CN102019266A - 涂层材料的涂布方法 - Google Patents
涂层材料的涂布方法 Download PDFInfo
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- CN102019266A CN102019266A CN2009101958407A CN200910195840A CN102019266A CN 102019266 A CN102019266 A CN 102019266A CN 2009101958407 A CN2009101958407 A CN 2009101958407A CN 200910195840 A CN200910195840 A CN 200910195840A CN 102019266 A CN102019266 A CN 102019266A
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CN2009101958407A CN102019266A (zh) | 2009-09-17 | 2009-09-17 | 涂层材料的涂布方法 |
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Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102489464A (zh) * | 2011-11-24 | 2012-06-13 | 深圳深爱半导体股份有限公司 | 匀胶清洗装置及匀胶清洗方法 |
CN103838087A (zh) * | 2012-11-26 | 2014-06-04 | 无锡华润上华科技有限公司 | 一种光刻胶做厚的方法 |
CN104516194A (zh) * | 2013-09-30 | 2015-04-15 | 中芯国际集成电路制造(上海)有限公司 | 图形化光刻胶层的形成方法、晶圆级芯片封装方法 |
CN104952704A (zh) * | 2014-03-25 | 2015-09-30 | 中芯国际集成电路制造(上海)有限公司 | 涂层的形成方法 |
CN107255912A (zh) * | 2017-08-02 | 2017-10-17 | 睿力集成电路有限公司 | 改善光刻胶涂覆过程中晶边缺陷的方法 |
US9829805B2 (en) | 2013-03-14 | 2017-11-28 | Applied Materials, Inc. | Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor |
CN108700815A (zh) * | 2015-12-23 | 2018-10-23 | Asml荷兰有限公司 | 用于去除衬底上的光敏材料的方法 |
US10209613B2 (en) | 2013-03-12 | 2019-02-19 | Applied Materials, Inc. | System and method for manufacturing planarized extreme ultraviolet lithography blank |
CN111266265A (zh) * | 2018-12-05 | 2020-06-12 | 长鑫存储技术有限公司 | 一种半导体的涂布设备及涂布方法 |
US10788744B2 (en) | 2013-03-12 | 2020-09-29 | Applied Materials, Inc. | Extreme ultraviolet lithography mask blank manufacturing system and method of operation therefor |
CN114472090A (zh) * | 2022-02-10 | 2022-05-13 | 华能新能源股份有限公司 | 一种膜层生长设备及膜层生长方法 |
CN114682451A (zh) * | 2020-12-28 | 2022-07-01 | 联合微电子中心有限责任公司 | 一种胶层涂布方法 |
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2009
- 2009-09-17 CN CN2009101958407A patent/CN102019266A/zh active Pending
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102489464A (zh) * | 2011-11-24 | 2012-06-13 | 深圳深爱半导体股份有限公司 | 匀胶清洗装置及匀胶清洗方法 |
CN103838087A (zh) * | 2012-11-26 | 2014-06-04 | 无锡华润上华科技有限公司 | 一种光刻胶做厚的方法 |
US10209613B2 (en) | 2013-03-12 | 2019-02-19 | Applied Materials, Inc. | System and method for manufacturing planarized extreme ultraviolet lithography blank |
US10788744B2 (en) | 2013-03-12 | 2020-09-29 | Applied Materials, Inc. | Extreme ultraviolet lithography mask blank manufacturing system and method of operation therefor |
US9829805B2 (en) | 2013-03-14 | 2017-11-28 | Applied Materials, Inc. | Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor |
CN104516194A (zh) * | 2013-09-30 | 2015-04-15 | 中芯国际集成电路制造(上海)有限公司 | 图形化光刻胶层的形成方法、晶圆级芯片封装方法 |
CN104952704A (zh) * | 2014-03-25 | 2015-09-30 | 中芯国际集成电路制造(上海)有限公司 | 涂层的形成方法 |
CN108700815A (zh) * | 2015-12-23 | 2018-10-23 | Asml荷兰有限公司 | 用于去除衬底上的光敏材料的方法 |
CN108700815B (zh) * | 2015-12-23 | 2024-03-19 | Asml荷兰有限公司 | 用于去除衬底上的光敏材料的方法 |
CN107255912A (zh) * | 2017-08-02 | 2017-10-17 | 睿力集成电路有限公司 | 改善光刻胶涂覆过程中晶边缺陷的方法 |
CN111266265A (zh) * | 2018-12-05 | 2020-06-12 | 长鑫存储技术有限公司 | 一种半导体的涂布设备及涂布方法 |
CN111266265B (zh) * | 2018-12-05 | 2021-10-08 | 长鑫存储技术有限公司 | 一种半导体的涂布设备及涂布方法 |
CN114682451A (zh) * | 2020-12-28 | 2022-07-01 | 联合微电子中心有限责任公司 | 一种胶层涂布方法 |
CN114472090A (zh) * | 2022-02-10 | 2022-05-13 | 华能新能源股份有限公司 | 一种膜层生长设备及膜层生长方法 |
CN114472090B (zh) * | 2022-02-10 | 2023-06-02 | 华能新能源股份有限公司 | 一种膜层生长设备及膜层生长方法 |
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Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHA Effective date: 20130614 Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING Free format text: FORMER OWNER: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION Effective date: 20130614 |
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