SG194655A1 - Preparation method of ruthenium (ru) powder for preparation of ruthenium target - Google Patents
Preparation method of ruthenium (ru) powder for preparation of ruthenium target Download PDFInfo
- Publication number
- SG194655A1 SG194655A1 SG2013079744A SG2013079744A SG194655A1 SG 194655 A1 SG194655 A1 SG 194655A1 SG 2013079744 A SG2013079744 A SG 2013079744A SG 2013079744 A SG2013079744 A SG 2013079744A SG 194655 A1 SG194655 A1 SG 194655A1
- Authority
- SG
- Singapore
- Prior art keywords
- powder
- plasma
- produced
- target
- refined
- Prior art date
Links
- 239000000843 powder Substances 0.000 title claims description 151
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 title claims description 9
- 229910052707 ruthenium Inorganic materials 0.000 title claims description 8
- 238000002360 preparation method Methods 0.000 title description 4
- 238000000034 method Methods 0.000 claims description 108
- 238000010298 pulverizing process Methods 0.000 claims description 28
- 238000004519 manufacturing process Methods 0.000 claims description 27
- 239000002699 waste material Substances 0.000 claims description 21
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 18
- 229910052799 carbon Inorganic materials 0.000 claims description 16
- 230000005611 electricity Effects 0.000 claims description 11
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 10
- 239000003344 environmental pollutant Substances 0.000 claims description 10
- 239000007789 gas Substances 0.000 claims description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims description 10
- 239000001257 hydrogen Substances 0.000 claims description 10
- 231100000719 pollutant Toxicity 0.000 claims description 10
- 239000012495 reaction gas Substances 0.000 claims description 9
- 229910019897 RuOx Inorganic materials 0.000 claims description 7
- 238000005406 washing Methods 0.000 claims description 3
- 239000002245 particle Substances 0.000 description 17
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 10
- 229910052760 oxygen Inorganic materials 0.000 description 10
- 239000001301 oxygen Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000000126 substance Substances 0.000 description 6
- 239000012535 impurity Substances 0.000 description 5
- 238000005245 sintering Methods 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 239000013078 crystal Substances 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 238000007670 refining Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- UDKYUQZDRMRDOR-UHFFFAOYSA-N tungsten Chemical compound [W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W][W] UDKYUQZDRMRDOR-UHFFFAOYSA-N 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 101150051159 ARTN gene Proteins 0.000 description 1
- 241000478345 Afer Species 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000005773 Enders reaction Methods 0.000 description 1
- 241000252067 Megalops atlanticus Species 0.000 description 1
- -1 Nby Inorganic materials 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000112 cooling gas Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000000349 field-emission scanning electron micrograph Methods 0.000 description 1
