TW200535090A - Dispersion liquid for forming transparent conductive film, method for forming transparent conductive film and transparent electrode - Google Patents
Dispersion liquid for forming transparent conductive film, method for forming transparent conductive film and transparent electrode Download PDFInfo
- Publication number
- TW200535090A TW200535090A TW94103236A TW94103236A TW200535090A TW 200535090 A TW200535090 A TW 200535090A TW 94103236 A TW94103236 A TW 94103236A TW 94103236 A TW94103236 A TW 94103236A TW 200535090 A TW200535090 A TW 200535090A
- Authority
- TW
- Taiwan
- Prior art keywords
- transparent conductive
- conductive film
- gas
- environment
- fine particles
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Conductive Materials (AREA)
- Non-Insulated Conductors (AREA)
- Manufacturing Of Electric Cables (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004047342A JP4814491B2 (ja) | 2004-02-24 | 2004-02-24 | 透明導電膜の形成方法及び透明電極 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200535090A true TW200535090A (en) | 2005-11-01 |
| TWI364402B TWI364402B (https=) | 2012-05-21 |
Family
ID=34879471
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW94103236A TW200535090A (en) | 2004-02-24 | 2005-02-02 | Dispersion liquid for forming transparent conductive film, method for forming transparent conductive film and transparent electrode |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4814491B2 (https=) |
| TW (1) | TW200535090A (https=) |
| WO (1) | WO2005081265A1 (https=) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015021698A1 (zh) * | 2013-08-15 | 2015-02-19 | 京东方科技集团股份有限公司 | 透明导电氧化物膜层的制备方法 |
| TWI490353B (zh) * | 2010-10-29 | 2015-07-01 | Hon Hai Prec Ind Co Ltd | 鍍膜件及其製備方法 |
| TWI491751B (zh) * | 2010-10-29 | 2015-07-11 | 鴻海精密工業股份有限公司 | 鍍膜件及其製備方法 |
| TWI689622B (zh) * | 2014-12-05 | 2020-04-01 | 日商富士軟片股份有限公司 | 金屬氧化物膜的製造方法、金屬氧化物膜、薄膜電晶體、薄膜電晶體的製造方法、電子元件及紫外線照射裝置 |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007182605A (ja) * | 2006-01-06 | 2007-07-19 | Konica Minolta Holdings Inc | 薄膜形成方法及び薄膜 |
| TWI309050B (en) * | 2006-04-03 | 2009-04-21 | Ind Tech Res Inst | Azo transparent conducting film with metallic nano particles and method of producing thereof |
| CN101496117B (zh) * | 2006-07-28 | 2012-04-18 | 株式会社爱发科 | 透明导电膜的成膜方法 |
| JP2008182141A (ja) * | 2007-01-26 | 2008-08-07 | Seiko Epson Corp | 紫外線検出センサー、紫外線検出センサーの製造方法、紫外線の検出方法及び太陽電池 |
| JP2008258050A (ja) * | 2007-04-06 | 2008-10-23 | Ulvac Japan Ltd | 透明導電膜形成用塗布液、透明導電膜の形成方法及び透明電極 |
| JP5222486B2 (ja) * | 2007-04-11 | 2013-06-26 | 株式会社アルバック | 透明導電膜の形成方法 |
| JPWO2024209990A1 (https=) * | 2023-04-03 | 2024-10-10 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6196609A (ja) * | 1984-10-15 | 1986-05-15 | 大阪特殊合金株式会社 | 透明導電膜 |
| JPH02234309A (ja) * | 1989-03-06 | 1990-09-17 | Japan Synthetic Rubber Co Ltd | 導電性皮膜形成用組成物 |
| JPH06139822A (ja) * | 1992-10-23 | 1994-05-20 | Asahi Glass Co Ltd | 透明導電膜、低反射帯電防止膜およびこれらの製造方法 |
| KR100472496B1 (ko) * | 1997-07-23 | 2005-05-16 | 삼성에스디아이 주식회사 | 투명도전성조성물,이로부터형성된투명도전막및그제조방법 |
| JP4377003B2 (ja) * | 1999-07-23 | 2009-12-02 | 日本曹達株式会社 | 透明導電膜のシート抵抗値の調整方法及び透明導電膜の形成方法 |
| JP4099911B2 (ja) * | 1999-10-07 | 2008-06-11 | 日立電線株式会社 | 透明導電膜形成基板及び形成方法 |
| JP4902048B2 (ja) * | 2001-01-11 | 2012-03-21 | 日揮触媒化成株式会社 | 透明導電性被膜付基材および表示装置 |
| JP2003249131A (ja) * | 2002-02-26 | 2003-09-05 | Fuji Photo Film Co Ltd | 透明導電膜の製造方法 |
| JP4002469B2 (ja) * | 2002-05-21 | 2007-10-31 | 触媒化成工業株式会社 | インジウム系金属微粒子の製造方法、インジウム系金属微粒子を含む透明導電性被膜形成用塗布液、分散ゾル、透明導電性被膜付基材、表示装置 |
-
2004
- 2004-02-24 JP JP2004047342A patent/JP4814491B2/ja not_active Expired - Lifetime
-
2005
- 2005-02-02 TW TW94103236A patent/TW200535090A/zh not_active IP Right Cessation
- 2005-02-24 WO PCT/JP2005/003009 patent/WO2005081265A1/ja not_active Ceased
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI490353B (zh) * | 2010-10-29 | 2015-07-01 | Hon Hai Prec Ind Co Ltd | 鍍膜件及其製備方法 |
| TWI491751B (zh) * | 2010-10-29 | 2015-07-11 | 鴻海精密工業股份有限公司 | 鍍膜件及其製備方法 |
| WO2015021698A1 (zh) * | 2013-08-15 | 2015-02-19 | 京东方科技集团股份有限公司 | 透明导电氧化物膜层的制备方法 |
| TWI689622B (zh) * | 2014-12-05 | 2020-04-01 | 日商富士軟片股份有限公司 | 金屬氧化物膜的製造方法、金屬氧化物膜、薄膜電晶體、薄膜電晶體的製造方法、電子元件及紫外線照射裝置 |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI364402B (https=) | 2012-05-21 |
| WO2005081265A1 (ja) | 2005-09-01 |
| JP2005243249A (ja) | 2005-09-08 |
| JP4814491B2 (ja) | 2011-11-16 |
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| MK4A | Expiration of patent term of an invention patent |