JP4814491B2 - 透明導電膜の形成方法及び透明電極 - Google Patents

透明導電膜の形成方法及び透明電極 Download PDF

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Publication number
JP4814491B2
JP4814491B2 JP2004047342A JP2004047342A JP4814491B2 JP 4814491 B2 JP4814491 B2 JP 4814491B2 JP 2004047342 A JP2004047342 A JP 2004047342A JP 2004047342 A JP2004047342 A JP 2004047342A JP 4814491 B2 JP4814491 B2 JP 4814491B2
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JP
Japan
Prior art keywords
fine particles
atmosphere
gas
conductive film
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2004047342A
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English (en)
Japanese (ja)
Other versions
JP2005243249A (ja
Inventor
禎之 浮島
日出夫 竹井
暁 石橋
勉 厚木
正明 小田
浩史 山口
年治 林
礼子 清嶋
真也 白石
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Mitsubishi Materials Electronic Chemicals Co Ltd
Original Assignee
Jemco Inc
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jemco Inc, Ulvac Inc filed Critical Jemco Inc
Priority to JP2004047342A priority Critical patent/JP4814491B2/ja
Priority to TW94103236A priority patent/TW200535090A/zh
Priority to PCT/JP2005/003009 priority patent/WO2005081265A1/ja
Publication of JP2005243249A publication Critical patent/JP2005243249A/ja
Application granted granted Critical
Publication of JP4814491B2 publication Critical patent/JP4814491B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Conductive Materials (AREA)
  • Non-Insulated Conductors (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
JP2004047342A 2004-02-24 2004-02-24 透明導電膜の形成方法及び透明電極 Expired - Lifetime JP4814491B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004047342A JP4814491B2 (ja) 2004-02-24 2004-02-24 透明導電膜の形成方法及び透明電極
TW94103236A TW200535090A (en) 2004-02-24 2005-02-02 Dispersion liquid for forming transparent conductive film, method for forming transparent conductive film and transparent electrode
PCT/JP2005/003009 WO2005081265A1 (ja) 2004-02-24 2005-02-24 透明導電膜形成用分散液、透明導電膜の形成方法及び透明電極

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004047342A JP4814491B2 (ja) 2004-02-24 2004-02-24 透明導電膜の形成方法及び透明電極

Publications (2)

Publication Number Publication Date
JP2005243249A JP2005243249A (ja) 2005-09-08
JP4814491B2 true JP4814491B2 (ja) 2011-11-16

Family

ID=34879471

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004047342A Expired - Lifetime JP4814491B2 (ja) 2004-02-24 2004-02-24 透明導電膜の形成方法及び透明電極

Country Status (3)

Country Link
JP (1) JP4814491B2 (https=)
TW (1) TW200535090A (https=)
WO (1) WO2005081265A1 (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007182605A (ja) * 2006-01-06 2007-07-19 Konica Minolta Holdings Inc 薄膜形成方法及び薄膜
TWI309050B (en) * 2006-04-03 2009-04-21 Ind Tech Res Inst Azo transparent conducting film with metallic nano particles and method of producing thereof
CN101496117B (zh) * 2006-07-28 2012-04-18 株式会社爱发科 透明导电膜的成膜方法
JP2008182141A (ja) * 2007-01-26 2008-08-07 Seiko Epson Corp 紫外線検出センサー、紫外線検出センサーの製造方法、紫外線の検出方法及び太陽電池
JP2008258050A (ja) * 2007-04-06 2008-10-23 Ulvac Japan Ltd 透明導電膜形成用塗布液、透明導電膜の形成方法及び透明電極
JP5222486B2 (ja) * 2007-04-11 2013-06-26 株式会社アルバック 透明導電膜の形成方法
TWI491751B (zh) * 2010-10-29 2015-07-11 鴻海精密工業股份有限公司 鍍膜件及其製備方法
TWI490353B (zh) * 2010-10-29 2015-07-01 Hon Hai Prec Ind Co Ltd 鍍膜件及其製備方法
CN103451618B (zh) * 2013-08-15 2016-06-15 京东方科技集团股份有限公司 一种透明导电氧化物膜层的制备方法
TWI689622B (zh) * 2014-12-05 2020-04-01 日商富士軟片股份有限公司 金屬氧化物膜的製造方法、金屬氧化物膜、薄膜電晶體、薄膜電晶體的製造方法、電子元件及紫外線照射裝置
JPWO2024209990A1 (https=) * 2023-04-03 2024-10-10

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6196609A (ja) * 1984-10-15 1986-05-15 大阪特殊合金株式会社 透明導電膜
JPH02234309A (ja) * 1989-03-06 1990-09-17 Japan Synthetic Rubber Co Ltd 導電性皮膜形成用組成物
JPH06139822A (ja) * 1992-10-23 1994-05-20 Asahi Glass Co Ltd 透明導電膜、低反射帯電防止膜およびこれらの製造方法
KR100472496B1 (ko) * 1997-07-23 2005-05-16 삼성에스디아이 주식회사 투명도전성조성물,이로부터형성된투명도전막및그제조방법
JP4377003B2 (ja) * 1999-07-23 2009-12-02 日本曹達株式会社 透明導電膜のシート抵抗値の調整方法及び透明導電膜の形成方法
JP4099911B2 (ja) * 1999-10-07 2008-06-11 日立電線株式会社 透明導電膜形成基板及び形成方法
JP4902048B2 (ja) * 2001-01-11 2012-03-21 日揮触媒化成株式会社 透明導電性被膜付基材および表示装置
JP2003249131A (ja) * 2002-02-26 2003-09-05 Fuji Photo Film Co Ltd 透明導電膜の製造方法
JP4002469B2 (ja) * 2002-05-21 2007-10-31 触媒化成工業株式会社 インジウム系金属微粒子の製造方法、インジウム系金属微粒子を含む透明導電性被膜形成用塗布液、分散ゾル、透明導電性被膜付基材、表示装置

Also Published As

Publication number Publication date
TW200535090A (en) 2005-11-01
TWI364402B (https=) 2012-05-21
WO2005081265A1 (ja) 2005-09-01
JP2005243249A (ja) 2005-09-08

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