GB2293488A - Alingap light emitting diodes - Google Patents

Alingap light emitting diodes Download PDF

Info

Publication number
GB2293488A
GB2293488A GB9517879A GB9517879A GB2293488A GB 2293488 A GB2293488 A GB 2293488A GB 9517879 A GB9517879 A GB 9517879A GB 9517879 A GB9517879 A GB 9517879A GB 2293488 A GB2293488 A GB 2293488A
Authority
GB
United Kingdom
Prior art keywords
substrate
light emitting
semiconductor device
ingaas
emitting diodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB9517879A
Other versions
GB9517879D0 (en
Inventor
Frank M Steranka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HP Inc
Original Assignee
Hewlett Packard Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hewlett Packard Co filed Critical Hewlett Packard Co
Publication of GB9517879D0 publication Critical patent/GB9517879D0/en
Publication of GB2293488A publication Critical patent/GB2293488A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/26Materials of the light emitting region
    • H01L33/30Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Led Devices (AREA)

Abstract

Quarternary AlInGaP light emitting diodes grown lattice-matched to an In-0.08Ga-.92As substrate. The diodes exhibit a substantial improvement in light emitting efficiency in the yellow to green portion of the visible spectrum

Description

AlinGaP Light Emitting Diodes This invention is in the field of semiconductor devices and their fabrication. In particular it relates to fabricating light emitting diodes ("LEDs") with acceptable light output at shorter wavelengths.
Very high efficiency AlInGaP LEDs are known. Herein, the term "high efficiency" means that a large percentage of the electrical energy applied to the LED is converted into light.
These LEDs are typically grown so that their lattice constant matches that of their GaAs substrate. Metalorganic chemical vapor deposition ("MOCVD") is used to grow these LEDs.
Quaternary AlInGaP switches from being a direct bandgap semiconductor, which generates light efficiently, to an indirect bandgap semiconductor, which generates light very inefficiently, at a composition that corresponds to light emission in the green portion of the visible spectrum. The result is a precipitous drop in the light generation efficiency as the emission wavelength of the LED changes from about 590 nanometers (amber light) to light of shorter wavelengths.
The first embodiment of the present invention comprises quaternary AlInGaP LEDs grown lattice-matched an InOoaGa- 95 An substrate. LEDs grown in this manner experience a cross over from direct bandgap to indirect bandgap at a slightly higher energy level than when a GaAs substrate is used. This small increase in the energy at which the direct to indirect cross-over occurs results in a substantial improvement in the light emission efficiency in the yellow to green portions of the visible spectrum.
High quality films of InxGalxAs can be grown on GaAs by MOCVD, molecular beam epitaxy ("MBE") or hydride vapor phase epitaxy ("VPE"), especially if the In mole fraction is low.
Such a film could be used as a "pseudo-substrate" if bulk InxGalxAs substrates can not be obtained.
The present invention will now be described in detail with reference to an exemplary embodiment described with reference to Fig. 1 which is a graph showing the relationship between lattice constant, energy gap and wavelength of emitted light for a range of III-V materials.
As shown in Fig. 1, the crossover point from a direct bandgap semiconductor to an indirect semiconductor occurs at a slightly higher energy gap if quaternary AllnGaP is grown lattice-matched to ln.,,8Ga gAs, as opposed to pure GaAs. Although the energy gap difference appears small, any increase in the energy gap at which AlInGaP changes from direct to indirect bandgap results in a large improvement in light emission efficiency in the green to yellow portion of the visible spectrum. The human eye being very color sensitive, moving the emitted light's wavelength from 570 to 560 nanometers results in changing the perceived color from a yellow/green to a deeper green.
Although InxGaXxAs substrates have been produced in bulk substrate form and can be purchased(e.g., from Crystallod Inc.
of Martinsville, N.J.), they are not readily available. High quality films of InxGalxAs can, however, be grown on GaAs by MOCVD, MBE, or hydride VPE, especially at low In mole fractions. Growing AlInGaP LED structures on In00sGa 92As films or substrates, if available, so that the LEDs and the films or substrates are lattice matched, achieves higher quantum efficiencies in the green-yellow portion of the visible spectrum than in the known art. The lattice constants of the LED structure and the films/substrates should match to within approximately 1%.
The optimum Indium mole fraction x of the InxGalxAs substrate or film is unknown but should be within the 0.04 to 0.12 range. The quality of the material is also important, as high quality films or substrates will perform well near the cross-over point between direct and indirect bandgap semiconductors.

Claims (10)

1. A method for making light emitting diodes comprising the steps of: growing an InGaAs substrate; growing an active region comprising at least a first P-N junction from Al InGaP on the InGaAs substrate; and forming a cathode and anode contact on the substrate and Al InGaP region, respectively.
2. The method of claim 1 wherein the lattice constant of the substrate and the lattice constant of the active region are within about 1% of one another.
3. The method of claim 2 wherein the mole fraction of In in the substrate is between 0.04 and 0.12.
4. The method of claim 3 wherein the InGaAs substrate is an InGaAs film.
5. A semiconductor device comprising: an InGaAs substrate; and an AllnGaP active region.
6. The semiconductor device of claim 5 wherein the lattice constant of the substrate and the lattice constant of the active region are matched to within 1%.
7. The semiconductor device of claim 6 wherein the mole fraction of In in the substrate is between 0.04 and 0.12.
8. The semiconductor device of claim 7 wherein the substrate comprises an InGaAs ilm.
9. The semiconductor device of any of claims 5 to 8 wherein the device is a light emitting diode.
10. The semiconductor device of claim 9 wherein the substrate comprises In0.08Ga0.92As .
GB9517879A 1994-09-20 1995-09-01 Alingap light emitting diodes Withdrawn GB2293488A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US30935094A 1994-09-20 1994-09-20

Publications (2)

Publication Number Publication Date
GB9517879D0 GB9517879D0 (en) 1995-11-01
GB2293488A true GB2293488A (en) 1996-03-27

Family

ID=23197856

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9517879A Withdrawn GB2293488A (en) 1994-09-20 1995-09-01 Alingap light emitting diodes

Country Status (2)

Country Link
JP (1) JPH08306957A (en)
GB (1) GB2293488A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7244630B2 (en) 2005-04-05 2007-07-17 Philips Lumileds Lighting Company, Llc A1InGaP LED having reduced temperature dependence

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002043696A (en) * 2000-07-26 2002-02-08 Fujitsu Ltd Semiconductor laser device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0416128A1 (en) * 1989-03-17 1991-03-13 Sumitomo Electric Industries Limited Wafer of compound semiconductor

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0416128A1 (en) * 1989-03-17 1991-03-13 Sumitomo Electric Industries Limited Wafer of compound semiconductor

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7244630B2 (en) 2005-04-05 2007-07-17 Philips Lumileds Lighting Company, Llc A1InGaP LED having reduced temperature dependence
EP1869716A1 (en) * 2005-04-05 2007-12-26 LumiLeds Lighting U.S., LLC Allngap led having reduced temperature dependence
US7544525B2 (en) 2005-04-05 2009-06-09 Philips Lumileds Lighting Co., Llc AllnGaP LED having reduced temperature dependence
US7863631B2 (en) 2005-04-05 2011-01-04 Koninklijke Philips Electronics N.V. A1InGaP LED having reduced temperature dependence

Also Published As

Publication number Publication date
JPH08306957A (en) 1996-11-22
GB9517879D0 (en) 1995-11-01

Similar Documents

Publication Publication Date Title
US5481122A (en) Surface light emitting diode with electrically conductive window layer
US20040079960A1 (en) Semiconductor light emitting device and method for producing the same
JP3643665B2 (en) Semiconductor light emitting device
US20020110172A1 (en) Efficiency GaN-based light emitting devices
JP3143662B2 (en) Opto-electronic semiconductor devices
US5300791A (en) Light emitting diode
JPH04219984A (en) Four-dimentional groupii-vi material for photon device
US6489175B1 (en) Electrically pumped long-wavelength VCSEL and methods of fabrication
US5204284A (en) Method of making a high band-gap opto-electronic device
JPH0897468A (en) Semiconductor light emitting device
JP2628801B2 (en) Semiconductor laser structure
US7679165B2 (en) High brightness light emitting diode with a bidirectionally angled substrate
KR20030001405A (en) Thin semiconductor GaInN layer, method for preparing same, light-emitting diode comprising said layer and illumination device
JP2875124B2 (en) Semiconductor light emitting device and method of manufacturing the same
JPH05275744A (en) Hetero-superlattice p-n junction
JPH06342936A (en) Algainp light-emitting device
US5250814A (en) Semiconductor light-emitting devices
JPH1117219A (en) Semiconductor light-emitting device having dh structure
GB2293488A (en) Alingap light emitting diodes
Chang et al. High-brightness AlGaInP 573-nm light-emitting diode with a chirped multiquantum barrier
US5091758A (en) Semiconductor light-emitting devices
US4284467A (en) Method for making semiconductor material
US5382813A (en) Light emission diode comprising a pn junction of p-type and n-type A1-containing ZnS compound semiconductor layers
JPH04316374A (en) Semiconductor light-emitting element
JPH08130347A (en) Semiconductor light emitting element and manufacture thereof

Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)