TW359038B - Non-volatile semiconductor memory device - Google Patents
Non-volatile semiconductor memory deviceInfo
- Publication number
- TW359038B TW359038B TW084107324A TW84107324A TW359038B TW 359038 B TW359038 B TW 359038B TW 084107324 A TW084107324 A TW 084107324A TW 84107324 A TW84107324 A TW 84107324A TW 359038 B TW359038 B TW 359038B
- Authority
- TW
- Taiwan
- Prior art keywords
- field
- electrode
- drain
- semiconductor memory
- volatile semiconductor
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 3
- 238000009413 insulation Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B69/00—Erasable-and-programmable ROM [EPROM] devices not provided for in groups H10B41/00 - H10B63/00, e.g. ultraviolet erasable-and-programmable ROM [UVEPROM] devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/788—Field effect transistors with field effect produced by an insulated gate with floating gate
- H01L29/7881—Programmable transistors with only two possible levels of programmation
- H01L29/7884—Programmable transistors with only two possible levels of programmation charging by hot carrier injection
- H01L29/7885—Hot carrier injection from the channel
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Non-Volatile Memory (AREA)
- Semiconductor Memories (AREA)
- Read Only Memory (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14896995A JP3878681B2 (ja) | 1995-06-15 | 1995-06-15 | 不揮発性半導体記憶装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW359038B true TW359038B (en) | 1999-05-21 |
Family
ID=15464726
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW084107324A TW359038B (en) | 1995-06-15 | 1995-07-13 | Non-volatile semiconductor memory device |
Country Status (5)
Country | Link |
---|---|
US (2) | US5877524A (zh) |
JP (1) | JP3878681B2 (zh) |
KR (1) | KR100211187B1 (zh) |
DE (1) | DE19600544C2 (zh) |
TW (1) | TW359038B (zh) |
Families Citing this family (72)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3878681B2 (ja) * | 1995-06-15 | 2007-02-07 | 株式会社ルネサステクノロジ | 不揮発性半導体記憶装置 |
US6753568B1 (en) * | 1996-11-15 | 2004-06-22 | Hitachi, Ltd. | Memory device |
JPH1187658A (ja) * | 1997-09-05 | 1999-03-30 | Mitsubishi Electric Corp | メモリセルおよびそれを備える不揮発性半導体記憶装置 |
JP3424898B2 (ja) * | 1997-09-17 | 2003-07-07 | 松下電器産業株式会社 | 不揮発性半導体記憶装置の書き換え方法 |
US6134144A (en) * | 1997-09-19 | 2000-10-17 | Integrated Memory Technologies, Inc. | Flash memory array |
US5946234A (en) * | 1997-12-18 | 1999-08-31 | Advanced Micro Devices, Inc. | Constant current source programming of electrically programmable memory arrays |
JP3895855B2 (ja) * | 1997-12-25 | 2007-03-22 | 株式会社東芝 | 不揮発性半導体記憶装置 |
KR100295150B1 (ko) * | 1997-12-31 | 2001-07-12 | 윤종용 | 비휘발성메모리장치의동작방법과상기동작을구현할수있는장치및그제조방법 |
US6188604B1 (en) * | 1998-03-02 | 2001-02-13 | Amic Technology, Inc. | Flash memory cell & array with improved pre-program and erase characteristics |
US6009017A (en) * | 1998-03-13 | 1999-12-28 | Macronix International Co., Ltd. | Floating gate memory with substrate band-to-band tunneling induced hot electron injection |
KR100339025B1 (ko) | 1998-10-27 | 2002-07-18 | 박종섭 | 플래쉬메모리셀의제조방법 |
JP3594221B2 (ja) * | 1999-01-26 | 2004-11-24 | シャープ株式会社 | 半導体集積回路装置のテスト回路 |
US6272047B1 (en) * | 1999-12-17 | 2001-08-07 | Micron Technology, Inc. | Flash memory cell |