- 238000000445 field-emission scanning electron microscopy Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000003621 hammer milling Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/02—Making metallic powder or suspensions thereof using physical processes
- B22F9/14—Making metallic powder or suspensions thereof using physical processes using electric discharge
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/02—Making metallic powder or suspensions thereof using physical processes
- B22F9/04—Making metallic powder or suspensions thereof using physical processes starting from solid material, e.g. by crushing, grinding or milling
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/16—Making metallic powder or suspensions thereof using chemical processes
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/0466—Alloys based on noble metals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F2009/001—Making metallic powder or suspensions thereof from scrap particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
- B22F2998/10—Processes characterised by the sequence of their steps
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Manufacture And Refinement Of Metals (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020110042657A KR101206416B1 (ko) | 2011-05-04 | 2011-05-04 | 루테늄(Ｒｕ)타겟 제조를 위한 루테늄 분말 제조방법 |
| PCT/KR2012/000741 WO2012150757A1 (ko) | 2011-05-04 | 2012-01-31 | 루테늄(Ｒｕ)타겟 제조를 위한 루테늄 분말 제조방법 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG194655A1 true SG194655A1 (en) | 2013-12-30 |
Family
ID=47107927
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG2013079744A SG194655A1 (en) | 2011-05-04 | 2012-01-31 | Preparation method of ruthenium (ru) powder for preparation of ruthenium target |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20140123810A1 (ja) |
| JP (1) | JP5733732B2 (ja) |
| KR (1) | KR101206416B1 (ja) |
| SG (1) | SG194655A1 (ja) |
| WO (1) | WO2012150757A1 (ja) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20150003580A (ko) * | 2013-07-01 | 2015-01-09 | 희성금속 주식회사 | 루테늄 분말 및 루테늄 타겟의 제조방법 |
| KR20150049883A (ko) * | 2013-10-31 | 2015-05-08 | 희성금속 주식회사 | 스퍼터링 폐 타겟의 재생방법 및 이에 의해 재생된 스퍼터링 타겟 |
| KR20160050491A (ko) * | 2014-10-29 | 2016-05-11 | 희성금속 주식회사 | 루테늄 또는 루테늄 합금계 스퍼터링 폐타겟의 재생방법 및 이로부터 제조된 균일한 결정립을 갖는 루테늄 또는 루테늄 합금계 재활용 스퍼터링 타겟 |
| KR20160050485A (ko) * | 2014-10-29 | 2016-05-11 | 희성금속 주식회사 | 루테늄 또는 루테늄 합금계 스퍼터링 타겟의 제조방법 및 이로부터 제조된 루테늄 또는 루테늄 합금계 스퍼터링 타겟 |
| JP7296232B2 (ja) * | 2019-03-27 | 2023-06-22 | 株式会社フルヤ金属 | 中実球状粉末の製造方法及び造形製品の製造方法 |
| CN114105228B (zh) * | 2021-11-25 | 2022-08-19 | 西北有色金属研究院 | 一种厚膜电阻用氧化钌的制备方法 |
| CN114289727A (zh) * | 2021-12-09 | 2022-04-08 | 贵研铂业股份有限公司 | 一种高均质微粒径高纯钌粉及其制备方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09227965A (ja) * | 1996-02-19 | 1997-09-02 | Mitsubishi Materials Corp | 精製金属ルテニウム粉末とその製造方法 |
| JP2001020065A (ja) * | 1999-07-07 | 2001-01-23 | Hitachi Metals Ltd | スパッタリング用ターゲット及びその製造方法ならびに高融点金属粉末材料 |
| JP2001342506A (ja) | 2000-05-31 | 2001-12-14 | Hitachi Metals Ltd | 粉末原料の製造方法およびターゲット材の製造方法 |
| JP2005154834A (ja) | 2003-11-26 | 2005-06-16 | Hitachi Metals Ltd | ルテニウム超微粉末およびその製造方法 |
