RU2012137134A - Фотополимерная композиция с записывающими мономерами на основе триазина - Google Patents

Фотополимерная композиция с записывающими мономерами на основе триазина Download PDF

Info

Publication number
RU2012137134A
RU2012137134A RU2012137134/04A RU2012137134A RU2012137134A RU 2012137134 A RU2012137134 A RU 2012137134A RU 2012137134/04 A RU2012137134/04 A RU 2012137134/04A RU 2012137134 A RU2012137134 A RU 2012137134A RU 2012137134 A RU2012137134 A RU 2012137134A
Authority
RU
Russia
Prior art keywords
acrylate
meth
photopolymer composition
composition according
residues
Prior art date
Application number
RU2012137134/04A
Other languages
English (en)
Russian (ru)
Inventor
Томас РЕЛЛЕ
Фридрих-Карл БРУДЕР
Томас ФЭККЕ
Марк-Штефан ВАЙЗЕР
Деннис ХЕНЕЛЬ
Original Assignee
Байер Интеллектуэль Проперти Гмбх
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Байер Интеллектуэль Проперти Гмбх filed Critical Байер Интеллектуэль Проперти Гмбх
Publication of RU2012137134A publication Critical patent/RU2012137134A/ru

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/2805—Compounds having only one group containing active hydrogen
    • C08G18/2815—Monohydroxy compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/30—Low-molecular-weight compounds
    • C08G18/38—Low-molecular-weight compounds having heteroatoms other than oxygen
    • C08G18/3802—Low-molecular-weight compounds having heteroatoms other than oxygen having halogens
    • C08G18/3804—Polyhydroxy compounds
    • C08G18/3812—Polyhydroxy compounds having fluorine atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/42—Polycondensates having carboxylic or carbonic ester groups in the main chain
    • C08G18/44—Polycarbonates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/48—Polyethers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/48—Polyethers
    • C08G18/4825—Polyethers containing two hydroxy groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/48—Polyethers
    • C08G18/4833—Polyethers containing oxyethylene units
    • C08G18/4837—Polyethers containing oxyethylene units and other oxyalkylene units
    • C08G18/485—Polyethers containing oxyethylene units and other oxyalkylene units containing mixed oxyethylene-oxypropylene or oxyethylene-higher oxyalkylene end groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • G03C1/733—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds with macromolecular compounds as photosensitive substances, e.g. photochromic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/2403—Layers; Shape, structure or physical properties thereof
    • G11B7/24035—Recording layers
    • G11B7/24044—Recording layers for storing optical interference patterns, e.g. holograms; for storing data in three dimensions [3D], e.g. volume storage
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
    • G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/026—Recording materials or recording processes
    • G03H2001/0264—Organic recording material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Holo Graphy (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
RU2012137134/04A 2010-02-02 2011-01-28 Фотополимерная композиция с записывающими мономерами на основе триазина RU2012137134A (ru)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP10001006 2010-02-02
EP10001006.5 2010-02-02
PCT/EP2011/051246 WO2011095441A1 (de) 2010-02-02 2011-01-28 Photopolymer-formulierung mit triazin-basierten schreibmonomeren

Publications (1)

Publication Number Publication Date
RU2012137134A true RU2012137134A (ru) 2014-03-10

Family

ID=42313702

Family Applications (1)

Application Number Title Priority Date Filing Date
RU2012137134/04A RU2012137134A (ru) 2010-02-02 2011-01-28 Фотополимерная композиция с записывающими мономерами на основе триазина

Country Status (8)

Country Link
US (1) US9366957B2 (https=)
EP (1) EP2531892B1 (https=)
JP (1) JP6023592B2 (https=)
KR (1) KR20120125270A (https=)
CN (1) CN102763037A (https=)
BR (1) BR112012019378A2 (https=)
RU (1) RU2012137134A (https=)
WO (1) WO2011095441A1 (https=)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201133264A (en) * 2009-11-03 2011-10-01 Bayer Materialscience Ag Method for selecting additives in photopolymers
EP2496617B1 (de) * 2009-11-03 2015-02-25 Bayer Intellectual Property GmbH Urethane als additive in einer photopolymer-formulierung
ES2453267T3 (es) * 2009-11-03 2014-04-07 Bayer Intellectual Property Gmbh Procedimiento de fabricación de una película holográfica
CN102741925B (zh) * 2009-11-03 2015-12-16 拜尔材料科学股份公司 生产全息膜的方法
US8808946B2 (en) * 2009-11-03 2014-08-19 Bayer Materialscience Ag Urethane acrylate having a high refractive index and reduced double bond density
WO2011054795A1 (de) * 2009-11-03 2011-05-12 Bayer Materialscience Ag Fluorurethane als additive in einer photopolymer-formulierung
RU2542981C9 (ru) * 2009-11-03 2015-12-10 Байер Матириальсайенс Аг Способ изготовления голографических сред
JP5638085B2 (ja) * 2009-11-03 2014-12-10 バイエル・マテリアルサイエンス・アクチェンゲゼルシャフトＢａｙｅｒ ＭａｔｅｒｉａｌＳｃｉｅｎｃｅ ＡＧ 異なった書込コモノマーを含有する感光性ポリマー組成物
PL2317511T3 (pl) 2009-11-03 2012-08-31 Bayer Materialscience Ag Formulacje fotopolimerowe z nastawialnym mechanicznym modułem Guv
EP2496549B1 (de) * 2009-11-03 2014-10-08 Bayer Intellectual Property GmbH Neue, nicht kristallisierende methacrylate, deren herstellung und verwendung
WO2011095442A1 (de) * 2010-02-02 2011-08-11 Bayer Materialscience Ag Photopolymer-formulierung mit ester-basierten schreibmonomeren
CN103819420A (zh) * 2013-07-01 2014-05-28 江阴摩尔化工新材料有限公司 紫外光固化低聚物、其合成方法及含有该低聚物的紫外光固化涂料
US9804490B2 (en) * 2013-12-20 2017-10-31 Covestro Deutschland Ag Holographic media with improved light sensitivity
US10241402B2 (en) * 2014-12-12 2019-03-26 Covestro Deutschland Ag Naphthyl acrylates as writing monomers for photopolymers
KR20180019200A (ko) 2015-06-23 2018-02-23 코베스트로 도이칠란트 아게 치환된 트리아진 및 그의 제조 방법
CN107750379A (zh) * 2015-06-23 2018-03-02 科思创德国股份有限公司 作为光引发剂的新型三嗪及其制备
US11535713B2 (en) 2016-08-23 2022-12-27 The Regents Of The University Of Colorado, A Body Corporate Network polymers and methods of making and using same
TW201906882A (zh) * 2017-05-09 2019-02-16 德商科思創德意志股份有限公司 含有用於全像照射的光聚合物層及高度耐性漆層之薄膜結構
JP2020519943A (ja) * 2017-05-09 2020-07-02 コベストロ、ドイチュラント、アクチエンゲゼルシャフトＣｏｖｅｓｔｒｏ Ｄｅｕｔｓｃｈｌａｎｄ Ａｇ ホログラフィック露光用のフォトポリマー層と高耐性コーティング層を含むホログラフィック媒体
KR102214895B1 (ko) * 2017-12-26 2021-02-09 삼성에스디아이 주식회사 레지스트 하층막용 조성물 및 이를 이용한 패턴 형성 방법
WO2019237117A1 (en) 2018-06-08 2019-12-12 The Regents Of The University Of Colorado, A Body Corporate High dynamic range two-stage photopolymers
JPWO2020050321A1 (ja) * 2018-09-04 2021-09-30 国立大学法人電気通信大学 トリアジン環含有ハイパーブランチポリマーを含む体積ホログラム記録材料用組成物
US12391780B2 (en) 2019-02-18 2025-08-19 The Regents Of The University Of Colorado, A Body Corporate Network polymers and methods of making and using same
CN112759701B (zh) * 2019-10-21 2022-12-30 杭州光粒科技有限公司 光致聚合物组合物、反射式衍射光栅及其制备方法
CN113527143B (zh) * 2020-04-20 2023-06-20 杭州光粒科技有限公司 书写单体及其制备方法以及光致聚合物组合物及其光栅

Family Cites Families (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3047532A (en) * 1958-09-30 1962-07-31 Dal Mon Research Co Triazinyl vinyl monomer and polymer and copolymers thereof
GB1429649A (en) 1972-06-22 1976-03-24 Agfagevaert Unsaturated carboxylic esters of hydroxyalkyl carbamates addition polymers derived thereform and photographic silver halide materials containing said polymers
JPS5240472Y2 (https=) 1973-02-20 1977-09-13
JPS584027B2 (ja) * 1973-04-03 1983-01-24 東亞合成株式会社 シアヌル環を有するポリアクリレ−ト又はポリメタクリレ−トの製造法
US4230740A (en) * 1979-04-23 1980-10-28 W. R. Grace & Co. Heat stable, non-yellowing photopolymer compositions
JPS56152467A (en) * 1980-04-28 1981-11-26 Teijin Ltd Preparation of cyanurate group-containing (meth acrylate)
JPS5716446A (en) * 1980-07-04 1982-01-27 Fujitsu Ltd Formation of micropattern and photoresist used in said formation
JPS5850522B2 (ja) * 1981-03-31 1983-11-11 日東電工株式会社 複合半透膜及びその製造方法
JPS584027A (ja) 1981-06-27 1983-01-11 Masaya Nagashima 組立式土留よう壁の建設方法及びその装置
EP0223587B1 (en) 1985-11-20 1991-02-13 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
IL81307A0 (en) 1986-01-23 1987-08-31 Union Carbide Agricult Method for reducing moisture loss from plants and increasing crop yield utilizing nitrogen containing heterocyclic compounds and some novel polysubstituted pyridine derivatives
US4942112A (en) * 1988-01-15 1990-07-17 E. I. Du Pont De Nemours And Company Photopolymerizable compositions and elements for refractive index imaging
US5387682A (en) 1988-09-07 1995-02-07 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing a monomeric moiety
RU2006990C1 (ru) 1991-01-22 1994-01-30 Константин Иванович Баринов Большая интегральная схема (ее варианты)
US5702846A (en) * 1994-10-03 1997-12-30 Nippon Paint Co. Ltd. Photosensitive composition for volume hologram recording
JPH0928785A (ja) * 1995-07-18 1997-02-04 Asahi Denka Kogyo Kk 眼科用レンズ
JPH09123627A (ja) * 1995-11-02 1997-05-13 Dainippon Printing Co Ltd 転写シート
US5747629A (en) * 1996-12-16 1998-05-05 Bayer Corporation Low surface energy polyisocyanates and their use in one-or two-component coating compositions
US5837586A (en) * 1997-02-14 1998-11-17 Kodak Polychrome Graphics Company, Ltd. 4-(alkoxyhydroxy)styryl triazine photinitiators and photo sensitive composition
US6627354B1 (en) * 1999-03-01 2003-09-30 Lucent Technologies Inc. Photorecording medium, process for fabricating medium, and process for holography using medium
TWI258634B (en) 1999-10-22 2006-07-21 Hitachi Chemical Co Ltd Photosensitive resin composition, photosensitive element using the same, a process for producing resist pattern and resist pattern laminate
US6403702B1 (en) * 1999-12-03 2002-06-11 Bayer Corporation Diurethane plasticizer containing one-shot polyurethane cast elastomers
KR100379760B1 (ko) * 2001-02-24 2003-04-10 한국화학연구원 고굴절 트리아진형 단량체
US6743552B2 (en) * 2001-08-07 2004-06-01 Inphase Technologies, Inc. Process and composition for rapid mass production of holographic recording article
US6765061B2 (en) * 2001-09-13 2004-07-20 Inphase Technologies, Inc. Environmentally durable, self-sealing optical articles
JP4071525B2 (ja) * 2002-04-08 2008-04-02 メモリーテック株式会社 光情報記録媒体
JP2004300046A (ja) * 2003-03-31 2004-10-28 Mitsubishi Paper Mills Ltd 新規なチアジアゾール誘導体及びトリアジン誘導体、並びに感光性組成物及び平版印刷版
JP2005049608A (ja) * 2003-07-29 2005-02-24 Fuji Photo Film Co Ltd 体積型ホログラム記録用感光性組成物及びそれを用いた体積型ホログラム記録媒体
JP4349613B2 (ja) * 2003-07-30 2009-10-21 大日本印刷株式会社 付加情報の付いたホログラム記録フィルム、及び、その記録方法とその真偽判定方法
JP4369780B2 (ja) * 2004-03-22 2009-11-25 富士フイルム株式会社 重合性組成物、及びそれを用いた画像記録材料
JP4414797B2 (ja) * 2004-03-22 2010-02-10 富士フイルム株式会社 重合性組成物、及びそれを用いた画像記録材料
JP2006330655A (ja) * 2005-04-26 2006-12-07 Fujifilm Holdings Corp 感光性組成物及び感光性フィルム、並びに、永久パターン及びその形成方法
KR100684884B1 (ko) * 2005-09-12 2007-02-20 연세대학교 산학협력단 트리아진계 단량체 및 이를 포함하는 중합 조성물
DE602008005437D1 (de) 2007-04-11 2011-04-21 Bayer Materialscience Ag Strahlungsvernetzende und wärmevernetzende pu-systeme auf der basis von isocyanat-reaktiven blockcopolymeren
CN101668782A (zh) * 2007-04-11 2010-03-10 拜尔材料科学股份公司 具有高折射指数的芳族脲烷丙烯酸酯类
JP5495238B2 (ja) 2007-04-11 2014-05-21 バイエル・マテリアルサイエンス・アクチェンゲゼルシャフト ホログラフィ用途用の有利な記録媒体
JP5229879B2 (ja) * 2007-06-08 2013-07-03 日本化薬株式会社 （メタ）アクリレート化合物及びそれを含有する樹脂組成物並びにその硬化物
US20090142672A1 (en) * 2007-11-30 2009-06-04 Fujifilm Corporation Optical recording composition and holographic recording medium
JP4879158B2 (ja) * 2007-12-27 2012-02-22 富士フイルム株式会社 ホログラフィック記録用化合物、ホログラフィック記録用組成物、およびホログラフィック記録媒体
TW201133264A (en) * 2009-11-03 2011-10-01 Bayer Materialscience Ag Method for selecting additives in photopolymers
ES2453267T3 (es) * 2009-11-03 2014-04-07 Bayer Intellectual Property Gmbh Procedimiento de fabricación de una película holográfica
JP5638085B2 (ja) * 2009-11-03 2014-12-10 バイエル・マテリアルサイエンス・アクチェンゲゼルシャフトＢａｙｅｒ ＭａｔｅｒｉａｌＳｃｉｅｎｃｅ ＡＧ 異なった書込コモノマーを含有する感光性ポリマー組成物
EP2496549B1 (de) * 2009-11-03 2014-10-08 Bayer Intellectual Property GmbH Neue, nicht kristallisierende methacrylate, deren herstellung und verwendung
WO2011095442A1 (de) * 2010-02-02 2011-08-11 Bayer Materialscience Ag Photopolymer-formulierung mit ester-basierten schreibmonomeren
EP2372454A1 (de) * 2010-03-29 2011-10-05 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme
EP2450387A1 (de) * 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung für die Herstellung holographischer Medien
EP2450893A1 (de) * 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung holographischer Medien mit hoch vernetzten Matrixpolymeren

