EA201890238A1 - Способ выращивания нанопроволок или нанопирамидок на графитовых подложках - Google Patents

Способ выращивания нанопроволок или нанопирамидок на графитовых подложках

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Publication number
EA201890238A1
EA201890238A1 EA201890238A EA201890238A EA201890238A1 EA 201890238 A1 EA201890238 A1 EA 201890238A1 EA 201890238 A EA201890238 A EA 201890238A EA 201890238 A EA201890238 A EA 201890238A EA 201890238 A1 EA201890238 A1 EA 201890238A1
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EA
Eurasian Patent Office
Prior art keywords
graphite substrate
nanopyramides
nanoproxes
cultivation
nanowires
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Application number
EA201890238A
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English (en)
Inventor
Дон-Чуль Ким
Ида Мари Хёиос
Мазид Мунши
Бъёрн Ове Фимланд
Хельге Веман
Диндин Рен
Даса Дирадж
Original Assignee
Крайонано Ас
НОРВИДЖЕН ЮНИВЕРСИТИ ОФ САЙЕНС ЭНД ТЕКНОЛОДЖИ (ЭнТиЭнЮ)
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Priority claimed from GBGB1513567.6A external-priority patent/GB201513567D0/en
Priority claimed from GBGB1600162.0A external-priority patent/GB201600162D0/en
Application filed by Крайонано Ас, НОРВИДЖЕН ЮНИВЕРСИТИ ОФ САЙЕНС ЭНД ТЕКНОЛОДЖИ (ЭнТиЭнЮ) filed Critical Крайонано Ас
Publication of EA201890238A1 publication Critical patent/EA201890238A1/ru

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    • HELECTRICITY
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    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/02587Structure
    • H01L21/0259Microstructure
    • H01L21/02603Nanowires
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    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02436Intermediate layers between substrates and deposited layers
    • H01L21/02439Materials
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    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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    • H01L21/02365Forming inorganic semiconducting materials on a substrate
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  • Crystals, And After-Treatments Of Crystals (AREA)
  • Led Devices (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Photovoltaic Devices (AREA)
  • Light Receiving Elements (AREA)

Abstract

Способ выращивания нанопроволок или нанопирамидок, включающий (I) предоставление графитовой подложки и осаждение AlGaN, InGaN, AlN или AlGa(In)N на указанную графитовую подложку при повышенной температуре с образованием буферного слоя или островков образования зародышей наномасштаба из указанных соединений, (II) выращивание множества полупроводниковых нанопроволок или нанопирамидок группы III-V, предпочтительно III-нитридных нанопроволок или нанопирамидок, на указанном буферном слое или на островках образования зародышей на графитовой подложке, предпочтительно посредством ГЭМПО или МПЭ.