| JP2007070650A (ja) * | 2005-09-02 | 2007-03-22 | Asahi Pretec Corp | ルテニウム酸化物の製法およびルテニウム粉末の製法 |
| CA2648771C (en) * | 2006-04-14 | 2010-11-09 | Hitachi Metals, Ltd. | Process for producing low-oxygen metal powder |
| JP4527743B2 (ja) * | 2007-03-09 | 2010-08-18 | アサヒプリテック株式会社 | ルテニウム金属粉末の製造方法 |
| US8118906B2 (en) * | 2007-10-29 | 2012-02-21 | Heraeus Inc. | Methodology for recycling Ru and Ru-alloy deposition targets and targets made of recycled Ru and Ru-based alloy powders |
| JP5294073B2 (ja) * | 2008-03-25 | 2013-09-18 | 日立金属株式会社 | Ｒｕターゲット材の製造方法 |
| KR101143860B1 (ko) * | 2009-12-24 | 2012-05-22 | 희성금속 주식회사 | 루테늄（Ｒｕ）폐타겟을 이용한 루테늄（Ｒｕ） 분말 및 루테늄（Ｒｕ） 타겟 재료 제조방법 |
| KR101175676B1 (ko) * | 2010-03-25 | 2012-08-22 | 희성금속 주식회사 | 폐 루테늄（Ｒｕ） 타겟을 이용한 고순도화 및 미세화된 루테늄（Ｒｕ）분말 제조법 |
| KR101285284B1 (ko) * | 2011-04-26 | 2013-07-11 | 희성금속 주식회사 | 폐 루테늄(Ｒｕ) 타겟을 이용한 초고순도 루테늄(Ｒｕ) 분말 및 타겟의 제조방법 |
-
2011
- 2011-05-04 KR KR1020110042657A patent/KR101206416B1/ko active IP Right Grant
-
2012
- 2012-01-31 JP JP2014509236A patent/JP5733732B2/ja not_active Expired - Fee Related
- 2012-01-31 SG SG2013079744A patent/SG194655A1/en unknown
- 2012-01-31 WO PCT/KR2012/000741 patent/WO2012150757A1/ko active Application Filing
- 2012-01-31 US US14/115,597 patent/US20140123810A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| KR101206416B1 (ko) | 2012-11-29 |
| KR20120124803A (ko) | 2012-11-14 |
| WO2012150757A1 (ko) | 2012-11-08 |
| JP2014518939A (ja) | 2014-08-07 |
| JP5733732B2 (ja) | 2015-06-10 |
| US20140123810A1 (en) | 2014-05-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| SG194655A1 (en) | Preparation method of ruthenium (ru) powder for preparation of ruthenium target | |
| EP1066899B1 (en) | Method of making a sputtering target | |
| US7067197B2 (en) | Powder metallurgy sputtering targets and methods of producing same | |
| US7981191B2 (en) | Method for the production of tantalum powder using reclaimed scrap as source material | |
| EP2284289B1 (en) | Tungsten sintered material sputtering target | |
| JP2005533182A (ja) | ホウ素／炭素／窒素／酸素／ケイ素でドープ処理したスパッタリングターゲットの製造方法 | |
| WO2004024977A1 (ja) | 珪化鉄スパッタリングターゲット及びその製造方法 | |
| JP2012237056A (ja) | ＭｏＣｒターゲット材の製造方法およびＭｏＣｒターゲット材 | |
| JP2005336617A (ja) | スパッタリング用ターゲット及びその製造方法ならびに高融点金属粉末材料 | |
| JP2023061988A (ja) | 希土類永久磁石材料及びその原料組成物、製造方法、並びに応用 | |
| KR101469873B1 (ko) | 초고순도, 초미세 루테늄 합금 분말 제조방법 | |
| JP2001342506A (ja) | 粉末原料の製造方法およびターゲット材の製造方法 | |
| US20140105777A1 (en) | Production method for ultra-high-purity ruthenium(ru) powder and target by using waste ruthenium(ru) targets | |
| US10050160B2 (en) | Cu—Ga target, method of producing same, light-absorbing layer formed from Cu—Ga based alloy film, and CIGS system solar cell having the light-absorbing layer | |
| KR102003766B1 (ko) | 탄탈륨(Ta) 분말 제조 방법 | |
| JP5577454B2 (ja) | 共晶合金を用いたタンタル（Ｔａ）粉末の製造方法 | |
| JP2013522473A (ja) | 使用済みルテニウム（Ｒｕ）ターゲットを用いた高純度化及び微細化されたルテニウム（Ｒｕ）粉末の製造方法 | |
| CN112680592B (zh) | Ni/Co回收的前处理方法 | |
| KR20190019368A (ko) | 탄탈륨(Ta) 분말 제조 방법 | |
| CN117166006A (zh) | 一种CoCrFeNi高熵合金的惰性阳极及其制备方法 | |
| KR20220129340A (ko) | 황산 코발트 염의 제조 방법 | |
| KR20120122898A (ko) | ＭｏＣｒ 타겟재의 제조방법 및 ＭｏＣｒ 타겟재 |