TW200705715A - Allngap LED having reduced temperature dependence - Google Patents

Allngap LED having reduced temperature dependence

Info

Publication number
TW200705715A
TW200705715A TW095112045A TW95112045A TW200705715A TW 200705715 A TW200705715 A TW 200705715A TW 095112045 A TW095112045 A TW 095112045A TW 95112045 A TW95112045 A TW 95112045A TW 200705715 A TW200705715 A TW 200705715A
Authority
TW
Taiwan
Prior art keywords
layer
alingap
lattice constant
ingaas
ingap
Prior art date
Application number
TW095112045A
Other languages
English (en)
Other versions
TWI399865B (zh
Inventor
Michael R Krames
Nathan F Gardner
Frank M Steranka
Original Assignee
Philips Lumileds Lighting Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Lumileds Lighting Co filed Critical Philips Lumileds Lighting Co
Publication of TW200705715A publication Critical patent/TW200705715A/zh
Application granted granted Critical
Publication of TWI399865B publication Critical patent/TWI399865B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/26Materials of the light emitting region
    • H01L33/30Materials of the light emitting region containing only elements of group III and group V of the periodic system
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/13Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00011Not relevant to the scope of the group, the symbol of which is combined with the symbol of this group
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Led Devices (AREA)
  • Recrystallisation Techniques (AREA)
TW095112045A 2005-04-05 2006-04-04 具有降低溫度相依性之鋁銦鎵磷發光二極體 TWI399865B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/100,080 US7244630B2 (en) 2005-04-05 2005-04-05 A1InGaP LED having reduced temperature dependence

Publications (2)

Publication Number Publication Date
TW200705715A true TW200705715A (en) 2007-02-01
TWI399865B TWI399865B (zh) 2013-06-21

Family

ID=36658681

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095112045A TWI399865B (zh) 2005-04-05 2006-04-04 具有降低溫度相依性之鋁銦鎵磷發光二極體

Country Status (6)

Country Link
US (3) US7244630B2 (zh)
EP (1) EP1869716A1 (zh)
JP (1) JP5373253B2 (zh)
CN (1) CN101180741B (zh)
TW (1) TWI399865B (zh)
WO (1) WO2006106467A1 (zh)

