TWI306272B - - Google Patents

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Publication number
TWI306272B
TWI306272B TW095134057A TW95134057A TWI306272B TW I306272 B TWI306272 B TW I306272B TW 095134057 A TW095134057 A TW 095134057A TW 95134057 A TW95134057 A TW 95134057A TW I306272 B TWI306272 B TW I306272B
Authority
TW
Taiwan
Prior art keywords
substrate
cleaning
liquid
chamber
decompression chamber
Prior art date
Application number
TW095134057A
Other languages
English (en)
Chinese (zh)
Other versions
TW200746251A (en
Inventor
Futoshi Shimai
Shigeru Kawata
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200746251A publication Critical patent/TW200746251A/zh
Application granted granted Critical
Publication of TWI306272B publication Critical patent/TWI306272B/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/32—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations between different workstations
    • H10P72/3202—Mechanical details, e.g. rollers or belts
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0448—Apparatus for applying a liquid, a resin, an ink or the like

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
TW095134057A 2005-10-31 2006-09-14 Conveying/processing apparatus TW200746251A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005316881A JP4817802B2 (ja) 2005-10-31 2005-10-31 搬送処理装置

Publications (2)

Publication Number Publication Date
TW200746251A TW200746251A (en) 2007-12-16
TWI306272B true TWI306272B (enExample) 2009-02-11

Family

ID=38071554

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095134057A TW200746251A (en) 2005-10-31 2006-09-14 Conveying/processing apparatus

Country Status (4)

Country Link
JP (1) JP4817802B2 (enExample)
KR (1) KR100834702B1 (enExample)
CN (1) CN100466216C (enExample)
TW (1) TW200746251A (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI407270B (zh) * 2009-12-30 2013-09-01 Au Optronics Corp 顯影設備
CN101718963B (zh) * 2010-01-14 2011-10-05 友达光电股份有限公司 显影设备
JP5641989B2 (ja) * 2011-03-17 2014-12-17 三菱電機ビルテクノサービス株式会社 フィルタ洗浄装置
WO2014069577A1 (ja) * 2012-11-05 2014-05-08 日本電気硝子株式会社 板ガラス洗浄装置および板ガラス洗浄方法
US20150118012A1 (en) * 2013-10-31 2015-04-30 Lam Research Corporation Wafer entry port with gas concentration attenuators
CN104538332B (zh) * 2014-12-12 2017-06-27 深圳市华星光电技术有限公司 一种湿制程机台的腔室结构
CN116198779A (zh) * 2023-03-31 2023-06-02 西安奕斯伟材料科技股份有限公司 一种用于包装硅片盒的设备及方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08203858A (ja) * 1995-01-31 1996-08-09 Dainippon Screen Mfg Co Ltd 基板処理装置
JPH11334870A (ja) * 1998-05-26 1999-12-07 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2001135702A (ja) * 1999-11-04 2001-05-18 Canon Inc 基板搬送装置および基板処理装置ならびにデバイス製造方法
JP4316767B2 (ja) * 2000-03-22 2009-08-19 株式会社半導体エネルギー研究所 基板処理装置
JP4056858B2 (ja) * 2001-11-12 2008-03-05 東京エレクトロン株式会社 基板処理装置
KR100904278B1 (ko) * 2001-11-12 2009-06-25 도쿄엘렉트론가부시키가이샤 기판처리장치
JP4044047B2 (ja) * 2002-02-04 2008-02-06 住友精密工業株式会社 搬送式基板処理装置
JP2004299850A (ja) * 2003-03-31 2004-10-28 Dainippon Printing Co Ltd 処理方法及び処理装置
JP4346967B2 (ja) * 2003-06-13 2009-10-21 住友精密工業株式会社 レジスト剥離装置

Also Published As

Publication number Publication date
CN1959951A (zh) 2007-05-09
CN100466216C (zh) 2009-03-04
KR20070046727A (ko) 2007-05-03
TW200746251A (en) 2007-12-16
JP2007117953A (ja) 2007-05-17
JP4817802B2 (ja) 2011-11-16
KR100834702B1 (ko) 2008-06-02

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees