HK1246405B - 圓筒光罩 - Google Patents

圓筒光罩

Info

Publication number
HK1246405B
HK1246405B HK18105549.5A HK18105549A HK1246405B HK 1246405 B HK1246405 B HK 1246405B HK 18105549 A HK18105549 A HK 18105549A HK 1246405 B HK1246405 B HK 1246405B
Authority
HK
Hong Kong
Prior art keywords
cylindrical mask
mask
cylindrical
Prior art date
Application number
HK18105549.5A
Other languages
English (en)
Inventor
加藤正紀
Original Assignee
株式會社尼康
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式會社尼康 filed Critical 株式會社尼康
Publication of HK1246405B publication Critical patent/HK1246405B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
HK18105549.5A 2013-04-30 2016-03-18 圓筒光罩 HK1246405B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013095647 2013-04-30

Publications (1)

Publication Number Publication Date
HK1246405B true HK1246405B (zh) 2020-05-15

Family

ID=51843379

Family Applications (3)

Application Number Title Priority Date Filing Date
HK18105549.5A HK1246405B (zh) 2013-04-30 2016-03-18 圓筒光罩
HK18104875.2A HK1245419B (zh) 2013-04-30 2016-03-18 圓筒光罩
HK16103220.8A HK1215308A1 (zh) 2013-04-30 2016-03-18 基板處理裝置、器件製造方法以及圓筒光罩

Family Applications After (2)

Application Number Title Priority Date Filing Date
HK18104875.2A HK1245419B (zh) 2013-04-30 2016-03-18 圓筒光罩
HK16103220.8A HK1215308A1 (zh) 2013-04-30 2016-03-18 基板處理裝置、器件製造方法以及圓筒光罩

Country Status (6)

Country Link
JP (5) JP6269660B2 (zh)
KR (5) KR102096961B1 (zh)
CN (4) CN108227408B (zh)
HK (3) HK1246405B (zh)
TW (5) TWI646407B (zh)
WO (1) WO2014178244A1 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102096961B1 (ko) * 2013-04-30 2020-04-03 가부시키가이샤 니콘 표시 패널 제조 방법
US11143862B2 (en) * 2016-03-30 2021-10-12 Nikon Corporation Pattern drawing device, pattern drawing method, and method for manufacturing device
KR102379193B1 (ko) * 2016-05-19 2022-03-28 가부시키가이샤 니콘 기판 지지 장치, 노광 장치, 및 패터닝 장치
CN114096797B (zh) * 2020-01-31 2024-03-22 日本精工株式会社 旋转角度传感器、电动助力转向装置以及旋转角度传感器的制造方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6019037U (ja) * 1983-07-18 1985-02-08 株式会社リコー 露光装置
JPH01128069A (ja) * 1987-11-12 1989-05-19 Dainippon Screen Mfg Co Ltd スリット走査露光式複写カメラの試写像露光装置
JPH01175730A (ja) * 1987-12-29 1989-07-12 Matsushita Electric Ind Co Ltd 露光装置
KR100363922B1 (ko) 1993-12-06 2003-08-21 가부시키가이샤 니콘 노광장치및노광방법
US6018383A (en) * 1997-08-20 2000-01-25 Anvik Corporation Very large area patterning system for flexible substrates
JP2000035677A (ja) * 1998-07-17 2000-02-02 Adtec Engineeng:Kk 露光装置
US6411362B2 (en) * 1999-01-04 2002-06-25 International Business Machines Corporation Rotational mask scanning exposure method and apparatus
CN100396945C (zh) * 2002-02-28 2008-06-25 富士通株式会社 动压轴承的制造方法、动压轴承及动压轴承制造装置
JP2007227438A (ja) * 2006-02-21 2007-09-06 Nikon Corp 露光装置及び方法並びに光露光用マスク
JP4984631B2 (ja) 2006-04-28 2012-07-25 株式会社ニコン 露光装置及び方法、露光用マスク、並びにデバイス製造方法
KR101422298B1 (ko) * 2006-09-08 2014-08-13 가부시키가이샤 니콘 마스크, 노광 장치, 노광 방법 및 그 노광 장치 또는 노광 방법을 이용한 디바이스 제조 방법
JP2009026933A (ja) * 2007-07-19 2009-02-05 Konica Minolta Holdings Inc 電磁波遮蔽フィルムの製造方法及び電磁波遮蔽フィルム
JP2009237305A (ja) * 2008-03-27 2009-10-15 Mitsubishi Paper Mills Ltd マスクパターンフィルムの巻き付け機構及び露光装置
JP5724564B2 (ja) * 2010-04-13 2015-05-27 株式会社ニコン マスクケース、マスクユニット、露光装置、基板処理装置及びデバイス製造方法
JP2011221536A (ja) * 2010-04-13 2011-11-04 Nikon Corp マスク移動装置、露光装置、基板処理装置及びデバイス製造方法
JPWO2011129369A1 (ja) * 2010-04-13 2013-07-18 株式会社ニコン 露光装置、基板処理装置及びデバイス製造方法
JP2012252076A (ja) * 2011-06-01 2012-12-20 Nikon Corp 露光装置
WO2013035489A1 (ja) * 2011-09-06 2013-03-14 株式会社ニコン 基板処理装置
CN103477286A (zh) * 2011-09-07 2013-12-25 株式会社尼康 基板处理装置
KR101623695B1 (ko) * 2011-11-04 2016-05-23 가부시키가이샤 니콘 기판 처리 장치, 및 기판 처리 방법
TWI641915B (zh) * 2012-01-12 2018-11-21 尼康股份有限公司 基板處理裝置、基板處理方法、及圓筒狀光罩
JP5594328B2 (ja) * 2012-07-19 2014-09-24 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法。
KR101405251B1 (ko) * 2012-09-10 2014-06-17 경북대학교 산학협력단 노광 장치 및 이를 사용한 기판 처리 장치
KR102096961B1 (ko) * 2013-04-30 2020-04-03 가부시키가이샤 니콘 표시 패널 제조 방법