Families Citing this family (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6958497B2 (en) * 2001-05-30 2005-10-25 Cree, Inc. Group III nitride based light emitting diode structures with a quantum well and superlattice, group III nitride based quantum well structures and group III nitride based superlattice structures
MY142684A (en) 2003-02-26 2010-12-31 Cree Inc Composite white light source and method for fabricating
JP2006525682A (ja) 2003-04-30 2006-11-09 クリー インコーポレイテッド 高出力固体発光素子パッケージ
EP1569263B1 (de) * 2004-02-27 2011-11-23 OSRAM Opto Semiconductors GmbH Verfahren zum Verbinden zweier Wafer
TWI248222B (en) * 2005-05-12 2006-01-21 Univ Nat Central Light emitting diode and manufacturing method thereof
US8148713B2 (en) * 2008-04-04 2012-04-03 The Regents Of The University Of California Method for fabrication of semipolar (Al, In, Ga, B)N based light emitting diodes
JP4225510B2 (ja) * 2005-07-06 2009-02-18 昭和電工株式会社 化合物半導体発光ダイオードおよびその製造方法
DE102006004591A1 (de) * 2005-09-29 2007-04-05 Osram Opto Semiconductors Gmbh Strahlungsemittierender Halbleiterchip
DE102005047152A1 (de) * 2005-09-30 2007-04-12 Osram Opto Semiconductors Gmbh Epitaxiesubstrat, Verfahren zu seiner Herstellung und Verfahren zur Herstellung eines Halbleiterchips
JP2008159629A (ja) * 2006-12-20 2008-07-10 Rohm Co Ltd 光通信用半導体素子
KR100818466B1 (ko) * 2007-02-13 2008-04-02 삼성전기주식회사 반도체 발광소자
US20080197369A1 (en) * 2007-02-20 2008-08-21 Cree, Inc. Double flip semiconductor device and method for fabrication
US7683380B2 (en) * 2007-06-25 2010-03-23 Dicon Fiberoptics, Inc. High light efficiency solid-state light emitting structure and methods to manufacturing the same
US20090173956A1 (en) * 2007-12-14 2009-07-09 Philips Lumileds Lighting Company, Llc Contact for a semiconductor light emitting device
US8692286B2 (en) 2007-12-14 2014-04-08 Philips Lumileds Lighing Company LLC Light emitting device with bonded interface
US9431589B2 (en) 2007-12-14 2016-08-30 Cree, Inc. Textured encapsulant surface in LED packages
US8299480B2 (en) * 2008-03-10 2012-10-30 Kabushiki Kaisha Toshiba Semiconductor light emitting device and method for manufacturing same, and epitaxial wafer
TW200950162A (en) * 2008-04-04 2009-12-01 Univ California Method for fabrication of semipolar (Al, In, Ga, B)N based light emitting diodes
JP2011517099A (ja) * 2008-04-04 2011-05-26 ザ リージェンツ オブ ザ ユニバーシティ オブ カリフォルニア プレーナー半極性(Al,In,Ga,B)Nベースの発光ダイオード向けMOCVD成長技術
JP2010067903A (ja) * 2008-09-12 2010-03-25 Toshiba Corp 発光素子
TWI373861B (en) * 2008-12-11 2012-10-01 Nat Univ Tsing Hua Fabrication method of light emitting element and its light emitting element
US7972936B1 (en) * 2009-02-03 2011-07-05 Hrl Laboratories, Llc Method of fabrication of heterogeneous integrated circuits and devices thereof
US8017958B2 (en) * 2009-06-30 2011-09-13 Koninklijke Philips Electronics N.V. P-contact layer for a III-P semiconductor light emitting device
