SG11201706572YA - Constructions comprising stacked memory arrays - Google Patents

Constructions comprising stacked memory arrays

Info

Publication number
SG11201706572YA
SG11201706572YA SG11201706572YA SG11201706572YA SG11201706572YA SG 11201706572Y A SG11201706572Y A SG 11201706572YA SG 11201706572Y A SG11201706572Y A SG 11201706572YA SG 11201706572Y A SG11201706572Y A SG 11201706572YA SG 11201706572Y A SG11201706572Y A SG 11201706572YA
Authority
SG
Singapore
Prior art keywords
constructions
memory arrays
stacked memory
stacked
arrays
Prior art date
Application number
SG11201706572YA
Other languages
English (en)
Inventor
Andrea Redaelli
Original Assignee
Micron Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micron Technology Inc filed Critical Micron Technology Inc
Publication of SG11201706572YA publication Critical patent/SG11201706572YA/en

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0004Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements comprising amorphous/crystalline phase transition cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B63/00Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
    • H10B63/20Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having two electrodes, e.g. diodes
    • H10B63/24Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having two electrodes, e.g. diodes of the Ovonic threshold switching type
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B63/00Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
    • H10B63/80Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays
    • H10B63/84Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays arranged in a direction perpendicular to the substrate, e.g. 3D cell arrays
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/20Multistable switching devices, e.g. memristors
    • H10N70/231Multistable switching devices, e.g. memristors based on solid-state phase change, e.g. between amorphous and crystalline phases, Ovshinsky effect
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801Constructional details of multistable switching devices
    • H10N70/821Device geometry
    • H10N70/826Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801Constructional details of multistable switching devices
    • H10N70/881Switching materials
    • H10N70/882Compounds of sulfur, selenium or tellurium, e.g. chalcogenides
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801Constructional details of multistable switching devices
    • H10N70/881Switching materials
    • H10N70/882Compounds of sulfur, selenium or tellurium, e.g. chalcogenides
    • H10N70/8828Tellurides, e.g. GeSbTe
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0021Auxiliary circuits
    • G11C13/0023Address circuits or decoders
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0021Auxiliary circuits
    • G11C13/003Cell access
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C2213/00Indexing scheme relating to G11C13/00 for features not covered by this group
    • G11C2213/70Resistive array aspects
    • G11C2213/71Three dimensional array

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Semiconductor Memories (AREA)
SG11201706572YA 2015-03-19 2015-12-22 Constructions comprising stacked memory arrays SG11201706572YA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/662,920 US9691475B2 (en) 2015-03-19 2015-03-19 Constructions comprising stacked memory arrays
PCT/US2015/067264 WO2016148757A1 (fr) 2015-03-19 2015-12-22 Constructions comprenant des réseaux de mémoires empilées

Publications (1)

Publication Number Publication Date
SG11201706572YA true SG11201706572YA (en) 2017-09-28

Family

ID=56919289

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201706572YA SG11201706572YA (en) 2015-03-19 2015-12-22 Constructions comprising stacked memory arrays

Country Status (8)

Country Link
US (4) US9691475B2 (fr)
EP (1) EP3281225B1 (fr)
JP (2) JP6518779B2 (fr)
KR (1) KR102013052B1 (fr)
CN (2) CN111653586B (fr)
SG (1) SG11201706572YA (fr)
TW (1) TWI596608B (fr)
WO (1) WO2016148757A1 (fr)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9691475B2 (en) 2015-03-19 2017-06-27 Micron Technology, Inc. Constructions comprising stacked memory arrays
KR102375591B1 (ko) * 2015-10-27 2022-03-16 삼성전자주식회사 반도체 장치 및 이의 제조 방법
US10276555B2 (en) * 2016-10-01 2019-04-30 Samsung Electronics Co., Ltd. Method and system for providing a magnetic cell usable in spin transfer torque applications and including a switchable shunting layer
US10103325B2 (en) * 2016-12-15 2018-10-16 Winbond Electronics Corp. Resistance change memory device and fabrication method thereof
US10157667B2 (en) 2017-04-28 2018-12-18 Micron Technology, Inc. Mixed cross point memory
JPWO2018203459A1 (ja) * 2017-05-01 2020-05-14 ソニーセミコンダクタソリューションズ株式会社 選択素子および記憶装置
KR102307058B1 (ko) * 2017-07-06 2021-10-01 삼성전자주식회사 분리 라인들 사이의 정보 저장 패턴을 포함하는 반도체 소자
US10541271B2 (en) * 2017-10-18 2020-01-21 Macronix International Co., Ltd. Superlattice-like switching devices
KR20190056867A (ko) 2017-11-17 2019-05-27 에스케이하이닉스 주식회사 전자 장치 및 그 제조 방법
CN110660822A (zh) 2018-06-29 2020-01-07 三星电子株式会社 可变电阻存储器装置
US10374009B1 (en) 2018-07-17 2019-08-06 Macronix International Co., Ltd. Te-free AsSeGe chalcogenides for selector devices and memory devices using same
KR102557911B1 (ko) 2018-08-31 2023-07-19 삼성전자주식회사 반도체 장치 및 그 제조 방법
US10903216B2 (en) 2018-09-07 2021-01-26 Samsung Electronics Co., Ltd. Semiconductor memory device and method of fabricating the same
KR20200127746A (ko) * 2019-05-03 2020-11-11 에스케이하이닉스 주식회사 전자 장치
KR20210001262A (ko) 2019-06-27 2021-01-06 에스케이하이닉스 주식회사 전자 장치
KR102651904B1 (ko) * 2019-10-14 2024-03-28 양쯔 메모리 테크놀로지스 씨오., 엘티디. 3차원 상변화 메모리 디바이스들을 형성하는 방법들
KR102659033B1 (ko) 2019-10-14 2024-04-22 양쯔 메모리 테크놀로지스 씨오., 엘티디. 3차원 상변화 메모리 디바이스들
US11289540B2 (en) 2019-10-15 2022-03-29 Macronix International Co., Ltd. Semiconductor device and memory cell
KR20210069164A (ko) 2019-12-02 2021-06-11 삼성전자주식회사 가변 저항 메모리 소자 및 이의 제조 방법
US11158787B2 (en) 2019-12-17 2021-10-26 Macronix International Co., Ltd. C—As—Se—Ge ovonic materials for selector devices and memory devices using same
US11282747B2 (en) 2020-02-24 2022-03-22 Micron Technology, Inc. Methods of forming microelectronic devices, and related microelectronic devices, and electronic systems
US11362276B2 (en) 2020-03-27 2022-06-14 Macronix International Co., Ltd. High thermal stability SiOx doped GeSbTe materials suitable for embedded PCM application
EP3890024B1 (fr) * 2020-03-30 2024-05-01 STMicroelectronics (Crolles 2) SAS Puce électronique à deux mémoires à changement de phase et procédé de fabrication
KR102610966B1 (ko) * 2022-05-10 2023-12-06 고려대학교 산학협력단 전도성 필라멘트 나노 히터 형성을 활용한 다중 비트 상변화 메모리 소자
CN117596898B (zh) * 2023-11-29 2024-05-31 新存科技(武汉)有限责任公司 相变存储器及其形成方法、漏电测试方法

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6551857B2 (en) 1997-04-04 2003-04-22 Elm Technology Corporation Three dimensional structure integrated circuits
JP3575683B2 (ja) * 2000-10-05 2004-10-13 松下電器産業株式会社 多素子型磁気抵抗素子
US6327169B1 (en) * 2000-10-31 2001-12-04 Lsi Logic Corporation Multiple bit line memory architecture
US6344994B1 (en) * 2001-01-31 2002-02-05 Advanced Micro Devices Data retention characteristics as a result of high temperature bake
AU2003201760A1 (en) * 2002-04-04 2003-10-20 Kabushiki Kaisha Toshiba Phase-change memory device
US6768661B2 (en) 2002-06-27 2004-07-27 Matrix Semiconductor, Inc. Multiple-mode memory and method for forming same
US7057914B2 (en) 2002-08-02 2006-06-06 Unity Semiconductor Corporation Cross point memory array with fast access time
US7485891B2 (en) 2003-11-20 2009-02-03 International Business Machines Corporation Multi-bit phase change memory cell and multi-bit phase change memory including the same, method of forming a multi-bit phase change memory, and method of programming a multi-bit phase change memory
US7256126B1 (en) * 2004-02-03 2007-08-14 Macronix International Co., Ltd. Pitch reduction integrating formation of memory array and peripheral circuitry
KR100810615B1 (ko) * 2006-09-20 2008-03-06 삼성전자주식회사 고온 상전이 패턴을 구비한 상전이 메모리소자 및 그제조방법
JP4577695B2 (ja) 2006-11-07 2010-11-10 エルピーダメモリ株式会社 半導体記憶装置及び半導体記憶装置の製造方法
US8487450B2 (en) 2007-05-01 2013-07-16 Micron Technology, Inc. Semiconductor constructions comprising vertically-stacked memory units that include diodes utilizing at least two different dielectric materials, and electronic systems
JP5557419B2 (ja) * 2007-10-17 2014-07-23 スパンション エルエルシー 半導体装置
JP5113584B2 (ja) * 2008-03-28 2013-01-09 株式会社東芝 不揮発性記憶装置及びその製造方法
JP5342189B2 (ja) * 2008-08-06 2013-11-13 株式会社日立製作所 不揮発性記憶装置及びその製造方法
JP2010225741A (ja) 2009-03-23 2010-10-07 Toshiba Corp 不揮発性半導体記憶装置
JP4810581B2 (ja) 2009-03-25 2011-11-09 株式会社東芝 不揮発性記憶装置
US8173987B2 (en) * 2009-04-27 2012-05-08 Macronix International Co., Ltd. Integrated circuit 3D phase change memory array and manufacturing method
JP5659480B2 (ja) * 2009-10-26 2015-01-28 ソニー株式会社 記憶装置の製造方法
JP5443965B2 (ja) * 2009-12-17 2014-03-19 株式会社東芝 半導体記憶装置
US8367460B2 (en) * 2010-06-22 2013-02-05 Micron Technology, Inc. Horizontally oriented and vertically stacked memory cells
JP2012033828A (ja) * 2010-08-02 2012-02-16 Toshiba Corp 半導体記憶装置及びその製造方法
US8450789B2 (en) 2010-08-24 2013-05-28 Micron Technology, Inc. Memory array with an air gap between memory cells and the formation thereof
US8791447B2 (en) * 2011-01-20 2014-07-29 Micron Technology, Inc. Arrays of nonvolatile memory cells and methods of forming arrays of nonvolatile memory cells
JP2012253148A (ja) * 2011-06-01 2012-12-20 Toshiba Corp 半導体装置及びその製造方法
JP2013058521A (ja) * 2011-09-07 2013-03-28 Toshiba Corp 記憶装置及びその製造方法
US8536561B2 (en) 2011-10-17 2013-09-17 Micron Technology, Inc. Memory cells and memory cell arrays
US9318699B2 (en) 2012-01-18 2016-04-19 Micron Technology, Inc. Resistive memory cell structures and methods
KR101934013B1 (ko) 2012-03-27 2018-12-31 에스케이하이닉스 주식회사 가변 저항 메모리 장치
US8921960B2 (en) 2012-07-27 2014-12-30 Hewlett-Packard Development Company, L.P. Memristor cell structures for high density arrays
KR101456503B1 (ko) * 2013-05-15 2014-11-03 (주)실리콘화일 스택 메모리
US9231202B2 (en) 2013-06-19 2016-01-05 Intel Corporation Thermal-disturb mitigation in dual-deck cross-point memories
US20150028280A1 (en) * 2013-07-26 2015-01-29 Micron Technology, Inc. Memory cell with independently-sized elements
KR101545952B1 (ko) * 2013-10-28 2015-08-21 (주)실리콘화일 스택 메모리 장치 및 그 동작 방법
TWI549229B (zh) * 2014-01-24 2016-09-11 旺宏電子股份有限公司 應用於系統單晶片之記憶體裝置內的多相變化材料
US9691475B2 (en) * 2015-03-19 2017-06-27 Micron Technology, Inc. Constructions comprising stacked memory arrays

