TW484463U - Coating device - Google Patents
Coating deviceInfo
- Publication number
- TW484463U TW484463U TW087219356U TW87219356U TW484463U TW 484463 U TW484463 U TW 484463U TW 087219356 U TW087219356 U TW 087219356U TW 87219356 U TW87219356 U TW 87219356U TW 484463 U TW484463 U TW 484463U
- Authority
- TW
- Taiwan
- Prior art keywords
- coating device
- coating
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0254—Coating heads with slot-shaped outlet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0208—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
- B05C9/02—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material to surfaces by single means not covered by groups B05C1/00 - B05C7/00, whether or not also using other means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S118/00—Coating apparatus
- Y10S118/02—Bead coater
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32824194 | 1994-12-28 | ||
JP32824294 | 1994-12-28 | ||
JP32908894A JP3561998B2 (ja) | 1994-12-28 | 1994-12-28 | 枚葉塗工方法およびその装置 |
JP6135995 | 1995-03-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW484463U true TW484463U (en) | 2002-04-21 |
Family
ID=27464036
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW087219356U TW484463U (en) | 1994-12-28 | 1995-12-30 | Coating device |
Country Status (8)
Country | Link |
---|---|
US (1) | US6139639A (zh) |
EP (1) | EP0761317B1 (zh) |
KR (1) | KR100369571B1 (zh) |
CN (1) | CN1080143C (zh) |
CA (1) | CA2183163C (zh) |
DE (1) | DE69527353T2 (zh) |
TW (1) | TW484463U (zh) |
WO (1) | WO1996020045A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI828873B (zh) * | 2019-03-28 | 2024-01-11 | 日商尼康股份有限公司 | 塗布裝置、以及噴頭單元 |
Families Citing this family (86)
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DE19752926A1 (de) * | 1997-11-28 | 1999-06-10 | Bosch Gmbh Robert | Verfahren zum Aufbringen eines Schutzlacks auf einen Wafer |
WO1999034932A1 (en) * | 1998-01-09 | 1999-07-15 | Fastar, Ltd. | Moving head, coating apparatus and method |
US20050217707A1 (en) * | 1998-03-13 | 2005-10-06 | Aegerter Brian K | Selective processing of microelectronic workpiece surfaces |
US6632292B1 (en) | 1998-03-13 | 2003-10-14 | Semitool, Inc. | Selective treatment of microelectronic workpiece surfaces |
US6423642B1 (en) * | 1998-03-13 | 2002-07-23 | Semitool, Inc. | Reactor for processing a semiconductor wafer |
US6197481B1 (en) * | 1998-09-17 | 2001-03-06 | Taiwan Semiconductor Manufacturing Company | Wafer alignment marks protected by photoresist |
US6407009B1 (en) | 1998-11-12 | 2002-06-18 | Advanced Micro Devices, Inc. | Methods of manufacture of uniform spin-on films |
US6530340B2 (en) | 1998-11-12 | 2003-03-11 | Advanced Micro Devices, Inc. | Apparatus for manufacturing planar spin-on films |
US6317642B1 (en) * | 1998-11-12 | 2001-11-13 | Advanced Micro Devices, Inc. | Apparatus and methods for uniform scan dispensing of spin-on materials |
US6287636B1 (en) * | 1998-11-25 | 2001-09-11 | Canon Kabushiki Kaisha | Coating apparatus and method utilizing a diluent and a method for producing a color filter substrate |
EP1010473B1 (de) * | 1998-12-17 | 2006-07-12 | Guardian Industries Corp. | Vorrichtung und Verfahren zum Beschichten eines ebenen Substrates |
US6324440B1 (en) * | 1998-12-29 | 2001-11-27 | Lek Technologies, Llc | Apparatus for fabricating surface structures |
US6969682B2 (en) * | 1999-01-22 | 2005-11-29 | Semitool, Inc. | Single workpiece processing system |
US7217325B2 (en) * | 1999-01-22 | 2007-05-15 | Semitool, Inc. | System for processing a workpiece |
US6602382B1 (en) * | 1999-10-26 | 2003-08-05 | Tokyo Electron Limited | Solution processing apparatus |
DE10063216B8 (de) * | 1999-12-20 | 2013-05-16 | Mitsubishi Paper Mills Limited | Vorrichtung zum Bearbeiten von fotosensiblem Material |
US6544590B1 (en) * | 2000-01-17 | 2003-04-08 | Canon Kabushiki Kaisha | Liquid coating method, apparatus and film-forming method for producing the same employing excess coating removing unit having absorbent fabric on porous structure |
JP3824057B2 (ja) * | 2000-09-13 | 2006-09-20 | 東京エレクトロン株式会社 | 液処理装置 |
JP4130058B2 (ja) * | 2000-10-10 | 2008-08-06 | 東京応化工業株式会社 | 塗布方法 |
US6641670B2 (en) * | 2000-10-12 | 2003-11-04 | Toray Industries, Inc. | Leaf coater for producing leaf type coated substrates |
KR100470682B1 (ko) * | 2001-09-11 | 2005-03-07 | 나노에프에이 주식회사 | 포토레지스트의 흘림 길이를 조절할 수 있는 포토레지스트공급 장치 및 이를 이용한 포토레지스트 공급 방법 |
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CN100430151C (zh) * | 2002-07-18 | 2008-11-05 | 大日本印刷株式会社 | 涂覆模头和涂覆设备 |
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KR100724475B1 (ko) * | 2002-11-13 | 2007-06-04 | 엘지.필립스 엘시디 주식회사 | 액정 표시패널의 실 디스펜서 및 이를 이용한 실 패턴의단선 검출방법 |
ATE443577T1 (de) * | 2003-03-03 | 2009-10-15 | Toray Industries | Schlitzdüse und verfahren und vorrichtung zur herstellung von basismaterial mit überzugsfilm |
US7524527B2 (en) * | 2003-05-19 | 2009-04-28 | Boston Scientific Scimed, Inc. | Electrostatic coating of a device |
US7014724B2 (en) | 2003-06-25 | 2006-03-21 | Lear Corporation | Gravity regulated method and apparatus for controlling application of a fluid |
US7078355B2 (en) * | 2003-12-29 | 2006-07-18 | Asml Holding N.V. | Method and system of coating polymer solution on surface of a substrate |
JP4490797B2 (ja) * | 2004-01-23 | 2010-06-30 | 大日本スクリーン製造株式会社 | 基板処理装置 |
CN1304210C (zh) * | 2004-06-03 | 2007-03-14 | 李永南 | 小珠自动涂层设备 |
CN1304209C (zh) * | 2004-06-03 | 2007-03-14 | 李永南 | 小珠手动涂层设备 |
EP1799883A2 (en) * | 2004-08-18 | 2007-06-27 | Dow Corning Corporation | Coated substrates and methods for their preparation |
KR101074952B1 (ko) * | 2004-08-31 | 2011-10-18 | 엘지디스플레이 주식회사 | 포토레지스트 코팅장치 및 코팅방법 |
KR100780718B1 (ko) | 2004-12-28 | 2007-12-26 | 엘지.필립스 엘시디 주식회사 | 도포액 공급장치를 구비한 슬릿코터 |
CN100400172C (zh) * | 2004-12-30 | 2008-07-09 | 刘大佼 | 共挤压涂布两种涂层的方法 |
KR100700181B1 (ko) | 2004-12-31 | 2007-03-27 | 엘지.필립스 엘시디 주식회사 | 노즐대기부를 구비한 슬릿코터 및 이를 이용한 코팅방법 |
KR100675643B1 (ko) | 2004-12-31 | 2007-02-02 | 엘지.필립스 엘시디 주식회사 | 슬릿코터 |
WO2007007455A1 (ja) * | 2005-07-08 | 2007-01-18 | Murata Manufacturing Co., Ltd. | 電子部品の外部電極形成方法および装置 |
KR101182514B1 (ko) * | 2005-11-28 | 2012-09-12 | 엘지디스플레이 주식회사 | 진공 건조용 열경화 장치 및 진공건조 열경화방법 |
KR100703651B1 (ko) * | 2005-11-30 | 2007-04-06 | 주식회사 아이피에스 | 박막증착장치 |
JP4884871B2 (ja) * | 2006-07-27 | 2012-02-29 | 東京エレクトロン株式会社 | 塗布方法及び塗布装置 |
CN100448551C (zh) * | 2006-08-18 | 2009-01-07 | 青岛美露亚工艺品有限公司 | 人造珍珠小球的自动涂层装置 |
KR100824748B1 (ko) * | 2006-12-29 | 2008-04-24 | 세메스 주식회사 | 기판 처리 장치의 구동 방법 |
TW201011114A (en) * | 2008-05-19 | 2010-03-16 | Du Pont | Apparatus and method of vapor coating in an electronic device |
CN102085507B (zh) * | 2009-12-03 | 2016-05-11 | 塔工程有限公司 | 向液晶涂布机供应液晶的方法 |
KR101730644B1 (ko) * | 2009-12-03 | 2017-04-26 | 주식회사 탑 엔지니어링 | 액정 디스펜서에 액정을 공급하는 방법 |
US8460754B2 (en) * | 2009-12-21 | 2013-06-11 | 3M Innovative Properties Company | Needle coating and in-line curing of a coated workpiece |
CN101811106B (zh) * | 2010-04-14 | 2012-11-14 | 深圳南玻显示器件科技有限公司 | 防污膜涂布装置和方法 |
CN102380468B (zh) * | 2010-08-27 | 2014-01-29 | 比亚迪股份有限公司 | 一种涂布设备 |
CN102000652B (zh) * | 2010-09-10 | 2013-03-13 | 深圳市华星光电技术有限公司 | 液晶涂布装置及液晶涂布方法 |
KR101380978B1 (ko) * | 2011-12-09 | 2014-04-02 | 주식회사 탑 엔지니어링 | 합착장치 |
DE102012217683B3 (de) * | 2012-09-27 | 2014-02-20 | Volkswagen Varta Microbattery Forschungsgesellschaft Mbh & Co. Kg | Schaltbares Schlitzventil für eine Beschichtungsanlage, Beschichtungsanlage und Verwendung der Anlage |
KR102145845B1 (ko) * | 2013-09-17 | 2020-08-20 | 삼성디스플레이 주식회사 | 슬릿 노즐 및 이를 포함하는 약액 도포 장치 |
KR20150061593A (ko) * | 2013-11-27 | 2015-06-04 | 시바우라 메카트로닉스 가부시끼가이샤 | 도포 장치, 도포 방법, 표시 장치용 부재의 제조 장치 및 표시 장치용 부재의 제조 방법 |
CN103995368B (zh) * | 2014-01-27 | 2016-09-28 | 成都天马微电子有限公司 | 一种防干燥液供给系统及涂布设备 |
JP6272138B2 (ja) * | 2014-05-22 | 2018-01-31 | 東京エレクトロン株式会社 | 塗布処理装置 |
EP2960059B1 (en) | 2014-06-25 | 2018-10-24 | Universal Display Corporation | Systems and methods of modulating flow during vapor jet deposition of organic materials |
US11267012B2 (en) | 2014-06-25 | 2022-03-08 | Universal Display Corporation | Spatial control of vapor condensation using convection |
US11220737B2 (en) * | 2014-06-25 | 2022-01-11 | Universal Display Corporation | Systems and methods of modulating flow during vapor jet deposition of organic materials |
TWM490914U (zh) * | 2014-07-31 | 2014-12-01 | Sheng-Fu Wang | 塗佈機之滾輪夾合間隙補正裝置 |
JP6533043B2 (ja) | 2014-08-25 | 2019-06-19 | 三菱航空機株式会社 | 航空機エンジンの取り付け方法 |
CN104226545B (zh) * | 2014-09-26 | 2020-04-24 | 宁波旭升汽车技术股份有限公司 | 自动涂密封胶装置 |
US10566534B2 (en) | 2015-10-12 | 2020-02-18 | Universal Display Corporation | Apparatus and method to deliver organic material via organic vapor-jet printing (OVJP) |
CN105281505B (zh) * | 2015-10-26 | 2017-12-12 | 珠海凯邦电机制造有限公司 | 一种转子表面处理装置 |
CN105583123A (zh) * | 2015-12-15 | 2016-05-18 | 深圳市联得自动化装备股份有限公司 | 涂胶装置 |
JP6737693B2 (ja) | 2016-01-13 | 2020-08-12 | Ntn株式会社 | 微小突起の体積測定方法および液状材料の塗布方法 |
CN108496245A (zh) * | 2016-02-03 | 2018-09-04 | 富士胶片株式会社 | 有机半导体膜的制造装置 |
CN105537064A (zh) * | 2016-02-18 | 2016-05-04 | 易美芯光(北京)科技有限公司 | 一种用于cob围栏胶的生产控制系统 |
CN107032592B (zh) * | 2017-06-08 | 2019-08-09 | 重庆华瑞玻璃有限公司 | 一种玻璃切割方法及其装置 |
JP6835696B2 (ja) * | 2017-10-24 | 2021-02-24 | 株式会社ヒラノテクシード | 塗工装置 |
CN111989164B (zh) * | 2018-03-28 | 2022-02-25 | 马西莫·伯托拉的电动比姆公司 | 用液体产品对刚性面板的主要表面进行涂覆、特别是涂漆的装置 |
KR102162458B1 (ko) * | 2018-08-21 | 2020-10-06 | 주식회사 펨스 | 용액 전단 코팅 장치 |
CN109157985A (zh) * | 2018-10-31 | 2019-01-08 | 黄山学院 | 一种膜分离材料混合制膜装置 |
DE102019206706A1 (de) * | 2019-05-09 | 2020-11-12 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung und Verfahren zum Aufbringen flüssiger Medien auf eine Substratoberfläche |
JP7344533B2 (ja) * | 2019-05-14 | 2023-09-14 | Aiメカテック株式会社 | 塗布装置及び塗布方法 |
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CN112024293A (zh) * | 2020-09-10 | 2020-12-04 | 方条英 | 一种用于箱包加工的涂胶设备 |
CN112827750B (zh) * | 2020-12-31 | 2021-11-23 | 江苏智配新材料科技有限公司 | 一种套线表层涂饰材料的加工系统 |
IT202100013085A1 (it) * | 2021-05-20 | 2022-11-20 | Cefla Soc Cooperativa | Apparato e metodo per la verniciatura a rullo di pannelli, preferibilmente pannelli fotovoltaici |
CN114589058A (zh) * | 2022-01-11 | 2022-06-07 | 美述家智能家居有限公司 | 一种复合木板自动化涂胶设备 |
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1995
- 1995-12-27 KR KR1019960704741A patent/KR100369571B1/ko not_active IP Right Cessation
- 1995-12-27 US US08/700,421 patent/US6139639A/en not_active Expired - Lifetime
- 1995-12-27 CA CA002183163A patent/CA2183163C/en not_active Expired - Fee Related
- 1995-12-27 CN CN95192822A patent/CN1080143C/zh not_active Expired - Lifetime
- 1995-12-27 WO PCT/JP1995/002741 patent/WO1996020045A1/ja active IP Right Grant
- 1995-12-27 EP EP95942298A patent/EP0761317B1/en not_active Expired - Lifetime
- 1995-12-27 DE DE69527353T patent/DE69527353T2/de not_active Expired - Lifetime
- 1995-12-30 TW TW087219356U patent/TW484463U/zh not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI828873B (zh) * | 2019-03-28 | 2024-01-11 | 日商尼康股份有限公司 | 塗布裝置、以及噴頭單元 |
Also Published As
Publication number | Publication date |
---|---|
CA2183163A1 (en) | 1996-10-04 |
DE69527353D1 (de) | 2002-08-14 |
EP0761317A4 (en) | 1997-11-12 |
WO1996020045A1 (fr) | 1996-07-04 |
US6139639A (en) | 2000-10-31 |
DE69527353T2 (de) | 2003-01-30 |
KR100369571B1 (ko) | 2003-04-10 |
EP0761317A1 (en) | 1997-03-12 |
CN1147215A (zh) | 1997-04-09 |
CA2183163C (en) | 2006-08-08 |
EP0761317B1 (en) | 2002-07-10 |
CN1080143C (zh) | 2002-03-06 |
KR970701099A (ko) | 1997-03-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4K | Issue of patent certificate for granted utility model filed before june 30, 2004 | ||
MK4K | Expiration of patent term of a granted utility model |