TW200615694A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
TW200615694A
TW200615694A TW094114767A TW94114767A TW200615694A TW 200615694 A TW200615694 A TW 200615694A TW 094114767 A TW094114767 A TW 094114767A TW 94114767 A TW94114767 A TW 94114767A TW 200615694 A TW200615694 A TW 200615694A
Authority
TW
Taiwan
Prior art keywords
photosensitive composition
pattern
peeling
residue
free
Prior art date
Application number
TW094114767A
Other languages
English (en)
Chinese (zh)
Other versions
TWI305293B (ja
Inventor
Masaru Shida
Kiyoshi Uchikawa
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200615694A publication Critical patent/TW200615694A/zh
Application granted granted Critical
Publication of TWI305293B publication Critical patent/TWI305293B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
TW094114767A 2004-05-26 2005-05-06 Photosensitive composition TW200615694A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004155655A JP4448381B2 (ja) 2004-05-26 2004-05-26 感光性組成物

Publications (2)

Publication Number Publication Date
TW200615694A true TW200615694A (en) 2006-05-16
TWI305293B TWI305293B (ja) 2009-01-11

Family

ID=35491995

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094114767A TW200615694A (en) 2004-05-26 2005-05-06 Photosensitive composition

Country Status (4)

Country Link
JP (1) JP4448381B2 (ja)
KR (1) KR100829768B1 (ja)
CN (1) CN1702553A (ja)
TW (1) TW200615694A (ja)

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US8735026B2 (en) 2008-03-31 2014-05-27 Fujifilm Corporation Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device
US8822109B2 (en) 2007-09-28 2014-09-02 Fujifilm Corporation Colored curable composition, color filter, and solid image pickup element
TWI465524B (zh) * 2007-07-13 2014-12-21 Fujifilm Corp 硬化型組成物、以此製造的彩色濾光器及其製造方法以及固態成像裝置

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JP4492238B2 (ja) * 2004-07-26 2010-06-30 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル
TW200625002A (en) * 2005-01-12 2006-07-16 Chi Mei Corp Photosensitive resin composition for color filter
KR100814232B1 (ko) * 2005-12-01 2008-03-17 주식회사 엘지화학 옥심 에스테르를 포함하는 트리아진계 광활성 화합물을포함하는 착색 감광성 조성물
JP4882396B2 (ja) * 2006-01-31 2012-02-22 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよび液晶表示素子
JP5112733B2 (ja) * 2006-04-11 2013-01-09 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． フォトリソグラフィ用コーティング組成物
JP4954650B2 (ja) * 2006-09-14 2012-06-20 太陽ホールディングス株式会社 感光性ペースト組成物及びそれを用いて形成された焼成物パターン
JP4949809B2 (ja) * 2006-11-14 2012-06-13 東京応化工業株式会社 着色感光性樹脂組成物
KR100996591B1 (ko) * 2006-12-26 2010-11-25 주식회사 엘지화학 액정 디스플레이용 블랙 매트릭스 고감도 감광성 수지조성물 및 이를 이용하여 제조되는 블랙 매트릭스
KR101526618B1 (ko) 2007-05-11 2015-06-05 바스프 에스이 옥심 에스테르 광개시제
JP5535064B2 (ja) 2007-05-11 2014-07-02 ビーエーエスエフ ソシエタス・ヨーロピア オキシムエステル光重合開始剤
KR101247839B1 (ko) * 2007-12-14 2013-03-26 코오롱인더스트리 주식회사 수지 블랙 매트릭스용 감광성 수지 조성물
JP5173528B2 (ja) * 2008-03-28 2013-04-03 富士フイルム株式会社 感光性樹脂組成物、遮光性カラーフィルター及びその製造方法、並びに、固体撮像素子
JP2009244401A (ja) * 2008-03-28 2009-10-22 Fujifilm Corp 固体撮像素子用黒色感光性樹脂組成物及び画像形成方法
JP5192876B2 (ja) * 2008-03-28 2013-05-08 富士フイルム株式会社 感光性樹脂組成物、遮光性カラーフィルター及びその製造方法、並びに、固体撮像素子
JP5344843B2 (ja) * 2008-03-31 2013-11-20 富士フイルム株式会社 重合性組成物および固体撮像素子
JP2010032683A (ja) * 2008-07-28 2010-02-12 Toppan Printing Co Ltd 着色アルカリ現像型感光性樹脂組成物及びカラーフィルタ
US8507569B2 (en) 2009-03-23 2013-08-13 Basf Se Photoresist compositions
JP5535842B2 (ja) * 2009-09-30 2014-07-02 富士フイルム株式会社 ウェハレベルレンズ用黒色硬化性組成物、及び、ウェハレベルレンズ
JP2011170334A (ja) * 2010-01-20 2011-09-01 Fujifilm Corp ウエハレベルレンズ用黒色硬化性組成物、及びウエハレベルレンズ
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
TWI520940B (zh) 2010-10-05 2016-02-11 巴地斯顏料化工廠 肟酯
JP5121912B2 (ja) * 2010-11-24 2013-01-16 富士フイルム株式会社 着色感光性樹脂組成物、パターン形成方法、カラーフィルタの製造方法、カラーフィルタ及びそれを備えた表示装置
JP2011141550A (ja) * 2011-01-26 2011-07-21 Jsr Corp 着色層形成用感放射線性組成物、カラーフィルタおよび液晶表示素子
EP2668156B1 (en) 2011-01-28 2018-10-31 Basf Se Polymerizable composition comprising an oxime sulfonate as thermal curing agent
JP5946657B2 (ja) 2011-03-08 2016-07-06 株式会社ダイセル フォトレジスト製造用溶剤または溶剤組成物、及びフォトレジスト製造用組成物
KR101268203B1 (ko) 2011-03-18 2013-05-27 코오롱인더스트리 주식회사 환형 올레핀계 수지 조성물 및 이로부터 제조된 환형 올레핀계 수지 필름
KR102006041B1 (ko) 2011-12-07 2019-07-31 바스프 에스이 옥심 에스테르 광개시제
KR101968462B1 (ko) 2012-05-09 2019-04-11 바스프 에스이 옥심 에스테르 광개시제
KR101690814B1 (ko) 2012-05-31 2017-01-10 주식회사 엘지화학 감광성 수지 조성물, 상기 감광성 수지 조성물로 제조된 감광재, 이를 포함하는 컬러필터 및 이를 포함하는 디스플레이 장치
JP6457719B2 (ja) * 2013-03-06 2019-01-23 株式会社Adeka 光硬化性組成物
JP6469669B2 (ja) 2013-07-08 2019-02-13 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ オキシムエステル光開始剤
EP3044208B1 (en) 2013-09-10 2021-12-22 Basf Se Oxime ester photoinitiators
EP3186226B1 (en) 2014-08-29 2020-06-17 Basf Se Oxime sulfonate derivatives
US20170176856A1 (en) * 2015-12-21 2017-06-22 Az Electronic Materials (Luxembourg) S.A.R.L. Negative-working photoresist compositions for laser ablation and use thereof
JPWO2019059359A1 (ja) 2017-09-25 2020-09-03 東レ株式会社 着色樹脂組成物、着色膜、カラーフィルターおよび液晶表示装置
US20220121113A1 (en) 2019-01-23 2022-04-21 Basf Se Oxime ester photoinitiators having a special aroyl chromophore
TW202138351A (zh) 2020-03-04 2021-10-16 德商巴地斯顏料化工廠 肟酯光起始劑

