JP2016517633A - 蒸着で堆積されたフォトレジスト、及びそのための製造及びリソグラフィシステム - Google Patents
蒸着で堆積されたフォトレジスト、及びそのための製造及びリソグラフィシステム Download PDFInfo
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- JP2016517633A JP2016517633A JP2016502257A JP2016502257A JP2016517633A JP 2016517633 A JP2016517633 A JP 2016517633A JP 2016502257 A JP2016502257 A JP 2016502257A JP 2016502257 A JP2016502257 A JP 2016502257A JP 2016517633 A JP2016517633 A JP 2016517633A
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- photoresist
- semiconductor wafer
- deposition
- deposited
- deposited photoresist
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/167—Coating processes; Apparatus therefor from the gas phase, by plasma deposition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
Abstract
Description
冷却されたチャックによって冷却された基板上でフォトレジストを液化するために真空チャンバ内に前駆体を揮発させるための加熱された入口に接続された蒸着システムを含むフォトレジスト堆積システムを提供する。
Claims (20)
- 加熱素子と、基板を保持するための冷却されたチャックとを有する真空チャンバであって、加熱された入口を有する真空チャンバと、
冷却されたチャックによって冷却された基板上で蒸着されたフォトレジストを液化するために真空チャンバ内に前駆体を揮発させるための加熱された入口に接続された蒸着システムを含むフォトレジスト堆積システム。 - 蒸着システムは、蒸着の間、堆積組成及び条件を変化させる、請求項1記載のシステム。
- 蒸着システムは、蒸着されるフォトレジストを堆積させるための揮発性金属酸化物の前駆体を提供する、請求項1記載のシステム。
- 蒸着システムは、蒸着されるフォトレジストを堆積させるための金属アルコキシドの前駆体を提供する、請求項1記載のシステム。
- 真空チャンバは、金属酸化物前駆体を金属酸化物フォトレジストに変換するために、前駆体を酸化剤と反応させるためのものである、請求項1記載のシステム。
- 真空チャンバは、基板上に分子の堆積をもたらす気相反応を推進させるためのものである、請求項1記載のシステム。
- 蒸着システムは、金属中心の周りでリガンド置換反応を開始するリガンド前駆体を反応させるためのものである、請求項1記載のシステム。
- 蒸着システムは、真空チャンバ内に形成された金属酸化物と結合するためのリガンド前駆体を提供するためのものである、請求項1記載のシステム。
- 極端紫外線光源と、
極端紫外線光源からの光を導くためのミラーと、
極端紫外線光源からの光を極端紫外線マスク上に結像するためのレチクルステージと、
レチクルステージから光を受けるための蒸着されたフォトレジストでコーティングされた半導体ウェハを配置するためのウェハステージを含む極端紫外線リソグラフィシステム。 - 蒸着されたフォトレジストは、揮発性金属酸化物である、請求項9記載のシステム。
- 蒸着されたフォトレジストは、半導体ウェハ上の分子の堆積物である、請求項9記載のシステム。
- 蒸着されたフォトレジストは、リガンドを含有する、請求項9記載のシステム。
- 蒸着されたフォトレジストは、金属中心の周りのリガンドである、請求項9記載のシステム。
- 蒸着されたフォトレジストは、金属酸化物と結合したリガンドである、請求項9記載のシステム。
- 半導体ウェハと、
半導体ウェハ上の蒸着されたフォトレジストを含む半導体ウェハシステム。 - 蒸着されたフォトレジストは、揮発性金属酸化物である、請求項15記載の半導体ウェハシステム。
- 蒸着されたフォトレジストは、半導体ウェハ上の分子の堆積物である、請求項15記載の半導体ウェハのシステム。
- 蒸着されたフォトレジストは、リガンドを含む、請求項15記載の半導体ウェハシステム。
- 蒸着されたフォトレジストは、金属中心の周りのリガンドである、請求項15記載の半導体ウェハのシステム。
- 蒸着されたフォトレジストは、金属酸化物と結合したリガンドである、請求項15記載の半導体ウェハシステム。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201361786042P | 2013-03-14 | 2013-03-14 | |
US61/786,042 | 2013-03-14 | ||
US14/139,457 US9632411B2 (en) | 2013-03-14 | 2013-12-23 | Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor |
US14/139,457 | 2013-12-23 | ||
PCT/US2014/026826 WO2014152023A1 (en) | 2013-03-14 | 2014-03-13 | Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor |
Publications (3)
Publication Number | Publication Date |
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JP2016517633A true JP2016517633A (ja) | 2016-06-16 |
JP2016517633A5 JP2016517633A5 (ja) | 2021-09-24 |
JP6964979B2 JP6964979B2 (ja) | 2021-11-10 |
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Application Number | Title | Priority Date | Filing Date |
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JP2016502257A Active JP6964979B2 (ja) | 2013-03-14 | 2014-03-13 | 蒸着で堆積されたフォトレジスト、及びそのための製造及びリソグラフィシステム |
Country Status (7)
Country | Link |
---|---|
US (2) | US9632411B2 (ja) |
JP (1) | JP6964979B2 (ja) |
KR (1) | KR102207228B1 (ja) |
CN (1) | CN105074572B (ja) |
SG (2) | SG11201506506PA (ja) |
TW (1) | TWI614364B (ja) |
WO (1) | WO2014152023A1 (ja) |
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JP2021523403A (ja) * | 2018-05-11 | 2021-09-02 | ラム リサーチ コーポレーションLam Research Corporation | Euvパターン化可能ハードマスクを形成するための方法 |
US11921427B2 (en) | 2018-11-14 | 2024-03-05 | Lam Research Corporation | Methods for making hard masks useful in next-generation lithography |
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KR102204773B1 (ko) * | 2015-10-13 | 2021-01-18 | 인프리아 코포레이션 | 유기주석 옥사이드 하이드록사이드 패터닝 조성물, 전구체 및 패터닝 |
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Publication number | Publication date |
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CN105074572B (zh) | 2019-11-26 |
KR102207228B1 (ko) | 2021-01-25 |
CN105074572A (zh) | 2015-11-18 |
TW201439361A (zh) | 2014-10-16 |
US20140268082A1 (en) | 2014-09-18 |
KR20150129781A (ko) | 2015-11-20 |
US9632411B2 (en) | 2017-04-25 |
US20170068174A1 (en) | 2017-03-09 |
US9829805B2 (en) | 2017-11-28 |
SG10201707388RA (en) | 2017-10-30 |
JP6964979B2 (ja) | 2021-11-10 |
WO2014152023A1 (en) | 2014-09-25 |
TWI614364B (zh) | 2018-02-11 |
SG11201506506PA (en) | 2015-09-29 |
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