TW200631085A - Apparatus for treating substrates - Google Patents

Apparatus for treating substrates

Info

Publication number
TW200631085A
TW200631085A TW094130710A TW94130710A TW200631085A TW 200631085 A TW200631085 A TW 200631085A TW 094130710 A TW094130710 A TW 094130710A TW 94130710 A TW94130710 A TW 94130710A TW 200631085 A TW200631085 A TW 200631085A
Authority
TW
Taiwan
Prior art keywords
liquid
gas
piping
supply ports
supplied
Prior art date
Application number
TW094130710A
Other languages
Chinese (zh)
Other versions
TWI278031B (en
Inventor
Hideki Sueyoshi
Akinori Iso
Original Assignee
Shibaura Mechatronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Mechatronics Corp filed Critical Shibaura Mechatronics Corp
Publication of TW200631085A publication Critical patent/TW200631085A/en
Application granted granted Critical
Publication of TWI278031B publication Critical patent/TWI278031B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Optics & Photonics (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Nozzles (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

To provide a processor where piping is simplified for supplying processing liquid and gas to binary fluid spray nozzles installed in a plurality of chambers. The processor is provided with: a gas piping 41 to which gas is supplied and which is arranged along a direction crossing a conveyance direction of a substrate in the chamber 1; a liquid piping 31 to which liquid is supplied, is integrated with the gas piping, and is arranged in the chamber; and a plurality of binary fluid spray nozzles 44 which have liquid supply ports, gas supply ports and spray holes, in which the liquid supply ports are connected to the liquid piping and gas supply ports are connected to the gas piping, which are arranged in a longitudinal direction of piping at prescribed intervals, pressurize liquid supplied from the liquid piping through the liquid supply ports by gas supplied from the gas piping through the gas supply ports, and spray liquid from the spray holes.
TW094130710A 2004-09-27 2005-09-07 Apparatus for treating substrates TWI278031B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004279848A JP4789446B2 (en) 2004-09-27 2004-09-27 Substrate processing equipment

Publications (2)

Publication Number Publication Date
TW200631085A true TW200631085A (en) 2006-09-01
TWI278031B TWI278031B (en) 2007-04-01

Family

ID=36234243

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094130710A TWI278031B (en) 2004-09-27 2005-09-07 Apparatus for treating substrates

Country Status (4)

Country Link
JP (1) JP4789446B2 (en)
KR (1) KR100742678B1 (en)
CN (1) CN100553801C (en)
TW (1) TWI278031B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI419200B (en) * 2007-05-31 2013-12-11 Shibaura Mechatronics Corp Apparatus for supporting substrates and method of treating substrates

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101041168B1 (en) * 2008-12-29 2011-06-14 정우리 Spray device for low pressure
CN102078866A (en) * 2009-11-26 2011-06-01 昆山厚声电子工业有限公司 Mask cleaning and drying process of film flaky substrate
CN102091700B (en) * 2009-12-10 2013-03-06 中芯国际集成电路制造(上海)有限公司 Wafer spray cleaning method
JP6423204B2 (en) * 2014-09-01 2018-11-14 株式会社モリタホールディングス Vehicle storage device and support member
JP6865402B2 (en) * 2017-07-10 2021-04-28 パナソニックＩｐマネジメント株式会社 Cleaning method and cleaning equipment
CN110180822A (en) * 2019-06-18 2019-08-30 徐州玉伟机械设备有限公司 Automatic flushing device is used in a kind of production of automobile gearbox gear

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51137628A (en) * 1975-05-26 1976-11-27 Nippon Steel Corp Method of correcting spangle pattern on surface of zinc coated steel strip
JPS63248464A (en) * 1987-03-31 1988-10-14 Nisshin Steel Co Ltd Nozzle header for two fluids
JP3257340B2 (en) * 1995-05-24 2002-02-18 松下電器産業株式会社 Liquid coating method, liquid coating apparatus and slit nozzle
JP3626610B2 (en) * 1998-11-02 2005-03-09 東京エレクトロン株式会社 Processing apparatus and processing method
JP4611482B2 (en) * 2000-02-22 2011-01-12 株式会社テック・ヤスダ Index work holder for vice
JP3926593B2 (en) * 2001-09-14 2007-06-06 大日本スクリーン製造株式会社 Substrate processing equipment
JPWO2003071594A1 (en) * 2002-02-25 2005-06-16 住友精密工業株式会社 Transport type substrate processing equipment
JP2004237282A (en) * 2003-01-16 2004-08-26 Kyoritsu Gokin Co Ltd Double fluid nozzle

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI419200B (en) * 2007-05-31 2013-12-11 Shibaura Mechatronics Corp Apparatus for supporting substrates and method of treating substrates

Also Published As

Publication number Publication date
JP4789446B2 (en) 2011-10-12
JP2006093591A (en) 2006-04-06
CN1772400A (en) 2006-05-17
KR100742678B1 (en) 2007-07-25
CN100553801C (en) 2009-10-28
KR20060051701A (en) 2006-05-19
TWI278031B (en) 2007-04-01

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