TWI380130B - Photosensitive composition and laminated body thereof - Google Patents

Photosensitive composition and laminated body thereof Download PDF

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Publication number
TWI380130B
TWI380130B TW97131356A TW97131356A TWI380130B TW I380130 B TWI380130 B TW I380130B TW 97131356 A TW97131356 A TW 97131356A TW 97131356 A TW97131356 A TW 97131356A TW I380130 B TWI380130 B TW I380130B
Authority
TW
Taiwan
Prior art keywords
photosensitive resin
substrate
mass
group
resin composition
Prior art date
Application number
TW97131356A
Other languages
English (en)
Chinese (zh)
Other versions
TW200921275A (en
Inventor
Yukimasa Baba
Original Assignee
Asahi Kasei Emd Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei Emd Corp filed Critical Asahi Kasei Emd Corp
Publication of TW200921275A publication Critical patent/TW200921275A/zh
Application granted granted Critical
Publication of TWI380130B publication Critical patent/TWI380130B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Laminated Bodies (AREA)
TW97131356A 2007-08-15 2008-08-15 Photosensitive composition and laminated body thereof TWI380130B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007211622 2007-08-15

Publications (2)

Publication Number Publication Date
TW200921275A TW200921275A (en) 2009-05-16
TWI380130B true TWI380130B (en) 2012-12-21

Family

ID=40350777

Family Applications (1)

Application Number Title Priority Date Filing Date
TW97131356A TWI380130B (en) 2007-08-15 2008-08-15 Photosensitive composition and laminated body thereof

Country Status (5)

Country Link
JP (1) JP5221543B2 (ja)
KR (1) KR101167537B1 (ja)
CN (1) CN101779165B (ja)
TW (1) TWI380130B (ja)
WO (1) WO2009022724A1 (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5707420B2 (ja) * 2010-12-24 2015-04-30 旭化成イーマテリアルズ株式会社 感光性樹脂組成物
JP6019902B2 (ja) * 2011-09-06 2016-11-02 日立化成株式会社 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法、及びプリント配線板の製造方法
JP5826006B2 (ja) * 2011-12-01 2015-12-02 旭化成イーマテリアルズ株式会社 感光性樹脂組成物
CN103064253B (zh) * 2012-12-05 2015-04-08 北京化工大学常州先进材料研究院 一种含有吖啶类氧化物的感光性组合物
JP6486672B2 (ja) * 2013-12-20 2019-03-20 旭化成株式会社 感光性エレメント、及びその製造方法
KR102097261B1 (ko) 2015-08-25 2020-04-06 아사히 가세이 가부시키가이샤 감광성 수지 조성물
JP6514346B2 (ja) 2015-09-11 2019-05-15 旭化成株式会社 感光性樹脂組成物
WO2018225748A1 (ja) * 2017-06-08 2018-12-13 Jsr株式会社 組成物、硬化膜の製造方法及び電子部品

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4519356B2 (ja) * 2001-04-26 2010-08-04 旭化成イーマテリアルズ株式会社 感光性樹脂積層体
US20070269738A1 (en) * 2004-07-30 2007-11-22 Hitachi Chemical Company, Ltd. Photosensitive Film, Photosensitive Film Laminate and Photosensitive Film Roll
JP2006208734A (ja) * 2005-01-27 2006-08-10 Fuji Photo Film Co Ltd パターン形成方法
JP4761909B2 (ja) * 2005-10-05 2011-08-31 旭化成イーマテリアルズ株式会社 感光性樹脂組成物及び積層体
JP4752650B2 (ja) * 2006-04-13 2011-08-17 日立化成工業株式会社 感光性樹脂組成物
JP5188391B2 (ja) * 2006-05-09 2013-04-24 旭化成イーマテリアルズ株式会社 感光性樹脂組成物
JP2008020629A (ja) * 2006-07-12 2008-01-31 Fujifilm Corp パターン形成材料、並びに、パターン形成装置及びパターン形成方法
KR101059408B1 (ko) * 2006-08-03 2011-08-29 아사히 가세이 일렉트로닉스 가부시끼가이샤 감광성 수지 조성물 및 적층체

Also Published As

Publication number Publication date
TW200921275A (en) 2009-05-16
KR20100027240A (ko) 2010-03-10
CN101779165B (zh) 2014-09-24
CN101779165A (zh) 2010-07-14
JPWO2009022724A1 (ja) 2010-11-18
JP5221543B2 (ja) 2013-06-26
WO2009022724A1 (ja) 2009-02-19
KR101167537B1 (ko) 2012-07-20

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