SG11201506511PA - Ultra-smooth layer ultraviolet lithography mirrors and blanks, and manufacturing and lithography systems therefor - Google Patents

Ultra-smooth layer ultraviolet lithography mirrors and blanks, and manufacturing and lithography systems therefor

Info

Publication number
SG11201506511PA
SG11201506511PA SG11201506511PA SG11201506511PA SG11201506511PA SG 11201506511P A SG11201506511P A SG 11201506511PA SG 11201506511P A SG11201506511P A SG 11201506511PA SG 11201506511P A SG11201506511P A SG 11201506511PA SG 11201506511P A SG11201506511P A SG 11201506511PA
Authority
SG
Singapore
Prior art keywords
lithography
blanks
ultra
manufacturing
mirrors
Prior art date
Application number
SG11201506511PA
Inventor
Soumendra N Barman
Cara Beasley
Abhijit Basu Mallick
Ralf Hofmann
Nitin K Ingle
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of SG11201506511PA publication Critical patent/SG11201506511PA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/164—Coating processes; Apparatus therefor using electric, electrostatic or magnetic means; powder coating
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Chemical Vapour Deposition (AREA)
SG11201506511PA 2013-03-14 2014-03-13 Ultra-smooth layer ultraviolet lithography mirrors and blanks, and manufacturing and lithography systems therefor SG11201506511PA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361786109P 2013-03-14 2013-03-14
US14/139,507 US9417515B2 (en) 2013-03-14 2013-12-23 Ultra-smooth layer ultraviolet lithography mirrors and blanks, and manufacturing and lithography systems therefor
PCT/US2014/026844 WO2014152033A1 (en) 2013-03-14 2014-03-13 Ultra-smooth layer ultraviolet lithography mirrors and blanks, and manufacturing and lithography systems therefor

Publications (1)

Publication Number Publication Date
SG11201506511PA true SG11201506511PA (en) 2015-09-29

Family

ID=51525877

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201506511PA SG11201506511PA (en) 2013-03-14 2014-03-13 Ultra-smooth layer ultraviolet lithography mirrors and blanks, and manufacturing and lithography systems therefor

Country Status (7)

Country Link
US (1) US9417515B2 (en)
JP (1) JP6420310B2 (en)
KR (3) KR20170060177A (en)
CN (1) CN105027257B (en)
SG (1) SG11201506511PA (en)
TW (1) TWI631411B (en)
WO (1) WO2014152033A1 (en)

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KR102582099B1 (en) * 2016-03-02 2023-09-22 마테리온 코포레이션 Optically enhanced optical converter
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TWI767070B (en) * 2018-10-17 2022-06-11 台灣積體電路製造股份有限公司 Lithography system and method for cleaning lithography system
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Also Published As

Publication number Publication date
WO2014152033A1 (en) 2014-09-25
JP6420310B2 (en) 2018-11-07
JP2016519780A (en) 2016-07-07
CN105027257B (en) 2018-05-15
KR20190049836A (en) 2019-05-09
US9417515B2 (en) 2016-08-16
CN105027257A (en) 2015-11-04
TW201443549A (en) 2014-11-16
TWI631411B (en) 2018-08-01
KR20150129782A (en) 2015-11-20
US20140268083A1 (en) 2014-09-18
KR20170060177A (en) 2017-05-31

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