KR100703651B1 - 박막증착장치 - Google Patents
박막증착장치 Download PDFInfo
- Publication number
- KR100703651B1 KR100703651B1 KR1020050115347A KR20050115347A KR100703651B1 KR 100703651 B1 KR100703651 B1 KR 100703651B1 KR 1020050115347 A KR1020050115347 A KR 1020050115347A KR 20050115347 A KR20050115347 A KR 20050115347A KR 100703651 B1 KR100703651 B1 KR 100703651B1
- Authority
- KR
- South Korea
- Prior art keywords
- wafer
- wafer block
- thin film
- chamber
- bracket
- Prior art date
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45565—Shower nozzles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
Abstract
Description
Claims (3)
- 내부공간을 가지는 챔버;상기 챔버의 내부공간에 설치되며 웨이퍼가 배치되는 웨이퍼블록;상기 챔버에 고정되며, 상기 챔버의 내부공간에 상기 웨이퍼블록과 평행하게 배치되며, 상기 웨이퍼블록에 배치된 웨이퍼에 박막이 형성되도록 상기 웨이퍼를 향해 반응가스를 분사하는 샤워헤드; 및상기 웨이퍼블록을 상하방향으로 승강시키며, 상기 웨이퍼블록의 승강 도중에 상기 웨이퍼블록의 상면이 상기 샤워헤드의 하면에 대해 평행한 상태가 유지되도록 하는 승강수단;을 구비하는 것을 특징으로 하는 박막증착장치.
- 제 1항에 있어서,상기 승강수단은, 상기 웨이퍼블록에 결합되는 브라켓과, 상기 브라켓의 무게중심에 대해 대칭되도록 그 브라켓에 결합되는 복수의 볼스크류와, 상기 볼스크류들을 구동하는 구동원을 구비하는 것을 특징으로 하는 박막증착장치.
- 제 2항에 있어서,상기 구동원은, 상기 볼스크류들 중 어느 하나의 볼스크류에 결합되며 그 볼스크류를 회전시키는 모터와, 상기 볼스크류들 중 다른 볼스크류들에 상기 모터의 동력을 전달하는 벨트를 구비하는 것을 특징으로 하는 박막증착장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050115347A KR100703651B1 (ko) | 2005-11-30 | 2005-11-30 | 박막증착장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050115347A KR100703651B1 (ko) | 2005-11-30 | 2005-11-30 | 박막증착장치 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR100703651B1 true KR100703651B1 (ko) | 2007-04-06 |
Family
ID=38160861
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020050115347A KR100703651B1 (ko) | 2005-11-30 | 2005-11-30 | 박막증착장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100703651B1 (ko) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100369571B1 (ko) * | 1994-12-28 | 2003-04-10 | 도레이 가부시끼가이샤 | 도포방법및도포장치 |
KR20050048891A (ko) * | 2003-11-20 | 2005-05-25 | 주식회사 에버테크 | 유니버설 박막증착장치 |
-
2005
- 2005-11-30 KR KR1020050115347A patent/KR100703651B1/ko active IP Right Grant
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100369571B1 (ko) * | 1994-12-28 | 2003-04-10 | 도레이 가부시끼가이샤 | 도포방법및도포장치 |
KR20050048891A (ko) * | 2003-11-20 | 2005-05-25 | 주식회사 에버테크 | 유니버설 박막증착장치 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7988817B2 (en) | Lift pin driving device and a flat panel display manufacturing apparatus having same | |
KR20060103640A (ko) | 반도체 제조장치 | |
TWI609449B (zh) | Loading device | |
WO2013121878A1 (ja) | 基板処理装置及び基板処理方法 | |
CN1177948C (zh) | 用以形成薄膜的可在基片和防镀片之间改变距离的喷镀设备 | |
JP3718806B2 (ja) | スライドスリット式熱処理装置 | |
KR100703651B1 (ko) | 박막증착장치 | |
KR101343336B1 (ko) | 박막증착장치 | |
JP2011179531A (ja) | 蓋開閉装置及び真空装置 | |
JP2019123024A (ja) | 産業用ロボット | |
KR100682738B1 (ko) | 반도체 처리 장치 | |
CN1868600A (zh) | 半导体处理的流体注射设备 | |
KR20070117286A (ko) | 진공처리장치 | |
KR20100002938A (ko) | 측면개방형 진공챔버 | |
KR101180842B1 (ko) | 기판 처리장치 및 기판 처리장치의 제어방법 | |
KR20150008297A (ko) | 승강장치 및 이를 포함하는 기판 이송장치 | |
KR100297873B1 (ko) | 반도체장치제조용확산공정설비 | |
KR20120113994A (ko) | 스퍼터링 장치 및 이를 이용한 박막 형성 방법 | |
JPH11156772A (ja) | 薄型基板の搬送ロボット | |
KR20080053572A (ko) | 리프트 핀 구동장치 및 이것을 구비한 평판표시소자제조장치 | |
KR20240038431A (ko) | 기판처리장치 | |
KR20080076341A (ko) | 샤워헤드 유닛 및 이를 이용하는 박막증착용 반응용기 | |
KR101306627B1 (ko) | 원자층 고속 증착장치 | |
KR102097712B1 (ko) | 기판 고정 및 회전 장치 | |
KR20230080046A (ko) | 기판처리장치 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20130401 Year of fee payment: 7 |
|
FPAY | Annual fee payment |
Payment date: 20131206 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20141230 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20151209 Year of fee payment: 10 |
|
FPAY | Annual fee payment |
Payment date: 20161227 Year of fee payment: 11 |
|
FPAY | Annual fee payment |
Payment date: 20171204 Year of fee payment: 12 |
|
FPAY | Annual fee payment |
Payment date: 20181211 Year of fee payment: 13 |
|
FPAY | Annual fee payment |
Payment date: 20191210 Year of fee payment: 14 |