EA201890238A 2015-07-31 2016-08-01 Способ выращивания нанопроволок или нанопирамидок на графитовых подложках EA201890238A1 (ru)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GBGB1513567.6A GB201513567D0 (en) 2015-07-31 2015-07-31 Processes for growing nanowires
GBGB1600162.0A GB201600162D0 (en) 2016-01-05 2016-01-05 Processes for growing nanowires or nanopyramids
PCT/EP2016/068350 WO2017021380A1 (en) 2015-07-31 2016-08-01 Process for growing nanowires or nanopyramids on graphitic substrates

Publications (1)

Publication Number Publication Date
EA201890238A1 true EA201890238A1 (ru) 2018-08-31

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Country Status (11)

Country Link
US (2) US10714337B2 (ru)
EP (2) EP3329509A1 (ru)
JP (1) JP7009358B2 (ru)
KR (1) KR102698244B1 (ru)
CN (1) CN108156828A (ru)
AU (2) AU2016302692B2 (ru)
BR (1) BR112018001815A2 (ru)
CA (1) CA2993884A1 (ru)
EA (1) EA201890238A1 (ru)
TW (1) TWI711072B (ru)
WO (1) WO2017021380A1 (ru)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3048817B1 (fr) * 2016-03-11 2018-06-15 Valeo Comfort And Driving Assistance Ecran et afficheur tete haute comprenant un tel ecran
CN106206212A (zh) * 2016-07-25 2016-12-07 六盘水师范学院 一种生长可控AlN有序纳米阵列的方法
GB201701829D0 (en) 2017-02-03 2017-03-22 Norwegian Univ Of Science And Tech (Ntnu) Device
JP6947386B2 (ja) * 2017-06-29 2021-10-13 学校法人 名城大学 半導体発光素子および半導体発光素子の製造方法
FR3070791B1 (fr) * 2017-09-05 2023-04-14 Centre Nat Rech Scient Generateur de faisceau ionique a nanofils
EP3514257A1 (en) 2018-01-18 2019-07-24 Heraeus GMSI LLC Process for manufacturing a silicon carbide coated body
GB2570126B (en) * 2018-01-11 2022-07-27 Paragraf Ltd Graphene based contact layers for electronic devices
CN109003888A (zh) * 2018-07-20 2018-12-14 华南理工大学 硅/石墨烯复合衬底上外延生长GaN纳米柱及制备方法
CN108977887B (zh) * 2018-07-20 2023-11-17 深圳市科创数字显示技术有限公司 单晶氮化铟的生长方法
US11823900B2 (en) 2018-10-10 2023-11-21 The Johns Hopkins University Method for printing wide bandgap semiconductor materials
US11056338B2 (en) 2018-10-10 2021-07-06 The Johns Hopkins University Method for printing wide bandgap semiconductor materials
DE102019111225A1 (de) 2019-04-30 2020-11-05 Forschungsverbund Berlin E.V. Verfahren zur Herstellung eines 2D-Materials, 2D-Material und dessen Anwendungen
CN110190162A (zh) * 2019-06-04 2019-08-30 深圳扑浪创新科技有限公司 一种led芯片的外延结构及其制备方法
CN110364582B (zh) * 2019-06-20 2024-08-16 华南理工大学 一种基于石墨烯模板上AlGaN纳米柱基MSM型紫外探测器及其制备方法
CN110246913B (zh) * 2019-06-21 2024-09-20 华南理工大学 一种InGaN纳米柱阵列基GSG型可调谐光电探测器及其制备方法
CN110284198B (zh) * 2019-07-22 2020-11-10 南京大学 一种控制GaN纳米线结构与形貌的分子束外延生长方法
GB201913701D0 (en) * 2019-09-23 2019-11-06 Crayonano As Composition of matter
CN110993755B (zh) * 2019-12-18 2021-09-21 天津工业大学 电注入三维GaN核壳结构Nano-LED及制造方法
US10930490B1 (en) * 2019-12-26 2021-02-23 Wisconsin Alumni Research Foundation Arrays of high-aspect-ratio germanium nanostructures with nanoscale pitch and methods for the fabrication thereof
US11393682B2 (en) * 2020-03-05 2022-07-19 Microsoft Technology Licensing, Llc Nanowire with reduced defects
CN113451108B (zh) * 2020-03-24 2024-06-25 中国科学院苏州纳米技术与纳米仿生研究所 一种超柔性透明半导体薄膜及其制备方法
