TW200835639A - Variable pitch storage shelves - Google Patents
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- TW200835639A TW200835639A TW096143954A TW96143954A TW200835639A TW 200835639 A TW200835639 A TW 200835639A TW 096143954 A TW096143954 A TW 096143954A TW 96143954 A TW96143954 A TW 96143954A TW 200835639 A TW200835639 A TW 200835639A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G1/00—Storing articles, individually or in orderly arrangement, in warehouses or magazines
- B65G1/02—Storage devices
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200835639 九、發明說明: 【發明所屬之技術領域】 、概括而言,本發明包含一容器儲存裝置,此裝置以有效的 式同時儲存多個不同尺寸的容器。尤其,本發明包含一儲倉, 儲倉可有效地儲存具有變化尺寸的複數前開式集中晶
(F0甬UP【: ;^nt 0pening Unified Pod^,或其他具有可機二式 J 啟通道的〇 【先前技術】 ιη ίνΛ®2各自顯示在製造設施㈣崎存容器'的習知儲倉 10二圖u頁不用以儲存多個F0UPs 2的習知儲倉1〇。習知_ γ盒外殼4,具有前開口3,献用以隔離-個以上 Π,(巧曰圓盒通道9,與前開口 3機械式地搞合;⑴ 芽巧12 ’固定F0UP外殼4,並且包含例如用以安置在位於支 :JUt 3 ft口動f板等等)上之三個對應動態栓上“ 8儲^ 示);(1 灿端把柄6 ;以及(V)—對側柄 知的任何物品儲存容器。 旱u乂及在此技術中已 芊12圖isc ’除了包含其他物件外,更包含多個儲存 么- 7包含任1支撐部。吾人可將每—個ί 距離dl亦二咖,1之貫施例顯示儲存架12㈣開距離dl。 端12與條贿架12正下方之贈2上 例如抓取F0UP 2ϋ f可對運达機構(例如機械手臂機構)提供 提高的空間。在半導體以且將F〇UP 2由儲存架12 F0UP自儲存架提高¥。體業中口人亦知悉可嗜合F0UP的底板而將 在F0UP 2的分地支撐F〇UP 2,貝悔一麵存架12可 包含實質上等下伸出。舉例而言,每-個儲存架12可 P 2之底面的區域。或者儲存架12可包含小 200835639 區域舰域’ ?、要儲存架12可充分地支樓F〇up 存架12亦可勺ί5ΐ存架12上將不會傾倒、搖晃等等)。每一個儲 結才冓。、匕3 3點式支撐又或在此技術中已知的任何其他支撐 的儲ί Ϊ。顯以;剛Ps的f知儲倉1Q。在圖2中 FOUPs^I^ 22 1〇 方^臨儲在每—個儲存架邮儲存在正·; 姒,俾使機械手臂例如可^端===在最小間隙(例如 離似之間的差距即為浪2:: 〇UP^^f 6。距離d3與距 小容量F0UPS 20時J:择鉦、土 = 3亚且虽在^知儲倉10内儲存 ,⑷如儲存架被隔開=離:架:=均: 2〇 【發明内容】 本發明之一實施樣態提供一哭 效的方式同時儲存大容量容/哭盥丨存糸統,此系統可用有 中,小容量容器包含二器兩者。在一實施例 而大容量容器包含用以儲在 丄 個半導體晶圓的F0UP ; 知_。此容器儲存系統可子至導體晶圓或更多的習 存位置内。 將]谷里或大各量F〇UP儲存在任何儲 本备明之另一實施樣態提一 、/ 包括標準化支撐部_細置:、巧,此系統具有 隹貝苑例中,母一個儲存位置 200835639 包含一對支撐部。最好將每一對支撐部隔開一距離, ^大容量層料殼寬度。雖蚊#部與鄰 = 直間距係小於大容量賺外殼的高度,但大容量y 的垂 在任何儲存位肋。