PL3607115T3 - Kontrolowany sposób osadzania warstwy chromu albo stopu chromu na co najmniej jednym podłożu - Google Patents

Kontrolowany sposób osadzania warstwy chromu albo stopu chromu na co najmniej jednym podłożu

Info

Publication number
PL3607115T3
PL3607115T3 PL18713988.6T PL18713988T PL3607115T3 PL 3607115 T3 PL3607115 T3 PL 3607115T3 PL 18713988 T PL18713988 T PL 18713988T PL 3607115 T3 PL3607115 T3 PL 3607115T3
Authority
PL
Poland
Prior art keywords
chromium
depositing
substrate
alloy layer
controlled method
Prior art date
Application number
PL18713988.6T
Other languages
English (en)
Inventor
Anke WALTER
Oleksandra YEVTUSHENKO
Franziska PAULIG
Original Assignee
Atotech Deutschland GmbH & Co. KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=58489228&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=PL3607115(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Atotech Deutschland GmbH & Co. KG filed Critical Atotech Deutschland GmbH & Co. KG
Publication of PL3607115T3 publication Critical patent/PL3607115T3/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
    • B32B15/013—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of a metal other than iron or aluminium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C25D21/14—Controlled addition of electrolyte components
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C25D5/611—Smooth layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/619—Amorphous layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Physical Vapour Deposition (AREA)
PL18713988.6T 2017-04-04 2018-04-04 Kontrolowany sposób osadzania warstwy chromu albo stopu chromu na co najmniej jednym podłożu PL3607115T3 (pl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP17164733 2017-04-04
PCT/EP2018/058578 WO2018185144A1 (en) 2017-04-04 2018-04-04 Controlled method for depositing a chromium or chromium alloy layer on at least one substrate

Publications (1)

Publication Number Publication Date
PL3607115T3 true PL3607115T3 (pl) 2022-10-03

Family

ID=58489228

Family Applications (1)

Application Number Title Priority Date Filing Date
PL18713988.6T PL3607115T3 (pl) 2017-04-04 2018-04-04 Kontrolowany sposób osadzania warstwy chromu albo stopu chromu na co najmniej jednym podłożu

Country Status (12)

Country Link
US (1) US20200017986A1 (pl)
EP (2) EP3607115B1 (pl)
JP (2) JP7116081B2 (pl)
KR (1) KR20190133705A (pl)
CN (3) CN115216815A (pl)
CA (1) CA3058275A1 (pl)
ES (1) ES2926004T3 (pl)
MX (2) MX2019011934A (pl)
PL (1) PL3607115T3 (pl)
PT (1) PT3607115T (pl)
RU (2) RU2764454C2 (pl)
WO (1) WO2018185144A1 (pl)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12006585B2 (en) 2018-12-11 2024-06-11 Atotech Deutschland Gmbh Method for depositing a chromium or chromium alloy layer and plating apparatus
EP3744874A1 (en) 2019-05-29 2020-12-02 Coventya SAS Electroplated product with corrosion-resistant coating
FI129420B (en) * 2020-04-23 2022-02-15 Savroc Ltd AQUATIC ELECTRIC COATING BATH
JP7141780B1 (ja) * 2022-05-19 2022-09-26 奥野製薬工業株式会社 めっき皮膜の製造方法。
EP4570965A1 (de) * 2023-12-15 2025-06-18 topocrom systems AG Vorrichtung und verfahren zur galvanischen chrom-abscheidung

