TWI339448B - Package for carrying optical semiconductor element and optical semiconductor device using thereof - Google Patents
Package for carrying optical semiconductor element and optical semiconductor device using thereof Download PDFInfo
- Publication number
- TWI339448B TWI339448B TW096119083A TW96119083A TWI339448B TW I339448 B TWI339448 B TW I339448B TW 096119083 A TW096119083 A TW 096119083A TW 96119083 A TW96119083 A TW 96119083A TW I339448 B TWI339448 B TW I339448B
- Authority
- TW
- Taiwan
- Prior art keywords
- optical semiconductor
- resin
- semiconductor element
- package
- light
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 90
- 230000003287 optical effect Effects 0.000 title claims abstract description 74
- 229920005989 resin Polymers 0.000 claims abstract description 71
- 239000011347 resin Substances 0.000 claims abstract description 71
- 239000011342 resin composition Substances 0.000 claims abstract description 35
- 229920001187 thermosetting polymer Polymers 0.000 claims abstract description 19
- 239000000203 mixture Substances 0.000 claims description 14
- 239000002245 particle Substances 0.000 claims description 14
- 238000007789 sealing Methods 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 10
- 239000003795 chemical substances by application Substances 0.000 claims description 9
- 239000004848 polyfunctional curative Substances 0.000 claims description 9
- 230000003647 oxidation Effects 0.000 claims description 6
- 238000007254 oxidation reaction Methods 0.000 claims description 6
- -1 oxyhydroxide Chemical compound 0.000 claims description 6
- 239000000945 filler Substances 0.000 claims description 5
- 239000011256 inorganic filler Substances 0.000 claims description 5
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 241000219112 Cucumis Species 0.000 claims 1
- 235000015510 Cucumis melo subsp melo Nutrition 0.000 claims 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 1
- FJJCIZWZNKZHII-UHFFFAOYSA-N [4,6-bis(cyanoamino)-1,3,5-triazin-2-yl]cyanamide Chemical compound N#CNC1=NC(NC#N)=NC(NC#N)=N1 FJJCIZWZNKZHII-UHFFFAOYSA-N 0.000 claims 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 239000011593 sulfur Substances 0.000 claims 1