US6359305B1 (en) * | 1999-12-22 | 2002-03-19 | Turbo Ic, Inc. | Trench-isolated EEPROM flash in segmented bit line page architecture |
US6490205B1 (en) * | 2000-02-16 | 2002-12-03 | Advanced Micro Devices, Inc. | Method of erasing a non-volatile memory cell using a substrate bias |
US6631087B2 (en) * | 2000-06-23 | 2003-10-07 | Gennum Corporation | Low voltage single poly deep sub-micron flash eeprom |
JP2002132574A (ja) * | 2000-10-26 | 2002-05-10 | Mitsubishi Electric Corp | 携帯電話 |
US6858496B1 (en) | 2000-12-06 | 2005-02-22 | Advanced Micro Devices, Inc. | Oxidizing pretreatment of ONO layer for flash memory |
US6707115B2 (en) * | 2001-04-16 | 2004-03-16 | Airip Corporation | Transistor with minimal hot electron injection |
US6531366B1 (en) * | 2001-07-12 | 2003-03-11 | Cypress Semiconductor Corporation | Method and structure for high-voltage device with self-aligned graded junctions |
US7068544B2 (en) * | 2001-08-30 | 2006-06-27 | Micron Technology, Inc. | Flash memory with low tunnel barrier interpoly insulators |
US7012297B2 (en) * | 2001-08-30 | 2006-03-14 | Micron Technology, Inc. | Scalable flash/NV structures and devices with extended endurance |
US6735115B2 (en) * | 2001-09-18 | 2004-05-11 | Ememory Technology Inc. | Nonvolatile semiconductor memory device having divided bit lines |
TW495977B (en) * | 2001-09-28 | 2002-07-21 | Macronix Int Co Ltd | Erasing method for p-channel silicon nitride read only memory |
US6784480B2 (en) * | 2002-02-12 | 2004-08-31 | Micron Technology, Inc. | Asymmetric band-gap engineered nonvolatile memory device |
JP3906177B2 (ja) * | 2002-05-10 | 2007-04-18 | 株式会社東芝 | 不揮発性半導体記憶装置 |
US6876582B2 (en) * | 2002-05-24 | 2005-04-05 | Hynix Semiconductor, Inc. | Flash memory cell erase scheme using both source and channel regions |
US6795348B2 (en) * | 2002-05-29 | 2004-09-21 | Micron Technology, Inc. | Method and apparatus for erasing flash memory |
JP2004014978A (ja) * | 2002-06-11 | 2004-01-15 | Renesas Technology Corp | 不揮発性半導体記憶装置 |
US7221586B2 (en) * | 2002-07-08 | 2007-05-22 | Micron Technology, Inc. | Memory utilizing oxide nanolaminates |
US6903969B2 (en) * | 2002-08-30 | 2005-06-07 | Micron Technology Inc. | One-device non-volatile random access memory cell |
KR100442883B1 (ko) * | 2002-09-11 | 2004-08-02 | 삼성전자주식회사 | 측벽 게이트와 sonos 셀 구조를 갖는 불휘발성메모리 소자의 제조 방법 |
US6925011B2 (en) * | 2002-12-26 | 2005-08-02 | Micron Technology, Inc. | Programming flash memories |
US6815757B2 (en) * | 2003-01-22 | 2004-11-09 | Texas Instruments Incorporated | Single-poly EEPROM on a negatively biased substrate |
US20040228168A1 (en) * | 2003-05-13 | 2004-11-18 | Richard Ferrant | Semiconductor memory device and method of operating same |
TWI220252B (en) * | 2003-08-06 | 2004-08-11 | Ememory Technology Inc | Method for programming, erasing and reading a flash memory cell |
US7021900B2 (en) * | 2003-10-08 | 2006-04-04 | Prueitt Melvin L | Vapor-powered kinetic pump |
DE10352785A1 (de) * | 2003-11-12 | 2005-06-02 | Infineon Technologies Ag | Speichertransistor und Speichereinheit mit asymmetrischem Kanaldotierbereich |
CN100358049C (zh) * | 2003-12-08 | 2007-12-26 | 联华电子股份有限公司 | P沟道电可擦可编程只读存储器的编程方法 |
KR100600316B1 (ko) * | 2003-12-22 | 2006-07-14 | 에스티마이크로일렉트로닉스 엔.브이. | 플래쉬 메모리 셀 및 그 소거 방법 |
US7154779B2 (en) * | 2004-01-21 | 2006-12-26 | Sandisk Corporation | Non-volatile memory cell using high-k material inter-gate programming |