US11295983B2 (en) 2020-05-27 2022-04-05 International Business Machines Corporation Transistor having source or drain formation assistance regions with improved bottom isolation
CN112018213B (zh) * 2020-07-20 2022-03-29 烟台南山学院 一种与基底表面具有高粘附力的直立Au纳米锥的制备方法
JP2022056788A (ja) 2020-09-30 2022-04-11 スタンレー電気株式会社 Iii族窒化物半導体ナノ粒子及びその製造方法
CN112614910B (zh) * 2020-12-17 2023-07-21 华南师范大学 一种基于pin型氮化镓微米线的紫外光电探测器及其制备方法
CN117038712B (zh) * 2023-08-21 2024-03-26 西南交通大学 一种二维InGa3(ZnO)m超晶格纳米带及其制备方法

Family Cites Families (137)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4213801A (en) 1979-03-26 1980-07-22 Bell Telephone Laboratories, Incorporated Ohmic contact of N-GaAs to electrical conductive substrates by controlled growth of N-GaAs polycrystalline layers
JP3631157B2 (ja) 2001-03-21 2005-03-23 日本電信電話株式会社 紫外発光ダイオード
WO2002080280A1 (en) 2001-03-30 2002-10-10 The Regents Of The University Of California Methods of fabricating nanostructures and nanowires and devices fabricated therefrom
JP3823784B2 (ja) 2001-09-06 2006-09-20 富士ゼロックス株式会社 ナノワイヤーおよびその製造方法、並びにそれを用いたナノネットワーク、ナノネットワークの製造方法、炭素構造体、電子デバイス
FR2840452B1 (fr) 2002-05-28 2005-10-14 Lumilog Procede de realisation par epitaxie d'un film de nitrure de gallium separe de son substrat
JP3679097B2 (ja) 2002-05-31 2005-08-03 株式会社光波 発光素子
US7594982B1 (en) 2002-06-22 2009-09-29 Nanosolar, Inc. Nanostructured transparent conducting electrode
US7335908B2 (en) 2002-07-08 2008-02-26 Qunano Ab Nanostructures and methods for manufacturing the same
US7608147B2 (en) 2003-04-04 2009-10-27 Qunano Ab Precisely positioned nanowhiskers and nanowhisker arrays and method for preparing them
US7354850B2 (en) 2004-02-06 2008-04-08 Qunano Ab Directionally controlled growth of nanowhiskers
EP1766108A1 (en) 2004-06-25 2007-03-28 Btg International Limited Formation of nanowhiskers on a substrate of dissimilar material
KR100533645B1 (ko) 2004-09-13 2005-12-06 삼성전기주식회사 발광 효율을 개선한 발광 다이오드
GB2418532A (en) 2004-09-28 2006-03-29 Arima Optoelectronic Textured light emitting diode structure with enhanced fill factor
US20070240757A1 (en) 2004-10-15 2007-10-18 The Trustees Of Boston College Solar cells using arrays of optical rectennas
US7939218B2 (en) 2004-12-09 2011-05-10 Nanosys, Inc. Nanowire structures comprising carbon
CA2588548A1 (en) 2004-12-09 2006-06-15 Nanosys, Inc. Nanowire-based membrane electrode assemblies for fuel cells
EP2410582B1 (en) 2005-05-24 2019-09-04 LG Electronics Inc. Nano rod type light emitting diode and method for fabricating a nano rod type light emitting diode
JP4425194B2 (ja) 2005-08-18 2010-03-03 株式会社神戸製鋼所 成膜方法
KR101390619B1 (ko) 2005-11-21 2014-04-30 나노시스, 인크. 탄소를 포함하는 나노배선 구조체
US7570355B2 (en) 2006-01-27 2009-08-04 Hewlett-Packard Development Company, L.P. Nanowire heterostructures and methods of forming the same
US7643136B2 (en) 2006-02-02 2010-01-05 Optilia Instrument Ab Device for inspection of narrow spaces and objects in narrow spaces
WO2008048704A2 (en) * 2006-03-10 2008-04-24 Stc.Unm Pulsed growth of gan nanowires and applications in group iii nitride semiconductor substrate materials and devices
FR2904146B1 (fr) 2006-07-20 2008-10-17 Commissariat Energie Atomique Procede de fabrication d'une nanostructure a base de nanofils interconnectes,nanostructure et utilisation comme convertisseur thermoelectrique
JP4106397B2 (ja) 2006-09-14 2008-06-25 株式会社島津製作所 光または放射線検出器の製造方法
US7442575B2 (en) 2006-09-29 2008-10-28 Texas Christian University Method of manufacturing semiconductor nanowires
JP2008130877A (ja) 2006-11-22 2008-06-05 Sharp Corp 窒化物半導体発光素子の製造方法
WO2008140611A2 (en) 2006-12-18 2008-11-20 The Regents Of The University Of California Nanowire array-based light emitting diodes and lasers
US20080191317A1 (en) 2007-02-13 2008-08-14 International Business Machines Corporation Self-aligned epitaxial growth of semiconductor nanowires
JP2010525557A (ja) 2007-03-28 2010-07-22 クナノ アーベー ナノワイヤ回路構造物
JP2009010012A (ja) 2007-06-26 2009-01-15 Panasonic Electric Works Co Ltd 半導体発光素子、その製造方法及び発光装置
KR100904588B1 (ko) * 2007-07-05 2009-06-25 삼성전자주식회사 코어/쉘 형태의 나노와이어를 제조하는 방법, 그에 의해제조된 나노와이어 및 이를 포함하는 나노와이어 소자
US7714317B2 (en) 2007-08-30 2010-05-11 Brookhaven Science Associates, Llc Assembly of ordered carbon shells on semiconducting nanomaterials
US8084337B2 (en) 2007-10-26 2011-12-27 Qunano Ab Growth of III-V compound semiconductor nanowires on silicon substrates
US8273983B2 (en) 2007-12-21 2012-09-25 Hewlett-Packard Development Company, L.P. Photonic device and method of making same using nanowires
US8435676B2 (en) 2008-01-09 2013-05-07 Nanotek Instruments, Inc. Mixed nano-filament electrode materials for lithium ion batteries
US7871653B2 (en) 2008-01-30 2011-01-18 Ocean Duke Corporation Double-stack shrimp tray
US8129763B2 (en) * 2008-02-07 2012-03-06 International Business Machines Corporation Metal-oxide-semiconductor device including a multiple-layer energy filter
JP5386747B2 (ja) 2008-02-21 2014-01-15 公益財団法人神奈川科学技術アカデミー 半導体基板、半導体素子、発光素子及び電子素子
KR101445877B1 (ko) 2008-03-24 2014-09-29 삼성전자주식회사 산화아연 나노와이어의 제조방법
US7781780B2 (en) 2008-03-31 2010-08-24 Bridgelux, Inc. Light emitting diodes with smooth surface for reflective electrode
TW200952184A (en) 2008-06-03 2009-12-16 Univ Nat Taiwan Structure of mixed type heterojunction thin film solar cells and its manufacturing method
CN103022282B (zh) 2008-07-07 2016-02-03 格罗有限公司 纳米结构led
US8735797B2 (en) 2009-12-08 2014-05-27 Zena Technologies, Inc. Nanowire photo-detector grown on a back-side illuminated image sensor
WO2010056064A2 (ko) 2008-11-13 2010-05-20 주식회사 엘지화학 리튬 이차전지용 비수 전해액 및 이를 구비한 리튬 이차전지
KR101071906B1 (ko) 2008-11-14 2011-10-11 한국과학기술원 단결정 게르마늄코발트 나노와이어, 게르마늄코발트 나노와이어 구조체, 및 이들의 제조방법
JP5453045B2 (ja) 2008-11-26 2014-03-26 株式会社日立製作所 グラフェン層が成長された基板およびそれを用いた電子・光集積回路装置
CN101504961B (zh) 2008-12-16 2010-08-11 华中科技大学 面发射多色发光二极管及其制造方法
US8389387B2 (en) 2009-01-06 2013-03-05 Brookhaven Science Associates, Llc Segmented nanowires displaying locally controllable properties
KR101650310B1 (ko) 2009-01-16 2016-08-24 삼성전자주식회사 도광부재 및 이를 구비하는 제전유닛, 화상형성장치, 화상독취장치
WO2010087853A1 (en) 2009-01-30 2010-08-05 Hewlett-Packard Development Company Photovoltaic structure and solar cell and method of fabrication employing hidden electrode
FR2941688B1 (fr) 2009-01-30 2011-04-01 Commissariat Energie Atomique Procede de formation de nano-fils
KR100995394B1 (ko) 2009-02-18 2010-11-19 한국과학기술원 박막 태양전지의 박막 형성장치
WO2010096035A1 (en) 2009-02-23 2010-08-26 Nanosys, Inc. Nanostructured catalyst supports
WO2010138506A1 (en) 2009-05-26 2010-12-02 Nanosys, Inc. Methods and systems for electric field deposition of nanowires and other devices
WO2010141348A1 (en) 2009-05-31 2010-12-09 College Of William And Mary Method for making polymer composites containing graphene sheets
JP5299105B2 (ja) 2009-06-16 2013-09-25 ソニー株式会社 二酸化バナジウムナノワイヤとその製造方法、及び二酸化バナジウムナノワイヤを用いたナノワイヤデバイス
CN102868498B (zh) 2009-06-18 2015-12-09 华为技术有限公司 码本生成方法、数据传输方法及装置
US8409366B2 (en) 2009-06-23 2013-04-02 Oki Data Corporation Separation method of nitride semiconductor layer, semiconductor device, manufacturing method thereof, semiconductor wafer, and manufacturing method thereof
US9290388B2 (en) 2009-08-03 2016-03-22 Inje University Industry-Academic Cooperation Foundation Carbonaceous nanocomposite having novel structure and fabrication method thereof
US10164135B2 (en) 2009-08-07 2018-12-25 Guardian Glass, LLC Electronic device including graphene-based layer(s), and/or method or making the same
US8507797B2 (en) 2009-08-07 2013-08-13 Guardian Industries Corp. Large area deposition and doping of graphene, and products including the same
JP2011057474A (ja) 2009-09-07 2011-03-24 Univ Of Tokyo 半導体基板、半導体基板の製造方法、半導体成長用基板、半導体成長用基板の製造方法、半導体素子、発光素子、表示パネル、電子素子、太陽電池素子及び電子機器
US20110081500A1 (en) * 2009-10-06 2011-04-07 Tokyo Electron Limited Method of providing stable and adhesive interface between fluorine-based low-k material and metal barrier layer
JP4724256B2 (ja) 2009-10-20 2011-07-13 パナソニック株式会社 発光ダイオード素子およびその製造方法
JP4718652B2 (ja) 2009-10-21 2011-07-06 パナソニック株式会社 太陽電池およびその製造方法
KR20110057989A (ko) * 2009-11-25 2011-06-01 삼성전자주식회사 그래핀과 나노구조체의 복합 구조체 및 그 제조방법
CN101710567A (zh) 2009-11-27 2010-05-19 晶能光电(江西)有限公司 具有复合碳基衬底的氮化镓基半导体器件及其制造方法
US9306099B2 (en) 2009-12-01 2016-04-05 Samsung Electronics Co., Ltd. Material including graphene and an inorganic material and method of manufacturing the material
KR101736972B1 (ko) 2009-12-01 2017-05-19 삼성전자주식회사 그라펜 및 무기물의 적층 구조체 및 이를 구비한 전기소자
WO2011067893A1 (ja) 2009-12-04 2011-06-09 パナソニック株式会社 基板およびその製造方法
WO2011081440A2 (ko) 2009-12-30 2011-07-07 성균관대학교산학협력단 그래핀 필름의 롤투롤 도핑 방법 및 도핑된 그래핀 필름
WO2011090863A1 (en) 2010-01-19 2011-07-28 Eastman Kodak Company Ii-vi core-shell semiconductor nanowires
US8377729B2 (en) 2010-01-19 2013-02-19 Eastman Kodak Company Forming II-VI core-shell semiconductor nanowires
US8212236B2 (en) 2010-01-19 2012-07-03 Eastman Kodak Company II-VI core-shell semiconductor nanowires
US20110240099A1 (en) 2010-03-30 2011-10-06 Ellinger Carolyn R Photovoltaic nanowire device
TWI440074B (zh) 2010-04-02 2014-06-01 Univ Nat Chiao Tung 一種在三族氮化物磊晶過程中降低缺陷產生的方法
CN102859691B (zh) 2010-04-07 2015-06-10 株式会社岛津制作所 放射线检测器及其制造方法
AU2011258422C1 (en) 2010-05-24 2017-03-30 Lummus Technology Llc Nanowire catalysts
