TWI332672B - - Google Patents

Download PDF

Info

Publication number
TWI332672B
TWI332672B TW094118383A TW94118383A TWI332672B TW I332672 B TWI332672 B TW I332672B TW 094118383 A TW094118383 A TW 094118383A TW 94118383 A TW94118383 A TW 94118383A TW I332672 B TWI332672 B TW I332672B
Authority
TW
Taiwan
Prior art keywords
lamp
unit
excimer
excimer light
plate
Prior art date
Application number
TW094118383A
Other languages
English (en)
Chinese (zh)
Other versions
TW200609990A (en
Inventor
Satoshi Murakami
Hideki Fujitugu
Kenichi Hirose
Original Assignee
Ushio Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Electric Inc filed Critical Ushio Electric Inc
Publication of TW200609990A publication Critical patent/TW200609990A/zh
Application granted granted Critical
Publication of TWI332672B publication Critical patent/TWI332672B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • H01J65/042Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
    • H01J65/046Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21VFUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V29/00Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
    • F21V29/50Cooling arrangements
    • F21V29/60Cooling arrangements characterised by the use of a forced flow of gas, e.g. air
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J5/00Details relating to vessels or to leading-in conductors common to two or more basic types of discharge tubes or lamps
    • H01J5/50Means forming part of the tube or lamps for the purpose of providing electrical connection to it
    • H01J5/54Means forming part of the tube or lamps for the purpose of providing electrical connection to it supported by a separate part, e.g. base
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00Gas-discharge or vapour-discharge lamps
    • H01J61/02Details
    • H01J61/30Vessels; Containers
    • H01J61/34Double-wall vessels or containers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00Gas-discharge or vapour-discharge lamps
    • H01J61/02Details
    • H01J61/52Cooling arrangements; Heating arrangements; Means for circulating gas or vapour within the discharge space

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Plasma & Fusion (AREA)
  • General Engineering & Computer Science (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Arrangement Of Elements, Cooling, Sealing, Or The Like Of Lighting Devices (AREA)
  • Fastening Of Light Sources Or Lamp Holders (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
TW094118383A 2004-09-13 2005-06-03 Excimer lamp apparatus TW200609990A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004265237 2004-09-13
JP2005142792A JP4380591B2 (ja) 2004-09-13 2005-05-16 エキシマランプ装置

Publications (2)

Publication Number Publication Date
TW200609990A TW200609990A (en) 2006-03-16
TWI332672B true TWI332672B (enExample) 2010-11-01

Family

ID=36377509

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094118383A TW200609990A (en) 2004-09-13 2005-06-03 Excimer lamp apparatus

Country Status (4)

Country Link
JP (1) JP4380591B2 (enExample)
KR (1) KR100849801B1 (enExample)
CN (1) CN1750230B (enExample)
TW (1) TW200609990A (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5146808B2 (ja) * 2007-10-05 2013-02-20 ウシオ電機株式会社 紫外線照射装置
JP5146061B2 (ja) * 2008-04-10 2013-02-20 ウシオ電機株式会社 エキシマランプおよびこれを備えたランプユニット
JP5504896B2 (ja) * 2010-01-07 2014-05-28 ウシオ電機株式会社 ランプユニット
JP6364953B2 (ja) * 2014-05-23 2018-08-01 岩崎電気株式会社 冷却構造体、及び光源ユニット
JP6844292B2 (ja) * 2017-02-09 2021-03-17 ウシオ電機株式会社 光照射器および光照射装置
EP3998116A4 (en) * 2019-08-05 2023-01-11 Ushio Denki Kabushiki Kaisha UV RADIATION DEVICE
CN112582251A (zh) * 2020-12-29 2021-03-30 清华四川能源互联网研究院 射频无极准分子固化灯
JP2025027727A (ja) 2023-08-17 2025-02-28 ウシオ電機株式会社 光処理装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59112935U (ja) * 1983-01-21 1984-07-30 株式会社精密エンタプライズ Uv/o↓3クリ−ニング装置の筐体構造
JPH079294Y2 (ja) * 1990-04-25 1995-03-06 株式会社テック 照明器具
JPH08309304A (ja) * 1995-05-19 1996-11-26 Japan Storage Battery Co Ltd 紫外線洗浄方法及びその装置
JP2001113163A (ja) * 1999-10-20 2001-04-24 Hoya Schott Kk 紫外光照射装置及び方法
JP4035680B2 (ja) * 1999-11-19 2008-01-23 リコープリンティングシステムズ株式会社 定着装置およびそれを用いた印刷装置
JP3743270B2 (ja) * 2000-07-12 2006-02-08 松下電工株式会社 表示用照明器具
JP3972586B2 (ja) * 2001-02-21 2007-09-05 ウシオ電機株式会社 光照射処理装置
JP2003144913A (ja) * 2001-11-13 2003-05-20 Ushio Inc 誘電体バリア放電ランプによる処理装置、および処理方法
JP2003346727A (ja) * 2002-05-27 2003-12-05 Ushio Inc エキシマ光照射装置
JP2004113984A (ja) * 2002-09-27 2004-04-15 Japan Storage Battery Co Ltd 紫外線照射装置
JP2004152842A (ja) * 2002-10-29 2004-05-27 Ushio Inc 紫外光照射による処理方法および紫外光照射装置
JP4196649B2 (ja) * 2002-11-19 2008-12-17 ウシオ電機株式会社 エキシマ光源装置

Also Published As

Publication number Publication date
JP2006108069A (ja) 2006-04-20
CN1750230B (zh) 2010-08-18
JP4380591B2 (ja) 2009-12-09
KR100849801B1 (ko) 2008-07-31
CN1750230A (zh) 2006-03-22
KR20060049916A (ko) 2006-05-19
TW200609990A (en) 2006-03-16

Similar Documents

Publication Publication Date Title
JP5092808B2 (ja) 紫外線照射ユニットおよび紫外線照射処理装置
TWI332672B (enExample)
KR100413884B1 (ko) 기판처리장치 및 방법
US9616469B2 (en) Light projection device
KR20090012348A (ko) Uv 보조 열 처리 장치 및 방법
CN112397415A (zh) 热处理装置及热处理装置的洗净方法
CN220526865U (zh) 紫外线照射装置
CN102414782A (zh) 用于光刻机的准备单元
CN101124663B (zh) 用于处理基板的外周部的方法及设备
US20010031229A1 (en) UV-enhanced, in-line, infrared phosphorous diffusion furnace
JP3769583B1 (ja) 基材処理装置及び方法
JPH09326367A (ja) 基板処理装置
TW201009888A (en) Ultraviolet radiation device
JP6844292B2 (ja) 光照射器および光照射装置
WO2006095575A1 (ja) プラズマ処理装置およびそれを用いた半導体薄膜の製造方法
JP4355182B2 (ja) 乾燥装置
KR101942511B1 (ko) 기판 처리 장치 및 기판 처리 방법
JP3526691B2 (ja) 紫外線照射装置および紫外線処理装置
JP2003047842A (ja) 紫外線照射装置と照射方法
JPH07185489A (ja) 紫外線照射式改質装置
CN101404188B (zh) 紫外线照射装置
JP5504896B2 (ja) ランプユニット
JP6866193B2 (ja) 紫外線照射装置及び紫外線照射方法
KR102136128B1 (ko) 기판 처리 장치 및 노즐 유닛
JP2001217216A (ja) 紫外線照射方法及び装置

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees