SG11201506506PA - Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor - Google Patents

Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor

Info

Publication number
SG11201506506PA
SG11201506506PA SG11201506506PA SG11201506506PA SG11201506506PA SG 11201506506P A SG11201506506P A SG 11201506506PA SG 11201506506P A SG11201506506P A SG 11201506506PA SG 11201506506P A SG11201506506P A SG 11201506506PA SG 11201506506P A SG11201506506P A SG 11201506506PA
Authority
SG
Singapore
Prior art keywords
manufacturing
vapor deposition
lithography systems
systems therefor
deposited photoresist
Prior art date
Application number
SG11201506506PA
Other languages
English (en)
Inventor
Timothy Michaelson
Timothy W Weidman
Barry Lee Chin
Majeed A Foad
Paul Deaton
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of SG11201506506PA publication Critical patent/SG11201506506PA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/167—Coating processes; Apparatus therefor from the gas phase, by plasma deposition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
SG11201506506PA 2013-03-14 2014-03-13 Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor SG11201506506PA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361786042P 2013-03-14 2013-03-14
US14/139,457 US9632411B2 (en) 2013-03-14 2013-12-23 Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor
PCT/US2014/026826 WO2014152023A1 (en) 2013-03-14 2014-03-13 Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor

Publications (1)

Publication Number Publication Date
SG11201506506PA true SG11201506506PA (en) 2015-09-29

Family

ID=51525876

Family Applications (2)

Application Number Title Priority Date Filing Date
SG10201707388RA SG10201707388RA (en) 2013-03-14 2014-03-13 Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor
SG11201506506PA SG11201506506PA (en) 2013-03-14 2014-03-13 Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG10201707388RA SG10201707388RA (en) 2013-03-14 2014-03-13 Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor

Country Status (7)

Country Link
US (2) US9632411B2 (zh)
JP (1) JP6964979B2 (zh)
KR (1) KR102207228B1 (zh)
CN (1) CN105074572B (zh)
SG (2) SG10201707388RA (zh)
TW (1) TWI614364B (zh)
WO (1) WO2014152023A1 (zh)

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Also Published As

Publication number Publication date
KR102207228B1 (ko) 2021-01-25
KR20150129781A (ko) 2015-11-20
CN105074572B (zh) 2019-11-26
WO2014152023A1 (en) 2014-09-25
US20170068174A1 (en) 2017-03-09
JP2016517633A (ja) 2016-06-16
TWI614364B (zh) 2018-02-11
CN105074572A (zh) 2015-11-18
SG10201707388RA (en) 2017-10-30
US9829805B2 (en) 2017-11-28
JP6964979B2 (ja) 2021-11-10
US9632411B2 (en) 2017-04-25
US20140268082A1 (en) 2014-09-18
TW201439361A (zh) 2014-10-16

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