FR2953328B1 (fr) * 2009-12-01 2012-03-30 S O I Tec Silicon On Insulator Tech Heterostructure pour composants electroniques de puissance, composants optoelectroniques ou photovoltaiques
KR101039988B1 (ko) * 2010-03-09 2011-06-09 엘지이노텍 주식회사 발광 소자 및 그 제조방법
DE102010014177A1 (de) * 2010-04-01 2011-10-06 Jenoptik Polymer Systems Gmbh Oberflächenemittierende Halbleiter-Leuchtdiode
CN101859860B (zh) * 2010-05-04 2013-04-10 厦门市三安光电科技有限公司 具有双反射层的铝镓铟磷系发光二极管的制备方法
US8536022B2 (en) * 2010-05-19 2013-09-17 Koninklijke Philips N.V. Method of growing composite substrate using a relaxed strained layer
JP5801542B2 (ja) * 2010-07-13 2015-10-28 昭和電工株式会社 発光ダイオード及び発光ダイオードランプ
EP2628183A4 (en) * 2010-10-12 2014-04-02 Alliance Sustainable Energy III-V BAND WEAPONS IMPORTANT FOR OPTOELECTRONIC COMPONENTS OF HIGH EFFICIENCY
DE102010052727B4 (de) * 2010-11-26 2019-01-31 Osram Opto Semiconductors Gmbh Verfahren zum Herstellen eines optoelektronischen Halbleiterchips und derartiger Halbleiterchip
JP5608589B2 (ja) * 2011-03-10 2014-10-15 スタンレー電気株式会社 半導体発光素子および半導体発光素子の製造方法
TW201340405A (zh) * 2012-03-30 2013-10-01 Lextar Electronics Corp 發光二極體
CN104241262B (zh) 2013-06-14 2020-11-06 惠州科锐半导体照明有限公司 发光装置以及显示装置
CN104576627B (zh) * 2013-10-25 2018-06-01 广东德力光电有限公司 一种高显色性白光led结构及其制作方法
CN104576628B (zh) * 2013-10-25 2018-04-06 广东德力光电有限公司 一种新型白光led结构及其制作方法
EP2947702B1 (de) * 2014-05-21 2019-03-20 AZUR SPACE Solar Power GmbH Solarzellenstapel
EP3213355B1 (en) 2014-10-31 2020-01-29 Lumileds Holding B.V. Phosphor converted led with temperature stable flux and saturated red color point
WO2017005188A1 (en) * 2015-07-06 2017-01-12 The Hong Kong University Of Science And Technology Semiconductor device and method of forming the same
CN107851699B (zh) * 2015-09-15 2019-06-04 信越半导体株式会社 发光组件的安装方法
US10014271B2 (en) * 2015-11-20 2018-07-03 Taiwan Semiconductor Manufacturing Company Ltd. Semiconductor structure and method of manufacturing the same
US10615311B2 (en) 2016-04-22 2020-04-07 Lg Innotek Co., Ltd. Light emitting device and display comprising same
CN108051951B (zh) * 2017-12-29 2022-12-13 西安智盛锐芯半导体科技有限公司 Led光源、背光模组及液晶显示装置
TWI698057B (zh) * 2018-02-13 2020-07-01 國立交通大學 具有透明導電層之二維光子晶體面射型雷射
US11721954B2 (en) 2019-07-19 2023-08-08 Visual Photonics Epitaxy Co., Ltd. Vertical cavity surface emitting laser diode (VCSEL) having AlGaAsP layer with compressive strain
CN110600417B (zh) * 2019-08-02 2022-11-18 中国科学院微电子研究所 一种GaAs衬底上的外延转移方法及制得的半导体器件
US11592166B2 (en) 2020-05-12 2023-02-28 Feit Electric Company, Inc. Light emitting device having improved illumination and manufacturing flexibility
US11876042B2 (en) 2020-08-03 2024-01-16 Feit Electric Company, Inc. Omnidirectional flexible light emitting device
CN114220894A (zh) * 2021-12-02 2022-03-22 泉州三安半导体科技有限公司 一种不可见光发光二极管及其制备方法

