HK1215308A1 - Substrate processing apparatus, device manufacturing method, and cylindrical mask - Google Patents
Substrate processing apparatus, device manufacturing method, and cylindrical maskInfo
- Publication number
- HK1215308A1 HK1215308A1 HK16103220.8A HK16103220A HK1215308A1 HK 1215308 A1 HK1215308 A1 HK 1215308A1 HK 16103220 A HK16103220 A HK 16103220A HK 1215308 A1 HK1215308 A1 HK 1215308A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- processing apparatus
- substrate processing
- device manufacturing
- cylindrical mask
- mask
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/24—Curved surfaces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Liquid Crystal (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013095647 | 2013-04-30 | ||
| PCT/JP2014/058590 WO2014178244A1 (en) | 2013-04-30 | 2014-03-26 | Substrate processing apparatus, device manufacturing method, and cylindrical mask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| HK1215308A1 true HK1215308A1 (en) | 2016-08-19 |
Family
ID=51843379
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| HK18105549.5A HK1246405B (en) | 2013-04-30 | 2016-03-18 | Cylindrical mask |
| HK16103220.8A HK1215308A1 (en) | 2013-04-30 | 2016-03-18 | Substrate processing apparatus, device manufacturing method, and cylindrical mask |
| HK18104875.2A HK1245419B (en) | 2013-04-30 | 2016-03-18 | Cylindrical mask |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| HK18105549.5A HK1246405B (en) | 2013-04-30 | 2016-03-18 | Cylindrical mask |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| HK18104875.2A HK1245419B (en) | 2013-04-30 | 2016-03-18 | Cylindrical mask |
Country Status (6)
| Country | Link |
|---|---|
| JP (5) | JP6269660B2 (en) |
| KR (5) | KR101979562B1 (en) |
| CN (4) | CN108227408B (en) |
| HK (3) | HK1246405B (en) |
| TW (5) | TWI717946B (en) |
| WO (1) | WO2014178244A1 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108227408B (en) * | 2013-04-30 | 2020-02-14 | 株式会社尼康 | Exposure apparatus and exposure method |
| KR102541913B1 (en) * | 2016-03-30 | 2023-06-13 | 가부시키가이샤 니콘 | The apparatus for drawing pattern, and the pattern imaging method and device manufacturing method |
| WO2017199658A1 (en) * | 2016-05-19 | 2017-11-23 | 株式会社ニコン | Substrate support device, exposure device, and patterning device |
| JP7047986B2 (en) * | 2020-01-31 | 2022-04-05 | 日本精工株式会社 | Manufacturing method of rotation angle sensor, electric power steering device and rotation angle sensor |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6019037U (en) * | 1983-07-18 | 1985-02-08 | 株式会社リコー | exposure equipment |
| JPH01128069A (en) * | 1987-11-12 | 1989-05-19 | Dainippon Screen Mfg Co Ltd | Trialingly photographed image exposing device for slit scan exposure type copying camera |
| JPH01175730A (en) * | 1987-12-29 | 1989-07-12 | Matsushita Electric Ind Co Ltd | Aligner |
| US5640227A (en) | 1993-12-06 | 1997-06-17 | Nikon Corporation | Exposure apparatus and exposure method for minimizing defocusing of the transferred pattern |
| US6018383A (en) * | 1997-08-20 | 2000-01-25 | Anvik Corporation | Very large area patterning system for flexible substrates |
| JP2000035677A (en) * | 1998-07-17 | 2000-02-02 | Adtec Engineeng:Kk | Aligner |
| US6411362B2 (en) * | 1999-01-04 | 2002-06-25 | International Business Machines Corporation | Rotational mask scanning exposure method and apparatus |
| AU2003211404A1 (en) * | 2002-02-28 | 2003-09-09 | Fujitsu Limited | Dynamic pressure bearing manufacturing method, dynamic pressure bearing, and dynamic pressure bearing manufacturing device |
| JP2007227438A (en) | 2006-02-21 | 2007-09-06 | Nikon Corp | Exposure apparatus and exposure method, and mask for light exposure |