- 239000000725 suspension Substances 0.000 claims 1
- 238000000465 moulding Methods 0.000 abstract description 15
- 239000003822 epoxy resin Substances 0.000 description 15
- 229920000647 polyepoxide Polymers 0.000 description 15
- 229920001568 phenolic resin Polymers 0.000 description 11
- 239000005011 phenolic resin Substances 0.000 description 11
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 10
- 238000001723 curing Methods 0.000 description 9
- 239000007822 coupling agent Substances 0.000 description 8
- 239000012463 white pigment Substances 0.000 description 6
- 150000008064 anhydrides Chemical class 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000000049 pigment Substances 0.000 description 5
- 239000002253 acid Substances 0.000 description 4
- 238000004040 coloring Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 3
- 206010040844 Skin exfoliation Diseases 0.000 description 3
- 150000008065 acid anhydrides Chemical class 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 2
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 125000002091 cationic group Chemical group 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- SSUJUUNLZQVZMO-UHFFFAOYSA-N 1,2,3,4,8,9,10,10a-octahydropyrimido[1,2-a]azepine Chemical compound C1CCC=CN2CCCNC21 SSUJUUNLZQVZMO-UHFFFAOYSA-N 0.000 description 1
- MFAWEYJGIGIYFH-UHFFFAOYSA-N 2-[4-(trimethoxymethyl)dodecoxymethyl]oxirane Chemical compound C(C1CO1)OCCCC(C(OC)(OC)OC)CCCCCCCC MFAWEYJGIGIYFH-UHFFFAOYSA-N 0.000 description 1
- FDIPWBUDOCPIMH-UHFFFAOYSA-N 2-decylphenol Chemical compound CCCCCCCCCCC1=CC=CC=C1O FDIPWBUDOCPIMH-UHFFFAOYSA-N 0.000 description 1
- AAMHBRRZYSORSH-UHFFFAOYSA-N 2-octyloxirane Chemical class CCCCCCCCC1CO1 AAMHBRRZYSORSH-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- 244000007835 Cyamopsis tetragonoloba Species 0.000 description 1
- 239000012988 Dithioester Substances 0.000 description 1
- 241000196324 Embryophyta Species 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- KJFMBFZCATUALV-UHFFFAOYSA-N Phenolphthalein Natural products C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C(=O)O1 KJFMBFZCATUALV-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- SBJCMTYLUFDUGC-UHFFFAOYSA-N SC12C(=O)OC(C1CCCC2)=O Chemical compound SC12C(=O)OC(C1CCCC2)=O SBJCMTYLUFDUGC-UHFFFAOYSA-N 0.000 description 1
