HK1246405B - Cylindrical mask - Google Patents

Cylindrical mask

Info

Publication number
HK1246405B
HK1246405B HK18105549.5A HK18105549A HK1246405B HK 1246405 B HK1246405 B HK 1246405B HK 18105549 A HK18105549 A HK 18105549A HK 1246405 B HK1246405 B HK 1246405B
Authority
HK
Hong Kong
Prior art keywords
cylindrical mask
mask
cylindrical
Prior art date
Application number
HK18105549.5A
Other languages
Chinese (zh)
Inventor
加藤正紀
Original Assignee
株式會社尼康
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式會社尼康 filed Critical 株式會社尼康
Publication of HK1246405B publication Critical patent/HK1246405B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
HK18105549.5A 2013-04-30 2016-03-18 Cylindrical mask HK1246405B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013095647 2013-04-30

Publications (1)

Publication Number Publication Date
HK1246405B true HK1246405B (en) 2020-05-15

Family

ID=51843379

Family Applications (3)

Application Number Title Priority Date Filing Date
HK18104875.2A HK1245419B (en) 2013-04-30 2016-03-18 Cylindrical mask
HK16103220.8A HK1215308A1 (en) 2013-04-30 2016-03-18 Substrate processing apparatus, device manufacturing method, and cylindrical mask
HK18105549.5A HK1246405B (en) 2013-04-30 2016-03-18 Cylindrical mask

Family Applications Before (2)

Application Number Title Priority Date Filing Date
HK18104875.2A HK1245419B (en) 2013-04-30 2016-03-18 Cylindrical mask
HK16103220.8A HK1215308A1 (en) 2013-04-30 2016-03-18 Substrate processing apparatus, device manufacturing method, and cylindrical mask

Country Status (6)

Country Link
JP (5) JP6269660B2 (en)
KR (5) KR102096961B1 (en)
CN (4) CN107390480B (en)
HK (3) HK1245419B (en)
TW (5) TWI681263B (en)
WO (1) WO2014178244A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107390480B (en) * 2013-04-30 2019-08-13 株式会社尼康 Cylinder light shield
TWI782698B (en) * 2016-03-30 2022-11-01 日商尼康股份有限公司 Pattern drawing device, pattern drawing method, and device manufacturing method
JP7114459B2 (en) * 2016-05-19 2022-08-08 株式会社ニコン patterning device
JP7047986B2 (en) * 2020-01-31 2022-04-05 日本精工株式会社 Manufacturing method of rotation angle sensor, electric power steering device and rotation angle sensor