WO2011155157A1 (ja) * 2010-06-07 2011-12-15 パナソニック株式会社 太陽電池及びその製造法
AU2011268135B2 (en) 2010-06-18 2014-06-12 Glo Ab Nanowire LED structure and method for manufacturing the same
KR101781552B1 (ko) 2010-06-21 2017-09-27 삼성전자주식회사 보론 및 질소로 치환된 그라핀 및 제조방법과, 이를 구비한 트랜지스터
CN103098216A (zh) 2010-06-24 2013-05-08 Glo公司 具有用于定向纳米线生长的缓冲层的衬底
CA2829242A1 (en) 2010-08-07 2012-02-16 Arjun Daniel Srinivas Device components with surface-embedded additives and related manufacturing methods
CN102376817A (zh) 2010-08-11 2012-03-14 王浩 一种半导体光电器件的制备方法
WO2012067687A2 (en) 2010-08-26 2012-05-24 The Ohio State University Nanoscale emitters with polarization grading
KR20150098246A (ko) 2010-09-01 2015-08-27 샤프 가부시키가이샤 발광 소자 및 그 제조 방법, 발광 장치의 제조 방법, 조명 장치, 백라이트, 표시 장치 및 다이오드
WO2012029381A1 (ja) 2010-09-01 2012-03-08 シャープ株式会社 発光素子およびその製造方法、発光装置の製造方法、照明装置、バックライト、表示装置、並びにダイオード
KR101636915B1 (ko) 2010-09-03 2016-07-07 삼성전자주식회사 그래핀 또는 탄소나노튜브를 이용한 반도체 화합물 구조체 및 그 제조방법과, 반도체 화합물 구조체를 포함하는 반도체 소자
FR2975532B1 (fr) 2011-05-18 2013-05-10 Commissariat Energie Atomique Connexion electrique en serie de nanofils emetteurs de lumiere
KR101691906B1 (ko) 2010-09-14 2017-01-02 삼성전자주식회사 Ⅲ족 질화물 나노로드 발광 소자 제조방법
US8901536B2 (en) 2010-09-21 2014-12-02 The United States Of America, As Represented By The Secretary Of The Navy Transistor having graphene base
KR101802374B1 (ko) 2010-10-05 2017-11-29 삼성전자주식회사 도핑된 그래핀 함유 투명전극, 그의 제조방법, 및 이를 구비하는 표시소자와 태양전지
US8321961B2 (en) 2010-10-07 2012-11-27 International Business Machines Corporation Production scale fabrication method for high resolution AFM tips
KR101217209B1 (ko) 2010-10-07 2012-12-31 서울대학교산학협력단 발광소자 및 그 제조방법
KR101142545B1 (ko) 2010-10-25 2012-05-08 서울대학교산학협력단 태양전지 및 그 제조 방법
US8980862B2 (en) 2010-11-12 2015-03-17 Gentium S.P.A. Defibrotide for use in prophylaxis and/or treatment of Graft versus Host Disease (GVHD)
US20120141799A1 (en) 2010-12-03 2012-06-07 Francis Kub Film on Graphene on a Substrate and Method and Devices Therefor
GB201021112D0 (en) 2010-12-13 2011-01-26 Ntnu Technology Transfer As Nanowires
KR20120065792A (ko) 2010-12-13 2012-06-21 삼성전자주식회사 나노 센서 및 그의 제조 방법
KR20120083084A (ko) 2011-01-17 2012-07-25 삼성엘이디 주식회사 나노 로드 발광 소자 및 그 제조 방법
KR101227600B1 (ko) 2011-02-11 2013-01-29 서울대학교산학협력단 그래핀-나노와이어 하이브리드 구조체에 기반한 광센서 및 이의 제조방법
US8591990B2 (en) 2011-03-25 2013-11-26 GM Global Technology Operations LLC Microfiber supported metal silicide nanowires
JP2012230969A (ja) 2011-04-25 2012-11-22 Sumitomo Electric Ind Ltd GaN系半導体デバイスの製造方法
CN103826840B (zh) 2011-05-06 2017-04-19 纽约州州立大学研究基金会 磁性类石墨烯纳米粒子或石墨纳米或微米粒子和其制造方法和用途
US9564579B2 (en) 2011-05-27 2017-02-07 University Of North Texas Graphene magnetic tunnel junction spin filters and methods of making
JP2012250868A (ja) 2011-06-01 2012-12-20 Sumitomo Electric Ind Ltd Iii族窒化物層の成長方法およびiii族窒化物基板
WO2012167282A1 (en) 2011-06-02 2012-12-06 Brown University High-efficiency silicon-compatible photodetectors based on ge quantumdots and ge/si hetero-nanowires
KR101305705B1 (ko) 2011-07-12 2013-09-09 엘지이노텍 주식회사 터치 패널 및 전극 제조 방법