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL75772C (pl) 1948-03-20
US3111464A (en) * 1961-09-29 1963-11-19 Battelle Development Corp Electrodeposition of chromium and chromium alloys
GB1455580A (en) * 1973-12-13 1976-11-17 Albright & Wilson Electrodeposition of chromium
US4093521A (en) * 1975-12-18 1978-06-06 Stanley Renton Chromium electroplating
US4477318A (en) * 1980-11-10 1984-10-16 Omi International Corporation Trivalent chromium electrolyte and process employing metal ion reducing agents
US4392922A (en) * 1980-11-10 1983-07-12 Occidental Chemical Corporation Trivalent chromium electrolyte and process employing vanadium reducing agent
US4466865A (en) * 1982-01-11 1984-08-21 Omi International Corporation Trivalent chromium electroplating process
JPS60165388A (ja) * 1984-02-07 1985-08-28 Mitsubishi Metal Corp 焼結金属部材のメツキ方法
US4804446A (en) * 1986-09-19 1989-02-14 The United States Of America As Represented By The Secretary Of Commerce Electrodeposition of chromium from a trivalent electrolyte
JP3188361B2 (ja) * 1994-06-27 2001-07-16 ペルメレック電極株式会社 クロムめっき方法
RU2139368C1 (ru) * 1999-01-14 1999-10-10 Виноградов Сергей Станиславович Способ электрохимического нанесения хромовых покрытий на металлы и сплавы
RU2139369C1 (ru) * 1999-01-25 1999-10-10 Виноградов Сергей Станиславович Способ электрохимического нанесения хромовых покрытий на металлы и сплавы
RU2146309C1 (ru) * 1999-03-25 2000-03-10 Винокуров Евгений Геннадьевич Электролит для осаждения хромовых покрытий на металлы и сплавы
US20080274373A1 (en) * 2004-10-18 2008-11-06 Yamaha Hatsudoki Kabushiki Kaisha Engine Part
JP4394050B2 (ja) 2005-09-02 2010-01-06 千代田第一工業株式会社 低摩擦性、耐摩耗性を向上させた金属板の製造方法
JP2007302917A (ja) 2006-05-09 2007-11-22 Chiyoda Daiichi Kogyo Kk 金属部材およびその製造方法
CN101078131A (zh) * 2006-05-26 2007-11-28 中国科学院兰州化学物理研究所 在三价铬镀液中电沉积装饰性铬镀层的方法
CN101078132A (zh) * 2006-05-26 2007-11-28 中国科学院兰州化学物理研究所 在三价铬镀液中电沉积耐磨性厚铬镀层的方法
TW200639277A (en) * 2006-07-07 2006-11-16 Univ Chang Gung A composition and a method of aqueous solution for Trivalent Chromium electrodeposition
CN101469435A (zh) * 2007-12-25 2009-07-01 中国科学院兰州化学物理研究所 一种在环保型三价铬镀液中电沉积铬磷合金镀层的方法
JP5880510B2 (ja) * 2013-09-27 2016-03-09 豊田合成株式会社 ３価クロムめっき液の再生装置、前記再生装置を備えた３価クロムめっきシステム、及び３価クロムめっき液の再生方法
EP2899299A1 (en) 2014-01-24 2015-07-29 COVENTYA S.p.A. Electroplating bath containing trivalent chromium and process for depositing chromium
CN105177640A (zh) * 2015-08-04 2015-12-23 重庆立道表面技术有限公司 一种高效高性能高硬镀铬工艺
CN105112959A (zh) * 2015-09-21 2015-12-02 无锡清杨机械制造有限公司 一种Cr-Ni合金电镀液及电镀方法

Also Published As

Publication number Publication date
MX2019011934A (es) 2019-11-28
JP7116081B2 (ja) 2022-08-09
RU2021129491A (ru) 2021-11-12
CN115216815A (zh) 2022-10-21
RU2021129491A3 (pl) 2021-12-20
RU2764454C2 (ru) 2022-01-17
EP3607115A1 (en) 2020-02-12
MX2023002873A (es) 2023-04-03
BR112019018993A2 (pt) 2020-04-14
CN110446801B (zh) 2022-08-30
US20200017986A1 (en) 2020-01-16
KR20190133705A (ko) 2019-12-03
JP2022141949A (ja) 2022-09-29
RU2019134939A (ru) 2021-05-05
RU2019134939A3 (pl) 2021-08-27
EP3607115B1 (en) 2022-06-08
EP4071280A1 (en) 2022-10-12
JP7502375B2 (ja) 2024-06-18
RU2758651C2 (ru) 2021-11-01
ES2926004T3 (es) 2022-10-21
JP2020513061A (ja) 2020-04-30
CA3058275A1 (en) 2018-10-11
PT3607115T (pt) 2022-08-23
CN115386922A (zh) 2022-11-25
CN110446801A (zh) 2019-11-12
WO2018185144A1 (en) 2018-10-11

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