WO2011037438A3 - 드라이필름 포토레지스트 - Google Patents
드라이필름 포토레지스트 Download PDFInfo
- Publication number
- WO2011037438A3 WO2011037438A3 PCT/KR2010/006592 KR2010006592W WO2011037438A3 WO 2011037438 A3 WO2011037438 A3 WO 2011037438A3 KR 2010006592 W KR2010006592 W KR 2010006592W WO 2011037438 A3 WO2011037438 A3 WO 2011037438A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- dry film
- film photoresist
- exposure
- protection layer
- present
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Laminated Bodies (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201080043364.8A CN102549500B (zh) | 2009-09-28 | 2010-09-28 | 干膜光致抗蚀剂 |
JP2012530787A JP5551255B2 (ja) | 2009-09-28 | 2010-09-28 | ドライフィルムフォトレジスト |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2009-0092045 | 2009-09-28 | ||
KR20090092045 | 2009-09-28 | ||
KR20090112829 | 2009-11-20 | ||
KR10-2009-0112829 | 2009-11-20 | ||
KR10-2010-0060520 | 2010-06-25 | ||
KR1020100060520A KR101739730B1 (ko) | 2010-06-25 | 2010-06-25 | 드라이필름 포토레지스트 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2011037438A2 WO2011037438A2 (ko) | 2011-03-31 |
WO2011037438A3 true WO2011037438A3 (ko) | 2011-08-04 |
Family
ID=43796412
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2010/006592 WO2011037438A2 (ko) | 2009-09-28 | 2010-09-28 | 드라이필름 포토레지스트 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5551255B2 (ko) |
CN (1) | CN102549500B (ko) |
WO (1) | WO2011037438A2 (ko) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104714377A (zh) * | 2013-12-11 | 2015-06-17 | 中国航空工业第六一八研究所 | 一种抗腐蚀修版液 |
JP5882510B2 (ja) * | 2014-06-30 | 2016-03-09 | 太陽インキ製造株式会社 | 感光性ドライフィルムおよびそれを用いたプリント配線板の製造方法 |
CN104965390A (zh) * | 2015-05-29 | 2015-10-07 | 王氏港建经销有限公司 | 一种运送多个基板依次通过曝光机的方法和系统 |
CN107850839A (zh) | 2015-07-08 | 2018-03-27 | 日立化成株式会社 | 感光性元件、层叠体、抗蚀剂图案的形成方法和印刷配线板的制造方法 |
CN111279804B (zh) * | 2017-12-20 | 2023-10-24 | 住友电气工业株式会社 | 制造印刷电路板和层压结构的方法 |
WO2019215848A1 (ja) | 2018-05-09 | 2019-11-14 | 日立化成株式会社 | 感光性エレメント、バリア層形成用樹脂組成物、レジストパターンの形成方法及びプリント配線板の製造方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030180635A1 (en) * | 2002-02-12 | 2003-09-25 | Harald Baumann | Visible radiation sensitive composition |
US20040023166A1 (en) * | 2002-07-30 | 2004-02-05 | Kevin Ray | Method of manufacturing imaging compositions |
KR20050056159A (ko) * | 2003-12-09 | 2005-06-14 | 후지 샤신 필름 가부시기가이샤 | 드라이필름 포토레지스트 |
KR20080003948A (ko) * | 2006-07-04 | 2008-01-09 | 주식회사 코오롱 | 4층 구조의 드라이 필름 포토레지스트 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5155853B2 (ja) * | 2006-04-28 | 2013-03-06 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂積層体 |
JP4979391B2 (ja) * | 2007-01-17 | 2012-07-18 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂積層体 |
WO2009054705A2 (en) * | 2007-10-25 | 2009-04-30 | Kolon Industries, Inc. | Film type transfer material |
CN101925861B (zh) * | 2008-01-29 | 2013-07-03 | 旭化成电子材料株式会社 | 感光性树脂层压体 |
-
2010
- 2010-09-28 WO PCT/KR2010/006592 patent/WO2011037438A2/ko active Application Filing
- 2010-09-28 JP JP2012530787A patent/JP5551255B2/ja active Active
- 2010-09-28 CN CN201080043364.8A patent/CN102549500B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030180635A1 (en) * | 2002-02-12 | 2003-09-25 | Harald Baumann | Visible radiation sensitive composition |
US20040023166A1 (en) * | 2002-07-30 | 2004-02-05 | Kevin Ray | Method of manufacturing imaging compositions |
KR20050056159A (ko) * | 2003-12-09 | 2005-06-14 | 후지 샤신 필름 가부시기가이샤 | 드라이필름 포토레지스트 |
KR20080003948A (ko) * | 2006-07-04 | 2008-01-09 | 주식회사 코오롱 | 4층 구조의 드라이 필름 포토레지스트 |
Also Published As
Publication number | Publication date |
---|---|
WO2011037438A2 (ko) | 2011-03-31 |
CN102549500A (zh) | 2012-07-04 |
JP2013505483A (ja) | 2013-02-14 |
JP5551255B2 (ja) | 2014-07-16 |
CN102549500B (zh) | 2014-04-30 |
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