Also Published As

Publication number Publication date
KR20120125270A (ko) 2012-11-14
WO2011095441A1 (de) 2011-08-11
BR112012019378A2 (pt) 2016-05-03
EP2531892B1 (de) 2016-01-27
US20120321998A1 (en) 2012-12-20
US9366957B2 (en) 2016-06-14
EP2531892A1 (de) 2012-12-12
CN102763037A (zh) 2012-10-31
JP2013519111A (ja) 2013-05-23
JP6023592B2 (ja) 2016-11-09

Similar Documents

Publication Publication Date Title
RU2012137134A (ru) Фотополимерная композиция с записывающими мономерами на основе триазина
JP2013519111A5 (https=)
RU2013110226A (ru) Дифункциональные (мет)-акрилатные пишущие мономеры
JP2013518952A5 (https=)
Mueller et al. Visible‐light‐induced click chemistry
JP6602062B2 (ja) 硬化性組成物、硬化物の製造方法、及びハードコート材
Ronzitti et al. LCoS nematic SLM characterization and modeling for diffraction efficiency optimization, zero and ghost orders suppression
ATE548730T1 (de) Photopolymerformulierungen mit einstellbarem mechanischem modul guv
BR112012010471A2 (pt) fluorouretanos como aditivos em uma formulação de fotopolímero
Garcia-Sucerquia Color lensless digital holographic microscopy with micrometer resolution
IN2012DN03891A (https=)
Jia et al. Axial resolution enhancement of light‐sheet microscopy by double scanning of Bessel beam and its complementary beam
JP2013517296A (ja) 眼科用レンズの材料のための可視光吸収剤
MX2013000634A (es) Metodo para producir placas de impresión flexograficas usando irradiacion de uv-led.
Kwon et al. Ultraviolet light blocking optically clear adhesives for foldable displays via highly efficient visible-light curing
RU2013112856A (ru) Новый способ получения промежуточных соединений, используемых при получении ингибиторов nep
BR0317983A (pt) Processo aperfeiçoado para a preparação contìnua de (met)acrilatos de alquila com reciclagem repetida do catalisador
RU2011101907A (ru) Композиция герметизирующего средства, отверждаемая высокоактивным излучением, и деталь с герметизирующим слоем
Hernandez et al. Zero-order suppression for two-photon holographic excitation
TW201022742A (en) Polarizing plate and production method thereof
JP2012111931A (ja) ハードコート性樹脂組成物及びその硬化物
WO2020015964A1 (en) Photo-curable resin composition for 3d printing
Galli et al. Cyclic allylic sulfide based photopolymer for holographic recording showing high refractive index modulation
Murray et al. Review of recent advances in photosensitive polymer materials and requirements for transmission diffractive optical elements for LED light sources
RU2012137135A (ru) Фотополимерная композиция с записывающими мономерами на основе сложных эфиров

Legal Events

Date Code Title Description
FA93 Acknowledgement of application withdrawn (no request for examination)

Effective date: 20140129