當大容量FQUP被安置在 ^儲存 大容量F0UP夕卜殼可伸出位於正上方的此對支撐部二 部不需調整以容納此大容量F〇UP。 ^支撐 本發明之又-實施樣態提供一種容器儲存系統,此 對準及/或包含對正特徵部的齡位置,以確保每_姆哭被^確 ,置在此儲存位置内。在—實施例中,在儲存位置^每= 部包含至少一對正特徵部,例如動態栓或其他定位元件, W政部可與F0UP的底板或凸緣對正。在另—實施例中,每一 壁,以防止大容侧p安置在這些支撐部上的同時 本發明之又另一實施樣態提供一種容器儲存系統,此系統提 供安全特徵部’以確絲踩此儲㈣_運送及搬運期間不會 相互接觸。在一實施例中,在每一儲存位置内的至少一支撐部I =一感測器:以偵測F0UP是否被安置在此儲存位置内。這些感測 态可防止運送機構嘗試將容器運送至一個已經被佔用的儲存位 置。 【實施方式】 •國際半導體設備及原料組織(SEMI,Semiconductor Equipment and Material International)已制定半導體晶圓製造 口又,的4示準(參考http://www.semi.org)。SEMI標準統一管理可 接义的半導體製造設備公差及介面。於此說明的本發明並非限制 在用以搬運前開式集中晶圓盒(FOUPs,Front Opening Unified Pods)或其他類型之容器的半導體製造設備。 僅作為示範,本發明的各種不同實施例亦可被使用及/或被採 用於搬運才示準機械介面(SMIF,Standard Mechanical InterFace) 200835639 的ί、ί容:丄撐或處 含但不限制於半導體基板。“為=任 t=a=rr藉以可存取此物品,例如平面顯Ϊ ,啟之通道的容器(例如底部開啟SMIF晶圓ί及F〇upf =械, ,說明本發明之目的,於此僅參考曰®-及聰)。然而,為了 - 圖3至圖5說明本發明之各種不同的膏絲舞能 發明之各種不同實施樣態之目的,在此ϋ儲倉=°為了說明本 buffers) Λ大交旦pottd 〇 乂叉保才干1〇1。母一個F0UP,不兔豆 101 F〇UP 20 5 ;1# -小财咖2及12的 此底板可與容器外殼—體成形,或包 ^圖5)±-起為之。 落入本發明的範圍及精神内。凸 容器應 合。凸緣可沿著容器外:^容的支擇部㈣ 外殼^^出、從容器外殼的中ϊ伸出:並ii 如ίΐ器 上(例置在^ 容器包含自容器上is的=±錢撑部101上)。例如,假使 101上的凸緣而被吊離或懸 」_观39 含水平、傾斜或呈階 桿等等。同樣地,切部2列從容器外殼伸出的检或 的任何結構。支撐部1G1最、諸容器之凸緣特徵部 巧=置内的同時,使工作器被 ^貝上為水平。僅為了說明本 抑内,故些支撐部
,容器的支撐部‘底板以及對應之用以實質上水平支H _ 整支撐㈣_寬度的情 .的支樓結構102與104ΡΡ1距雜二5支按圖3之大容量_Ρ 2
2〇的支禮結構118盘⑽汗=J;並且將支稽圖3之小容量FOUP 置的支撐結構m " 距離d4。藉由將每一個儲存位 儲存位置中^存大準距離(例如d4),儲倉⑽可在任何 #邱ιηι ίΐ _ 2或小容量F0UP 20。當然,每 支撐。M01之間的距離不需相等。 、、且 在相i 3、ff之儲倉100包含四個縱列,每一個縱列具有八個儲 碰縱列分別為:第—儲存列C1、第二儲存列c2、= 歹C3以及第四儲存列C4。圖3顯示儲倉100的總儲存容量係 根據儲倉所儲存之小及大容量·s雜量。在此 >列Cl T在八個儲存位置的每一個之内儲存小容量F〇up 2〇。第二 1 C2可儲存一個大容量FOUP 2以及六個小容量FOUPs 20。大 容量F0UP 2本質上佔用兩個儲存位置(在縱列C2上端的兩個儲存 位置)。因此,縱列C2僅儲存七個FOUPs。第三縱列C3可儲存三 個大容量FOUPs 2以及兩個小容量f〇UPs 20。第四縱列C4可儲存 四個大容量F0UPS2〇 圖3所示之儲倉1〇〇可儲存二十四個FOUPs。若儲倉1〇〇完 全儲存小容量FOUPs 20時,儲倉1〇〇可儲存三十二個FOUPs。