KR970027091A - 유기 규소 변성된 전하 수송성 화합물 및 이 화합물을 함유하고 전하 수송능을 갖는 경화성 조성물 - Google Patents

유기 규소 변성된 전하 수송성 화합물 및 이 화합물을 함유하고 전하 수송능을 갖는 경화성 조성물 Download PDF

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KR970027091A
KR970027091A KR1019960052270A KR19960052270A KR970027091A KR 970027091 A KR970027091 A KR 970027091A KR 1019960052270 A KR1019960052270 A KR 1019960052270A KR 19960052270 A KR19960052270 A KR 19960052270A KR 970027091 A KR970027091 A KR 970027091A
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organosilicon
charge transport
curable composition
represented
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노부오 구시비끼
기꾸꼬 다께우찌
히데끼 고바야시
도루 마사또미
가즈오 요시나가
유이찌 하시모또
슌이찌로 니시다
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마쯔무라 다다시
다우 코닝 아시아 가부시끼가이샤
아이즈까 고지
도레이 다우 코닝 실리콘 가부끼가이샤
미따라이 후지오
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Abstract

본 발명은 구조가 하기 화학식 (I)로 표시되는 유기 규소 변성된 전하 수송성 화합물, 및 이 유기 규소 변성된 전하 수송성 화합물과 유기 규소계 고분자를 주성분으로 하는 경화형 수지를 함유하는 경화성 조성물에 관한 것이다.
상기 식 중, A는 전하 수송기를 나타내고, Q는 가수 분해성기 또는 히드록실기를 나타내고, R2는 탄소 원자수 1 내지 15의 1가 탄화수소기 또는 할로겐 치환된 1가 탄화수소기를 나타내고, n은 1 내지 18이고, m은 1 내지 3이고, 1은 1 내지 5이다.

Description

유기 규소 변성된 전하 수송성 화합물 및 이 화합물을 함유하고 전하 수송능을 갖는 경화성 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 실시예 1의 4-[2-(트리에톡시실릴)에틸]트리페닐아민의 H-NMR 스펙트럼, 제2도는 실시예 4의 4-[N, N-비스(3,4-디메틸페닐)아미노]-[2-(트리에톡시실릴)에틸]벤젠의 H-NMR 스펙트럼, 제3도는 실시예 4의 4-[N,N-비스(3,4-디메틸페닐)아미노]-[2-(트리에톡시실릴)에틸]벤젠의 C-NMR 스펙트럼.

Claims (10)

