WO2008127112A3 - Electrodeposition - Google Patents

Electrodeposition Download PDF

Info

Publication number
WO2008127112A3
WO2008127112A3 PCT/NL2008/050222 NL2008050222W WO2008127112A3 WO 2008127112 A3 WO2008127112 A3 WO 2008127112A3 NL 2008050222 W NL2008050222 W NL 2008050222W WO 2008127112 A3 WO2008127112 A3 WO 2008127112A3
Authority
WO
WIPO (PCT)
Prior art keywords
metalloid
substrate
metal
value
anode
Prior art date
Application number
PCT/NL2008/050222
Other languages
French (fr)
Other versions
WO2008127112A2 (en
Inventor
Erkel Joost Van
Original Assignee
Tno
Erkel Joost Van
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tno, Erkel Joost Van filed Critical Tno
Publication of WO2008127112A2 publication Critical patent/WO2008127112A2/en
Publication of WO2008127112A3 publication Critical patent/WO2008127112A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/617—Crystalline layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/66—Electroplating: Baths therefor from melts
    • C25D3/665—Electroplating: Baths therefor from melts from ionic liquids
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C25D5/611—Smooth layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

The invention relates to a method for preparing an article which comprises a metal and/or a metalloid deposition, applied by electro-deposition, the method comprising - providing a substrate (serving as a cathode) and an anode in a plating liquid, the plating liquid comprising (a) metal ions and/or metalloid ions to form the metallic layer and/or the metalloid layer and (b) an ionic liquid; and - depositing the metal and/or metalloid on the substrate by applying an electrical potential between anode and substrate, wherein the electrical potential and/or electrical current are changed a plurality of times between at least one first value (A) and at least one second value different from said first value (B).
PCT/NL2008/050222 2007-04-17 2008-04-17 Electrodeposition WO2008127112A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP07106339A EP1983078A1 (en) 2007-04-17 2007-04-17 Electrodeposition
EP07106339.0 2007-04-17

Publications (2)

Publication Number Publication Date
WO2008127112A2 WO2008127112A2 (en) 2008-10-23
WO2008127112A3 true WO2008127112A3 (en) 2009-07-09

Family

ID=38461756

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/NL2008/050222 WO2008127112A2 (en) 2007-04-17 2008-04-17 Electrodeposition

Country Status (2)

Country Link
EP (1) EP1983078A1 (en)
WO (1) WO2008127112A2 (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2250301B1 (en) * 2008-02-26 2011-11-02 Ewald Dörken Ag Coating method for a work piece
US20120028868A1 (en) * 2009-04-16 2012-02-02 Basf Se Removal of metal salt-comprising ionic liquids from workpieces and recycling of such liquids
DE102009035660A1 (en) * 2009-07-30 2011-02-03 Ewald Dörken Ag Process for the electrochemical coating of a workpiece
CN101724869B (en) * 2009-12-18 2011-06-22 北京有色金属研究总院 Application of ion liquid addictive in watt nickel electroplating bath
WO2012023989A2 (en) 2010-08-20 2012-02-23 Rhodia Operations Polymer compositions, polymer films, polymer gels, polymer foams, and electronic devices containing such films, gels, and foams
CN101949044B (en) * 2010-09-20 2011-12-28 大连海事大学 Niobium electro-osmosis method for steel surface in ionic liquid
CN101985766B (en) * 2010-11-26 2012-09-05 昆明理工大学 Method for electroplating Zn-Ti alloy by ionic liquid
US8778164B2 (en) 2010-12-16 2014-07-15 Honeywell International Inc. Methods for producing a high temperature oxidation resistant coating on superalloy substrates and the coated superalloy substrates thereby produced
EP2476784A1 (en) * 2011-01-18 2012-07-18 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Method for manufacturing an electronic device by electrodeposition from an ionic liquid
US9771661B2 (en) 2012-02-06 2017-09-26 Honeywell International Inc. Methods for producing a high temperature oxidation resistant MCrAlX coating on superalloy substrates
US20130299453A1 (en) * 2012-05-14 2013-11-14 United Technologies Corporation Method for making metal plated gas turbine engine components
EP3127183B1 (en) 2014-03-31 2020-09-30 Technion Research & Development Foundation Ltd. Method for passive metal activation and uses thereof
CN104499002A (en) * 2014-12-10 2015-04-08 上海大学 Method for preparing copper-iron nano plated layer from low-grade sulfide ore through direct electro-deposition
US10087540B2 (en) 2015-02-17 2018-10-02 Honeywell International Inc. Surface modifiers for ionic liquid aluminum electroplating solutions, processes for electroplating aluminum therefrom, and methods for producing an aluminum coating using the same
CN109023454B (en) * 2018-09-18 2020-04-07 蒙城繁枫真空科技有限公司 Method for electroplating Cr-Ag alloy coating by using double-cation ionic liquid
CN114855231A (en) * 2022-05-27 2022-08-05 江西思远再生资源有限公司 Method for plating niobium on magnesium and magnesium alloy

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4966660A (en) * 1987-07-13 1990-10-30 Nisshin Steel Co., Ltd. Process for electrodeposition of aluminum on metal sheet
DE10108893A1 (en) * 2001-02-23 2002-10-24 Rolf Hempelmann Production of metals and their alloys and compound semiconductors comprises galvanically depositing metals, alloys or compound semiconductors from an ionic liquid or suitable molten salt in an electrolysis device
WO2006053362A2 (en) * 2004-11-19 2006-05-26 Plansee Se Method for depositing layers from ionic liquids

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4966660A (en) * 1987-07-13 1990-10-30 Nisshin Steel Co., Ltd. Process for electrodeposition of aluminum on metal sheet
DE10108893A1 (en) * 2001-02-23 2002-10-24 Rolf Hempelmann Production of metals and their alloys and compound semiconductors comprises galvanically depositing metals, alloys or compound semiconductors from an ionic liquid or suitable molten salt in an electrolysis device
WO2006053362A2 (en) * 2004-11-19 2006-05-26 Plansee Se Method for depositing layers from ionic liquids

Also Published As

Publication number Publication date
EP1983078A1 (en) 2008-10-22
WO2008127112A2 (en) 2008-10-23

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