SG11201706572YA - Constructions comprising stacked memory arrays - Google Patents
Constructions comprising stacked memory arraysInfo
- Publication number
- SG11201706572YA SG11201706572YA SG11201706572YA SG11201706572YA SG11201706572YA SG 11201706572Y A SG11201706572Y A SG 11201706572YA SG 11201706572Y A SG11201706572Y A SG 11201706572YA SG 11201706572Y A SG11201706572Y A SG 11201706572YA SG 11201706572Y A SG11201706572Y A SG 11201706572YA
- Authority
- SG
- Singapore
- Prior art keywords
- constructions
- memory arrays
- stacked memory
- stacked
- arrays
- Prior art date
Links
- 238000003491 array Methods 0.000 title 1
- 238000010276 construction Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0004—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements comprising amorphous/crystalline phase transition cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
- H10B63/20—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having two electrodes, e.g. diodes
- H10B63/24—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having two electrodes, e.g. diodes of the Ovonic threshold switching type
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
- H10B63/80—Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays
- H10B63/84—Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays arranged in a direction perpendicular to the substrate, e.g. 3D cell arrays
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/20—Multistable switching devices, e.g. memristors
- H10N70/231—Multistable switching devices, e.g. memristors based on solid-state phase change, e.g. between amorphous and crystalline phases, Ovshinsky effect
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/821—Device geometry
- H10N70/826—Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/881—Switching materials
- H10N70/882—Compounds of sulfur, selenium or tellurium, e.g. chalcogenides
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/881—Switching materials
- H10N70/882—Compounds of sulfur, selenium or tellurium, e.g. chalcogenides
- H10N70/8828—Tellurides, e.g. GeSbTe
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0023—Address circuits or decoders
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/003—Cell access
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
- G11C2213/70—Resistive array aspects
- G11C2213/71—Three dimensional array
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Semiconductor Memories (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/662,920 US9691475B2 (en) | 2015-03-19 | 2015-03-19 | Constructions comprising stacked memory arrays |
PCT/US2015/067264 WO2016148757A1 (fr) | 2015-03-19 | 2015-12-22 | Constructions comprenant des réseaux de mémoires empilées |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201706572YA true SG11201706572YA (en) | 2017-09-28 |
Family
ID=56919289
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201706572YA SG11201706572YA (en) | 2015-03-19 | 2015-12-22 | Constructions comprising stacked memory arrays |
Country Status (8)
Country | Link |
---|---|
US (4) | US9691475B2 (fr) |
EP (1) | EP3281225B1 (fr) |
JP (2) | JP6518779B2 (fr) |
KR (1) | KR102013052B1 (fr) |
CN (2) | CN111653586B (fr) |
SG (1) | SG11201706572YA (fr) |
TW (1) | TWI596608B (fr) |
WO (1) | WO2016148757A1 (fr) |
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US9691475B2 (en) | 2015-03-19 | 2017-06-27 | Micron Technology, Inc. | Constructions comprising stacked memory arrays |
KR102375591B1 (ko) * | 2015-10-27 | 2022-03-16 | 삼성전자주식회사 | 반도체 장치 및 이의 제조 방법 |
US10276555B2 (en) * | 2016-10-01 | 2019-04-30 | Samsung Electronics Co., Ltd. | Method and system for providing a magnetic cell usable in spin transfer torque applications and including a switchable shunting layer |
US10103325B2 (en) * | 2016-12-15 | 2018-10-16 | Winbond Electronics Corp. | Resistance change memory device and fabrication method thereof |
US10157667B2 (en) | 2017-04-28 | 2018-12-18 | Micron Technology, Inc. | Mixed cross point memory |
JPWO2018203459A1 (ja) * | 2017-05-01 | 2020-05-14 | ソニーセミコンダクタソリューションズ株式会社 | 選択素子および記憶装置 |
KR102307058B1 (ko) * | 2017-07-06 | 2021-10-01 | 삼성전자주식회사 | 분리 라인들 사이의 정보 저장 패턴을 포함하는 반도체 소자 |
US10541271B2 (en) * | 2017-10-18 | 2020-01-21 | Macronix International Co., Ltd. | Superlattice-like switching devices |
KR20190056867A (ko) | 2017-11-17 | 2019-05-27 | 에스케이하이닉스 주식회사 | 전자 장치 및 그 제조 방법 |
CN110660822A (zh) | 2018-06-29 | 2020-01-07 | 三星电子株式会社 | 可变电阻存储器装置 |
US10374009B1 (en) | 2018-07-17 | 2019-08-06 | Macronix International Co., Ltd. | Te-free AsSeGe chalcogenides for selector devices and memory devices using same |
KR102557911B1 (ko) | 2018-08-31 | 2023-07-19 | 삼성전자주식회사 | 반도체 장치 및 그 제조 방법 |
US10903216B2 (en) | 2018-09-07 | 2021-01-26 | Samsung Electronics Co., Ltd. | Semiconductor memory device and method of fabricating the same |
KR20200127746A (ko) * | 2019-05-03 | 2020-11-11 | 에스케이하이닉스 주식회사 | 전자 장치 |
KR20210001262A (ko) | 2019-06-27 | 2021-01-06 | 에스케이하이닉스 주식회사 | 전자 장치 |
KR102651904B1 (ko) * | 2019-10-14 | 2024-03-28 | 양쯔 메모리 테크놀로지스 씨오., 엘티디. | 3차원 상변화 메모리 디바이스들을 형성하는 방법들 |
KR102659033B1 (ko) | 2019-10-14 | 2024-04-22 | 양쯔 메모리 테크놀로지스 씨오., 엘티디. | 3차원 상변화 메모리 디바이스들 |
US11289540B2 (en) | 2019-10-15 | 2022-03-29 | Macronix International Co., Ltd. | Semiconductor device and memory cell |
KR20210069164A (ko) | 2019-12-02 | 2021-06-11 | 삼성전자주식회사 | 가변 저항 메모리 소자 및 이의 제조 방법 |
US11158787B2 (en) | 2019-12-17 | 2021-10-26 | Macronix International Co., Ltd. | C—As—Se—Ge ovonic materials for selector devices and memory devices using same |
US11282747B2 (en) | 2020-02-24 | 2022-03-22 | Micron Technology, Inc. | Methods of forming microelectronic devices, and related microelectronic devices, and electronic systems |
US11362276B2 (en) | 2020-03-27 | 2022-06-14 | Macronix International Co., Ltd. | High thermal stability SiOx doped GeSbTe materials suitable for embedded PCM application |
EP3890024B1 (fr) * | 2020-03-30 | 2024-05-01 | STMicroelectronics (Crolles 2) SAS | Puce électronique à deux mémoires à changement de phase et procédé de fabrication |
KR102610966B1 (ko) * | 2022-05-10 | 2023-12-06 | 고려대학교 산학협력단 | 전도성 필라멘트 나노 히터 형성을 활용한 다중 비트 상변화 메모리 소자 |
CN117596898B (zh) * | 2023-11-29 | 2024-05-31 | 新存科技(武汉)有限责任公司 | 相变存储器及其形成方法、漏电测试方法 |
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-
2015
- 2015-03-19 US US14/662,920 patent/US9691475B2/en active Active
- 2015-12-22 EP EP15885764.9A patent/EP3281225B1/fr active Active
- 2015-12-22 SG SG11201706572YA patent/SG11201706572YA/en unknown
- 2015-12-22 CN CN202010516766.0A patent/CN111653586B/zh active Active
- 2015-12-22 WO PCT/US2015/067264 patent/WO2016148757A1/fr active Application Filing
- 2015-12-22 JP JP2017544894A patent/JP6518779B2/ja active Active
- 2015-12-22 KR KR1020177024085A patent/KR102013052B1/ko active IP Right Grant
- 2015-12-22 CN CN201580077081.8A patent/CN107408570B/zh active Active
-
2016
- 2016-01-07 TW TW105100427A patent/TWI596608B/zh active
-
2017
- 2017-05-30 US US15/607,786 patent/US9881973B2/en active Active
- 2017-12-18 US US15/845,938 patent/US10147764B2/en active Active
-
2018
- 2018-08-14 US US16/103,032 patent/US10396127B2/en active Active
-
2019
- 2019-04-22 JP JP2019080605A patent/JP6812488B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
US20190006423A1 (en) | 2019-01-03 |
CN107408570A (zh) | 2017-11-28 |
US20160276022A1 (en) | 2016-09-22 |
CN111653586B (zh) | 2023-07-21 |
JP6518779B2 (ja) | 2019-05-22 |
WO2016148757A1 (fr) | 2016-09-22 |
EP3281225A4 (fr) | 2018-12-05 |
JP2018512728A (ja) | 2018-05-17 |
TWI596608B (zh) | 2017-08-21 |
JP6812488B2 (ja) | 2021-01-13 |
JP2019165231A (ja) | 2019-09-26 |
US9691475B2 (en) | 2017-06-27 |
US20180122860A1 (en) | 2018-05-03 |
US20170263685A1 (en) | 2017-09-14 |
KR20170109014A (ko) | 2017-09-27 |
CN107408570B (zh) | 2020-07-03 |
TW201703043A (zh) | 2017-01-16 |
US9881973B2 (en) | 2018-01-30 |
EP3281225B1 (fr) | 2020-03-11 |
EP3281225A1 (fr) | 2018-02-14 |
US10147764B2 (en) | 2018-12-04 |
KR102013052B1 (ko) | 2019-08-21 |
CN111653586A (zh) | 2020-09-11 |
US10396127B2 (en) | 2019-08-27 |
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