TW200705715A - Allngap LED having reduced temperature dependence - Google Patents
Allngap LED having reduced temperature dependenceInfo
- Publication number
- TW200705715A TW200705715A TW095112045A TW95112045A TW200705715A TW 200705715 A TW200705715 A TW 200705715A TW 095112045 A TW095112045 A TW 095112045A TW 95112045 A TW95112045 A TW 95112045A TW 200705715 A TW200705715 A TW 200705715A
- Authority
- TW
- Taiwan
- Prior art keywords
- layer
- alingap
- lattice constant
- ingaas
- ingap
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/26—Materials of the light emitting region
- H01L33/30—Materials of the light emitting region containing only elements of group III and group V of the periodic system
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00011—Not relevant to the scope of the group, the symbol of which is combined with the symbol of this group
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
- Recrystallisation Techniques (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/100,080 US7244630B2 (en) | 2005-04-05 | 2005-04-05 | A1InGaP LED having reduced temperature dependence |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200705715A true TW200705715A (en) | 2007-02-01 |
TWI399865B TWI399865B (zh) | 2013-06-21 |
Family
ID=36658681
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095112045A TWI399865B (zh) | 2005-04-05 | 2006-04-04 | 具有降低溫度相依性之鋁銦鎵磷發光二極體 |
Country Status (6)
Country | Link |
---|---|
US (3) | US7244630B2 (zh) |
EP (1) | EP1869716A1 (zh) |
JP (1) | JP5373253B2 (zh) |
CN (1) | CN101180741B (zh) |
TW (1) | TWI399865B (zh) |
WO (1) | WO2006106467A1 (zh) |
Families Citing this family (49)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6958497B2 (en) * | 2001-05-30 | 2005-10-25 | Cree, Inc. | Group III nitride based light emitting diode structures with a quantum well and superlattice, group III nitride based quantum well structures and group III nitride based superlattice structures |
MY142684A (en) | 2003-02-26 | 2010-12-31 | Cree Inc | Composite white light source and method for fabricating |
JP2006525682A (ja) | 2003-04-30 | 2006-11-09 | クリー インコーポレイテッド | 高出力固体発光素子パッケージ |
EP1569263B1 (de) * | 2004-02-27 | 2011-11-23 | OSRAM Opto Semiconductors GmbH | Verfahren zum Verbinden zweier Wafer |
TWI248222B (en) * | 2005-05-12 | 2006-01-21 | Univ Nat Central | Light emitting diode and manufacturing method thereof |
US8148713B2 (en) * | 2008-04-04 | 2012-04-03 | The Regents Of The University Of California | Method for fabrication of semipolar (Al, In, Ga, B)N based light emitting diodes |
JP4225510B2 (ja) * | 2005-07-06 | 2009-02-18 | 昭和電工株式会社 | 化合物半導体発光ダイオードおよびその製造方法 |
DE102006004591A1 (de) * | 2005-09-29 | 2007-04-05 | Osram Opto Semiconductors Gmbh | Strahlungsemittierender Halbleiterchip |
DE102005047152A1 (de) * | 2005-09-30 | 2007-04-12 | Osram Opto Semiconductors Gmbh | Epitaxiesubstrat, Verfahren zu seiner Herstellung und Verfahren zur Herstellung eines Halbleiterchips |
JP2008159629A (ja) * | 2006-12-20 | 2008-07-10 | Rohm Co Ltd | 光通信用半導体素子 |
KR100818466B1 (ko) * | 2007-02-13 | 2008-04-02 | 삼성전기주식회사 | 반도체 발광소자 |
US20080197369A1 (en) * | 2007-02-20 | 2008-08-21 | Cree, Inc. | Double flip semiconductor device and method for fabrication |
US7683380B2 (en) * | 2007-06-25 | 2010-03-23 | Dicon Fiberoptics, Inc. | High light efficiency solid-state light emitting structure and methods to manufacturing the same |