- 238000003723 Smelting Methods 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 238000004512 die casting Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 125000004119 disulfanediyl group Chemical group *SS* 0.000 description 1
- 150000004141 diterpene derivatives Chemical class 0.000 description 1
- 238000007688 edging Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- FPVGTPBMTFTMRT-NSKUCRDLSA-L fast yellow Chemical compound [Na+].[Na+].C1=C(S([O-])(=O)=O)C(N)=CC=C1\N=N\C1=CC=C(S([O-])(=O)=O)C=C1 FPVGTPBMTFTMRT-NSKUCRDLSA-L 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 235000003642 hunger Nutrition 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- YOBAEOGBNPPUQV-UHFFFAOYSA-N iron;trihydrate Chemical compound O.O.O.[Fe].[Fe] YOBAEOGBNPPUQV-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- ACKBOPJQVQYKJO-UHFFFAOYSA-H magnesium strontium barium(2+) tricarbonate Chemical compound C([O-])([O-])=O.[Ba+2].C([O-])([O-])=O.[Sr+2].C([O-])([O-])=O.[Mg+2] ACKBOPJQVQYKJO-UHFFFAOYSA-H 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 108091008695 photoreceptors Proteins 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 239000001117 sulphuric acid Substances 0.000 description 1
- 235000011149 sulphuric acid Nutrition 0.000 description 1
- XSOKHXFFCGXDJZ-UHFFFAOYSA-N telluride(2-) Chemical compound [Te-2] XSOKHXFFCGXDJZ-UHFFFAOYSA-N 0.000 description 1
- 239000002470 thermal conductor Substances 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- 229960000281 trometamol Drugs 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/58—Optical field-shaping elements
- H01L33/60—Reflective elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/483—Containers
- H01L33/486—Containers adapted for surface mounting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/52—Encapsulations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/52—Encapsulations
- H01L33/56—Materials, e.g. epoxy or silicone resin
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16245—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