Family Cites Families (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3406907B2 (ja) * 1990-08-20 2003-05-19 株式会社東芝 半導体発光ダイオード
JP3086748B2 (ja) 1991-07-26 2000-09-11 株式会社東芝 高電子移動度トランジスタ
JP3242967B2 (ja) 1992-01-31 2001-12-25 株式会社東芝 半導体発光素子
DE69331816T2 (de) * 1992-01-31 2002-08-29 Canon Kk Verfahren zur Herstellung eines Halbleitersubstrats
JP2758803B2 (ja) 1992-12-17 1998-05-28 日本電気株式会社 電界効果トランジスタ
US5376580A (en) 1993-03-19 1994-12-27 Hewlett-Packard Company Wafer bonding of light emitting diode layers
JPH07254732A (ja) * 1994-03-15 1995-10-03 Toshiba Corp 半導体発光装置
GB2293488A (en) 1994-09-20 1996-03-27 Hewlett Packard Co Alingap light emitting diodes
JPH08307005A (ja) * 1995-05-10 1996-11-22 Hitachi Ltd 半導体レーザ素子
EP0757377B1 (en) * 1995-08-02 2003-04-09 Canon Kabushiki Kaisha Semiconductor substrate and fabrication method for the same
US6233264B1 (en) * 1996-08-27 2001-05-15 Ricoh Company, Ltd. Optical semiconductor device having an active layer containing N
US6072196A (en) * 1996-09-05 2000-06-06 Ricoh Company, Ltd. semiconductor light emitting devices
TW497759U (en) * 1997-03-13 2002-08-01 Rohm Co Ltd Semiconductor light emitting device
US6232138B1 (en) 1997-12-01 2001-05-15 Massachusetts Institute Of Technology Relaxed InxGa(1-x)as buffers
JP3253267B2 (ja) * 1997-12-05 2002-02-04 ローム株式会社 半導体発光素子
US6100544A (en) * 1998-05-20 2000-08-08 Visual Photonics Epitaxy Co., Ltd. Light-emitting diode having a layer of AlGaInP graded composition
US6194742B1 (en) 1998-06-05 2001-02-27 Lumileds Lighting, U.S., Llc Strain engineered and impurity controlled III-V nitride semiconductor films and optoelectronic devices
JP2000068554A (ja) * 1998-08-21 2000-03-03 Sharp Corp 半導体発光素子
JP3525061B2 (ja) * 1998-09-25 2004-05-10 株式会社東芝 半導体発光素子の製造方法
JP2000124092A (ja) 1998-10-16 2000-04-28 Shin Etsu Handotai Co Ltd 水素イオン注入剥離法によってsoiウエーハを製造する方法およびこの方法で製造されたsoiウエーハ
JP4286983B2 (ja) * 1999-07-27 2009-07-01 昭和電工株式会社 AlGaInP発光ダイオード
DE10008583A1 (de) * 2000-02-24 2001-09-13 Osram Opto Semiconductors Gmbh Verfahren zum Herstellen eines optisch transparenten Substrates und Verfahren zum Herstellen eines lichtemittierenden Halbleiterchips
JP4024994B2 (ja) * 2000-06-30 2007-12-19 株式会社東芝 半導体発光素子
JP2002026393A (ja) * 2000-06-30 2002-01-25 Toshiba Corp 半導体発光素子およびそれを用いた表示装置
JP2002111052A (ja) * 2000-09-28 2002-04-12 Toshiba Corp 半導体発光素子及びその製造方法
US6525335B1 (en) * 2000-11-06 2003-02-25 Lumileds Lighting, U.S., Llc Light emitting semiconductor devices including wafer bonded heterostructures
US7968362B2 (en) * 2001-03-27 2011-06-28 Ricoh Company, Ltd. Semiconductor light-emitting device, surface-emission laser diode, and production apparatus thereof, production method, optical module and optical telecommunication system
JP4084620B2 (ja) * 2001-09-27 2008-04-30 信越半導体株式会社 発光素子及び発光素子の製造方法
US20030089921A1 (en) * 2001-11-13 2003-05-15 Motorola, Inc Structure and method for fabricating semiconductor structures and devices utilizing the formation of a compliant substrate having a niobium concentration
AU2002366856A1 (en) * 2001-12-21 2003-07-09 Aixtron Ag Method for depositing iii-v semiconductor layers on a non-iii-v substrate
US6777257B2 (en) * 2002-05-17 2004-08-17 Shin-Etsu Handotai Co., Ltd. Method of fabricating a light emitting device and light emitting device
EP1385199A1 (en) * 2002-07-24 2004-01-28 IMEC vzw, Interuniversitair Microelectronica Centrum vzw Method for making thin film devices intended for solar cells or SOI application
JP2004128452A (ja) * 2002-07-31 2004-04-22 Shin Etsu Handotai Co Ltd 発光素子の製造方法及び発光素子
JP3872398B2 (ja) * 2002-08-07 2007-01-24 信越半導体株式会社 発光素子の製造方法及び発光素子
FR2845523B1 (fr) * 2002-10-07 2005-10-28 Procede pour realiser un substrat par transfert d'une plaquette donneuse comportant des especes etrangeres, et plaquette donneuse associee
US6927412B2 (en) * 2002-11-21 2005-08-09 Ricoh Company, Ltd. Semiconductor light emitter
JP4500516B2 (ja) * 2002-12-13 2010-07-14 三菱電機株式会社 半導体レーザ素子およびその製造方法
JP4140007B2 (ja) * 2003-04-28 2008-08-27 信越半導体株式会社 発光素子及び発光素子の製造方法
US7119377B2 (en) * 2004-06-18 2006-10-10 3M Innovative Properties Company II-VI/III-V layered construction on InP substrate
TW200707799A (en) * 2005-04-21 2007-02-16 Aonex Technologies Inc Bonded intermediate substrate and method of making same

Also Published As

Publication number Publication date
CN101180741B (zh) 2010-05-19
US7544525B2 (en) 2009-06-09
US20060220031A1 (en) 2006-10-05
CN101180741A (zh) 2008-05-14
TWI399865B (zh) 2013-06-21
EP1869716A1 (en) 2007-12-26
JP5373253B2 (ja) 2013-12-18
US20070131961A1 (en) 2007-06-14
US7244630B2 (en) 2007-07-17
WO2006106467A1 (en) 2006-10-12
US7863631B2 (en) 2011-01-04
US20090230381A1 (en) 2009-09-17
JP2006352089A (ja) 2006-12-28

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