US20090173956A1 (en) * | 2007-12-14 | 2009-07-09 | Philips Lumileds Lighting Company, Llc | Contact for a semiconductor light emitting device |
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US9431589B2 (en) | 2007-12-14 | 2016-08-30 | Cree, Inc. | Textured encapsulant surface in LED packages |
US8299480B2 (en) * | 2008-03-10 | 2012-10-30 | Kabushiki Kaisha Toshiba | Semiconductor light emitting device and method for manufacturing same, and epitaxial wafer |
TW200950162A (en) * | 2008-04-04 | 2009-12-01 | Univ California | Method for fabrication of semipolar (Al, In, Ga, B)N based light emitting diodes |
JP2011517099A (ja) * | 2008-04-04 | 2011-05-26 | ザ リージェンツ オブ ザ ユニバーシティ オブ カリフォルニア | プレーナー半極性(Al,In,Ga,B)Nベースの発光ダイオード向けMOCVD成長技術 |
JP2010067903A (ja) * | 2008-09-12 | 2010-03-25 | Toshiba Corp | 発光素子 |
TWI373861B (en) * | 2008-12-11 | 2012-10-01 | Nat Univ Tsing Hua | Fabrication method of light emitting element and its light emitting element |
US7972936B1 (en) * | 2009-02-03 | 2011-07-05 | Hrl Laboratories, Llc | Method of fabrication of heterogeneous integrated circuits and devices thereof |
US8017958B2 (en) * | 2009-06-30 | 2011-09-13 | Koninklijke Philips Electronics N.V. | P-contact layer for a III-P semiconductor light emitting device |
FR2953328B1 (fr) * | 2009-12-01 | 2012-03-30 | S O I Tec Silicon On Insulator Tech | Heterostructure pour composants electroniques de puissance, composants optoelectroniques ou photovoltaiques |
KR101039988B1 (ko) * | 2010-03-09 | 2011-06-09 | 엘지이노텍 주식회사 | 발광 소자 및 그 제조방법 |
DE102010014177A1 (de) * | 2010-04-01 | 2011-10-06 | Jenoptik Polymer Systems Gmbh | Oberflächenemittierende Halbleiter-Leuchtdiode |
CN101859860B (zh) * | 2010-05-04 | 2013-04-10 | 厦门市三安光电科技有限公司 | 具有双反射层的铝镓铟磷系发光二极管的制备方法 |
US8536022B2 (en) * | 2010-05-19 | 2013-09-17 | Koninklijke Philips N.V. | Method of growing composite substrate using a relaxed strained layer |
JP5801542B2 (ja) * | 2010-07-13 | 2015-10-28 | 昭和電工株式会社 | 発光ダイオード及び発光ダイオードランプ |
EP2628183A4 (en) * | 2010-10-12 | 2014-04-02 | Alliance Sustainable Energy | III-V BAND WEAPONS IMPORTANT FOR OPTOELECTRONIC COMPONENTS OF HIGH EFFICIENCY |
DE102010052727B4 (de) * | 2010-11-26 | 2019-01-31 | Osram Opto Semiconductors Gmbh | Verfahren zum Herstellen eines optoelektronischen Halbleiterchips und derartiger Halbleiterchip |
JP5608589B2 (ja) * | 2011-03-10 | 2014-10-15 | スタンレー電気株式会社 | 半導体発光素子および半導体発光素子の製造方法 |
TW201340405A (zh) * | 2012-03-30 | 2013-10-01 | Lextar Electronics Corp | 發光二極體 |
CN104241262B (zh) | 2013-06-14 | 2020-11-06 | 惠州科锐半导体照明有限公司 | 发光装置以及显示装置 |
CN104576627B (zh) * | 2013-10-25 | 2018-06-01 | 广东德力光电有限公司 | 一种高显色性白光led结构及其制作方法 |
CN104576628B (zh) * | 2013-10-25 | 2018-04-06 | 广东德力光电有限公司 | 一种新型白光led结构及其制作方法 |
EP2947702B1 (de) * | 2014-05-21 | 2019-03-20 | AZUR SPACE Solar Power GmbH | Solarzellenstapel |
EP3213355B1 (en) | 2014-10-31 | 2020-01-29 | Lumileds Holding B.V. | Phosphor converted led with temperature stable flux and saturated red color point |
WO2017005188A1 (en) * | 2015-07-06 | 2017-01-12 | The Hong Kong University Of Science And Technology | Semiconductor device and method of forming the same |
CN107851699B (zh) * | 2015-09-15 | 2019-06-04 | 信越半导体株式会社 | 发光组件的安装方法 |
US10014271B2 (en) * | 2015-11-20 | 2018-07-03 | Taiwan Semiconductor Manufacturing Company Ltd. | Semiconductor structure and method of manufacturing the same |