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Description
24494pif 九、發明說明: 【發明所屬之技術領域】 本發明關於―接 裝的光半導㈣光半導體元件搭制封裝及使用此封 合有光半^w 1光半導體元件搭載⑽裝於製造組 置方面較為有用體等波長轉換機構的光半導體裝 【先前技術】 為了使光半導體裝置實現小型及薄型化,取 的矣ΐ光半導體裝置’而較多使用具有如圖3所示構造 、面安裝(SMD(Surfacemounteddevice))型光半導體 ^置(發光裝置)。該表面安裝型光半導體農置通常是藉由 士下方法而製造的:藉由使樹脂成形體403與正負導線電 極404 -體化而構成的光半導體元件搭載用封裝的凹部底 面,經由黏晶(die bond)材400而搭載著光半導體元件(發 光一極體(LED,light-emitting diode)等)400,由接線 401電性連接該光半導體元件400與導線電極4〇4後,向 凹T填充包含螢光體405的透明密封樹脂4〇2,並密封光 半導體元件400,其中該樹脂成形體403具有作為光半導 體元件搭載用區域的凹部。此外,上述光半導體元件搭載 用封裝通常是藉由如下方法而製造的:利用成形模具夾持 導線電極,向關閉的模具内注入熔融的熱可塑性樹脂組合 物後,回到室溫下使該樹脂組合物硬化,從而藉由使上述 導線電極與樹脂組合物一體化而構成。於日本專利早期公 開第2002 — 280616號公報、曰本專利早期公開第2〇〇4 — 24494pif 200^342782 c/揭不有一種使用光半導體元件搭載用44壯二i ^型led裝置,該光半導體元件搭載 4凹部的樹脂成形體與正負導線電極—體化==由使 近年來,光半導體裝置之應用 數情況下其使用條件也變得嚴:,:需二有多 可靠性。然而,製作上述樹脂成形體;==高的 性樹脂組合物的線膨脹率(20〜 /π、 ”、、可塑 ,電極而使用的銅的線膨脹率。 虽藉由使樹脂組合物與導線電 而 大應力,結果,導致樹脂成構成時會產生較 低,從而導致樹脂組合物電極間的接著性降 右的間隙。此外,若二線電極之間產生幾十微米左 ϋ θ] σ」罪性。 … 此::出板入樹脂組合物而製作樹脂球形體 今辦开彡^偏蔣日、會由於樹脂的射出壓力而使模具 移^時1模具的合模邊產生間隙, 導致方、.二广格載用封裝側面產生樹脂毛邊 pamnghne ’刀I線)。該樹 低,則由於導線電極外“導::;【線電極間的接著性較 半導體裝置的可靠性。間產生間隙’從而降低了光 時應用n 產生稍許變形或偏移,此日; 導致於光半導體元件搭#田+ V . Γ p,八幻戰用封裝側面產生樹脂毛邊 (partinghne’刀軎'J線)。該植+肸 驟中成為障礙,由於使光半f =邊於成形(f_mg)步 L ^ L T卜〇p導線進行高精度加工。此 外,此時於^^方向上對導竦咖; 电極與樹脂成形體的界面施 1339448 24494pif 加應力,自於橫方向延伸的毛邊前端部分於上述界面產生 間隙。進而,亦有樹脂毛邊剝離的危險,該樹脂毛邊的剝 離成為封裝龜裂的重要原因,水分或雜質會自該龜裂侵 入,導致光半導體裝置的可靠性顯著降低。此外,剝離毛 邊很嚴重時,產生空壁導致外觀不良。 此外,近年來,開發出於紫外區域等中具有發光峰值 波長的光半導體元件,對該元件而言亦期待能夠應用於 SMD型LED,由於紫外區域附近的光的能量較高,故而 存在如下問題:容易導致樹脂成形體的凹部内周面(反射 板’ reflector)劣化’進而,隨著該内周面劣化亦會導致可 見光的反射率降低。 【發明内容】 本發明是雲於上述問題開發而研製成的,其目的在於 提供一種樹脂成形體與導線電極的接著性良好且可靠性優 良的光半導體元件搭載用封裝及使用此封裴的光半導體裝 置。 此外,本發明的其他目的在於提供一種硬化後可見光 至近紫外光的反射率較鬲、具有耐光及耐熱劣化性優良的 凹部(反射板)的光半導體元件搭載用封裝及使用此封裝 的光半導體裝置。 即,本發明的特徵在於下述(1)〜(12)事項。 (1)-種光半導體元件搭仙封裝,具有作為光半導 體元件搭載區域的凹部,其特徵在於:藉由使樹脂成形體 與至少-對正及負的導線電極—體化而構成,其中該樹脂 8 2449^P^ 成—熱 四部側面’上犯至y 述樹脂成形