  1. 구조가 하기 화학식 (I)로 표시되는 유기 규소 변성된 전하 수송성 화합물.
    상기 식 중, A는 전하 수송기를 나타내고, Q는 가수 분해성기 또는 히드록실기를 나타내고, R2는 탄소 원자수 1 내지 15의 1가 탄화수소기 또는 할로겐 치환된 1가 탄화수소기를 나타내고, n은 1 내지 18이고, m은 1내지 3이고, 1은 1내지 5이다.
  2. 제1항에 있어서, 상기 가수 분해성기가 -OR1(여기서, R1은 탄소 원자수 1 내지 6의 알킬기 또는 알콕시 알킬기를 나타냄)로 표시되는 기인 유기 규소 변성된 전하 수송성 화합물.
  3. 제1항에 있어서, 이온화 포텐셜이 4.5eV 내지 6.2eV인 유기 규소 변성된 전하 수송성 화합물.
  4. 제1항에 있어서, 상기 전하 수송기의 구조가 하기 화학식 (II)로 표시되는 것인 유기 규소 변성된 전하 수송성 화합물.
    상기 식 중, R3, R4및 R5는 각각 유기기를 나타내고, 이들 중 적어도 하나는 방향족 탄화수소 고리기 또는 헤테로시클릭기를 나타내고, R3, R4및 R5는 동일하거나 또는 상이할 수 있다.
  5. 규소 원자에 결합된 1가 탄화수소기 및 규소 원자의 비가 0.5 내지 1.5인 유기 규소계 고분자를 주성분으로 하는 경화형 수지 및 구조가 하기 화학식 (I)로 표시되는 유기 규소 변성된 전하 수송성 화합물을 포함하는, 전하 수송능을 갖는 경화성 조성물.
    상기 식 중, A는 전하 수송기를 나타내고, Q는 가수 분해성기 또는 히드록실기를 나타내고, R2는 탄소 원자수 1 내지 15의 1가 탄화수소기 또는 할로겐 치환된 1가 탄화수소기를 나타내고, n은 1 내지 18이고, m은 1 내지 3이고, 1은 1 내지 5이다.
  6. 제5항에 있어서, 상기 가수 분해성기가 -OR1(여기서, R1은 탄소 원자수 1 내지 6의 알킬기 또는 알콕시 알킬기를 나타냄)로 표시되는 기인 경화성 조성물.
  7. 제5항에 있어서, 상기 유기 규소계 고분자가 하기 일반식(Ⅲ)으로 표시되는 구조 단위를 갖는 오르가노폴리실록산인 경화성 조성물.
    R6 nSiO(4-n-m)/2(OR7)m(Ⅲ)
    상기 식 중, R6은 탄소 원자수 1 내지 18의 직쇄 또는 분지쇄 알킬기 또는 알케닐기, 또는 아릴기를 나타내고, R7은 탄소 원자수 1 내지 4의 알킬기를 나타내고, n은 평균 0.5 내지 1.5이고, m은 평균 0.001 내지 1.5이다.
  8. 제5항에 있어서, 상기 유기 규소 변성된 전하 수송성 화합물이 경화성 수지의 유기 규소계 고분자 100 중량부에 대하여 20 중량부 내지 200 중량부의 양으로 함유되는 것인 경화성 조성물.
  9. 제5항에 있어서, 상기 전하 수송기의 구조가 하기 화학식(Ⅱ)로 표시되는 것인 경화성 조성물.
    상기 식중, R3, R4및 R5는 각각 유기기를 나타내고, 이들 중 적어도 하나는 방향족 탄화수소 고리기 또는 헤테로시클릭기를 나타내고, R3, R4및 R5는 동일하거나 또는 상이할 수 있다.
  10. 제5항에 있어서, 상기 경화성 수지가 하기 화학식(Ⅳ)로 표시되는 실란 화합물을 함유하는 것인 경화성 조성물.
    R8 aSiX4-a(Ⅳ)
    상기 식 중, R8은 탄소 원자수 1 내지 18의 직쇄 또는 분지쇄 또는 알케닐기, 또는 페닐기를 나타내고, X는 가수 분해성기를 나타내고, a는 몰비를 나타낸다.
    ※ 참고사항 : 최초출원 의하여 공개하는 것임.
KR1019960052270A 1995-11-06 1996-11-06 유기 규소 변성된 전하 수송성 화합물 및 이 화합물을 함유하고 전하 수송능을 갖는 경화성 조성물 KR100195429B1 (ko)