US7366025B2 (en) * | 2004-06-10 | 2008-04-29 | Saifun Semiconductors Ltd. | Reduced power programming of non-volatile cells |
US7180125B2 (en) * | 2004-08-16 | 2007-02-20 | Chih-Hsin Wang | P-channel electrically alterable non-volatile memory cell |
JP3962769B2 (ja) * | 2004-11-01 | 2007-08-22 | 株式会社Genusion | 不揮発性半導体記憶装置およびその書込方法 |
US7177190B2 (en) * | 2004-11-26 | 2007-02-13 | Aplus Flash Technology, Inc. | Combination nonvolatile integrated memory system using a universal technology most suitable for high-density, high-flexibility and high-security sim-card, smart-card and e-passport applications |
JP4522879B2 (ja) * | 2005-02-07 | 2010-08-11 | 株式会社Genusion | 不揮発性半導体記憶装置 |
US7636257B2 (en) * | 2005-06-10 | 2009-12-22 | Macronix International Co., Ltd. | Methods of operating p-channel non-volatile memory devices |
JP4832835B2 (ja) * | 2005-09-13 | 2011-12-07 | 株式会社Genusion | 不揮発性半導体記憶装置の読み書き制御方法 |
US7282406B2 (en) * | 2006-03-06 | 2007-10-16 | Semiconductor Companents Industries, L.L.C. | Method of forming an MOS transistor and structure therefor |
US7626864B2 (en) * | 2006-04-26 | 2009-12-01 | Chih-Hsin Wang | Electrically alterable non-volatile memory cells and arrays |
US7391652B2 (en) * | 2006-05-05 | 2008-06-24 | Macronix International Co., Ltd. | Method of programming and erasing a p-channel BE-SONOS NAND flash memory |
JP2009537932A (ja) | 2006-05-19 | 2009-10-29 | エヌエックスピー ビー ヴィ | Sonosメモリデバイス及びsonosメモリデバイスの作動方法 |
US7684252B2 (en) * | 2006-06-21 | 2010-03-23 | Macronix International Co., Ltd. | Method and structure for operating memory devices on fringes of control gate |
US7599229B2 (en) * | 2006-06-21 | 2009-10-06 | Macronix International Co., Ltd. | Methods and structures for expanding a memory operation window and reducing a second bit effect |
KR100806039B1 (ko) * | 2006-08-31 | 2008-02-26 | 동부일렉트로닉스 주식회사 | 플래시 메모리 소자 및 이의 제조 방법 |
JP4282699B2 (ja) | 2006-09-01 | 2009-06-24 | 株式会社東芝 | 半導体装置 |
US7916550B2 (en) * | 2006-11-17 | 2011-03-29 | Macronix International Co., Ltd. | Method and apparatus for operating nonvolatile memory with floating voltage at one of the source and drain regions |
US20080150000A1 (en) * | 2006-12-21 | 2008-06-26 | Spansion Llc | Memory system with select gate erase |
US8339862B2 (en) | 2007-12-25 | 2012-12-25 | Genusion, Inc. | Nonvolatile semiconductor memory device |
JP2009158513A (ja) * | 2007-12-25 | 2009-07-16 | Genusion:Kk | 不揮発性半導体記憶素子、不揮発性半導体記憶装置、不揮発性半導体記憶素子のデータ書き込み方法、および、不揮発性半導体記憶装置のデータ書き換え方法 |
JP2010226375A (ja) * | 2009-03-23 | 2010-10-07 | Fujifilm Corp | 撮像装置及び固体撮像素子の駆動方法 |
US20110085382A1 (en) * | 2009-10-13 | 2011-04-14 | Aplus Flash Technology, Inc. | Universal dual charge-retaining transistor flash NOR cell, a dual charge-retaining transistor flash NOR cell array, and method for operating same |
TWI396288B (zh) * | 2009-10-22 | 2013-05-11 | Acer Inc | 記憶體元件之操作方法 |
US8467245B2 (en) | 2010-03-24 | 2013-06-18 | Ememory Technology Inc. | Non-volatile memory device with program current clamp and related method |
EP2498258B1 (en) * | 2011-03-11 | 2016-01-13 | eMemory Technology Inc. | Non-volatile memory device with program current clamp and related method |
US9779814B2 (en) * | 2011-08-09 | 2017-10-03 | Flashsilicon Incorporation | Non-volatile static random access memory devices and methods of operations |