Also Published As

Publication number Publication date
CN105359040A (zh) 2016-02-24
JP2019074769A (ja) 2019-05-16
TWI646407B (zh) 2019-01-01
TWI677767B (zh) 2019-11-21
KR102096961B1 (ko) 2020-04-03
TW202014807A (zh) 2020-04-16
JP6816814B2 (ja) 2021-01-20
TW201445262A (zh) 2014-12-01
TWI681263B (zh) 2020-01-01
JP2020064317A (ja) 2020-04-23
TW201809909A (zh) 2018-03-16
JP6638835B2 (ja) 2020-01-29
CN108227408A (zh) 2018-06-29
KR102079793B1 (ko) 2020-02-21
JP6269660B2 (ja) 2018-01-31
KR20180128521A (ko) 2018-12-03
CN107390480A (zh) 2017-11-24
KR20190104256A (ko) 2019-09-06
HK1245419B (zh) 2019-11-29
CN107390480B (zh) 2019-08-13
CN107255910A (zh) 2017-10-17
JP2019070840A (ja) 2019-05-09
JP2018081320A (ja) 2018-05-24
KR101924255B1 (ko) 2018-11-30
TW201908880A (zh) 2019-03-01
CN107255910B (zh) 2019-04-02
JPWO2014178244A1 (ja) 2017-02-23
WO2014178244A1 (ja) 2014-11-06
CN105359040B (zh) 2018-01-19
TWI717946B (zh) 2021-02-01
TW201907244A (zh) 2019-02-16
KR20180128520A (ko) 2018-12-03
CN108227408B (zh) 2020-02-14
JP6662473B2 (ja) 2020-03-11
KR20200019782A (ko) 2020-02-24
KR20160003181A (ko) 2016-01-08
KR102019620B1 (ko) 2019-09-06
KR101979562B1 (ko) 2019-05-16
HK1215308A1 (zh) 2016-08-19
TWI610143B (zh) 2018-01-01
JP6485535B2 (ja) 2019-03-20

Similar Documents

Publication Publication Date Title
DK3689865T3 (en) Hidtil ukendte aminopyrimidinderivater
DK3088517T5 (en) Humant anti-il-33-neutraliserende monoklonalt antistof
DK3736291T3 (en) Anti-FCRH5-antistoffer
DK3354246T3 (en) Udstyrsmonteringssystem
DK3077519T3 (en) Cmv-vacciner
HK1199852A1 (zh) 口罩
DK3470074T3 (en) Probiotika
GB2514668B (en) Cylindrical labyrinth
AU353643S (en) Stamphousing
HUP1300468A2 (en) Laryngeal mask
HK1245419B (zh) 圓筒光罩
DK3056208T3 (en) Immunpotentiator
GB201310928D0 (en) New Processes
IL245464A0 (en) Spiro-oxazolones
DK2979701T3 (en) Antitumormiddel indbefattende irinotecanhydrochloridhydrat
IL232981A0 (en) incinerator
GB201318444D0 (en) Printing
GB201414605D0 (en) Improved mask
DK2989854T3 (en) Strømstyret opvarmningssystem
AU4899P (en) Herbie53 Iresine herbstii
AU4953P (en) Flogazora Gazania rigens
AU4977P (en) Harrosy Gaura lindheimeri
GB201318565D0 (en) New processes
GB201417087D0 (en) No detials
AU353330S (en) Kettlebell

Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20240322