Also Published As

Publication number Publication date
US20190006423A1 (en) 2019-01-03
CN107408570A (zh) 2017-11-28
US20160276022A1 (en) 2016-09-22
CN111653586B (zh) 2023-07-21
JP6518779B2 (ja) 2019-05-22
WO2016148757A1 (fr) 2016-09-22
EP3281225A4 (fr) 2018-12-05
JP2018512728A (ja) 2018-05-17
TWI596608B (zh) 2017-08-21
JP6812488B2 (ja) 2021-01-13
JP2019165231A (ja) 2019-09-26
US9691475B2 (en) 2017-06-27
US20180122860A1 (en) 2018-05-03
US20170263685A1 (en) 2017-09-14
KR20170109014A (ko) 2017-09-27
CN107408570B (zh) 2020-07-03
TW201703043A (zh) 2017-01-16
US9881973B2 (en) 2018-01-30
EP3281225B1 (fr) 2020-03-11
EP3281225A1 (fr) 2018-02-14
US10147764B2 (en) 2018-12-04
KR102013052B1 (ko) 2019-08-21
CN111653586A (zh) 2020-09-11
US10396127B2 (en) 2019-08-27

Similar Documents

Publication Publication Date Title
SG11201706572YA (en) Constructions comprising stacked memory arrays
EP3635782A4 (fr) Matrices mémoire
EP3635783A4 (fr) Matrices mémoires
EP3259757A4 (fr) Cellules mémoires
PT3515600T (pt) Matrizes de organóides
GB2577831B (en) Memristive structure
GB2558492B (en) Array antenna
EP3507808A4 (fr) Réseaux de mémoire
GB2571218B (en) Memory cell structure
HK1223195A1 (zh) 反熔絲存儲器單元
GB2536200B (en) Memory management
SG11202001464XA (en) Three dimensional memory arrays
GB2545264B (en) A storage array
GB2536880B (en) Memory management
EP3347820A4 (fr) Mémoire de groupe cohérente en lecture
GB2537960B (en) Memory management
GB201620954D0 (en) Memory management
GB201603590D0 (en) Memory unit
GB2565499B (en) Memory unit
EP3257081A4 (fr) Réseau crossbar de mémoire non volatile
IL258594B (en) Memory access instructions
GB2557923B (en) Non-volatile memory
GB201609703D0 (en) Memory unit
TWM533323U (en) Stacked type battery structure
TWI563670B (en) Non-volatile memory