US8837219B2 (en) * | 2011-09-30 | 2014-09-16 | Ememory Technology Inc. | Method of programming nonvolatile memory |
JP5853853B2 (ja) * | 2012-05-09 | 2016-02-09 | 富士通セミコンダクター株式会社 | 半導体記憶装置及びその駆動方法 |
JP2014056877A (ja) * | 2012-09-11 | 2014-03-27 | Hitachi Ltd | 半導体装置およびそれを用いた半導体集積回路装置 |
TWI595487B (zh) * | 2015-09-30 | 2017-08-11 | Egalax_Empia Tech Inc | Method to prevent the loss of memory cell data |
KR101771819B1 (ko) | 2015-12-18 | 2017-09-06 | 매그나칩 반도체 유한회사 | Otp 비휘발성 메모리 소자 |
JP2018022543A (ja) * | 2016-08-05 | 2018-02-08 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1392599A (en) * | 1971-07-28 | 1975-04-30 | Mullard Ltd | Semiconductor memory elements |
US3868187A (en) | 1972-08-31 | 1975-02-25 | Tokyo Shibaura Electric Co | Avalanche injection type mos memory |
US3797000A (en) | 1972-12-29 | 1974-03-12 | Ibm | Non-volatile semiconductor storage device utilizing avalanche injection and extraction of stored information |
JPS5232234A (en) * | 1975-09-05 | 1977-03-11 | Matsushita Electronics Corp | Fixed-semiconductor memory |
US4115914A (en) | 1976-03-26 | 1978-09-26 | Hughes Aircraft Company | Electrically erasable non-volatile semiconductor memory |
DE3031748A1 (de) * | 1979-08-24 | 1982-03-04 | Centre Electronique Horloger S.A., Neuchâtel | Elektrisch loeschbares und wiederholt programmierbares speicherelement zum dauerhaften speichern |
US4742491A (en) * | 1985-09-26 | 1988-05-03 | Advanced Micro Devices, Inc. | Memory cell having hot-hole injection erase mode |
JPS63249375A (ja) | 1987-04-06 | 1988-10-17 | Oki Electric Ind Co Ltd | 半導体記憶装置のデ−タ消去方法 |
JPH0797608B2 (ja) * | 1988-10-19 | 1995-10-18 | 株式会社東芝 | 不揮発性半導体メモリおよびその製造方法 |
JPH0355881A (ja) * | 1989-07-24 | 1991-03-11 | Seiko Instr Inc | 半導体不揮発生メモリ |
US5223451A (en) * | 1989-10-06 | 1993-06-29 | Kabushiki Kaisha Toshiba | Semiconductor device wherein n-channel MOSFET, p-channel MOSFET and nonvolatile memory cell are formed in one chip and method of making it |
JPH0494578A (ja) * | 1990-08-10 | 1992-03-26 | Seiko Instr Inc | 半導体装置の製造方法 |
JPH0499578A (ja) * | 1990-08-20 | 1992-03-31 | Omron Corp | 電動式遊技機の打球発射装置 |
US5739569A (en) * | 1991-05-15 | 1998-04-14 | Texas Instruments Incorporated | Non-volatile memory cell with oxide and nitride tunneling layers |
JPH06132541A (ja) * | 1992-10-19 | 1994-05-13 | Fujitsu Ltd | 半導体装置及びその製造方法 |
US5418390A (en) * | 1993-03-19 | 1995-05-23 | Lattice Semiconductor Corporation | Single polysilicon layer E2 PROM cell |
JPH06291332A (ja) * | 1993-04-06 | 1994-10-18 | Nippon Steel Corp | 半導体記憶装置及びその使用方法 |
US5467306A (en) | 1993-10-04 | 1995-11-14 | Texas Instruments Incorporated | Method of using source bias to increase threshold voltages and/or to correct for over-erasure of flash eproms |
DE4340592C2 (de) * | 1993-11-29 | 2002-04-18 | Gold Star Electronics | Verfahren zum Herstellen eines nichtflüchtigen Halbleiterspeichers und einen nach diesem Verfahren hergestellten Halbleiterspeicher |
US5574685A (en) * | 1994-09-01 | 1996-11-12 | Advanced Micro Devices, Inc. | Self-aligned buried channel/junction stacked gate flash memory cell |
US5468981A (en) * | 1994-09-01 | 1995-11-21 | Advanced Micro Devices, Inc. | Self-aligned buried channel/junction stacked gate flash memory cell |