形成上述凹部底面的,广 Q 線€極=合面無述之光半導體元件搭載用封裝, (2 ^ $由使上述樹脂成形體與上述至少一 其中藉由傳送成形而雜=而耩成。 對立及⑺#之光半導體元件搭載用 # 二光反射用樹腊組合物"含有填充料。 対我⑷如上述⑴A(2)所述之光半導體元件搭載用 Μ,对上述熱固性光反射用樹脂組合物之成分中包括 3)環氧樹脂、(Β)硬化劑、(Ci硬化促進劑、⑼無 “充劍、(E)白色顏料、(F) 且該樹脂組合物 ^軌硬化後於350 _』〇〇_的波長中光反射率大於等 於80%且在常溫(0〜35°C )下能夠加壓成形。 m (5)如上述(4)所述之光半導體元件搭載用封裝, 其中上述(D)無機填充劑是選自二氧化矽、氧化鋁、氣 !組成的族群中的直少一種。 (6)如上逑(4)所述之光半導體 丹 T 卜 π 广 η、 . u , ^錢、氧化錄、氫氧化|g、氫氧化鎂、硫酸鋇、碳酸鎂 呶酸鋇,· 、 如上逑(4)所述之光半導體元件搭載用封裝, 上述(Ε)白色顏料為無機中空粒子。 其 ,色顏料的不均极徑在0,1 (8)如上述(4)所述之光半導體 50 μπι範圍内 元件搭載用封裝 (4) — U半導體元件搭載用封裝, 二)白色顏料的不均极徑在0.1〜50 _ 9 1339448 24494pif 其中上述(D)然機填充劑與上述(e )白色顏料的合計量 相對於上述熱固性光反射用樹脂組合物全體為體積% 〜85體積%。 且、 (9) 如上述(1 )或(2)所述之光半導體元件搭載用 封裝,其中上述熱固性光反射用樹脂組合物的螺旋流動 (spiia] flow )大於寺於5〇 cm且小於等於。 (10) 如上述(1)或(2)所述之光半導體元件搭載
用封裝,其巾上述熱g]性光反㈣触組合物的圓板流動 大於等於5 0 mm。 (1.1)如上述(1)或(2)所述之光半導體元件搭載 用封衣纟中上述熱固性光反射用樹脂組合物的線膨服係 數為10〜30卩卩111/。〇。 (12) —種光半導體裝置,其特徵在於含有:上述(ι) 或(2)所述之光半導體元件搭載用封裝、搭載於上述封裝 中上述凹部底面的光半導體元件以及覆蓋上述凹部内的上 述光半導體元件的透明密封樹脂層。
»根據本Θ ’可提供—種樹脂成形體與導線電極間的 接著f生良好可#性優良的光半導體元件搭載㈣裝及使用 此封裝的光半導體裝置,進而亦可提供—種硬化後自可見 光至近紫外光的反射率較高、具有耐光及耐熱劣化性優良 的光半導體元件搭裁用封裝及使用此封裳的光半導 1339448 24494pif 倍的放大率觀察樹脂成形體與導線電 該界面上未觀察關_狀態。如目接的界叫,於 此外’本^案根據㈣請人切申請的日本專利申 請第.2006 - 154652喊(申請日2〇〇6年6月2且 其優先權,^中轉照㈣式制其中 、 【實施方式】 元件=::==封Ϊ具有作為光半導體 至"正及_電極 ==== 凹部底面的一部分,且上=電極呈對向配置以形成上述 接合面無間隙。再者,形體與上述導線電極的 負導線電極的—端互相;里=是,正導線電極的-端與 露出而形成凹部;^ 以使各個正面(主面) 離。此外,Ιϋ _ ]错由成形樹脂而使導線電極之間分 —端與樹脂成形體極的另—端與負導線電極的另 體側面突出 /體化而構成後,立即設為自樹脂成形 3所示,向封裝部導線部較理想的是’例如圖 (彎管)切 成七體接合面的内側彎*,成為J —Bend 的構造並不僅子部。當然’本發明中連接端子部 型i其他^亦可_翼 製造方m發明的光半導體元件搭載用封褒各結構、 吏用該封裝的光半導體裝置進行詳述。 24494pif (導線電極) 如,麵鋼等高熱傳導體而構成,例 屬板不Α為 _的銅合金屬所構成的長金 防止導:1 壓而是進行穿孔加工而形成。此外,為 防止導e電極⑽等,可於導線電紅面•銀、紹、金、 纪或該等合金等金屬。此外,為提昇發光元件的光率, 是使導線電極正面平滑。此外,較好的是盡可能擴 大¥線電極的面積,@此,可提高放熱性,有 ;的:光元件的溫度上升’進而,可對發光元; 多的電力,可提昇光輸出。 k 1
此外,於本發明中,至少有一對導線電 以形成封裝凹部底面的一部分,較好的 J J 極端部背面與側面相交的角帶有曲線(參照圖 者,導線電極的背面是指於封I凹部底面再 的反面)。如此,若沿成形樹脂注入的方向而於暮(主面山) 部設置圓形’則成形樹脂的流動會平滑,〜t泉電極端 電極間無間隙地填充成形樹脂二可 間分離’此外,可強化導線電極與成形樹月旨體二t極 進而,由於樹脂成形體與導線電 虹的饴者性。 π避免應力集中於接合線上,=極可的^合線帶有曲線,故 另-方面,對向的導線電杨制封裝龜裂的產生。 較好的是突起為銳角(參照圖4的R主面與侧面交又的角 止成形樹脂自導線電極間向導線電極2)。因此,可有效阻 防土發光元件的黏晶(die b〇ndJ^主面上流出,從而可 g不良或打線接合(wife 1339448 24494pif* bonding)不良。此外,可提昇導哼 著性,抑制導線電極與成形樹脂在界面j形樹月旨間的密 (樹脂成形體) 上剝離。 月身組合 月旨組 本發明的封裝中的樹脂成形體較好 反射用樹脂组合物成形。此外,熱固/是,由熱固性光 物中較好的是含有填充料。進而’、,、、 ,反射用樹脂 合物的成分中,較好的是包含光反射用樹 劑、(C)硬化促進劑、(D) 二虱樹脂、(B) ⑺,偶合劑。 味充劑、(E)白色 關於上述⑷環氧樹脂, 氧樹脂成形材料中-般使用的材料,=零件密封用環 (ph⑽1 _〇㈣型環氧樹脂、鄰甲^ 有以紛酸 的將苯酚類與醛類的酚醛樹沪户& 丄衣虱树脂為代表 西分A、雙齡F、雙紛S、化後所得的樹脂;由雙 _環氧樹脂;二胺二笨笨齡等的二縮水甘油 矣tr萨“.M u」. 、異三聚氰酸等的聚胺與 氧桝r . Γ:⑽y Πη)反應後而獲得的縮水甘油胺型環 乳乙酸等過酸將馳鍵氧化而獲得的線狀脂 =衣减月曰’以及脂環族環氧樹脂等,可適當以任何方 :併^上述夕個祕月曰。