相 較之下’不論小容量及大容量FOUPs的何種組合被儲存在儲倉10 内,圖1所示之儲倉1〇僅可儲存最多十六個FOUPs。 9 200835639 如圖3所示,儲倉100可儲存兩種不同尺寸的容器··大容量 FOUPs 2以及小容量FOUPs 20。然而,儲倉1〇〇可儲存兩種以上 尺寸的FOUPs。為了使儲倉1〇〇的彈性最大化,較佳係以儲存在儲 倉100内之最小谷态尺寸的向度設定位於每一儲存位置内之支撐 部101之間的垂直間距d5(例如小容量F〇UP2〇的高度吆)。因此, , S撐結構101可包含許多不同的結構。在-實施例中,每一 個支撐結構101係由支撐桿所組成,並且每一對支撐部1〇1 =距或距離d4加以分開。支撐結構1〇1 距4在 倉 上之底板或』 支撐結構二3的實施例中’ no與支撐結構ι12之間的間距 與支樓結構120之間的間距d4箄草離相’支撐結構別 分開距td5 支撐部m垂直地分隔或 •距_。吾人將支撐支樓結構垂直分隔 結構m分隔='df U6等分將支撐結構⑽與支撐 之容器外殼24的高度hf #田士離/^父佳係大於小容量_ 20 被安置在一袓支浐部口此,在本乾例中,當小容量F0UP 20 卿,在小容量‘圖4B所示之支撐部12〇與 之谷》。外设24的上端與位於小容量F〇up 2〇β 200835639 正上方之FOUP 20A的底板32之間會存在一間隙g。 圖4A至4B顯示將小容量F0UP 20儲存在儲倉1〇〇 施例。圖4A-4B所示之小容量F〇up 20與習知F〇up並 夕鬥 的特性。*容量酬P 20包含容器外殼24、與 以 麵開啟容器通道29、上端把柄26、一對 ,緣32。從圖4A所提供的頂視圖觀之,小容量_ρ 2〇的容器;卜 喊24具有錐形構造。在本實施例中,前開口烈 二 =寬度°容^卜殼24的寬度W4係窄於底凸緣32 if器外殼24,底板32亦係呈錐形。圖从顯示 ==ί 小錢剛P 2G的絲32不需超舒響20 大容量F0UP 2具有與小容量證20類似的 、與前開㈣合的可機械式‘通道9 及底板或凸緣12。容器外殼4與底凸 '、彖12各自具有錐形構造。在本實施例中,前開口 3
圖4A顯示支撐結構124與丨26各自包含長度L1。支撐壯構 124與哗並沒有超出F0UP的總長度a。對於支撑結構似與⑽ =長度變化以及其他構造(例如包含三叉結構)應落人本發明的範 ^及精神内。支稽部124與126較佳係足夠長以充分地支撐小容 1 F(|1JP 20 2本實施例中,支撐部124與126支禮剛p的底板 32,因此,,、係足夠長以支撐F〇up的底板犯。在其他 , ?可支樓自容器夕卜殼伸出之_ρ的凸緣(無顯示) 1上伸出的凸緣)。若酬p包含不域凸緣的凸緣 r支撐4124與126必需充分地支樓F〇up的凸緣。此將在之後 作更詳細的朗,每—個切部的長度u制、於觸p(大容量或 小容量F0UP)的長度’俾使當F〇up被安置在一對支撐部ι〇ι上時, F0UP的通道開口不會接觸或碰撞位於上方之儲存位置内的支撐部 11 200835639 101 ° 在本實施例中,圖4A亦顯示F0UP的底板32 撐 各自的支禮表面131上。如上所述 部間的距離d4 一樣長的任何長度,其的g 产W31則,F0UP 2〇無法被一對支樓結構1〇1所支撐。的見度 一個支撐結構1Q1可包含栓(例如動態栓)或其他對正蚊 寺,’其可與位於大容量簡p之底板12以及小容量二 ^底板32兩者上㈣合特徵生财 可 位^ 一實施例中’此儲存位置可包含兩個 古拎处操,牙冓彳如支撐部102)上的圓形栓,以及一個位於另一 用於 300mm 之F0UPS 上之__« 丄:其係經過SEMI標準化。其他對準及/或對 出的=ii _㈣’這些對珊部亦可與自_伸 F〇UPsS2〇r^ ^ m h ^ * 支撐結構124盥126之第w 1女置在儲舍100中之具有 在小容量foup、2nH f存内。小容量贈薦被安置 上。五人將,*择之弟一儲存位置内的支撐結構120與122 距‘。小容量^ 腑20B的上端把柄26 f /5,而在小容量 32之間產生間隙g。_、^_方。之小谷® _Ρ 20A的底板 F0UP運送裝置可在j:内邱浐^ /、一區域’藉以機械手臂或其他 把柄26 fm的上端 露。這種機構的一範例知而不需在此更加揭 再j關破揭路於吴國專利第6579052號,此專利 12 200835639
