DE10063216B8 - Vorrichtung zum Bearbeiten von fotosensiblem Material - Google Patents

Vorrichtung zum Bearbeiten von fotosensiblem Material Download PDF

Info

Publication number
DE10063216B8
DE10063216B8 DE10063216A DE10063216A DE10063216B8 DE 10063216 B8 DE10063216 B8 DE 10063216B8 DE 10063216 A DE10063216 A DE 10063216A DE 10063216 A DE10063216 A DE 10063216A DE 10063216 B8 DE10063216 B8 DE 10063216B8
Authority
DE
Germany
Prior art keywords
photosensitive material
processing photosensitive
processing
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE10063216A
Other languages
English (en)
Other versions
DE10063216B4 (de
DE10063216A1 (de
Inventor
Toshihito Maruyama
Shigeyoshi Suzuki
Sadao Kuriu
Yasuo Tsubai
Shin Nakagawa
Kunihiro Fukushima
Masayoshi Otsuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Paper Mills Ltd
Original Assignee
Mitsubishi Paper Mills Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP36102799A external-priority patent/JP2001174970A/ja
Priority claimed from JP2000126396A external-priority patent/JP2001305708A/ja
Priority claimed from JP2000128653A external-priority patent/JP2001312037A/ja
Priority claimed from JP2000128652A external-priority patent/JP3707992B2/ja
Priority claimed from JP2000344647A external-priority patent/JP4092069B2/ja
Application filed by Mitsubishi Paper Mills Ltd filed Critical Mitsubishi Paper Mills Ltd
Publication of DE10063216A1 publication Critical patent/DE10063216A1/de
Application granted granted Critical
Publication of DE10063216B4 publication Critical patent/DE10063216B4/de
Publication of DE10063216B8 publication Critical patent/DE10063216B8/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D5/00—Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected
    • G03D5/04—Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected using liquid sprays

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Coating Apparatus (AREA)
  • Photographic Processing Devices Using Wet Methods (AREA)
DE10063216A 1999-12-20 2000-12-19 Vorrichtung zum Bearbeiten von fotosensiblem Material Expired - Fee Related DE10063216B8 (de)

Applications Claiming Priority (10)

Application Number Priority Date Filing Date Title
JP361027/99 1999-12-20
JP36102799A JP2001174970A (ja) 1999-12-20 1999-12-20 感光材料処理方法および装置
JP2000126396A JP2001305708A (ja) 2000-04-26 2000-04-26 感光材料処理装置
JP126396/00 2000-04-26
JP2000128653A JP2001312037A (ja) 2000-04-28 2000-04-28 感光材料処理方法および感光材料処理装置
JP128653/00 2000-04-28
JP2000128652A JP3707992B2 (ja) 2000-04-28 2000-04-28 感光材料処理方法および感光材料処理装置
JP128652/00 2000-04-28
JP344647/00 2000-11-13
JP2000344647A JP4092069B2 (ja) 2000-11-13 2000-11-13 スロットダイを用いた感光材料用処理装置

Publications (3)

Publication Number Publication Date
DE10063216A1 DE10063216A1 (de) 2001-07-05
DE10063216B4 DE10063216B4 (de) 2013-04-18
DE10063216B8 true DE10063216B8 (de) 2013-05-16

Family

ID=27531330

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10063216A Expired - Fee Related DE10063216B8 (de) 1999-12-20 2000-12-19 Vorrichtung zum Bearbeiten von fotosensiblem Material

Country Status (2)

Country Link
US (1) US6478483B2 (de)
DE (1) DE10063216B8 (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100923022B1 (ko) * 2002-06-14 2009-10-22 삼성전자주식회사 감광물질 코팅 방법 및 장치
US6992688B2 (en) * 2004-01-28 2006-01-31 Eastman Kodak Company Method for developing multilayer imageable elements
US7275879B2 (en) * 2004-02-23 2007-10-02 Mitsubishi Paper Mills Limited Processing device of photo-sensitive material
JP2006095491A (ja) * 2004-09-30 2006-04-13 Fuji Photo Film Co Ltd 塗布方法、光学フィルム及び反射防止フィルム
KR100628275B1 (ko) * 2004-11-04 2006-09-27 엘지.필립스 엘시디 주식회사 인쇄노즐
US20090197206A1 (en) * 2008-01-25 2009-08-06 Ray Kevin B Method of making images using fresh processing solution
US8034538B2 (en) 2009-02-13 2011-10-11 Eastman Kodak Company Negative-working imageable elements
US8318405B2 (en) 2009-03-13 2012-11-27 Eastman Kodak Company Negative-working imageable elements with overcoat
US8247163B2 (en) 2009-06-12 2012-08-21 Eastman Kodak Company Preparing lithographic printing plates with enhanced contrast
US8257907B2 (en) 2009-06-12 2012-09-04 Eastman Kodak Company Negative-working imageable elements
US8936899B2 (en) 2012-09-04 2015-01-20 Eastman Kodak Company Positive-working lithographic printing plate precursors and use
US8329383B2 (en) 2009-11-05 2012-12-11 Eastman Kodak Company Negative-working lithographic printing plate precursors
US8752501B2 (en) 2010-07-29 2014-06-17 Corning Incorporated Systems and methods for dispensing a fluid
CN101916392B (zh) * 2010-09-06 2013-11-06 耐世特凌云驱动系统(涿州)有限公司 钢球数量检测机
JP5162642B2 (ja) * 2010-10-26 2013-03-13 富士フイルム株式会社 塗膜付きフィルムの製造方法、及び塗布装置
US8632940B2 (en) 2011-04-19 2014-01-21 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
US8722308B2 (en) 2011-08-31 2014-05-13 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
US20130255515A1 (en) 2012-03-27 2013-10-03 Celin Savariar-Hauck Positive-working lithographic printing plate precursors
US8679726B2 (en) 2012-05-29 2014-03-25 Eastman Kodak Company Negative-working lithographic printing plate precursors
US8889341B2 (en) 2012-08-22 2014-11-18 Eastman Kodak Company Negative-working lithographic printing plate precursors and use
US9063423B2 (en) 2013-02-28 2015-06-23 Eastman Kodak Company Lithographic printing plate precursors and use
CN103464315B (zh) * 2013-08-28 2015-12-09 清华大学深圳研究生院 一种能形成均匀水幕的工艺喷嘴
US9201302B2 (en) 2013-10-03 2015-12-01 Eastman Kodak Company Negative-working lithographic printing plate precursor
CN106313870B (zh) 2016-08-19 2018-06-15 浙江康尔达新材料股份有限公司 一种可成像涂层、热敏阴图平版印刷版及其制版方法
EP3441223B1 (de) 2017-08-07 2024-02-21 Eco3 Bv Lithographiedruckplattenvorläufer
US11633948B2 (en) 2020-01-22 2023-04-25 Eastman Kodak Company Method for making lithographic printing plates
CN113942289B (zh) 2021-10-26 2023-02-28 浙江康尔达新材料股份有限公司 一种用于光敏阴图型平版印刷版的可成像组合物及其制版方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1752816A1 (de) * 1967-07-21 1971-12-16 Fuji Photo Film Co Ltd Mehrfachrakelauftragsvorrichtung
DE3828899A1 (de) * 1987-08-28 1989-03-09 Arnold Hoffman Einrichtung zum entwickeln von photographischen filmen
US5210005A (en) * 1988-08-16 1993-05-11 Fuji Photo Film Co., Ltd. Method and apparatus for developing photosensitive lithographic plate
DE69213606T2 (de) * 1991-07-25 1997-03-20 Eastman Kodak Co Beschichtungsvorrichtung mit niedriger Durchflussgeschwindigkeit
DE69029747T2 (de) * 1989-08-31 1997-07-31 Eastman Kodak Co Entwicklungsgerät
US5702527A (en) * 1995-02-22 1997-12-30 Minnesota Mining And Manufacturing Company Restricted flow die
JPH11221509A (ja) * 1998-02-09 1999-08-17 Sharp Corp 塗布装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3589261A (en) * 1968-01-16 1971-06-29 Du Pont Photographic developing apparatus
US4623236A (en) * 1985-10-31 1986-11-18 Polaroid Corporation Photographic processing composition applicator
JPH0778631B2 (ja) * 1986-05-27 1995-08-23 コニカ株式会社 残膜が改良される感光性平版印刷版の現像方法および装置
DE69420123T2 (de) * 1994-03-25 2000-04-06 Agfa-Gevaert N.V. Vorrichtung und Verfahren zur Herstellung einer lithographischen Offset-Druckform, mittels Silbersalzdiffusionsübertragungsverfahrens
WO1996020045A1 (fr) * 1994-12-28 1996-07-04 Toray Industries, Inc. Procede de depot d'une revetement et appareil associe
JPH11188301A (ja) * 1997-12-26 1999-07-13 Hirata Corp 流体塗布装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1752816A1 (de) * 1967-07-21 1971-12-16 Fuji Photo Film Co Ltd Mehrfachrakelauftragsvorrichtung
DE3828899A1 (de) * 1987-08-28 1989-03-09 Arnold Hoffman Einrichtung zum entwickeln von photographischen filmen
US5210005A (en) * 1988-08-16 1993-05-11 Fuji Photo Film Co., Ltd. Method and apparatus for developing photosensitive lithographic plate
DE69029747T2 (de) * 1989-08-31 1997-07-31 Eastman Kodak Co Entwicklungsgerät
DE69213606T2 (de) * 1991-07-25 1997-03-20 Eastman Kodak Co Beschichtungsvorrichtung mit niedriger Durchflussgeschwindigkeit
US5702527A (en) * 1995-02-22 1997-12-30 Minnesota Mining And Manufacturing Company Restricted flow die
JPH11221509A (ja) * 1998-02-09 1999-08-17 Sharp Corp 塗布装置

Also Published As

Publication number Publication date
DE10063216B4 (de) 2013-04-18
US6478483B2 (en) 2002-11-12
US20010004422A1 (en) 2001-06-21
DE10063216A1 (de) 2001-07-05

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8125 Change of the main classification

Ipc: G03D 5/00

R018 Grant decision by examination section/examining division
R020 Patent grant now final

Effective date: 20130719

R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee

Effective date: 20140701