SG136078A1 - Uv cure system - Google Patents
Uv cure systemInfo
- Publication number
- SG136078A1 SG136078A1 SG200701946-6A SG2007019466A SG136078A1 SG 136078 A1 SG136078 A1 SG 136078A1 SG 2007019466 A SG2007019466 A SG 2007019466A SG 136078 A1 SG136078 A1 SG 136078A1
- Authority
- SG
- Singapore
- Prior art keywords
- substrate
- ultraviolet radiation
- support
- lamp
- substrate support
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
- B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
- B05D3/065—After-treatment
- B05D3/067—Curing or cross-linking the coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C71/00—After-treatment of articles without altering their shape; Apparatus therefor
- B29C71/04—After-treatment of articles without altering their shape; Apparatus therefor by wave energy or particle radiation, e.g. for curing or vulcanising preformed articles
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B3/00—Drying solid materials or objects by processes involving the application of heat
- F26B3/28—Drying solid materials or objects by processes involving the application of heat by radiation, e.g. from the sun
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
- H01L21/02318—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment
- H01L21/02345—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to radiation, e.g. visible light
- H01L21/02348—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to radiation, e.g. visible light treatment by exposure to UV light
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
- B29C2035/0827—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microbiology (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Toxicology (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US78342106P | 2006-03-17 | 2006-03-17 | |
US81666006P | 2006-06-26 | 2006-06-26 | |
US81672306P | 2006-06-26 | 2006-06-26 | |
US88690607P | 2007-01-26 | 2007-01-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG136078A1 true SG136078A1 (en) | 2007-10-29 |
Family
ID=38591674
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200701946-6A SG136078A1 (en) | 2006-03-17 | 2007-03-15 | Uv cure system |
Country Status (6)
Country | Link |
---|---|
US (3) | US7589336B2 (ko) |
JP (1) | JP5285864B2 (ko) |
KR (1) | KR101341540B1 (ko) |
CN (2) | CN101093786B (ko) |
SG (1) | SG136078A1 (ko) |
TW (1) | TWI388692B (ko) |
Families Citing this family (79)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050250346A1 (en) * | 2004-05-06 | 2005-11-10 | Applied Materials, Inc. | Process and apparatus for post deposition treatment of low k dielectric materials |
US7777198B2 (en) * | 2005-05-09 | 2010-08-17 | Applied Materials, Inc. | Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation |
US7622378B2 (en) | 2005-11-09 | 2009-11-24 | Tokyo Electron Limited | Multi-step system and method for curing a dielectric film |
US7692171B2 (en) * | 2006-03-17 | 2010-04-06 | Andrzei Kaszuba | Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors |
US7589336B2 (en) * | 2006-03-17 | 2009-09-15 | Applied Materials, Inc. | Apparatus and method for exposing a substrate to UV radiation while monitoring deterioration of the UV source and reflectors |
US7566891B2 (en) * | 2006-03-17 | 2009-07-28 | Applied Materials, Inc. | Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectors |
US7547633B2 (en) * | 2006-05-01 | 2009-06-16 | Applied Materials, Inc. | UV assisted thermal processing |
US20070287091A1 (en) * | 2006-06-12 | 2007-12-13 | Jacobo Victor M | System and method for exposing electronic substrates to UV light |
US8956457B2 (en) * | 2006-09-08 | 2015-02-17 | Tokyo Electron Limited | Thermal processing system for curing dielectric films |
US7763869B2 (en) * | 2007-03-23 | 2010-07-27 | Asm Japan K.K. | UV light irradiating apparatus with liquid filter |
US20090075491A1 (en) * | 2007-09-13 | 2009-03-19 | Tokyo Electron Limited | Method for curing a dielectric film |
US8186855B2 (en) * | 2007-10-01 | 2012-05-29 | Wassel James J | LED lamp apparatus and method of making an LED lamp apparatus |
US8322881B1 (en) | 2007-12-21 | 2012-12-04 | Appalachian Lighting Systems, Inc. | Lighting fixture |
JP5234319B2 (ja) * | 2008-01-21 | 2013-07-10 | ソニー株式会社 | 光造形装置および光造形方法 |
US20090226694A1 (en) * | 2008-03-06 | 2009-09-10 | Tokyo Electron Limited | POROUS SiCOH-CONTAINING DIELECTRIC FILM AND A METHOD OF PREPARING |
US20090226695A1 (en) * | 2008-03-06 | 2009-09-10 | Tokyo Electron Limited | Method for treating a dielectric film with infrared radiation |
US7977256B2 (en) | 2008-03-06 | 2011-07-12 | Tokyo Electron Limited | Method for removing a pore-generating material from an uncured low-k dielectric film |
US7858533B2 (en) * | 2008-03-06 | 2010-12-28 | Tokyo Electron Limited | Method for curing a porous low dielectric constant dielectric film |
US8022377B2 (en) * | 2008-04-22 | 2011-09-20 | Applied Materials, Inc. | Method and apparatus for excimer curing |
US20090305515A1 (en) * | 2008-06-06 | 2009-12-10 | Dustin Ho | Method and apparatus for uv curing with water vapor |
CN102077316A (zh) * | 2008-06-27 | 2011-05-25 | 应用材料股份有限公司 | 用于高产量及稳定逐基材表现的快速周期和广泛的后期紫外臭氧清洗程序的添加 |
JP5423205B2 (ja) * | 2008-08-29 | 2014-02-19 | 東京エレクトロン株式会社 | 成膜装置 |
US8895942B2 (en) * | 2008-09-16 | 2014-11-25 | Tokyo Electron Limited | Dielectric treatment module using scanning IR radiation source |
JP2012503313A (ja) * | 2008-09-16 | 2012-02-02 | 東京エレクトロン株式会社 | 誘電材料処理システム及び当該システムの操作方法 |
US20100065758A1 (en) * | 2008-09-16 | 2010-03-18 | Tokyo Electron Limited | Dielectric material treatment system and method of operating |
EP2345089A4 (en) * | 2008-10-17 | 2012-10-03 | Atonometrics Inc | UV EXPOSURE CHAMBER FOR PV MODULES |
US20100096569A1 (en) * | 2008-10-21 | 2010-04-22 | Applied Materials, Inc. | Ultraviolet-transmitting microwave reflector comprising a micromesh screen |
US7964858B2 (en) * | 2008-10-21 | 2011-06-21 | Applied Materials, Inc. | Ultraviolet reflector with coolant gas holes and method |
JP5445044B2 (ja) * | 2008-11-14 | 2014-03-19 | 東京エレクトロン株式会社 | 成膜装置 |
WO2010066298A1 (de) * | 2008-12-11 | 2010-06-17 | Osram Gesellschaft mit beschränkter Haftung | Uv-leuchte mit einer mehrzahl uv-lampen, insbesondere zur technischen produktbehandlung |
US20100193674A1 (en) * | 2009-02-03 | 2010-08-05 | Wkk Distribution, Ltd. | Lamp system producing uniform high intensity ultraviolet light for exposure of photolithographic and other light polymerizable materials |
US8617347B2 (en) * | 2009-08-06 | 2013-12-31 | Applied Materials, Inc. | Vacuum processing chambers incorporating a moveable flow equalizer |
US8603292B2 (en) * | 2009-10-28 | 2013-12-10 | Lam Research Corporation | Quartz window for a degas chamber |
JP5257328B2 (ja) * | 2009-11-04 | 2013-08-07 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法及び記憶媒体 |
JP5310512B2 (ja) * | 2009-12-02 | 2013-10-09 | 東京エレクトロン株式会社 | 基板処理装置 |
JP5553588B2 (ja) * | 2009-12-10 | 2014-07-16 | 東京エレクトロン株式会社 | 成膜装置 |
US8584612B2 (en) * | 2009-12-17 | 2013-11-19 | Lam Research Corporation | UV lamp assembly of degas chamber having rotary shutters |
US20110151677A1 (en) | 2009-12-21 | 2011-06-23 | Applied Materials, Inc. | Wet oxidation process performed on a dielectric material formed from a flowable cvd process |
US20110224475A1 (en) * | 2010-02-12 | 2011-09-15 | Andries Nicolaas Schreuder | Robotic mobile anesthesia system |
US20110232677A1 (en) * | 2010-03-29 | 2011-09-29 | Tokyo Electron Limited | Method for cleaning low-k dielectrics |
JP5909039B2 (ja) * | 2010-04-06 | 2016-04-26 | 株式会社小森コーポレーション | 巻紙印刷機 |
WO2011152650A2 (ko) * | 2010-05-31 | 2011-12-08 | 주식회사 메가젠임플란트 | 치과용 임플란트의 표면 처리 장치 |
US8492736B2 (en) | 2010-06-09 | 2013-07-23 | Lam Research Corporation | Ozone plenum as UV shutter or tunable UV filter for cleaning semiconductor substrates |
DE112011102371T5 (de) * | 2010-07-16 | 2013-04-25 | Nordson Corporation | Lampensysteme und Verfahren zum Erzeugen von ultraviolettem Licht |
CN103109357B (zh) | 2010-10-19 | 2016-08-24 | 应用材料公司 | 用于紫外线纳米固化腔室的石英喷洒器 |
WO2012053132A1 (ja) * | 2010-10-22 | 2012-04-26 | パナソニック株式会社 | 半導体製造装置、膜の製造方法及び半導体装置の製造方法 |
US8309421B2 (en) * | 2010-11-24 | 2012-11-13 | Applied Materials, Inc. | Dual-bulb lamphead control methodology |
CN102121607B (zh) * | 2011-01-11 | 2012-10-24 | 安徽师范大学 | 一种紫外led平面固化装置的设计方案 |
US20120258259A1 (en) | 2011-04-08 | 2012-10-11 | Amit Bansal | Apparatus and method for uv treatment, chemical treatment, and deposition |
US20130026381A1 (en) * | 2011-07-25 | 2013-01-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Dynamic, real time ultraviolet radiation intensity monitor |
KR101310657B1 (ko) * | 2011-12-27 | 2013-09-24 | 주은유브이텍 주식회사 | 자외선 경화장치 |
KR101310656B1 (ko) * | 2011-12-27 | 2013-09-24 | 주은유브이텍 주식회사 | 자외선 경화장치 |
US9287154B2 (en) | 2012-06-01 | 2016-03-15 | Taiwan Semiconductor Manufacturing Co., Ltd. | UV curing system for semiconductors |
US20150123015A1 (en) * | 2013-11-04 | 2015-05-07 | Nordson Corporation | Apparatus and methods for irradiating substrates with ultraviolet light |
JP6349208B2 (ja) * | 2014-09-09 | 2018-06-27 | 東京応化工業株式会社 | 紫外線照射装置、紫外線照射方法、基板処理装置、及び基板処理装置の製造方法 |
US10520251B2 (en) * | 2015-01-15 | 2019-12-31 | Heraeus Noblelight America Llc | UV light curing systems, and methods of designing and operating the same |
TWI535971B (zh) * | 2015-04-16 | 2016-06-01 | 隆達電子股份有限公司 | 車用燈具 |
US9433973B1 (en) * | 2015-06-15 | 2016-09-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | UV curing apparatus |
DE102015011229B4 (de) * | 2015-08-27 | 2020-07-23 | Süss Microtec Photomask Equipment Gmbh & Co. Kg | Vorrichtung zum Aufbringen eines mit UV-Strahlung beaufschlagten flüssigen Mediums auf ein Substrat |
KR102302564B1 (ko) * | 2016-03-09 | 2021-09-15 | 어플라이드 머티어리얼스, 인코포레이티드 | 패드 구조 및 제조 방법들 |
US10541159B2 (en) * | 2016-05-26 | 2020-01-21 | Applied Materials, Inc. | Processing chamber with irradiance curing lens |
JP6721420B2 (ja) * | 2016-06-02 | 2020-07-15 | 株式会社ディスコ | 漏れ光検出方法 |
US20170358446A1 (en) * | 2016-06-13 | 2017-12-14 | Taiwan Semiconductor Manufacturing Co., Ltd. | Wafer processing apparatus and wafer processing method using the same |
JP6847199B2 (ja) | 2016-07-22 | 2021-03-24 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | エピの均一性調整を改善するための加熱変調器 |
US10483010B2 (en) * | 2016-09-07 | 2019-11-19 | Lam Research Ag | Reduction of surface and embedded substrate charge by controlled exposure to vacuum ultraviolet (VUV) light in low-oxygen environment |
CN110114204A (zh) * | 2017-02-10 | 2019-08-09 | 惠普发展公司,有限责任合伙企业 | 熔融模块 |
WO2018190844A1 (en) * | 2017-04-13 | 2018-10-18 | Hewlett-Packard Development Company, L.P. | Reflective barriers |
EP3814022A4 (en) | 2018-05-04 | 2022-06-01 | Xenon Corporation | REFLECTOR TO PROVIDE UNIFORM LIGHT ENERGY |
CN109340634A (zh) * | 2018-11-27 | 2019-02-15 | 广州黑格智造信息科技有限公司 | 光固化组件及光固化箱 |
US20220047736A1 (en) * | 2018-11-28 | 2022-02-17 | Gold Mine Ideas, Llc | Uv pathogen control device and system |
US11348784B2 (en) | 2019-08-12 | 2022-05-31 | Beijing E-Town Semiconductor Technology Co., Ltd | Enhanced ignition in inductively coupled plasmas for workpiece processing |
US11215934B2 (en) | 2020-01-21 | 2022-01-04 | Applied Materials, Inc. | In-situ light detection methods and apparatus for ultraviolet semiconductor substrate processing |
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CN111508872B (zh) * | 2020-04-22 | 2024-03-26 | 北京北方华创微电子装备有限公司 | 光照射装置及半导体加工设备 |
US11430671B2 (en) * | 2020-07-30 | 2022-08-30 | Taiwan Semiconductor Manufacturing Co., Ltd. | Ozone wafer cleaning module having an ultraviolet lamp module with rotatable reflectors |
KR102455371B1 (ko) * | 2020-09-14 | 2022-10-17 | 주식회사 유비테크 | Uv램프의 수명이 연장된 uv경화장치 |
TWI785519B (zh) * | 2021-03-05 | 2022-12-01 | 台灣積體電路製造股份有限公司 | 微波產生器、紫外光源、與基板處理方法 |
NL2028245B1 (en) * | 2021-05-19 | 2022-12-05 | Draka Comteq Bv | A plasma chemical vapor deposition apparatus |
TWI808488B (zh) | 2021-09-14 | 2023-07-11 | 林獻昇 | 集光束uvled紫外線掃描方法及其裝置 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3983039A (en) * | 1975-03-03 | 1976-09-28 | Fusion Systems Corporation | Non-symmetrical reflector for ultraviolet curing |
US4135098A (en) * | 1976-11-05 | 1979-01-16 | Union Carbide Corporation | Method and apparatus for curing coating materials |
US5440137A (en) * | 1994-09-06 | 1995-08-08 | Fusion Systems Corporation | Screw mechanism for radiation-curing lamp having an adjustable irradiation area |
US5705232A (en) * | 1994-09-20 | 1998-01-06 | Texas Instruments Incorporated | In-situ coat, bake and cure of dielectric material processing system for semiconductor manufacturing |
DE10241330A1 (de) * | 2002-02-20 | 2003-09-04 | Geesthacht Gkss Forschung | Spiegelelement für die Reflektion von Röntgenstrahlen |
US20050064298A1 (en) * | 2003-09-18 | 2005-03-24 | Silverman Peter J. | Multilayer coatings for EUV mask substrates |
Family Cites Families (59)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE400191B (sv) * | 1972-03-22 | 1978-03-20 | Hildebrand Maschinenbau Gmbh R | Anordning for att herda beleggningsskikt genom ultraviolettbestralning fran kvicksilverangror |
JPS5845738A (ja) * | 1981-09-16 | 1983-03-17 | Toshiba Electric Equip Corp | 紫外線照射器具 |
US4411931A (en) | 1982-09-29 | 1983-10-25 | Armstrong World Industries, Inc. | Multiple step UV curing process for providing accurately controlled surface texture |
NL8402124A (nl) | 1984-07-04 | 1986-02-03 | Philips Nv | Inrichting voor het belichten van een uv hardende laag op een draadvormig lichaam. |
GB2203757B (en) * | 1987-04-16 | 1991-05-22 | Philips Electronic Associated | Electronic device manufacture |
JPH01112230A (ja) * | 1987-10-24 | 1989-04-28 | Mitsubishi Rayon Co Ltd | 照射装置 |
JPH02109338A (ja) * | 1988-10-18 | 1990-04-23 | Fujitsu Ltd | 絶縁膜の安定化処理方法 |
DE3919334A1 (de) * | 1989-06-13 | 1990-12-20 | Tetsuhiro Kano | Reflektor fuer eine leuchte |
JPH0360733A (ja) * | 1989-07-27 | 1991-03-15 | Toshiba Lighting & Technol Corp | 紫外線照射装置 |
JPH03169338A (ja) * | 1989-11-30 | 1991-07-23 | Toshiba Lighting & Technol Corp | 紫外線照射装置 |
JPH0435842A (ja) | 1990-05-31 | 1992-02-06 | Brother Ind Ltd | 加工ユニット制御装置 |
JPH04131460U (ja) * | 1991-05-23 | 1992-12-03 | 大平洋機工株式会社 | 長尺の被塗物の紫外線乾燥装置 |
US5228206A (en) | 1992-01-15 | 1993-07-20 | Submicron Systems, Inc. | Cluster tool dry cleaning system |
US5215588A (en) * | 1992-01-17 | 1993-06-01 | Amtech Systems, Inc. | Photo-CVD system |
DE4318735A1 (de) | 1993-06-05 | 1994-12-08 | Kammann Maschf Werner | UV-Strahler zum Bestrahlen von Druckfarben auf Objekten und Verfahren zum Trocknen von mit Druckfarbe versehenen Objekten |
GB2315850B (en) | 1996-08-02 | 2000-10-04 | Spectral Technology Limited | Lamp assembly |
EP0968962A4 (en) | 1997-06-23 | 2002-04-03 | Soloviev Evgeny Vladimirovich | METHOD AND DEVICE FOR TREATING LIQUIDS, AIR AND SURFACES WITH UV RAYS |
US6098637A (en) | 1998-03-03 | 2000-08-08 | Applied Materials, Inc. | In situ cleaning of the surface inside a vacuum processing chamber |
DE19810455C2 (de) * | 1998-03-11 | 2000-02-24 | Michael Bisges | Kaltlicht-UV-Bestrahlungsvorrichtung |
GB2336240A (en) * | 1998-04-09 | 1999-10-13 | Jenton International Limited | Apparatus for emitting light |
US6284050B1 (en) | 1998-05-18 | 2001-09-04 | Novellus Systems, Inc. | UV exposure for improving properties and adhesion of dielectric polymer films formed by chemical vapor deposition |
JP2000005295A (ja) * | 1998-06-22 | 2000-01-11 | Daikin Ind Ltd | 脱臭装置 |
JP3078528B2 (ja) * | 1998-09-10 | 2000-08-21 | 東京エレクトロン株式会社 | 被処理膜の改質装置 |
JP2000218156A (ja) | 1998-11-25 | 2000-08-08 | Hooya Shot Kk | 紫外光照射装置 |
US6331480B1 (en) | 1999-02-18 | 2001-12-18 | Taiwan Semiconductor Manufacturing Company | Method to improve adhesion between an overlying oxide hard mask and an underlying low dielectric constant material |
US7126687B2 (en) * | 1999-08-09 | 2006-10-24 | The United States Of America As Represented By The Secretary Of The Army | Method and instrumentation for determining absorption and morphology of individual airborne particles |
US6475930B1 (en) * | 2000-01-31 | 2002-11-05 | Motorola, Inc. | UV cure process and tool for low k film formation |
GB2360084B (en) | 2000-03-08 | 2004-04-21 | Nordson Corp | Lamp assembly |
CN1224074C (zh) * | 2000-04-07 | 2005-10-19 | 诺德森公司 | 带有灯体冷却系统的微波激励的紫外线灯系统 |
US6614181B1 (en) | 2000-08-23 | 2003-09-02 | Applied Materials, Inc. | UV radiation source for densification of CVD carbon-doped silicon oxide films |
US6566278B1 (en) | 2000-08-24 | 2003-05-20 | Applied Materials Inc. | Method for densification of CVD carbon-doped silicon oxide films through UV irradiation |
US6323601B1 (en) | 2000-09-11 | 2001-11-27 | Nordson Corporation | Reflector for an ultraviolet lamp system |
US6380270B1 (en) | 2000-09-26 | 2002-04-30 | Honeywell International Inc. | Photogenerated nanoporous materials |
US6559460B1 (en) * | 2000-10-31 | 2003-05-06 | Nordson Corporation | Ultraviolet lamp system and methods |
GB2407370B (en) * | 2001-02-27 | 2005-07-06 | Nordson Corp | Lamp assembly |
US6732451B2 (en) | 2001-04-11 | 2004-05-11 | Intermec Ip Corp. | UV curing module for label printer |
US6756085B2 (en) | 2001-09-14 | 2004-06-29 | Axcelis Technologies, Inc. | Ultraviolet curing processes for advanced low-k materials |
DE10204994B4 (de) * | 2002-02-05 | 2006-11-09 | Xtreme Technologies Gmbh | Anordnung zur Überwachung der Energieabstrahlung einer EUV-Strahlungsquelle |
US6619181B1 (en) * | 2002-05-16 | 2003-09-16 | The United States Of America As Represented By The Secretary Of The Army | Apparatus for reversing the detonability of an explosive in energetic armor |
US6717161B1 (en) | 2003-04-30 | 2004-04-06 | Fusion Uv Systems, Inc. | Apparatus and method providing substantially uniform irradiation of surfaces of elongated objects with a high level of irradiance |
PT1634078E (pt) * | 2003-06-03 | 2008-06-11 | Siemens Healthcare Diagnostics | Analito nativo utilizado como referência em ensaios de escoamento lateral |
US7119904B2 (en) * | 2004-01-13 | 2006-10-10 | Thermo Electron Scientific Instruments Corporation | Stabilized infrared source for infrared spectrometers |
JP2005223007A (ja) | 2004-02-03 | 2005-08-18 | Nikon Corp | 照明光学装置 |
US7164144B2 (en) * | 2004-03-10 | 2007-01-16 | Cymer Inc. | EUV light source |
US7227613B2 (en) | 2004-07-26 | 2007-06-05 | Asml Holding N.V. | Lithographic apparatus having double telecentric illumination |
US7077547B2 (en) * | 2004-07-29 | 2006-07-18 | Nordson Corporation | Shuttered lamp assembly and method of cooling the lamp assembly |
DE102004038592A1 (de) * | 2004-08-06 | 2006-03-16 | Ist Metz Gmbh | Bestrahlungsaggregat |
JP2006114848A (ja) * | 2004-10-18 | 2006-04-27 | Apex Corp | 紫外線照射処理装置、紫外線照射処理方法及び半導体製造装置 |
JP2006134974A (ja) | 2004-11-04 | 2006-05-25 | Canon Inc | 露光装置、判定方法及びデバイス製造方法 |
US20060251827A1 (en) | 2005-05-09 | 2006-11-09 | Applied Materials, Inc. | Tandem uv chamber for curing dielectric materials |
US20060249175A1 (en) | 2005-05-09 | 2006-11-09 | Applied Materials, Inc. | High efficiency UV curing system |