案被讓與給Asyst Technologies,Inc.。其他類型 本發明的範®及精㈣。若機械手臂或瓣送落入 舉起FOUP 20B的腑底板32或侧柄,^衣置^及/或 而將FOUP 20Β舉離支撐部120與122,並^供空間 20Α的底板32與接觸。 ㈢储存於上之F0UP 圖4Β顯示每一個支撐結構1〇1亦可包含—却 F0UP被安置於儲存位置内的同時,限制驗的橫向移兴二在 •言,圖4β顯示支撐結構丨20與122各自包含傾斜内辟〗牛例而 二F0—UP 20Β在儲存位置内橫向地移動。對於支撐部&旬= 然。母一個支撐結構101在其前方及/或後方(盔顯. ^徵部或壁,以對安置於-對支撐結構101上之二ΐ 及向後移動進行限制。若支撐結構m的確包含前 =向别 ί 舉起越過這些壁的其中之―,以放置 ,101 t,所以此前與後垂直壁最好係不要過高,以增加J二 論gertead clearance)的需求(例如增加對於間隙g的最小g 圖4至圖5顯示每-個F0UP包含一對自腑之侧邊突 丙;大容量F0UP 2包含一對側柄δ。小容量賺 對 :。,大容量F0UP 2上的側柄8最好係低於位在習知J 書== 如位於面對贈外殼的底部)。因此,當膽被安 正ίΐίίϊΓΓ大容量F0UP 2的側柄可越過(沒有接觸)位於 存内的此組支樓結構而。儲倉湖可儲存習知 =0刪iFOUPs。在此情況下,因為習知3〇〇咖之F〇up的侧柄係 3沿者FGUP侧壁的較高位置上(例如在_上的位置係高於圖 ,所以支撐結構101之間的垂直間距d5會大於圖3至圖5 以刹位置内之一個以上的支樓結構1Q1可包含感測器 是否被安置在儲存位置内。這種特徵可用於防止 匕幾械手臂或私裝置之任何類型的放置錯誤或補錯誤,此 13 200835639 ,,手臂或運送裝置移動在儲存位置之間的FQUPs,此儲存位置可 錄ί目前已被佔用。位於每一個支撐結構101上的感測器可 二,廷裝置精確記錄此資訊的交叉檢查或確認。此運送裝置亦 二2二用以ί測容器之底部放置及容器高度的感測器,以交叉檢 子放置貧訊並確保容器被固持在正確的層上,或者確保一位 r置(或複數位置)未被佔用。
,5A顯不除7其他物件以外大容量F0UP2尚包含F0UP外殼 •冰尤,,柄J、一對側柄8、F0UP通道Θ以及底凸緣或板12°F0UP 覓度W2及高度h1。底板12的寬度W1最好係大於F0UP •忘見度W2。底板12的深度可以係與充分地支撐F0UP 2之 ΡΏΠΡ 9 長的任何長度(例如當安置在支撐部102與104上時 包含自容=員卜=由。ψ如先前於上所討論’對於不包含底部支樓板而 及精神内無顯示)的剛ρ應落入本發明的範圍 存位置内的支撐=具有上端凸緣時,蕭凸緣可被安置在儲 ⑽上圖的51==在2儲倉^之儲存位置内之支撐結構搬與 煃g〇UP 2。大谷1F0UP 2的高度hl係大於支撐% ===支撐部遍與⑽之間的垂直間距邪傭 以以i 2,結構1Q1之間的水平間距d4。圖 的容器外殼4可伸出㈣104上時,大容量着2 而在I器外接殼觸4與如每%==伸出支樓部⑽與⑽之間, 的機 1冓板=^^ 離支撐結構102與104。F〇$ = = 6f喷合二並且使娜2舉 支擇部102與104的上端使底板12越過 與支撐部106及108之門在女置之F〇UP之側柄8的上蠕 間的距離必需夠大,以使FOUP被舉離支撐 14 200835639 部102與104,並且使侧柄8不會與支樓部1〇6及1〇8產生碰撞。 圖6^至6B顯不安置在儲存位置内之大容量容器5〇的另一實 施例。容器50包含容器外殼52、凸緣54、上端把柄6〇以及一對 ,柄62。在本實施例中,容器外殼52包含均勻的寬度界5。圖6B 顯不同時具有前開口通道56及底部開口通道58的容器5〇,以說 ,儲存位置係適合任何難的容器。容器外殼52包含高度泊及 寬度W5。在本實施例中包含底凸緣的凸緣54具有寬度财。凸緣 54J*包含與凸、緣54之寬度W4 -樣長的任何寬度,此寬度係大於 支撐部101之間的間距d4。