2 (ja) * | 2002-05-24 | 2008-09-03 | 日立ビアメカニクス株式会社 | プリント基板穴明け用レーザ加工機の制御方法 |
| US6580054B1 (en) * | 2002-06-10 | 2003-06-17 | New Wave Research | Scribing sapphire substrates with a solid state UV laser |
| US6610961B1 (en) * | 2002-07-25 | 2003-08-26 | Matsushita Electric Industrial Co., Ltd. | System and method of workpiece alignment in a laser milling system |
| US6706999B1 (en) * | 2003-02-24 | 2004-03-16 | Electro Scientific Industries, Inc. | Laser beam tertiary positioner apparatus and method |
| JP4215677B2 (ja) * | 2003-08-25 | 2009-01-28 | 日立ビアメカニクス株式会社 | レーザ加工機及びレーザ加工方法 |
| US20050205778A1 (en) * | 2003-10-17 | 2005-09-22 | Gsi Lumonics Corporation | Laser trim motion, calibration, imaging, and fixturing techniques |
| FR2883503B1 (fr) * | 2005-03-23 | 2020-11-06 | Datacard Corp | Machine de marquage laser a haute cadence |
-
2006
- 2006-05-02 US US11/417,269 patent/US7834293B2/en not_active Expired - Fee Related
-
2007
- 2007-05-01 WO PCT/US2007/067945 patent/WO2007130986A1/en not_active Ceased
- 2007-05-01 KR KR1020147033084A patent/KR20140146666A/ko not_active Ceased
- 2007-05-01 TW TW096115445A patent/TWI386266B/zh not_active IP Right Cessation
- 2007-05-01 CN CN2007800155301A patent/CN101432857B/zh not_active Expired - Fee Related
- 2007-05-01 DE DE112007001065T patent/DE112007001065T5/de not_active Withdrawn
- 2007-05-01 KR KR1020087026659A patent/KR101509549B1/ko not_active Expired - Fee Related
- 2007-05-01 GB GB0820346A patent/GB2451782A/en not_active Withdrawn
- 2007-05-01 JP JP2009510034A patent/JP2009535222A/ja active Pending
-
2013
- 2013-02-12 JP JP2013024399A patent/JP2013126691A/ja active Pending
-
2015
- 2015-12-24 JP JP2015250885A patent/JP6147325B2/ja not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1996011769A1 (en) * | 1994-10-18 | 1996-04-25 | Laser Machining, Inc. | Double x-y table system for use with a fixed beam laser system |
| US20060138097A1 (en) * | 1996-11-20 | 2006-06-29 | Ibiden Co., Ltd. | Laser machining apparatus, and apparatus and method for manufacturing a multilayered printed wiring board |
| US6340806B1 (en) * | 1999-12-28 | 2002-01-22 | General Scanning Inc. | Energy-efficient method and system for processing target material using an amplified, wavelength-shifted pulse train |
Also Published As
| Publication number | Publication date |
|---|---|
| US7834293B2 (en) | 2010-11-16 |
| JP2009535222A (ja) | 2009-10-01 |
| KR101509549B1 (ko) | 2015-04-06 |
| DE112007001065T5 (de) | 2009-04-23 |
| CN101432857B (zh) | 2011-07-06 |
| US20070257012A1 (en) | 2007-11-08 |
| GB0820346D0 (en) | 2008-12-17 |
| JP2016074040A (ja) | 2016-05-12 |
| GB2451782A (en) | 2009-02-11 |
| TW200800457A (en) | 2008-01-01 |
| KR20140146666A (ko) | 2014-12-26 |
| CN101432857A (zh) | 2009-05-13 |
| WO2007130986A1 (en) | 2007-11-15 |
| KR20090005121A (ko) | 2009-01-12 |
| JP2013126691A (ja) | 2013-06-27 |
| JP6147325B2 (ja) | 2017-06-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |