SG11201506465QA - Planarized extreme ultraviolet lithography blank, and manufacturing and lithography systems therefor - Google Patents
Planarized extreme ultraviolet lithography blank, and manufacturing and lithography systems thereforInfo
- Publication number
- SG11201506465QA SG11201506465QA SG11201506465QA SG11201506465QA SG11201506465QA SG 11201506465Q A SG11201506465Q A SG 11201506465QA SG 11201506465Q A SG11201506465Q A SG 11201506465QA SG 11201506465Q A SG11201506465Q A SG 11201506465QA SG 11201506465Q A SG11201506465Q A SG 11201506465QA
- Authority
- SG
- Singapore
- Prior art keywords
- lithography
- manufacturing
- extreme ultraviolet
- blank
- systems therefor
- Prior art date
Links
- 238000001900 extreme ultraviolet lithography Methods 0.000 title 1
- 238000001459 lithography Methods 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
- G03F1/24—Reflection masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361778335P | 2013-03-12 | 2013-03-12 | |
| US14/139,307 US9354508B2 (en) | 2013-03-12 | 2013-12-23 | Planarized extreme ultraviolet lithography blank, and manufacturing and lithography systems therefor |
| PCT/US2014/025110 WO2014165295A1 (en) | 2013-03-12 | 2014-03-12 | Planarized extreme ultraviolet lithography blank, and manufacturing and lithography systems therefor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201506465QA true SG11201506465QA (en) | 2015-09-29 |
Family
ID=51525874
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201506465QA SG11201506465QA (en) | 2013-03-12 | 2014-03-12 | Planarized extreme ultraviolet lithography blank, and manufacturing and lithography systems therefor |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US9354508B2 (en) |
| JP (2) | JP2016514288A (en) |
| KR (2) | KR20150130370A (en) |
| CN (2) | CN105027258A (en) |
| SG (1) | SG11201506465QA (en) |
| TW (1) | TWI589985B (en) |
| WO (1) | WO2014165295A1 (en) |
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-
2013
- 2013-12-23 US US14/139,307 patent/US9354508B2/en active Active
-
2014
- 2014-02-26 TW TW103106587A patent/TWI589985B/en active
- 2014-03-12 CN CN201480011357.8A patent/CN105027258A/en active Pending
- 2014-03-12 CN CN201910304139.8A patent/CN110262181A/en active Pending
- 2014-03-12 KR KR1020157027661A patent/KR20150130370A/en not_active Application Discontinuation
- 2014-03-12 KR KR1020177020626A patent/KR102060035B1/en active IP Right Grant
- 2014-03-12 SG SG11201506465QA patent/SG11201506465QA/en unknown
- 2014-03-12 WO PCT/US2014/025110 patent/WO2014165295A1/en active Application Filing
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| KR20150130370A (en) | 2015-11-23 |
| KR20170089943A (en) | 2017-08-04 |
| JP7285682B2 (en) | 2023-06-02 |
| JP2016514288A (en) | 2016-05-19 |
| TWI589985B (en) | 2017-07-01 |
| US10209613B2 (en) | 2019-02-19 |
| TW201443548A (en) | 2014-11-16 |
| CN110262181A (en) | 2019-09-20 |
| JP2019164362A (en) | 2019-09-26 |
| WO2014165295A1 (en) | 2014-10-09 |
| KR102060035B1 (en) | 2019-12-27 |
| US9354508B2 (en) | 2016-05-31 |
| US20160274454A1 (en) | 2016-09-22 |
| CN105027258A (en) | 2015-11-04 |
| US20140268080A1 (en) | 2014-09-18 |
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