類似於上述小容量及大容量F〇up、 容器,可包含贿何高度自容科殼52伸出的凸HF()UPs 圖6A顯示凸緣54的寬度W4最好係大於容器外殼记的 W5。凸緣54的深度可以係與充分地支撐容器52之凸緣% 一 = ::長度(例如當安置在支撐部1〇2與綱上時,容器52不^ 圖6B顯示安置在儲倉1〇〇之儲存位置内之支撐部1〇2 ^的容器50。類似於大容量F0UP 2 ’容器5〇的高度⑽係大、4 1G2與106以及支撐部1〇4與1〇8之間的垂直 、^ 盗外殼52的寬度W5最好係小於支撐部⑽與⑽之 = ,=。圖6B顯不當容器50被安置在支樓部1〇2與1〇4上時 為50的容器外殼52伸出支撐部106 i 1⑽之n,、· Q二 ^ 106108^ 10^"f8 之間,而在谷益外殼52與每一支撐部之間留下一 3例中,在支樓部1(U之間的間距肪係小於:^, j h3。因此,在容器外殼52的上端與安置在正上f = 54之間產生-間隙或未佔用的空間(無顯示凸, 2容器柄60相嗜合’並且可使容器5。被舉離支以 5_被__使凸緣54越過支擇“二二 吾人應明白上述儲倉100以及在儲倉内用以儲存與運送 200835639 FOUPs的方法僅為示範之目的,並且不藉以限制本發明。已用此種 方式說明用以儲存FOUPs之方法及系統的較佳實施例,熟習本項 1藝者,明白在系統内的某些優點已被達到。吾人亦應明白在本 月之範圍及精神内可產生各種不同的修改、改造、以及替代實 言’儲倉1QQ亦可被使用與半導體製造設施内的其 吾人應日肠許多上述發明觀點可同樣適用在其 他非+導體製造應用的使用上。 【圖式簡單說明】
圖1提供依照先前技術的習知儲倉 知儲::圖1戶斤示之用以儲存具有不同i存容量之容器的習 J 4?4B ; 容器之實施例的頂視及前視圖;μ =层或儲存裝置内之小容量 圖5A-5B提供儲存在圖3所示 、 容器之實施例的頂視及前視圖丨及諸倉或儲存裝置内之大容量 圖6A-6B提供安置在儲存位 的頂視及前視圖。 之工作件容器之另一實施例
【主要元件符號說明】 2大容量F0UP 3前開口 4外殼 6 上端把柄 8側柄 9 F0UP通道 10儲倉 12底板 16 200835639 20小容量FOUP 20A小容量FOUP 20B小容量FOUP 23 前開口 24容器外殼 26 上端把柄 28侧柄 . 29可機械式開啟容器通道 32底板 50容器 籲 52容器外殼 54凸緣‘ 56 前開口通道 58底部開口通道 60 上端把柄 62侧柄 100儲倉 101 支撐結構對 102 支撐結構 φ 104 支撐結構 106 支撐結構 108 支撐結構 110 支撐結構 ‘ 112支撐結構 - 114支撐結構 Π 6 支撐結構 Π8支撐結構 120 支撐結構 122支撐結構 17 200835639 124支撐結構 126支撐結構 130傾斜内壁 131 支撐表面 132支撐結構 134支撐結構
Claims (1)
- 200835639 十、申請專利範圍: 1· 一種容斋儲存裝置,該裝置用以儲工抑 量工作件容器,每一個小容量作 合里作件谷态與小容 包含一!與—凸緣,該容ϋ儲存裝置包含·· 件μ 二支撐部隔開一預定距離,該預定第 ^器之容器外殼的寬度,·及 雕係大於该大谷1工作件容 一第二儲存位置,用以支標一 存位置位於該第-儲存位置的_L方,3=的产凸緣’該第二儲 第二支撐部’該第—支撐部與該第二$ 第—支撐部與- 預定距離係大於該大容量乍 邛隔開一預定距離,該 .其中該第-儲存位容科殼的寬度; 位置之該第—及該第二支撐 -支稽部與該第二儲存 工作件容器之容H外殼的高度/、_垂直間距係小於該大容量 2.如申請專利範圍第丨項之容器 之該第-支揮部與該第二支樓 '久其中該第了儲存位置 ,徵部用來與該大容量卫作二$含—對正特徵部,該對 益的凸緣相嗜合。 6凸緣或該小容量工作件容 =申一請專利範圍第i項之容器儲 .$弟-支撐部與該第二支樓部 \,ς中該第二儲存位置 特斂部可與該大容量工件 —對正特徵部,該對正 *凸緣相嚙合。 °°、緣或該小容量工作件容器的 請專利範圍第i項之容器儲存 i ^弟―支禮部與該第二支撑部 中該第―儲存位置 辑二切部上之社作㈣-儲存位置之 的的杈向移動加以限制。 