BR112012019378A2 - formulação de fotopolímero apresentando monômeros graváveis à base de triazina - Google Patents
formulação de fotopolímero apresentando monômeros graváveis à base de triazinaInfo
- Publication number
- BR112012019378A2 BR112012019378A2 BR112012019378A BR112012019378A BR112012019378A2 BR 112012019378 A2 BR112012019378 A2 BR 112012019378A2 BR 112012019378 A BR112012019378 A BR 112012019378A BR 112012019378 A BR112012019378 A BR 112012019378A BR 112012019378 A2 BR112012019378 A2 BR 112012019378A2
- Authority
- BR
- Brazil
- Prior art keywords
- recordable
- photopolymer formulation
- triazine
- based monomers
- monomers
- Prior art date
Links
- 238000009472 formulation Methods 0.000 title abstract 4
- 239000000203 mixture Substances 0.000 title abstract 4
- 239000000178 monomer Substances 0.000 title abstract 4
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 title abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 1
- 125000005843 halogen group Chemical group 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000011159 matrix material Substances 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 239000004814 polyurethane Substances 0.000 abstract 1
- 229920002635 polyurethane Polymers 0.000 abstract 1
- 238000003847 radiation curing Methods 0.000 abstract 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/2805—Compounds having only one group containing active hydrogen
- C08G18/2815—Monohydroxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/30—Low-molecular-weight compounds
- C08G18/38—Low-molecular-weight compounds having heteroatoms other than oxygen
- C08G18/3802—Low-molecular-weight compounds having heteroatoms other than oxygen having halogens
- C08G18/3804—Polyhydroxy compounds
- C08G18/3812—Polyhydroxy compounds having fluorine atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/42—Polycondensates having carboxylic or carbonic ester groups in the main chain
- C08G18/44—Polycarbonates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/48—Polyethers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/48—Polyethers
- C08G18/4825—Polyethers containing two hydroxy groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/48—Polyethers
- C08G18/4833—Polyethers containing oxyethylene units
- C08G18/4837—Polyethers containing oxyethylene units and other oxyalkylene units
- C08G18/485—Polyethers containing oxyethylene units and other oxyalkylene units containing mixed oxyethylene-oxypropylene or oxyethylene-higher oxyalkylene end groups
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
- G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
- G03C1/733—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds with macromolecular compounds as photosensitive substances, e.g. photochromic
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/2403—Layers; Shape, structure or physical properties thereof
- G11B7/24035—Recording layers
- G11B7/24044—Recording layers for storing optical interference patterns, e.g. holograms; for storing data in three dimensions, e.g. volume storage
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
- G03H2001/0264—Organic recording material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2260/00—Recording materials or recording processes
- G03H2260/12—Photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Holo Graphy (AREA)
- Polyurethanes Or Polyureas (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymerisation Methods In General (AREA)
Abstract
formulação de fotopolímero apresentando monômeros graváveis à base de triazina. a invenção se relaciona a uma formulação de fotopolímero compreendendo uma matriz de polímeros de poliuretano, monômeros graváveis, e fotoiniciadores, em que os monômeros graváveis compreendem compostos da fórmula (i), onde r¹,r²,r³ são independentes um do outro sendo cada um um átomo de halogênio ou um radical orgânico, em que pelo menos um dosw radicais é um radical orgânico que compreende um grupo de cura por radiação. a invenção se relaciona ainda ao uso de uma formulação de fotopolímeros para a produção de mídia holográfica.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP10001006 | 2010-02-02 | ||