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6019037U (en) * 1983-07-18 1985-02-08 株式会社リコー exposure equipment
JPH01128069A (en) * 1987-11-12 1989-05-19 Dainippon Screen Mfg Co Ltd Trialingly photographed image exposing device for slit scan exposure type copying camera
JPH01175730A (en) * 1987-12-29 1989-07-12 Matsushita Electric Ind Co Ltd Aligner
KR100363922B1 (en) 1993-12-06 2003-08-21 가부시키가이샤 니콘 Exposure apparatus and exposure method
US6018383A (en) * 1997-08-20 2000-01-25 Anvik Corporation Very large area patterning system for flexible substrates
JP2000035677A (en) * 1998-07-17 2000-02-02 Adtec Engineeng:Kk Aligner
US6411362B2 (en) * 1999-01-04 2002-06-25 International Business Machines Corporation Rotational mask scanning exposure method and apparatus
JP4211932B2 (en) * 2002-02-28 2009-01-21 富士通株式会社 DYNAMIC PRESSURE BEARING MANUFACTURING METHOD AND DYNAMIC PRESSURE BEARING MANUFACTURING DEVICE
JP2007227438A (en) * 2006-02-21 2007-09-06 Nikon Corp Exposure apparatus and exposure method, and mask for light exposure
JP4984631B2 (en) 2006-04-28 2012-07-25 株式会社ニコン EXPOSURE APPARATUS AND METHOD, EXPOSURE MASK, AND DEVICE MANUFACTURING METHOD
TWI457723B (en) * 2006-09-08 2014-10-21 尼康股份有限公司 A mask, an exposure device, and an element manufacturing method
JP2009026933A (en) * 2007-07-19 2009-02-05 Konica Minolta Holdings Inc Method of manufacturing electromagnetic wave shield film, and electromagnetic wave shield film
JP2009237305A (en) * 2008-03-27 2009-10-15 Mitsubishi Paper Mills Ltd Winding mechanism of mask pattern film and exposure apparatus
JP2011221536A (en) * 2010-04-13 2011-11-04 Nikon Corp Mask moving device, exposure device, substrate processor and device manufacturing method
JP5724564B2 (en) * 2010-04-13 2015-05-27 株式会社ニコン Mask case, mask unit, exposure apparatus, substrate processing apparatus, and device manufacturing method
JPWO2011129369A1 (en) * 2010-04-13 2013-07-18 株式会社ニコン Exposure apparatus, substrate processing apparatus, and device manufacturing method
JP2012252076A (en) * 2011-06-01 2012-12-20 Nikon Corp Exposure apparatus
JP6056756B2 (en) * 2011-09-06 2017-01-11 株式会社ニコン Substrate processing apparatus and pattern exposure method
CN103477286A (en) * 2011-09-07 2013-12-25 株式会社尼康 Substrate processing device
JP5842925B2 (en) * 2011-11-04 2016-01-13 株式会社ニコン Substrate processing apparatus and substrate processing method
TWI641915B (en) * 2012-01-12 2018-11-21 尼康股份有限公司 Substrate processing apparatus, substrate processing method, and cylindrical mask
JP5594328B2 (en) 2012-07-19 2014-09-24 株式会社ニコン Exposure apparatus, exposure method, and device manufacturing method.
KR101405251B1 (en) * 2012-09-10 2014-06-17 경북대학교 산학협력단 Lithography and apparatus for processing substrate using the same
CN107390480B (en) * 2013-04-30 2019-08-13 株式会社尼康 Cylinder light shield

Also Published As

Publication number Publication date
JP6485535B2 (en) 2019-03-20
KR102096961B1 (en) 2020-04-03
JP6662473B2 (en) 2020-03-11
HK1245419B (en) 2019-11-29
TWI610143B (en) 2018-01-01
TW201907244A (en) 2019-02-16
JP2019074769A (en) 2019-05-16
TWI681263B (en) 2020-01-01
CN108227408B (en) 2020-02-14
KR20180128520A (en) 2018-12-03
TW202014807A (en) 2020-04-16
CN107390480B (en) 2019-08-13
WO2014178244A1 (en) 2014-11-06
KR101979562B1 (en) 2019-05-16
TWI717946B (en) 2021-02-01
KR20200019782A (en) 2020-02-24
KR101924255B1 (en) 2018-11-30
KR20180128521A (en) 2018-12-03
TW201809909A (en) 2018-03-16
CN107255910A (en) 2017-10-17
JPWO2014178244A1 (en) 2017-02-23
CN105359040A (en) 2016-02-24
CN107255910B (en) 2019-04-02
KR20160003181A (en) 2016-01-08
JP6816814B2 (en) 2021-01-20
JP6638835B2 (en) 2020-01-29
JP2019070840A (en) 2019-05-09
CN105359040B (en) 2018-01-19
JP6269660B2 (en) 2018-01-31
JP2020064317A (en) 2020-04-23
CN108227408A (en) 2018-06-29
TW201445262A (en) 2014-12-01
KR102019620B1 (en) 2019-09-06
KR102079793B1 (en) 2020-02-21
TWI646407B (en) 2019-01-01
KR20190104256A (en) 2019-09-06
CN107390480A (en) 2017-11-24
JP2018081320A (en) 2018-05-24
HK1215308A1 (en) 2016-08-19
TWI677767B (en) 2019-11-21
TW201908880A (en) 2019-03-01

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