MX2019011934A - Metodo controlado para depositar una capa de cromo o aleacion de cromo sobre al menos un sustrato. - Google Patents
Metodo controlado para depositar una capa de cromo o aleacion de cromo sobre al menos un sustrato.Info
- Publication number
- MX2019011934A MX2019011934A MX2019011934A MX2019011934A MX2019011934A MX 2019011934 A MX2019011934 A MX 2019011934A MX 2019011934 A MX2019011934 A MX 2019011934A MX 2019011934 A MX2019011934 A MX 2019011934A MX 2019011934 A MX2019011934 A MX 2019011934A
- Authority
- MX
- Mexico
- Prior art keywords
- chromium
- substrate
- bath
- alloy layer
- deposition bath
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
- B32B15/013—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of a metal other than iron or aluminium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C25D21/14—Controlled addition of electrolyte components
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
- C25D5/611—Smooth layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/615—Microstructure of the layers, e.g. mixed structure
- C25D5/619—Amorphous layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
Abstract
La presente invención se refiere a un método controlado para depositar una capa de cromo o aleación cromo sobre al menos un sustrato, el método comprende los pasos de (a) proporcionar un baño de deposición acuoso, donde el baño comprende-iones de cromo trivalente, -iones de bromuro, -cationes de metal alcalinos en una cantidad total de 0 mol/L hasta 1 mol/L, sobre la base del volumen total del baño de deposición, y el baño tiene - un pH objetivo dentro del intervalo de 4.1 a 7.0, (b) proporcionar al menos un sustrato y al menos un ánodo, (c) sumergir al menos un sustrato en el baño de deposición acuoso y aplicar una corriente eléctrica directa de modo que la capa de cromo o aleación de cromo se deposite sobre el sustrato, siendo el sustrato el cátodo, donde durante o después del paso (c) el pH del baño de deposición es menor que el pH objetivo, (d) agregar NH4OH y/o NH3 durante o después del paso (c) al baño de deposición de modo que el pH objetivo del baño de deposición se recupere.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP17164733 | 2017-04-04 | ||
PCT/EP2018/058578 WO2018185144A1 (en) | 2017-04-04 | 2018-04-04 | Controlled method for depositing a chromium or chromium alloy layer on at least one substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
MX2019011934A true MX2019011934A (es) | 2019-11-28 |
Family
ID=58489228
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2019011934A MX2019011934A (es) | 2017-04-04 | 2018-04-04 | Metodo controlado para depositar una capa de cromo o aleacion de cromo sobre al menos un sustrato. |
MX2023002873A MX2023002873A (es) | 2017-04-04 | 2019-10-03 | Metodo controlado para depositar una capa de cromo o aleacion de cromo sobre al menos un sustrato. |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2023002873A MX2023002873A (es) | 2017-04-04 | 2019-10-03 | Metodo controlado para depositar una capa de cromo o aleacion de cromo sobre al menos un sustrato. |
Country Status (13)
Country | Link |
---|---|
US (1) | US20200017986A1 (es) |
EP (2) | EP3607115B1 (es) |
JP (2) | JP7116081B2 (es) |
KR (1) | KR20190133705A (es) |
CN (3) | CN115386922A (es) |
BR (1) | BR112019018993A2 (es) |
CA (1) | CA3058275A1 (es) |
ES (1) | ES2926004T3 (es) |
MX (2) | MX2019011934A (es) |
PL (1) | PL3607115T3 (es) |
PT (1) | PT3607115T (es) |
RU (2) | RU2764454C2 (es) |
WO (1) | WO2018185144A1 (es) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102533808B1 (ko) * | 2018-12-11 | 2023-05-17 | 아토테크 도이칠란트 게엠베하 운트 콤파니 카게 | 크롬 또는 크롬 합금을 성막하기 위한 방법 및 도금 장치 |
EP3744874A1 (en) | 2019-05-29 | 2020-12-02 | Coventya SAS | Electroplated product with corrosion-resistant coating |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL75772C (es) * | 1948-03-20 | |||
US3111464A (en) * | 1961-09-29 | 1963-11-19 | Battelle Development Corp | Electrodeposition of chromium and chromium alloys |
GB1455580A (en) * | 1973-12-13 | 1976-11-17 | Albright & Wilson | Electrodeposition of chromium |
US4093521A (en) * | 1975-12-18 | 1978-06-06 | Stanley Renton | Chromium electroplating |
US4477318A (en) * | 1980-11-10 | 1984-10-16 | Omi International Corporation | Trivalent chromium electrolyte and process employing metal ion reducing agents |