19 200835639 5.如申請專利範圍第1項之 之該第—域部與該第二支“,可置以,二錯存位置 該弟一及料二切部上—料 6·如申請專利範圍第〗 包含一感,,㈣判定該工中,—健存位置 内。 仟谷态疋否位在该第一儲存位置 7.如申凊專利範圍第1 包含一感測器,用以判定、工:杜!衣置,其中該第二儲存位置 内。 ^版該工作件容器是否位在二館存^ 存容器-作件容器與小容 殼與一,,該容器谷!工作件容器包含-容器外 離係大於該大容ΐ隔[預定距離,該預定距 工作件容器的凸緣;^ 以卜殼的寬度,但能支撑於該 镇一 存位置,位於該第一儲存位置的上方,並且包含一 二iid二支撐部’該第—支撐部能第二支稽部水平 之容哭^的距離,該預定距離係大於該大容量卫作件容器 的見度,但能支撐於該工作件容器的凸緣; 容量工作工作件容器位在該第—儲存位肋時,該大 撐部與該第二殼可延伸至該第二儲存位置之該第一支 第一儲存位置 9·如申請專利範圍第8項之容器儲存裝置, 20 200835639 相嚙合 ^該如第申i8狀容雜縣置,其巾鮮二儲存值置 部可與該部各自包含—對正特徵部’該特徵 減人r ^里卫作件谷㈣凸緣或該小容量工作件容器的凸緣 =第申翻I8項之容11鄕裝置,其找第—儲存位置 之該工作件容器的橫向移動加以_[對文置在為儲存位置内 申請圍第8項之容器儲存褒置,其中該第二儲存位置 Ϊ以1ΐ該第二支撐部可對安置在該第二儲存位置内之 巧作件谷态的橫向移動加以限制。 m 專利範圍第8項之容器儲存裝置,其中 ^ 一感測器,肋判定該工作件容器是否位在該第—儲 1勺4人如一申^專利範圍帛δ項之容器儲存裝置,其中該第二儲存位 匕3 一感測ϋ’以判定該二作縣!!是否絲該第二儲存f置内。 十一、圖式: 21
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KR20220076343A (ko) | 2020-11-30 | 2022-06-08 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치의 반응 챔버 내에 배열되도록 구성된 인젝터 |
CN114639631A (zh) | 2020-12-16 | 2022-06-17 | Asm Ip私人控股有限公司 | 跳动和摆动测量固定装置 |
TW202231903A (zh) | 2020-12-22 | 2022-08-16 | 荷蘭商Asm Ip私人控股有限公司 | 過渡金屬沉積方法、過渡金屬層、用於沉積過渡金屬於基板上的沉積總成 |
USD981973S1 (en) | 2021-05-11 | 2023-03-28 | Asm Ip Holding B.V. | Reactor wall for substrate processing apparatus |
USD980814S1 (en) | 2021-05-11 | 2023-03-14 | Asm Ip Holding B.V. | Gas distributor for substrate processing apparatus |
USD980813S1 (en) | 2021-05-11 | 2023-03-14 | Asm Ip Holding B.V. | Gas flow control plate for substrate processing apparatus |
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Also Published As
Publication number | Publication date |
---|---|
WO2008064121A2 (en) | 2008-05-29 |
US20080118334A1 (en) | 2008-05-22 |
WO2008064121A3 (en) | 2008-08-28 |
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