此外,上述多個樹脂中較好的是比 較不容易著色的樹脂’例如可列舉雙紛Α型環氧樹脂、雙 盼F型環氧樹脂、雙紛s型環氧樹脂、三縮水甘油基異三 聚氰酸酯。 卜作為上述(B)硬化劑,若可與環氧樹脂發生反應則 热特別限制,但較好的是比較不容易著色的硬化劑。例如, 24494pif 可列舉酸酐系硬化劑、苯盼系硬化劑等。作為酸酐系硬化 劑,例如可列舉苯二甲酸酐、順丁烯二酸酐、偏笨三酸酐 (trimellitic anhydride)、均笨四甲酸酐、六氫苯二甲酸軒 四氫笨二曱酸酐、曱基耐地酸酐、耐地酸酐、戊二酸針、 曱基六氫苯二曱酸酐、甲基四氫苯二曱酸酐等。上述多個 酸酐系硬化劑中,較好的是笨二甲酸酐、六氫苯二甲酸酐、 四氫笨一甲酸酐、甲基六氫苯二曱酸酐。酸酐系硬化劑的 分子量較好的是140〜200左右,此外,較好的是無色或淡 黃色酸Sf。上述多個硬化劑可單賊用,亦可㈣兩種或 兩種以上。環氧樹脂與硬化劑的添加比例較好的是,相對 於環氧樹脂中1當量的環氧基而言,可與硬化劑中環氧基 反應的活性基(酸酐基或羥基)為〇.5〜15當量,進而^ 0/^1.2當量。當活性基的當量不足〇5時,有時會延遲 環氧樹肋合物的魏速度,並且會降低顺得的硬化灿 的玻璃轉移溫度,另-方面,t超過15當量時 月: 降低耐濕性。 1τ" 作為上述(C)硬化促進劑(硬化觸媒),並無特 定,例如可列舉1,8_二氮雜_雙環(5,4,0)十一烯々、三^ 二胺、三-2,4,6-二曱胺基曱基笨酚等三級胺類,2_乙^ 曱基咪。坐、2H心坐等味。錢’三笨基膦、 笨基硼酸鹽、四正丁其賊 ^ 0ί|ί 土&四 丨了杨·。,Q·-乙基叫基二 化^物,四級銨鹽、有機金屬鹽類及上述多個物質的衍生 物等。上述多個硬化促進劑可單獨使用或者也可併用。丁 述多個硬化促進劑(硬化觸媒)t,較好的是三級胺類、 1339448 24494pif 咪唑類、磷化合物。上述硬化促進劑的含量較奸的 ,氧樹脂1GG重量份而言,為G.01〜8.G重量份,更好的 是0」〜3.0重量份。若硬化促進劑(硬化觸媒)的含量不 足〇.〇1重1份,則有時無法獲得充分的促進硬化的致 此=,右超過8.0重量份,則有時會在所獲得的硬化 觀察到變色。 〃作為上述(D)無機填充材,y使用選自二 氧化紹、氧化_、氧轉、氫氧化㉟、氫氧 破酸鎮、瑞酸領組成的鱗中的 =、 :反:、成形性、難燃性方面考慮,較好的以化 充材的平均粒此外’無機填 〕十勺拉&亚無特別限定 具 範= 的: 平均粒徑在0.】〜50 Mm 色顏料的粒徑較好的是 時粒子易於凝集而使得分;差右粒=不足〇 ·】μ m則有 分獲得反射特性。 又差,右超過50 μπι則可充 上述(£ )白色顏料與 (填充料的填充量)’相野於真充材的合計填充量 體而言,較好的是7〇體積0;',,'〇性光反射用樹脂組合物全 個填充料的填充量不足體積°/。範圍内。若上述; 分,若超過85體積%,則成=則有光反射特性不充 艾差而存在難以製作基板 1339448 24494pif 的傾向。
作,上述⑺偶合劑,可列舉魏系偶合劑或欽酸 夕曰。禹〜j等’作為石夕坑偶合劑,一般以任意附著量而較 二使用環氧矽烷系、胺基矽烷系、陽離子型(cationic)矽 =乙稀基魏系、丙稀财H縣奶完系及上述 夕固^兀系的複合系等。偶合劑的種類或處理條件並無特 別限疋’但偶合劑的添加量較好的是,於油性光反射用 Μ脂組合物中小於等於5重量%。 /、他-上述熱固性光反射用樹脂組合物中,根據需要 可添加抗氧化劑、脫模劑、離子補充劑等。 含有以上成分的熱固性光反射用樹脂組合物較好的 是,於熱硬化前室溫(0〜饥)下可進行加壓成形,且較 好的疋熱硬化後於350 nm〜800 nm的波長中光反射率大 於等於80%。上述加壓成形例如可於室溫下、〇 5〜2
1〜5秒左右的條件下進行。此外’若上述光反射率不足 80/。,則存在热法充分有助於提昇光半導體裝置亮度的傾 向。更好的是,光反射率大於等於9〇〇/0。 此外,^述熱固性光反射用樹脂組合物的螺旋流動較 好的是大於等於50 cm且小於等於300 cm,更好的是大於 等於50 cm且小於等於200 cm,尤其好的是大於等於l〇cm 且小於等於15 0 c m。若螺旋流動不足5 〇 c m則材料填充性 會惡化,導致製品易於出現未填充的部分。另—方面,若 螺旋流動超過300 cm,則有易於出現空隙、降低彎曲強1 的傾向。此外,圓板流動較好的是大於等於5〇m=,更二 16 24494pif 的是大於等於8〇 _。若圓板流 間易於出現未填充或空隙。再去5〇咖,則導線架 狀槽的模具(模具溫度冒 ?、旋流動是對具有㈣ 力6.9 MPa),直至該樹脂組合物^^旨組合物(注入歷 長度的測定值,圓板流動是於 :^填充的旋渦的 180〇C,模具重量8 kg)之間配置、’板核具(模具溫度 u* a ^ ^ 置5 g樹脂組合物,測宏由 杈/、自重而使樹脂組合物潤濕並 ' 進而,上述熱固性光反射徑的值。 較好的…一此時,:;; = = = 此外,樹脂成形體的形狀如上所述,若且 導體元件搭載區域的凹部,則無特別限定,凹部側辟= 射板)較理想的是具有㈣將料導體元件發出的^ = 方反射的形狀。®丨衫本發_光半導體元件 裝110的-實施形態’該光半導體元件搭載用封裝, 備:樹脂成形體103、導線電極105、作為光半導 ^ 載區域的凹部200以及Ni/Ag電鍵1〇4。 干拾 (封裝的製造方法) 本發明的光半導體元件搭載用封裝的製造方法並 別限定,但較好的是藉由傳送成形而藉由使埶固性光 用樹脂組合物與導線電極一體化而構成。藉由傳送成米射 成形,從而難以於導線電極與樹脂成形體之間產生間卩< 而 更具體而言’可藉由如下方法而製造:例如,將導極 配置於預定形狀的模具中’自模具的樹脂注入口注入妖: 1339448 24494pif 性光反射用樹脂組合物,較好的θ 具溫度170〜]9〇。〇、成形厣力將該樹脂組合物在模 件下進行硬化,取出模具後,在Mh、60〜120秒的條 (aftercure)溫度下、1〜3小時l2〇°C〜180它的後處理 (光半導體裝置) 、条件進行熱硬化。 本毛月的光半導體裝置的特徵 的光半導體元件搭載用封裝、极都^至少具備:本發明 封裝凹部底面的光半導體元件以及光半導體元件搭載用 半導體元件的透明密封樹脂層。%成於凹部内而覆蓋光 上述光半導體元件(發光元 部内底面露出的負導線電極或正句如配置於在封裝凹 的n極與負導線電極是藉由打線接,半導體元件 成於發古;从,A 咬得。此外,於η極形 能中、ρ電極形成於發光元件下部的元件形 :中^極利祕漿料等黏晶材而黏接於正導線電極 %極與負導線電極則藉由打線接合而連接。如此, 光7^件配置於導線電極上,則可提昇發光元件的放 ,因此較好。此處,發光元件是例如可發出誃色光的 化合物半導體元件,該Μ例如於藍寶^板上 ⑽有匕括11型層、活性層及Ρ型層的氮化物半導體声, ^除^性層及Ρ型層的-部—心型層上形縣 %極’於ρ型層上形成有ρ電極。 ^述透明密封樹脂層可保護發光元件遠離 、。者,在由導線將發光元件電極與導線電極之間連^ 18 1339448 24494pif 的構造中,亦具有保護導線的功能。此外’透明密封樹脂 層中’為使A光元件發出的光能夠南效地射向外部,因此 對於光透過性的要求較高。作為透明密封樹脂層中的透明 密封樹脂的具體材料,可應用環氧樹脂、矽酮樹脂、丙烯 酸樹脂等,進而,為能夠對發光元件發出的光具有特定淚 光片效果等,亦可添加著色染料或著色顏料。 、 圖2表示本發明的光半導體裝置的一實施形態,其 中,於本發明的光半導體元件搭載用封裝1]()之作^光^ 導體元件搭栽區域的凹部200之底部的預定位置上搭載著 光半‘體元件100,§玄光半導體元件1 〇〇與導線電極、〇5 之間是利用接線102或焊錫凸塊107等眾所周知的方法而 電性連接,且該光半導體元件】00由含有眾所周知螢光體 106的透明密封樹脂ιοί而覆蓋。 實施例 以下’利用實施例說明本發明。本發明並不受下述多 個實施例的限制。 實施例1 (導線架) 採用一般的光I虫刻製程(photo-etching process ),於厚 度為0.15 mm的銅框架上形成包含有導線電極的電路後, 對該電路進行電解Ag電鑛,作為導線架。 19 1339448 24494pif [表l] (熱固性光反射用樹脂組合物的組成) 環氧樹脂:三縮水甘油基異三聚氰酸酯 100重量份(環氧的當量為丨00) 硬化劑:六氩苯二甲酸酐 140重量份 硬化促進劑:四正丁基膦二乙基膦酸基二硫代酯 2.4重量份 無機填充劑:炫融二氣化*^夕(平均粒徑20 μιτι) 600重量份 氧化鋁(平均粒徑1 μπι) 890重量份
白色顏料:硼矽酸鈉玻璃氣球形物(balloon)(平均粒徑27 μιη) 185重量份 偶合劑:γ-縮水甘油氧基丙基三甲氧基矽烷 ^ 19重量份 k氧化"41丨.9,10-一氫-9-氣雜-10-填雜菲(p]10Sphaphenanthrene) -]〇·氣化物 1重量份 、將上述組成材料以混煉溫度30〜40°C、混煉時間1 〇 分知的條件進行滾筒混煉,製作熱固性光反射用樹脂組合 物所獲得的樹脂組合物的螺旋流動為140 cm (硬化時間 ) ’圓板流動為85 mm (硬化時間9〇秒)。此外,所 獲仔的樹脂組合物硬化物的光反射率大於等於9〇%。再 者,。邊光反射率是指,將上述樹脂組合物以成形模具溫度 18〇c、成形壓力6 9 MPa、硬化時間9〇秒的條件傳送成 形後’於15(TC下進行2小時的熱處理,藉此製成厚度為 功的。式片,對此使用75〇型積分球型分光光度計 (曰本分光股份有限公司製造),在波長35〇〜85〇 nm的 條件下所測定的值。 (光半導體元件搭載用封裝的成形) 20 丄幷仔ο 24494pif 且將得的導線架安裝於模具中的相應的位置上, 中,在模:=Γί。光反射用樹脂組合物注入模具 傳送成形;=二,的條件下進行 露出正負導蜱雷炻或具有凹部且於該凹部底面 路Ά線電_光半㈣搭_ (光半導體裝置的製造) 利用黏晶材將LED S件固定於 =裝凹部底面的導線電極上,二下SC 日τγ,藉此,將LED元件點菩於# l 哪元件與端子電性連^而子上。此後’利用金線將 繼而4皆由4注(p0tting)而將具有以下組成的透明 密封樹脂液入上述凹部以覆蓋LED元件,於15(TC下加熱 2小時使樹脂硬化’從而製成光半導體裝置(SMD型Lm )。 [表2] (透明密封樹脂的組成) '氮化雙盼A型%氡樹脂(商品名DENac〇LEX252,NAGASECHEMTEX公 ㈣⑻… 90重量份 脂環式環氧樹脂(商品名CEL—2021P,DAICEL化學公司製造) 10重量份 •4-甲基六氫鄰笨二曱酸酐(商品名ΗΝ·55〇〇Ε,曰立化成工業股份有限公司 90重量份 0.4重量份 製造) 0.9重量份 •2,6二第三丁基-4-甲基笨酚ΒΗΤ ‘2-乙基-4-曱基咪唑 21 1339448 24494pif 實施例2 [表3] (熱固性光反射用樹脂組合物的組成) 環氧接m ·‘三縮水甘祕異三聚丨⑻重量 硬化劑:六氫笨二甲μ 125重量份 £為100) 硬化促進劑:四正丁基膦·。,。_二乙_酸基二硫代酿 2.4重量份 無機填充劑:熔融二氡化矽(平均粒徑2〇μηι) ^ 720重量份