US4392922A (en) * | 1980-11-10 | 1983-07-12 | Occidental Chemical Corporation | Trivalent chromium electrolyte and process employing vanadium reducing agent |
US4466865A (en) * | 1982-01-11 | 1984-08-21 | Omi International Corporation | Trivalent chromium electroplating process |
JPS60165388A (ja) * | 1984-02-07 | 1985-08-28 | Mitsubishi Metal Corp | 焼結金属部材のメツキ方法 |
US4804446A (en) * | 1986-09-19 | 1989-02-14 | The United States Of America As Represented By The Secretary Of Commerce | Electrodeposition of chromium from a trivalent electrolyte |
JP3188361B2 (ja) * | 1994-06-27 | 2001-07-16 | ペルメレック電極株式会社 | クロムめっき方法 |
RU2139368C1 (ru) * | 1999-01-14 | 1999-10-10 | Виноградов Сергей Станиславович | Способ электрохимического нанесения хромовых покрытий на металлы и сплавы |
RU2139369C1 (ru) * | 1999-01-25 | 1999-10-10 | Виноградов Сергей Станиславович | Способ электрохимического нанесения хромовых покрытий на металлы и сплавы |
RU2146309C1 (ru) * | 1999-03-25 | 2000-03-10 | Винокуров Евгений Геннадьевич | Электролит для осаждения хромовых покрытий на металлы и сплавы |
WO2006043507A1 (ja) * | 2004-10-18 | 2006-04-27 | Yamaha Hatsudoki Kabushiki Kaisha | エンジン用部品 |
JP4394050B2 (ja) * | 2005-09-02 | 2010-01-06 | 千代田第一工業株式会社 | 低摩擦性、耐摩耗性を向上させた金属板の製造方法 |
JP2007302917A (ja) * | 2006-05-09 | 2007-11-22 | Chiyoda Daiichi Kogyo Kk | 金属部材およびその製造方法 |
CN101078131A (zh) * | 2006-05-26 | 2007-11-28 | 中国科学院兰州化学物理研究所 | 在三价铬镀液中电沉积装饰性铬镀层的方法 |
CN101078132A (zh) * | 2006-05-26 | 2007-11-28 | 中国科学院兰州化学物理研究所 | 在三价铬镀液中电沉积耐磨性厚铬镀层的方法 |
CN101469435A (zh) * | 2007-12-25 | 2009-07-01 | 中国科学院兰州化学物理研究所 | 一种在环保型三价铬镀液中电沉积铬磷合金镀层的方法 |
JP5880510B2 (ja) * | 2013-09-27 | 2016-03-09 | 豊田合成株式会社 | 3価クロムめっき液の再生装置、前記再生装置を備えた3価クロムめっきシステム、及び3価クロムめっき液の再生方法 |
EP2899299A1 (en) * | 2014-01-24 | 2015-07-29 | COVENTYA S.p.A. | Electroplating bath containing trivalent chromium and process for depositing chromium |
CN105177640A (zh) * | 2015-08-04 | 2015-12-23 | 重庆立道表面技术有限公司 | 一种高效高性能高硬镀铬工艺 |
-
2018
- 2018-04-04 RU RU2021129491A patent/RU2764454C2/ru active
- 2018-04-04 US US16/495,122 patent/US20200017986A1/en not_active Abandoned
- 2018-04-04 ES ES18713988T patent/ES2926004T3/es active Active
- 2018-04-04 CA CA3058275A patent/CA3058275A1/en active Pending
- 2018-04-04 EP EP18713988.6A patent/EP3607115B1/en active Active
- 2018-04-04 KR KR1020197030591A patent/KR20190133705A/ko not_active Application Discontinuation
- 2018-04-04 JP JP2019554659A patent/JP7116081B2/ja active Active
- 2018-04-04 PT PT187139886T patent/PT3607115T/pt unknown
- 2018-04-04 WO PCT/EP2018/058578 patent/WO2018185144A1/en unknown
- 2018-04-04 PL PL18713988.6T patent/PL3607115T3/pl unknown
- 2018-04-04 CN CN202210937927.2A patent/CN115386922A/zh active Pending
- 2018-04-04 CN CN202210937931.9A patent/CN115216815A/zh active Pending
- 2018-04-04 MX MX2019011934A patent/MX2019011934A/es unknown
- 2018-04-04 EP EP22173932.9A patent/EP4071280A1/en active Pending
- 2018-04-04 BR BR112019018993A patent/BR112019018993A2/pt active Search and Examination
- 2018-04-04 RU RU2019134939A patent/RU2758651C2/ru active
- 2018-04-04 CN CN201880022182.9A patent/CN110446801B/zh active Active
-
2019
- 2019-10-03 MX MX2023002873A patent/MX2023002873A/es unknown
-
2022
- 2022-07-28 JP JP2022120486A patent/JP2022141949A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JP2020513061A (ja) | 2020-04-30 |
MX2023002873A (es) | 2023-04-03 |
CN110446801B (zh) | 2022-08-30 |
RU2021129491A3 (es) | 2021-12-20 |
EP3607115B1 (en) | 2022-06-08 |
RU2019134939A (ru) | 2021-05-05 |
WO2018185144A1 (en) | 2018-10-11 |
BR112019018993A2 (pt) | 2020-04-14 |
CN110446801A (zh) | 2019-11-12 |
RU2021129491A (ru) | 2021-11-12 |
KR20190133705A (ko) | 2019-12-03 |
ES2926004T3 (es) | 2022-10-21 |
JP7116081B2 (ja) | 2022-08-09 |
EP3607115A1 (en) | 2020-02-12 |
RU2019134939A3 (es) | 2021-08-27 |
PT3607115T (pt) | 2022-08-23 |
PL3607115T3 (pl) | 2022-10-03 |
CA3058275A1 (en) | 2018-10-11 |
JP2022141949A (ja) | 2022-09-29 |
US20200017986A1 (en) | 2020-01-16 |
RU2764454C2 (ru) | 2022-01-17 |
CN115216815A (zh) | 2022-10-21 |
RU2758651C2 (ru) | 2021-11-01 |
CN115386922A (zh) | 2022-11-25 |
EP4071280A1 (en) | 2022-10-12 |
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