| JP4984631B2 (en) | 2006-04-28 | 2012-07-25 | 株式会社ニコン | EXPOSURE APPARATUS AND METHOD, EXPOSURE MASK, AND DEVICE MANUFACTURING METHOD |
| WO2008029917A1 (en) * | 2006-09-08 | 2008-03-13 | Nikon Corporation | Mask, exposure apparatus and device manufacturing method |
| JP2009026933A (en) * | 2007-07-19 | 2009-02-05 | Konica Minolta Holdings Inc | Method of manufacturing electromagnetic wave shield film, and electromagnetic wave shield film |
| JP2009237305A (en) * | 2008-03-27 | 2009-10-15 | Mitsubishi Paper Mills Ltd | Winding mechanism of mask pattern film and exposure apparatus |
| JP2011221536A (en) | 2010-04-13 | 2011-11-04 | Nikon Corp | Mask moving device, exposure device, substrate processor and device manufacturing method |
| JP5724564B2 (en) * | 2010-04-13 | 2015-05-27 | 株式会社ニコン | Mask case, mask unit, exposure apparatus, substrate processing apparatus, and device manufacturing method |
| CN102834778A (en) * | 2010-04-13 | 2012-12-19 | 株式会社尼康 | Exposure apparatus, substrate processing apparatus, and device manufacturing method |
| JP2012252076A (en) | 2011-06-01 | 2012-12-20 | Nikon Corp | Exposure apparatus |
| JP6056756B2 (en) * | 2011-09-06 | 2017-01-11 | 株式会社ニコン | Substrate processing apparatus and pattern exposure method |
| CN103477286A (en) * | 2011-09-07 | 2013-12-25 | 株式会社尼康 | Substrate processing device |
| CN103958379B (en) | 2011-11-04 | 2016-12-28 | 株式会社尼康 | Substrate board treatment and substrate processing method using same |
| TWI641915B (en) | 2012-01-12 | 2018-11-21 | 尼康股份有限公司 | Substrate processing apparatus, substrate processing method, and cylindrical mask |
| JP5594328B2 (en) * | 2012-07-19 | 2014-09-24 | 株式会社ニコン | Exposure apparatus, exposure method, and device manufacturing method. |
| KR101405251B1 (en) * | 2012-09-10 | 2014-06-17 | 경북대학교 산학협력단 | Lithography and apparatus for processing substrate using the same |
| CN108227408B (en) * | 2013-04-30 | 2020-02-14 | 株式会社尼康 | Exposure apparatus and exposure method |
-
2014
- 2014-03-26 CN CN201711449976.7A patent/CN108227408B/en active Active
- 2014-03-26 KR KR1020187034082A patent/KR101979562B1/en active IP Right Grant
- 2014-03-26 CN CN201710546158.2A patent/CN107255910B/en active Active
- 2014-03-26 CN CN201480037519.5A patent/CN105359040B/en active Active
- 2014-03-26 WO PCT/JP2014/058590 patent/WO2014178244A1/en active Application Filing
- 2014-03-26 KR KR1020197025601A patent/KR102079793B1/en active IP Right Grant
- 2014-03-26 JP JP2015514784A patent/JP6269660B2/en active Active
- 2014-03-26 CN CN201710546115.4A patent/CN107390480B/en active Active
- 2014-03-26 KR KR1020157033942A patent/KR101924255B1/en active IP Right Grant
- 2014-03-26 KR KR1020187034083A patent/KR102019620B1/en active IP Right Grant
- 2014-03-26 KR KR1020207004470A patent/KR102096961B1/en active IP Right Grant
- 2014-04-07 TW TW108146958A patent/TWI717946B/en active
- 2014-04-07 TW TW107142070A patent/TWI681263B/en active
- 2014-04-07 TW TW106134178A patent/TWI646407B/en active
- 2014-04-07 TW TW107138014A patent/TWI677767B/en active
- 2014-04-07 TW TW103112644A patent/TWI610143B/en active
-
2016
- 2016-03-18 HK HK18105549.5A patent/HK1246405B/en unknown
- 2016-03-18 HK HK16103220.8A patent/HK1215308A1/en not_active IP Right Cessation
- 2016-03-18 HK HK18104875.2A patent/HK1245419B/en not_active IP Right Cessation
-
2017
- 2017-12-26 JP JP2017250253A patent/JP6485535B2/en active Active
-
2019
- 2019-01-10 JP JP2019002306A patent/JP6662473B2/en active Active
- 2019-02-20 JP JP2019028053A patent/JP6638835B2/en active Active
- 2019-12-25 JP JP2019234590A patent/JP6816814B2/en active Active
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20220328 |