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Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4158204B2 (ja) * 1995-04-10 2008-10-01 住友化学株式会社 ポリシラン化合物、その製造方法およびその原料
JP3614222B2 (ja) * 1995-11-06 2005-01-26 ダウ コーニング アジア株式会社 ケイ素系正孔輸送材の製造方法
JP3640444B2 (ja) * 1995-11-06 2005-04-20 ダウ コーニング アジア株式会社 ポリシロキサン系正孔輸送材料の製造方法
JP3596235B2 (ja) * 1996-07-17 2004-12-02 富士ゼロックス株式会社 シラン化合物及びその製造方法
JP3899600B2 (ja) * 1996-07-17 2007-03-28 富士ゼロックス株式会社 シラン化合物及びその製造方法
JP2000214602A (ja) 1999-01-25 2000-08-04 Fuji Xerox Co Ltd 画像形成装置
US6187491B1 (en) 1999-02-08 2001-02-13 Eastman Kodak Company Electrophotographic charge generating element containing acid scavenger in overcoat
US6489069B1 (en) 1999-02-15 2002-12-03 Konica Corporation Electrophotographic image carrier and image forming apparatus, image forming method and processing cartridge using it
JP2001011188A (ja) * 1999-06-30 2001-01-16 Dow Corning Toray Silicone Co Ltd 芳香族含ケイ素ポリマーおよびその製造方法
JP2001040216A (ja) * 1999-07-29 2001-02-13 Dow Corning Toray Silicone Co Ltd 硬化性芳香族含ケイ素ポリマー組成物
JP2001249478A (ja) 2000-03-02 2001-09-14 Fuji Xerox Co Ltd 画像形成装置、プロセスカートリッジ、及びそれらの再生方法
US6759945B2 (en) * 2001-03-29 2004-07-06 Vtec Technologies, Inc. Variable transmittance birefringent device
EP1380596B1 (en) * 2002-07-08 2007-12-05 Eastman Kodak Company Organic charge transporting polymers including charge transport mojeties and silane groups, and silsesquioxane compositions prepared therefrom
US7365230B2 (en) * 2004-02-20 2008-04-29 E.I. Du Pont De Nemours And Company Cross-linkable polymers and electronic devices made with such polymers
KR20060133056A (ko) 2004-03-31 2006-12-22 이 아이 듀폰 디 네모아 앤드 캄파니 전하 수송 물질용 트리아릴아민 화합물
US20080007158A1 (en) * 2004-06-15 2008-01-10 Omar Farooq Linear Polysiloxanes, Silicone Composition, and Organic Light-Emitting Diode
JP2006321794A (ja) * 2005-04-19 2006-11-30 Mitsubishi Chemicals Corp 芳香族アルデヒド化合物の精製方法、精製された芳香族アルデヒド化合物、それを用いた電子材料、電子写真感光体及び電子デバイス
JP2008311367A (ja) 2007-06-13 2008-12-25 Fuji Xerox Co Ltd 有機電界発光素子及び表示装置
JP5295266B2 (ja) 2008-01-11 2013-09-18 ダウ・コーニング・コーポレイション エレクトロクロミック組成物、エレクトロクロミック組成物の形成方法、およびエレクトロクロミック装置
CN102015900B (zh) 2008-03-26 2012-11-07 陶氏康宁公司 硅氧烷组合物和有机发光二极管
JP5644051B2 (ja) * 2009-02-04 2014-12-24 コニカミノルタ株式会社 有機感光体、画像形成装置及びプロセスカートリッジ
WO2011049904A2 (en) 2009-10-19 2011-04-28 E. I. Du Pont De Nemours And Company Triarylamine compounds for electronic applications
KR101782660B1 (ko) 2009-10-19 2017-09-27 이 아이 듀폰 디 네모아 앤드 캄파니 전자적 응용을 위한 트라이아릴아민 화합물
JP5762932B2 (ja) * 2010-11-30 2015-08-12 信越化学工業株式会社 シラノール基を有するトリアリールアミン誘導体
CN109233352A (zh) * 2018-08-03 2019-01-18 蚌埠市万科硅材料科技有限公司 一种白炭黑表面处理方法
US11022933B2 (en) * 2019-05-17 2021-06-01 Canon Kabushi Kikaisha Process cartridge, image forming apparatus and cleaning apparatus

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5595953A (en) 1979-01-11 1980-07-21 Ricoh Co Ltd Electrophotographic photoreceptor
EP0224784A3 (de) 1985-11-21 1988-09-28 BASF Aktiengesellschaft Carbazolsubstituierte Polysiloxane, daraus hergestellte feste, fotoleitfähige Schichten und diese enthaltende elektrofotographische Aufzeichnungsmaterialien
US5187310A (en) * 1990-03-14 1993-02-16 Kao Corporation Organic silicon compound, method of its production, and photoreceptor for electrophotography incorporating it
US5290963A (en) 1990-05-12 1994-03-01 Kao Corporation Organic silicon compound, method of its production, and photoreceptor for electrophotography incorporating it
US5326661A (en) * 1991-11-13 1994-07-05 Hoechst Celanese Corp. Photorefractive polymers containing discrete photoconductive and electrooptical units
US5232801A (en) 1991-12-23 1993-08-03 Eastman Kodak Company Hole-transport liquid crystalline polymeric compounds, electrophotographic elements comprising same, and electrophotographic process
US5230976A (en) 1991-12-27 1993-07-27 Xerox Corporation Polymeric arylamine silane compounds and imaging members incorporating same
US5436099A (en) 1993-12-21 1995-07-25 Xerox Corporation Photoreceptor with low surface energy overcoat
AU704760B2 (en) * 1995-11-06 1999-05-06 Dow Corning Asia Limited Method of manufacturing a cohydrolyzed polysiloxane electron-hole transfer material
JP3614222B2 (ja) * 1995-11-06 2005-01-26 ダウ コーニング アジア株式会社 ケイ素系正孔輸送材の製造方法

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