氧化紹(平均粒徑】μπ〇 640重量份 白色顏料:二氧化矽氣球形物(平均粒徑3 μη〇 435重量份 偶合劑:γ-縮水甘油氧基丙基三甲氣基矽烷 ^ 9重量份 k孔化劑:9,1〇-二氫斗氡雜·1〇磷雜菲_l〇-氧化物 1重量份 立將上述組成的材料以混煉溫度30〜40。〇混煉時間10 么在里的條件進行滾筒混煉,製作熱固性光反射用樹脂組合 >物所獲知的樹脂組合㈣螺旋流動為⑽⑽(硬化時間 9〇^ ) ’圓板流動為55 mm (硬化時間90秒)。此外,所 •獲㈣職組合物硬化物的光反射率大於等於 90% (350 〜850 nm)。 、使用上述獲得的熱固性光反射用樹脂組合物, 例I同樣的方式製作光半導體用及 導體裝置。 由以上方式製成的各實施例的光半導體裝置中,導線 與封政的界面點接力良好,確認該界面上沒有間隙。此外, 22 1339448 24494pif 於85°C、85%RH中放置24小時後,確認樹脂成形體與透 明密封樹脂或導線電極的界面有無剝離,確認沒有剝離, 且幾乎亦無水分混入。因此,可以說,各實施例的光半導 體裝置是耐流動性或耐遷移性等可靠性優良的光半導體裝 置。 【圖式簡單說明】 圖1是表示本發明的光半導體元件搭載用封裝的一實 施形態的立體圖與剖面圖。 圖2是表示本發明的光半導體裝置的一實施形態的剖 面圖。 圖3是表示一般的SMD型LED (光半導體裝置)的 剖面圖。 圖4是表示本發明的光半導體元件搭載用封裝的導線 電極端部的較佳構造的剖面圖。 【主要元件符號說明】 100 、 400 : 光半導體元件 101 、 402 : 透明密封樹脂 102 、 401 : 接線 103 、 403 : 樹脂成形體 104 : Ni/Ag 電鍍 105 、 104 : 導線電極 106 ' 405 : 螢光體 107 :焊錫凸塊 110 :光半導體元件搭載用封裝 23 1339448 24494pif 200 :凹部 406 :黏晶材
Claims (1)
1339448 24494ρίΠ 爲第%119083號中文專利範圍無劃線修正本 修正日期:99年12月15曰 十、申請專利範圍: 1.一種光半導體元件搭载用封努’ 元件搭載(1域的凹部,其龍在於^、有料光半導體 藉由使樹脂成形體與至少一谢 化而構成, 負的導線電極一體 其中上述樹脂成形體由熱固性 成且至少形成上述凹部側面, 射騎脂組合物構 > 上述至少-對正及負的導線電極 述凹部底面的一部分, 了门配置以形成上 上述樹脂成频與上料_ 上述熱固性光反射用樹脂組合:二:,隙, 氧樹脂、⑻硬化劑、(c)硬化促=包含⑷環 劑、⑻無機中空粒子、⑺偶 1、⑻無機填充 熱硬化後於350 nm〜_ nm的ϋ 且合物於 S〇%且可在常溫(〇〜35。〇下加麼成形先反射率大於等於 封裝2 f所述之光半導體元件搭載用 至少一對正 ^料猎由使上述_旨成形體與上述 訂及負的導線電極-體化而構成。 件二第2項所述之光半導懸元 填充料。 ^上述熱固性光反射用樹腊組合物含有 件搭載用封裝專1:或第2項所述之光半導體元 石夕、氧化銘、氧化ϋ述⑼無機填充劍是選自二氧化 、氧化錄、氫氧化鋁、氫氧化鎮、硫 25 24494ρίΩ 修正日期:99年12月丨5日 禺第96119083號中文專利範圍無劃線修疋本 酸鋇5、=礙酸鋇組成的族群中至少-種。 申專利乾圍第]β + # 件搭制封裝,盆中上述2項所述之光半導體元 在0.1〜5〇帅範圍内。(E)無機中空粒子的平均粒徑 件搭載用第1項或第2項所述之光半導體元 機中空粒子的合料無機填細與上述⑻無 組合物為% _%〜85體積;^上述_性歧射用樹脂 件搭載專,圍第1項或第2項所述之光半導體元 旋^動大^,、中上述熱固性光反射㈣脂組合物的螺 旋抓動大於等於5G咖則、於等於3〇〇cm。 件搭範圍第1項或第2項所述之光半導體元 板上賴·光反㈣聽組合物的圓 板/瓜動大於荨於50 mm。 ▲ 9.如申請專利制第1項或第2項所述之光半導體元 η载Γ封裝,其中上述熱固性光反射用樹脂組合物的線 恥脹係數為1〇〜3〇 ppm/t。 、 10.一種光半導體裝置,其特徵在於包括如申請 圍第、1項麵2項所述之光半導體元件搭制封裝、搭載 於上述封裴中的上述凹部底面的光半導體元件以及覆蓋上 述凹σ卩内的上述光半導體元件的透明密封樹脂層。 26
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