US10615311B2 (en) | 2016-04-22 | 2020-04-07 | Lg Innotek Co., Ltd. | Light emitting device and display comprising same |
CN108051951B (zh) * | 2017-12-29 | 2022-12-13 | 西安智盛锐芯半导体科技有限公司 | Led光源、背光模组及液晶显示装置 |
TWI698057B (zh) * | 2018-02-13 | 2020-07-01 | 國立交通大學 | 具有透明導電層之二維光子晶體面射型雷射 |
US11721954B2 (en) | 2019-07-19 | 2023-08-08 | Visual Photonics Epitaxy Co., Ltd. | Vertical cavity surface emitting laser diode (VCSEL) having AlGaAsP layer with compressive strain |
CN110600417B (zh) * | 2019-08-02 | 2022-11-18 | 中国科学院微电子研究所 | 一种GaAs衬底上的外延转移方法及制得的半导体器件 |
US11592166B2 (en) | 2020-05-12 | 2023-02-28 | Feit Electric Company, Inc. | Light emitting device having improved illumination and manufacturing flexibility |
US11876042B2 (en) | 2020-08-03 | 2024-01-16 | Feit Electric Company, Inc. | Omnidirectional flexible light emitting device |
CN114220894A (zh) * | 2021-12-02 | 2022-03-22 | 泉州三安半导体科技有限公司 | 一种不可见光发光二极管及其制备方法 |
Family Cites Families (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3406907B2 (ja) * | 1990-08-20 | 2003-05-19 | 株式会社東芝 | 半導体発光ダイオード |
JP3086748B2 (ja) | 1991-07-26 | 2000-09-11 | 株式会社東芝 | 高電子移動度トランジスタ |
JP3242967B2 (ja) | 1992-01-31 | 2001-12-25 | 株式会社東芝 | 半導体発光素子 |
DE69331816T2 (de) * | 1992-01-31 | 2002-08-29 | Canon Kk | Verfahren zur Herstellung eines Halbleitersubstrats |
JP2758803B2 (ja) | 1992-12-17 | 1998-05-28 | 日本電気株式会社 | 電界効果トランジスタ |
US5376580A (en) | 1993-03-19 | 1994-12-27 | Hewlett-Packard Company | Wafer bonding of light emitting diode layers |
JPH07254732A (ja) * | 1994-03-15 | 1995-10-03 | Toshiba Corp | 半導体発光装置 |
GB2293488A (en) | 1994-09-20 | 1996-03-27 | Hewlett Packard Co | Alingap light emitting diodes |
JPH08307005A (ja) * | 1995-05-10 | 1996-11-22 | Hitachi Ltd | 半導体レーザ素子 |
EP0757377B1 (en) * | 1995-08-02 | 2003-04-09 | Canon Kabushiki Kaisha | Semiconductor substrate and fabrication method for the same |
US6233264B1 (en) * | 1996-08-27 | 2001-05-15 | Ricoh Company, Ltd. | Optical semiconductor device having an active layer containing N |
US6072196A (en) * | 1996-09-05 | 2000-06-06 | Ricoh Company, Ltd. | semiconductor light emitting devices |
TW497759U (en) * | 1997-03-13 | 2002-08-01 | Rohm Co Ltd | Semiconductor light emitting device |
US6232138B1 (en) | 1997-12-01 | 2001-05-15 | Massachusetts Institute Of Technology | Relaxed InxGa(1-x)as buffers |
JP3253267B2 (ja) * | 1997-12-05 | 2002-02-04 | ローム株式会社 | 半導体発光素子 |
US6100544A (en) * | 1998-05-20 | 2000-08-08 | Visual Photonics Epitaxy Co., Ltd. | Light-emitting diode having a layer of AlGaInP graded composition |
US6194742B1 (en) | 1998-06-05 | 2001-02-27 | Lumileds Lighting, U.S., Llc | Strain engineered and impurity controlled III-V nitride semiconductor films and optoelectronic devices |
JP2000068554A (ja) * | 1998-08-21 | 2000-03-03 | Sharp Corp | 半導体発光素子 |
JP3525061B2 (ja) * | 1998-09-25 | 2004-05-10 | 株式会社東芝 | 半導体発光素子の製造方法 |
JP2000124092A (ja) | 1998-10-16 | 2000-04-28 | Shin Etsu Handotai Co Ltd | 水素イオン注入剥離法によってsoiウエーハを製造する方法およびこの方法で製造されたsoiウエーハ |
JP4286983B2 (ja) * | 1999-07-27 | 2009-07-01 | 昭和電工株式会社 | AlGaInP発光ダイオード |
DE10008583A1 (de) * | 2000-02-24 | 2001-09-13 | Osram Opto Semiconductors Gmbh | Verfahren zum Herstellen eines optisch transparenten Substrates und Verfahren zum Herstellen eines lichtemittierenden Halbleiterchips |
