TWD224691S - 用於物理氣相沉積（pvd）腔室中的準直器 - Google Patents

用於物理氣相沉積（pvd）腔室中的準直器 Download PDF

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Publication number
TWD224691S
TWD224691S TW111300795F TW111300795F TWD224691S TW D224691 S TWD224691 S TW D224691S TW 111300795 F TW111300795 F TW 111300795F TW 111300795 F TW111300795 F TW 111300795F TW D224691 S TWD224691 S TW D224691S
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TW
Taiwan
Prior art keywords
pvd
collimator
chamber
vapor deposition
physical vapor
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TW111300795F
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English (en)
Chinese (zh)
Inventor
馬丁李 萊克
凱斯Ａ 米勒
富宏 張
路克菲安妮 法凱
奇索庫瑪 卡拉瑟帕蘭比爾
祥金 謝
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美商應用材料股份有限公司
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Publication of TWD224691S publication Critical patent/TWD224691S/zh

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TW111300795F 2021-08-29 2022-02-18 用於物理氣相沉積（pvd）腔室中的準直器 TWD224691S (zh)

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Application Number Priority Date Filing Date Title
US29/805,681 USD1009816S1 (en) 2021-08-29 2021-08-29 Collimator for a physical vapor deposition chamber
US29/805,681 2021-08-29

Publications (1)

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TWD224691S true TWD224691S (zh) 2023-04-11

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TW111300795F TWD224691S (zh) 2021-08-29 2022-02-18 用於物理氣相沉積（pvd）腔室中的準直器

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US (1) USD1009816S1 (ja)
JP (1) JP1719724S (ja)
TW (1) TWD224691S (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1024149S1 (en) * 2022-12-16 2024-04-23 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1025936S1 (en) * 2022-12-16 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1026054S1 (en) 2022-04-22 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1026839S1 (en) * 2022-12-16 2024-05-14 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber

Family Cites Families (62)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2061119C (en) 1991-04-19 1998-02-03 Pei-Ing P. Lee Method of depositing conductors in high aspect ratio apertures
US5958193A (en) 1994-02-01 1999-09-28 Vlsi Technology, Inc. Sputter deposition with mobile collimator
JPH07335552A (ja) 1994-06-08 1995-12-22 Tel Varian Ltd 処理装置
US5643428A (en) 1995-02-01 1997-07-01 Advanced Micro Devices, Inc. Multiple tier collimator system for enhanced step coverage and uniformity
US5705042A (en) 1996-01-29 1998-01-06 Micron Technology, Inc. Electrically isolated collimator and method
US5702573A (en) 1996-01-29 1997-12-30 Varian Associates, Inc. Method and apparatus for improved low pressure collimated magnetron sputter deposition of metal films
US6362097B1 (en) 1998-07-14 2002-03-26 Applied Komatsu Technlology, Inc. Collimated sputtering of semiconductor and other films
TWM267462U (en) 2000-07-17 2005-06-11 Dura Tek Inc Collimator for sputtering apparatus
US20030015421A1 (en) 2001-07-20 2003-01-23 Applied Materials, Inc. Collimated sputtering of cobalt
JP2005504885A (ja) 2001-07-25 2005-02-17 アプライド　マテリアルズ　インコーポレイテッド 新規なスパッタ堆積方法を使用したバリア形成
US20030029715A1 (en) 2001-07-25 2003-02-13 Applied Materials, Inc. An Apparatus For Annealing Substrates In Physical Vapor Deposition Systems
USD452257S1 (en) * 2001-07-25 2001-12-18 J M P Industries, Inc. Extruder plate for diamond shaped extruder insert
KR100610019B1 (ko) * 2005-01-11 2006-08-08 삼성전자주식회사 플라즈마 분배장치 및 이를 구비하는 건식 스트리핑 장치
US7355192B2 (en) 2006-03-30 2008-04-08 Intel Corporation Adjustable suspension assembly for a collimating lattice
USD613829S1 (en) * 2006-09-13 2010-04-13 Hayward Industries, Inc. Circular suction outlet assembly cover
US20080121620A1 (en) 2006-11-24 2008-05-29 Guo G X Processing chamber
TWM346018U (en) 2008-03-14 2008-12-01 Everlight Electronics Co Ltd Alterable gear collimator
TWI356916B (en) 2008-03-14 2012-01-21 Everlight Electronics Co Ltd Alterable collimator and lightening module thereof
USD585389S1 (en) * 2008-04-23 2009-01-27 Littelfuse, Inc. Two-leafed vehicle electrical center subassembly
USD584697S1 (en) * 2008-04-23 2009-01-13 Littelfuse, Inc. Vehicle electrical center subassembly
US20090308739A1 (en) 2008-06-17 2009-12-17 Applied Materials, Inc. Wafer processing deposition shielding components
JP2011524471A (ja) 2008-06-17 2011-09-01 アプライド マテリアルズ インコーポレイテッド 均一蒸着のための装置及び方法
USD598717S1 (en) 2008-09-19 2009-08-25 Dart Industries Inc. Can strainer
USD752528S1 (en) * 2010-04-29 2016-03-29 Brenda M. Leonard Waterproof electronics container
US9869021B2 (en) * 2010-05-25 2018-01-16 Aventa Technologies, Inc. Showerhead apparatus for a linear batch chemical vapor deposition system
USD674759S1 (en) * 2010-08-19 2013-01-22 Epistar Corporation Wafer carrier
CA140095S (en) 2010-10-29 2011-11-21 Unilever Plc Tea capsule
USD760180S1 (en) * 2014-02-21 2016-06-28 Hzo, Inc. Hexcell channel arrangement for use in a boat for a deposition apparatus
USD665071S1 (en) 2012-01-25 2012-08-07 Applied Materials, Inc. Deposition chamber liner
USD686582S1 (en) * 2012-03-20 2013-07-23 Veeco Instruments Inc. Wafer carrier having pockets
USD695241S1 (en) * 2012-03-20 2013-12-10 Veeco Instruments Inc. Wafer carrier having pockets
EP2841619A4 (en) 2012-04-26 2015-06-03 Intevac Inc ENGINE SOURCE FOR PROCESSING PHYSICAL STEAM SEPARATION
TWD159673S (zh) 2012-11-30 2014-04-01 日立國際電氣股份有限公司 基板處理裝置用廻轉器
TWD159674S (zh) 2012-11-30 2014-04-01 日立國際電氣股份有限公司 基板處理裝置用廻轉器
TWD159676S (zh) 2012-11-30 2014-04-01 日立國際電氣股份有限公司 基板處理裝置用廻轉器
TWD166552S (zh) 2013-01-25 2015-03-11 日立國際電氣股份有限公司 基板處理裝置用氣化器
USD721417S1 (en) * 2013-04-11 2015-01-20 Canada Pipeline Accessories, Co., Ltd. Flow conditioner
TWD169790S (zh) 2013-07-10 2015-08-11 日立國際電氣股份有限公司 基板處理裝置用氣化器之部分
USD722298S1 (en) 2013-07-17 2015-02-10 Nuflare Technology, Inc. Chamber of charged particle beam drawing apparatus
USD759603S1 (en) 2013-07-17 2016-06-21 Nuflare Technology, Inc. Chamber of charged particle beam drawing apparatus
USD757713S1 (en) 2013-10-18 2016-05-31 Semiconductor Energy Laboratory Co., Ltd. Portable information terminal
US9831074B2 (en) 2013-10-24 2017-11-28 Applied Materials, Inc. Bipolar collimator utilized in a physical vapor deposition chamber
USD746647S1 (en) 2014-03-13 2016-01-05 Vienar Roaks Strainer
TWD178898S (zh) 2014-11-01 2016-10-11 米歇爾維尼希股份公司 開槽機
US9543126B2 (en) 2014-11-26 2017-01-10 Applied Materials, Inc. Collimator for use in substrate processing chambers
JP1535123S (ja) 2014-12-22 2015-10-13
JP1534914S (ja) 2014-12-22 2015-10-13
JP1534915S (ja) 2014-12-22 2015-10-13
USD753449S1 (en) 2015-01-06 2016-04-12 WineStor, LLC Strainer for beverage shaker
JP1546801S (ja) 2015-06-12 2016-03-28
JP1546799S (ja) 2015-06-12 2016-03-28
JP1551512S (ja) 2015-06-12 2016-06-13
EP3369108B1 (en) 2015-10-27 2021-08-04 Applied Materials, Inc. Biasable flux optimizer/collimator for pvd sputter chamber
JP1564934S (ja) 2016-02-26 2016-12-05
CN107305407B (zh) * 2016-04-19 2021-01-12 宏达国际电子股份有限公司 保护壳及保护壳制造方法
USD805700S1 (en) 2016-06-06 2017-12-19 Joe J. Owens, III Pet food bowl
USD821140S1 (en) 2016-12-27 2018-06-26 Tristar Products, Inc. Steamer plate
US10246777B2 (en) * 2017-06-12 2019-04-02 Asm Ip Holding B.V. Heater block having continuous concavity
USD859484S1 (en) * 2017-06-12 2019-09-10 Asm Ip Holding B.V. Heater block
USD859333S1 (en) * 2018-03-16 2019-09-10 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD858468S1 (en) * 2018-03-16 2019-09-03 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
JP6575641B1 (ja) * 2018-06-28 2019-09-18 株式会社明電舎 シャワーヘッドおよび処理装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1026054S1 (en) 2022-04-22 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1024149S1 (en) * 2022-12-16 2024-04-23 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1025936S1 (en) * 2022-12-16 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1026839S1 (en) * 2022-12-16 2024-05-14 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber

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JP1719724S (ja) 2022-07-13
USD1009816S1 (en) 2024-01-02

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