US7777198B2 (en) | 2005-05-09 | 2010-08-17 | Applied Materials, Inc. | Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation |
JP2007234527A (ja) * | 2006-03-03 | 2007-09-13 | Harison Toshiba Lighting Corp | 照明装置 |
US7692171B2 (en) | 2006-03-17 | 2010-04-06 | Andrzei Kaszuba | Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors |
US7589336B2 (en) | 2006-03-17 | 2009-09-15 | Applied Materials, Inc. | Apparatus and method for exposing a substrate to UV radiation while monitoring deterioration of the UV source and reflectors |
US7566891B2 (en) | 2006-03-17 | 2009-07-28 | Applied Materials, Inc. | Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectors |
US20070287091A1 (en) | 2006-06-12 | 2007-12-13 | Jacobo Victor M | System and method for exposing electronic substrates to UV light |
US20070295012A1 (en) | 2006-06-26 | 2007-12-27 | Applied Materials, Inc. | Nitrogen enriched cooling air module for uv curing system |
KR20080027009A (ko) | 2006-09-22 | 2008-03-26 | 에이에스엠지니텍코리아 주식회사 | 원자층 증착 장치 및 그를 이용한 다층막 증착 방법 |
-
2007
- 2007-03-15 US US11/686,897 patent/US7589336B2/en active Active
- 2007-03-15 US US11/686,901 patent/US7909595B2/en active Active
- 2007-03-15 SG SG200701946-6A patent/SG136078A1/en unknown
- 2007-03-16 TW TW096109233A patent/TWI388692B/zh active
- 2007-03-19 JP JP2007070851A patent/JP5285864B2/ja active Active
- 2007-03-19 CN CN2007100874797A patent/CN101093786B/zh active Active
- 2007-03-19 CN CN2010105348732A patent/CN102136411B/zh not_active Expired - Fee Related
- 2007-03-19 KR KR1020070026627A patent/KR101341540B1/ko active IP Right Grant
-
2010
- 2010-12-22 US US12/976,746 patent/US8597011B2/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3983039A (en) * | 1975-03-03 | 1976-09-28 | Fusion Systems Corporation | Non-symmetrical reflector for ultraviolet curing |
US4135098A (en) * | 1976-11-05 | 1979-01-16 | Union Carbide Corporation | Method and apparatus for curing coating materials |
US5440137A (en) * | 1994-09-06 | 1995-08-08 | Fusion Systems Corporation | Screw mechanism for radiation-curing lamp having an adjustable irradiation area |
US5705232A (en) * | 1994-09-20 | 1998-01-06 | Texas Instruments Incorporated | In-situ coat, bake and cure of dielectric material processing system for semiconductor manufacturing |
DE10241330A1 (de) * | 2002-02-20 | 2003-09-04 | Geesthacht Gkss Forschung | Spiegelelement für die Reflektion von Röntgenstrahlen |
US20050064298A1 (en) * | 2003-09-18 | 2005-03-24 | Silverman Peter J. | Multilayer coatings for EUV mask substrates |
Also Published As
Publication number | Publication date |
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JP5285864B2 (ja) | 2013-09-11 |
CN101093786A (zh) | 2007-12-26 |
US20070228618A1 (en) | 2007-10-04 |
US7589336B2 (en) | 2009-09-15 |
TWI388692B (zh) | 2013-03-11 |
KR20070094574A (ko) | 2007-09-20 |
JP2007247068A (ja) | 2007-09-27 |
KR101341540B1 (ko) | 2013-12-13 |
US7909595B2 (en) | 2011-03-22 |
US20070228289A1 (en) | 2007-10-04 |
CN102136411A (zh) | 2011-07-27 |
CN102136411B (zh) | 2013-06-05 |
US20120003398A1 (en) | 2012-01-05 |
US8597011B2 (en) | 2013-12-03 |
CN101093786B (zh) | 2010-12-22 |
TW200741028A (en) | 2007-11-01 |
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