JP4024994B2 (ja) * | 2000-06-30 | 2007-12-19 | 株式会社東芝 | 半導体発光素子 |
JP2002026393A (ja) * | 2000-06-30 | 2002-01-25 | Toshiba Corp | 半導体発光素子およびそれを用いた表示装置 |
JP2002111052A (ja) * | 2000-09-28 | 2002-04-12 | Toshiba Corp | 半導体発光素子及びその製造方法 |
US6525335B1 (en) * | 2000-11-06 | 2003-02-25 | Lumileds Lighting, U.S., Llc | Light emitting semiconductor devices including wafer bonded heterostructures |
US7968362B2 (en) * | 2001-03-27 | 2011-06-28 | Ricoh Company, Ltd. | Semiconductor light-emitting device, surface-emission laser diode, and production apparatus thereof, production method, optical module and optical telecommunication system |
JP4084620B2 (ja) * | 2001-09-27 | 2008-04-30 | 信越半導体株式会社 | 発光素子及び発光素子の製造方法 |
US20030089921A1 (en) * | 2001-11-13 | 2003-05-15 | Motorola, Inc | Structure and method for fabricating semiconductor structures and devices utilizing the formation of a compliant substrate having a niobium concentration |
AU2002366856A1 (en) * | 2001-12-21 | 2003-07-09 | Aixtron Ag | Method for depositing iii-v semiconductor layers on a non-iii-v substrate |
US6777257B2 (en) * | 2002-05-17 | 2004-08-17 | Shin-Etsu Handotai Co., Ltd. | Method of fabricating a light emitting device and light emitting device |
EP1385199A1 (en) * | 2002-07-24 | 2004-01-28 | IMEC vzw, Interuniversitair Microelectronica Centrum vzw | Method for making thin film devices intended for solar cells or SOI application |
JP2004128452A (ja) * | 2002-07-31 | 2004-04-22 | Shin Etsu Handotai Co Ltd | 発光素子の製造方法及び発光素子 |
JP3872398B2 (ja) * | 2002-08-07 | 2007-01-24 | 信越半導体株式会社 | 発光素子の製造方法及び発光素子 |
FR2845523B1 (fr) * | 2002-10-07 | 2005-10-28 | Procede pour realiser un substrat par transfert d'une plaquette donneuse comportant des especes etrangeres, et plaquette donneuse associee | |
US6927412B2 (en) * | 2002-11-21 | 2005-08-09 | Ricoh Company, Ltd. | Semiconductor light emitter |
JP4500516B2 (ja) * | 2002-12-13 | 2010-07-14 | 三菱電機株式会社 | 半導体レーザ素子およびその製造方法 |
JP4140007B2 (ja) * | 2003-04-28 | 2008-08-27 | 信越半導体株式会社 | 発光素子及び発光素子の製造方法 |
US7119377B2 (en) * | 2004-06-18 | 2006-10-10 | 3M Innovative Properties Company | II-VI/III-V layered construction on InP substrate |
TW200707799A (en) * | 2005-04-21 | 2007-02-16 | Aonex Technologies Inc | Bonded intermediate substrate and method of making same |
-
2005
- 2005-04-05 US US11/100,080 patent/US7244630B2/en active Active
-
2006
- 2006-04-03 CN CN2006800111629A patent/CN101180741B/zh active Active
- 2006-04-03 EP EP06727802A patent/EP1869716A1/en not_active Ceased
- 2006-04-03 WO PCT/IB2006/051000 patent/WO2006106467A1/en not_active Application Discontinuation
- 2006-04-04 TW TW095112045A patent/TWI399865B/zh active
- 2006-04-05 JP JP2006128666A patent/JP5373253B2/ja active Active
-
2007
- 2007-02-06 US US11/672,003 patent/US7544525B2/en active Active
-
2009
- 2009-04-30 US US12/433,106 patent/US7863631B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN101180741B (zh) | 2010-05-19 |
US7544525B2 (en) | 2009-06-09 |
US20060220031A1 (en) | 2006-10-05 |
CN101180741A (zh) | 2008-05-14 |
TWI399865B (zh) | 2013-06-21 |
EP1869716A1 (en) | 2007-12-26 |
JP5373253B2 (ja) | 2013-12-18 |
US20070131961A1 (en) | 2007-06-14 |
US7244630B2 (en) | 2007-07-17 |
WO2006106467A1 (en) | 2006-10-12 |
US7863631B2 (en) | 2011-01-04 |
US20090230381A1 (en) | 2009-09-17 |
JP2006352089A (ja) | 2006-12-28 |
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