US20130020623A1 (en) 2011-07-18 2013-01-24 Taiwan Semiconductor Manufacturing Company, Ltd. Structure and method for single gate non-volatile memory device
CN102254969B (zh) 2011-08-17 2012-11-14 中国科学院苏州纳米技术与纳米仿生研究所 基于纳米柱阵列的光电器件及其制作方法
KR101217216B1 (ko) 2011-08-31 2012-12-31 서울대학교산학협력단 전자 소자 및 그 제조 방법
WO2013052541A2 (en) 2011-10-04 2013-04-11 Arizona Board Of Regents, A Body Corporate Of The State Of Arizona Acting For And On Behalf Of Arizona State University Quantum dots, rods, wires, sheets, and ribbons, and uses thereof
US8440350B1 (en) 2011-11-10 2013-05-14 GM Global Technology Operations LLC Lithium-ion battery electrodes with shape-memory-alloy current collecting substrates
EA029490B1 (ru) 2011-11-29 2018-04-30 Силурия Текнолоджиз, Инк. Катализаторы из нанопроволоки и способы их применения и получения
KR20130069035A (ko) 2011-12-16 2013-06-26 삼성전자주식회사 그래핀상의 하이브리드 나노구조체 형성 방법
JP5795527B2 (ja) 2011-12-20 2015-10-14 日本電信電話株式会社 ナノワイヤの作製方法
GB201200355D0 (en) * 2012-01-10 2012-02-22 Norwegian Univ Sci & Tech Ntnu Nanowires
JP6196987B2 (ja) 2012-02-14 2017-09-13 ヘキサジェム アーベー 窒化ガリウムナノワイヤに基づくエレクトロニクス
TW201344749A (zh) 2012-04-23 2013-11-01 Nanocrystal Asia Inc 以塡膠燒結方式製造選擇性成長遮罩之方法
US20130311363A1 (en) 2012-05-15 2013-11-21 Jonathan E. Ramaci Dynamically re-programmable transaction card
US20140014171A1 (en) 2012-06-15 2014-01-16 Purdue Research Foundation High optical transparent two-dimensional electronic conducting system and process for generating same
GB201211038D0 (en) 2012-06-21 2012-08-01 Norwegian Univ Sci & Tech Ntnu Solar cells
US9401452B2 (en) 2012-09-14 2016-07-26 Palo Alto Research Center Incorporated P-side layers for short wavelength light emitters
FR2997558B1 (fr) * 2012-10-26 2015-12-18 Aledia Dispositif opto-electrique et son procede de fabrication
EP2922891A1 (en) 2012-11-26 2015-09-30 Massachusetts Institute of Technology Nanowire-modified graphene and methods of making and using same
JP5876408B2 (ja) 2012-12-14 2016-03-02 日本電信電話株式会社 ナノワイヤの作製方法
CN103050498B (zh) 2012-12-28 2015-08-26 中山大学 一种微纳米线阵列结构紫外雪崩光电探测器及其制备方法
GB201311101D0 (en) 2013-06-21 2013-08-07 Norwegian Univ Sci & Tech Ntnu Semiconducting Films
GB2517186A (en) * 2013-08-14 2015-02-18 Norwegian University Of Science And Technology Radial P-N junction nanowire solar cells
KR101517551B1 (ko) 2013-11-14 2015-05-06 포항공과대학교 산학협력단 발광소자의 제조방법 및 그에 의해 제조된 발광소자
CN103903973B (zh) 2014-03-05 2017-03-29 复旦大学 利用旋涂液态金属种子层在石墨烯上生长高k介质的方法
KR102198694B1 (ko) 2014-07-11 2021-01-06 삼성전자주식회사 반도체 발광소자 및 반도체 발광소자 제조방법
CN108064420B (zh) 2015-06-18 2020-06-30 纳米2D材料有限公司 异质结及由其衍生的电子器件
US9577176B1 (en) 2015-06-18 2017-02-21 Raytheon Bbn Technologies Corp. Josephson junction readout for graphene-based single photon detector
BR112018000612A2 (pt) * 2015-07-13 2018-09-18 Crayonano As nanofios ou nanopirâmides cultivados sobre um substrato grafítico
EA201890167A1 (ru) * 2015-07-13 2018-07-31 Крайонано Ас Светодиоды и фотодетекторы, сформированные из нанопроводников/нанопирамид
JP7154133B2 (ja) 2016-05-04 2022-10-17 ナノシス, インコーポレイテッド 異なる色のledを含むモノリシックマルチカラー直視型ディスプレイおよびそれを製造する方法

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