PCT/EP2011/051246 WO2011095441A1 (de) | 2010-02-02 | 2011-01-28 | Photopolymer-formulierung mit triazin-basierten schreibmonomeren |
Publications (1)
Publication Number | Publication Date |
---|---|
BR112012019378A2 true BR112012019378A2 (pt) | 2016-05-03 |
Family
ID=42313702
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR112012019378A BR112012019378A2 (pt) | 2010-02-02 | 2011-01-28 | formulação de fotopolímero apresentando monômeros graváveis à base de triazina |
Country Status (8)
Country | Link |
---|---|
US (1) | US9366957B2 (pt) |
EP (1) | EP2531892B1 (pt) |
JP (1) | JP6023592B2 (pt) |
KR (1) | KR20120125270A (pt) |
CN (1) | CN102763037A (pt) |
BR (1) | BR112012019378A2 (pt) |
RU (1) | RU2012137134A (pt) |
WO (1) | WO2011095441A1 (pt) |
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US8808946B2 (en) * | 2009-11-03 | 2014-08-19 | Bayer Materialscience Ag | Urethane acrylate having a high refractive index and reduced double bond density |
CN102667934B (zh) * | 2009-11-03 | 2015-09-09 | 拜尔材料科学股份公司 | 作为光聚合物制剂中的添加剂的氟代氨基甲酸酯 |
PL2317511T3 (pl) * | 2009-11-03 | 2012-08-31 | Bayer Materialscience Ag | Formulacje fotopolimerowe z nastawialnym mechanicznym modułem Guv |
JP5925686B2 (ja) * | 2009-11-03 | 2016-05-25 | バイエル・マテリアルサイエンス・アクチェンゲゼルシャフトBayer MaterialScience AG | ホログラフィックフィルムの製造方法 |
US8771903B2 (en) * | 2009-11-03 | 2014-07-08 | Bayer Materialscience Ag | Method for producing a holographic film |
TWI489209B (zh) * | 2009-11-03 | 2015-06-21 | Bayer Materialscience Ag | 在光聚合物配製物中作為添加劑的胺甲酸乙酯 |
JP5638085B2 (ja) * | 2009-11-03 | 2014-12-10 | バイエル・マテリアルサイエンス・アクチェンゲゼルシャフトBayer MaterialScience AG | 異なった書込コモノマーを含有する感光性ポリマー組成物 |
EP2496549B1 (de) * | 2009-11-03 | 2014-10-08 | Bayer Intellectual Property GmbH | Neue, nicht kristallisierende methacrylate, deren herstellung und verwendung |
CN102754026B (zh) * | 2010-02-02 | 2015-10-07 | 拜耳知识产权有限责任公司 | 具有酯基书写单体的光聚合物制剂 |
CN103819420A (zh) * | 2013-07-01 | 2014-05-28 | 江阴摩尔化工新材料有限公司 | 紫外光固化低聚物、其合成方法及含有该低聚物的紫外光固化涂料 |
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US10241402B2 (en) * | 2014-12-12 | 2019-03-26 | Covestro Deutschland Ag | Naphthyl acrylates as writing monomers for photopolymers |
TW201708197A (zh) | 2015-06-23 | 2017-03-01 | 科思創德意志股份有限公司 | 新穎之經取代三及其製造方法 |
US20180180993A1 (en) * | 2015-06-23 | 2018-06-28 | Covestro Deutschland Ag | New triazine as photo initiators and their preparation |
CN110603589B (zh) * | 2017-05-09 | 2021-11-16 | 科思创德国股份有限公司 | 含全息曝光的光致聚合物层和高耐受性涂料层的全息介质 |
TW201906882A (zh) * | 2017-05-09 | 2019-02-16 | 德商科思創德意志股份有限公司 | 含有用於全像照射的光聚合物層及高度耐性漆層之薄膜結構 |
KR102214895B1 (ko) * | 2017-12-26 | 2021-02-09 | 삼성에스디아이 주식회사 | 레지스트 하층막용 조성물 및 이를 이용한 패턴 형성 방법 |
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CN112759701B (zh) * | 2019-10-21 | 2022-12-30 | 杭州光粒科技有限公司 | 光致聚合物组合物、反射式衍射光栅及其制备方法 |
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EP2450893A1 (de) * | 2010-11-08 | 2012-05-09 | Bayer MaterialScience AG | Photopolymer-Formulierung zur Herstellung holographischer Medien mit hoch vernetzten Matrixpolymeren |
-
2011
- 2011-01-28 JP JP2012551583A patent/JP6023592B2/ja not_active Expired - Fee Related
- 2011-01-28 KR KR1020127020255A patent/KR20120125270A/ko not_active Application Discontinuation
- 2011-01-28 RU RU2012137134/04A patent/RU2012137134A/ru not_active Application Discontinuation
- 2011-01-28 CN CN2011800081361A patent/CN102763037A/zh active Pending
- 2011-01-28 WO PCT/EP2011/051246 patent/WO2011095441A1/de active Application Filing
- 2011-01-28 BR BR112012019378A patent/BR112012019378A2/pt not_active Application Discontinuation
- 2011-01-28 EP EP11701279.9A patent/EP2531892B1/de active Active
- 2011-01-28 US US13/576,775 patent/US9366957B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
EP2531892B1 (de) | 2016-01-27 |
WO2011095441A1 (de) | 2011-08-11 |
US9366957B2 (en) | 2016-06-14 |
EP2531892A1 (de) | 2012-12-12 |
CN102763037A (zh) | 2012-10-31 |
RU2012137134A (ru) | 2014-03-10 |
KR20120125270A (ko) | 2012-11-14 |
JP2013519111A (ja) | 2013-05-23 |
US20120321998A1 (en) | 2012-12-20 |
JP6023592B2 (ja) | 2016-11-09 |
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