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SG77689A1 (en) * 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
JP2000292615A (ja) * 1999-04-07 2000-10-20 Mitsubishi Chemicals Corp カラーフィルタ、およびそれを用いた液晶表示装置
JP2001261761A (ja) * 2000-03-22 2001-09-26 Jsr Corp 感放射線性樹脂組成物および表示パネル用スペーサー
JP2001264530A (ja) * 2000-03-22 2001-09-26 Jsr Corp カラーフィルタ用感放射線性組成物およびカラーフィルタ
JP2002323762A (ja) * 2001-04-25 2002-11-08 Nippon Kayaku Co Ltd ネガ型着色感光性組成物
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TWI285297B (en) * 2004-02-09 2007-08-11 Chi Mei Corp Light-sensitive resin composition for black matrix
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JP2005258254A (ja) * 2004-03-15 2005-09-22 Sumitomo Chemical Co Ltd 黒色感光性樹脂組成物
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JP4556479B2 (ja) * 2004-04-27 2010-10-06 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよび液晶表示パネル

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI465524B (zh) * 2007-07-13 2014-12-21 Fujifilm Corp 硬化型組成物、以此製造的彩色濾光器及其製造方法以及固態成像裝置
US8822109B2 (en) 2007-09-28 2014-09-02 Fujifilm Corporation Colored curable composition, color filter, and solid image pickup element
TWI476512B (zh) * 2007-09-28 2015-03-11 Fujifilm Corp 著色可硬化性組成物、彩色濾光器之彩色區域、彩色濾光器與彩色濾光器之製造方法以及固態影像拾取元件
US8735026B2 (en) 2008-03-31 2014-05-27 Fujifilm Corporation Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device
TWI558753B (zh) * 2008-03-31 2016-11-21 富士軟片股份有限公司 聚合性組成物、固態攝影元件用遮光性彩色濾光片及其製造方法、及固態攝影元件

Also Published As

Publication number Publication date
KR100829768B1 (ko) 2008-05-16
KR20060048098A (ko) 2006-05-18
JP4448381B2 (ja) 2010-04-07
JP2005338328A (ja) 2005-12-08
TWI305293B (ja) 2009-01-11
CN1702553A (zh) 2005-11-30

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