TWI278031B - Apparatus for treating substrates - Google Patents
Apparatus for treating substrates Download PDFInfo
- Publication number
- TWI278031B TWI278031B TW094130710A TW94130710A TWI278031B TW I278031 B TWI278031 B TW I278031B TW 094130710 A TW094130710 A TW 094130710A TW 94130710 A TW94130710 A TW 94130710A TW I278031 B TWI278031 B TW I278031B
- Authority
- TW
- Taiwan
- Prior art keywords
- liquid
- gas
- pipe
- piping
- supply unit
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Nozzles (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004279848A JP4789446B2 (ja) | 2004-09-27 | 2004-09-27 | 基板の処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200631085A TW200631085A (en) | 2006-09-01 |
TWI278031B true TWI278031B (en) | 2007-04-01 |
Family
ID=36234243
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094130710A TWI278031B (en) | 2004-09-27 | 2005-09-07 | Apparatus for treating substrates |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4789446B2 (ja) |
KR (1) | KR100742678B1 (ja) |
CN (1) | CN100553801C (ja) |
TW (1) | TWI278031B (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4954795B2 (ja) * | 2007-05-31 | 2012-06-20 | 芝浦メカトロニクス株式会社 | 基板の保持装置及び基板の処理方法 |
KR101041168B1 (ko) * | 2008-12-29 | 2011-06-14 | 정우리 | 저압분무장치 |
CN102078866A (zh) * | 2009-11-26 | 2011-06-01 | 昆山厚声电子工业有限公司 | 薄膜片状基板的掩膜清洗烘干工艺 |
CN102091700B (zh) * | 2009-12-10 | 2013-03-06 | 中芯国际集成电路制造(上海)有限公司 | 晶圆的喷雾清洗方法 |
JP6423204B2 (ja) * | 2014-09-01 | 2018-11-14 | 株式会社モリタホールディングス | 車両用収納装置及び支持部材 |
JP6865402B2 (ja) * | 2017-07-10 | 2021-04-28 | パナソニックIpマネジメント株式会社 | 洗浄方法及び洗浄装置 |
CN110180822A (zh) * | 2019-06-18 | 2019-08-30 | 徐州玉伟机械设备有限公司 | 一种汽车变速箱齿轮生产用自动清洗装置 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51137628A (en) * | 1975-05-26 | 1976-11-27 | Nippon Steel Corp | Method of correcting spangle pattern on surface of zinc coated steel strip |
JPS63248464A (ja) * | 1987-03-31 | 1988-10-14 | Nisshin Steel Co Ltd | 二流体ノズルヘツダ |
JP3257340B2 (ja) * | 1995-05-24 | 2002-02-18 | 松下電器産業株式会社 | 液体塗布方法、液体塗布装置およびスリットノズル |
JP3626610B2 (ja) * | 1998-11-02 | 2005-03-09 | 東京エレクトロン株式会社 | 処理装置及び処理方法 |
JP4611482B2 (ja) * | 2000-02-22 | 2011-01-12 | 株式会社テック・ヤスダ | バイス用のインデックスワークホルダ |
JP3926593B2 (ja) * | 2001-09-14 | 2007-06-06 | 大日本スクリーン製造株式会社 | 基板処理装置 |
WO2003071594A1 (fr) * | 2002-02-25 | 2003-08-28 | Sumitomo Precision Products Co., Ltd | Dispositif de traitement de substrats de type support |
JP2004237282A (ja) * | 2003-01-16 | 2004-08-26 | Kyoritsu Gokin Co Ltd | 二流体ノズル |
-
2004
- 2004-09-27 JP JP2004279848A patent/JP4789446B2/ja active Active
-
2005
- 2005-09-07 TW TW094130710A patent/TWI278031B/zh active
- 2005-09-27 KR KR1020050090145A patent/KR100742678B1/ko active IP Right Grant
- 2005-09-27 CN CNB2005101057296A patent/CN100553801C/zh active Active
Also Published As
Publication number | Publication date |
---|---|
TW200631085A (en) | 2006-09-01 |
CN1772400A (zh) | 2006-05-17 |
JP4789446B2 (ja) | 2011-10-12 |
JP2006093591A (ja) | 2006-04-06 |
CN100553801C (zh) | 2009-10-28 |
KR100742678B1 (ko) | 2007-07-25 |
KR20060051701A (ko) | 2006-05-19 |
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