EP0730310B1 (en) * | 1995-03-03 | 2001-10-17 | STMicroelectronics S.r.l. | Electrically programmable and erasable non-volatile memory cell and memory devices of FLASH and EEPROM type |
US5559735A (en) * | 1995-03-28 | 1996-09-24 | Oki Electric Industry Co., Ltd. | Flash memory having select transistors |
JP3878681B2 (ja) * | 1995-06-15 | 2007-02-07 | 株式会社ルネサステクノロジ | 不揮発性半導体記憶装置 |
US5687118A (en) * | 1995-11-14 | 1997-11-11 | Programmable Microelectronics Corporation | PMOS memory cell with hot electron injection programming and tunnelling erasing |
US5706227A (en) * | 1995-12-07 | 1998-01-06 | Programmable Microelectronics Corporation | Double poly split gate PMOS flash memory cell |
US5822242A (en) * | 1997-03-05 | 1998-10-13 | Macronix International Co, Ltd. | Asymmetric virtual ground p-channel flash cell with latid n-type pocket and method of fabrication therefor |
-
1995
- 1995-06-15 JP JP14896995A patent/JP3878681B2/ja not_active Expired - Lifetime
- 1995-07-13 TW TW084107324A patent/TW359038B/zh not_active IP Right Cessation
-
1996
- 1996-01-09 DE DE19600544A patent/DE19600544C2/de not_active Expired - Fee Related
- 1996-02-05 US US08/596,820 patent/US5877524A/en not_active Expired - Lifetime
- 1996-06-13 KR KR1019960021287A patent/KR100211187B1/ko not_active IP Right Cessation
-
1998
- 1998-12-30 US US09/222,794 patent/US6172397B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE19600544C2 (de) | 2001-12-13 |
JPH098153A (ja) | 1997-01-10 |
US5877524A (en) | 1999-03-02 |
KR100211187B1 (ko) | 1999-07-15 |
KR970004044A (ko) | 1997-01-29 |
JP3878681B2 (ja) | 2007-02-07 |
US6172397B1 (en) | 2001-01-09 |
DE19600544A1 (de) | 1996-12-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW359038B (en) | Non-volatile semiconductor memory device | |
TW338193B (en) | Non-volatile semiconductor memory | |
TW338846B (en) | Non-volatile semiconductor memory unit and the manufacturing method | |
TW283263B (en) | Fabrication method of semiconductor device and field effect transistor | |
AU3035192A (en) | Method for manufacture of a solar cell and solar cell | |
MX9710043A (es) | Fabricacion de dispositivos semiconductores. | |
JPS5279679A (en) | Semiconductor memory device | |
JPS55133574A (en) | Insulated gate field effect transistor | |
EP0718889A3 (en) | Photoelectric conversion device and method for fabricating the same | |
JPS55110069A (en) | Semiconductor memory device | |
TW265476B (en) | A self-aligned buried channel/junction stacked gate flash memory cell | |
JPS5787177A (en) | Semiconductor memory device | |
JPS5478679A (en) | Complementary memory cell capable of electric erasion | |
JPS57162370A (en) | Mos semiconductor memory device | |
JPS55112618A (en) | Constant voltage circuit | |
JPS57162371A (en) | Mos semiconductor memory device | |
JPS6417478A (en) | Semiconductor storage cell | |
JPS57102072A (en) | Semiconductor memory storage | |
JPS6466971A (en) | Floating gate tunnel oxide film type semiconductor memory element | |
JPS54101291A (en) | Semiconductor memory device | |
JPS57201066A (en) | Semiconductor memory cell | |
TW243553B (en) | Coding method for mask read only memory | |
JPS54148384A (en) | Power-use high dielectric strength field effect transistor | |
JPS57111880A (en) | Semiconductor storage device | |
JPS57188865A (en) | Semiconductor memory cell |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |