KR920009890A - 실리콘 수지 조성물 - Google Patents

실리콘 수지 조성물 Download PDF

Info

Publication number
KR920009890A
KR920009890A KR1019910018879A KR910018879A KR920009890A KR 920009890 A KR920009890 A KR 920009890A KR 1019910018879 A KR1019910018879 A KR 1019910018879A KR 910018879 A KR910018879 A KR 910018879A KR 920009890 A KR920009890 A KR 920009890A
Authority
KR
South Korea
Prior art keywords
resin composition
silicone resin
silicon
less
lather
Prior art date
Application number
KR1019910018879A
Other languages
English (en)
Other versions
KR960005085B1 (ko
Inventor
시게시 야마모도
히로시 아사다찌
히로부미 후지오까
유미쓰 가네게에
Original Assignee
시기 모리야
미쓰비시 뎅끼 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 시기 모리야, 미쓰비시 뎅끼 가부시끼가이샤 filed Critical 시기 모리야
Publication of KR920009890A publication Critical patent/KR920009890A/ko
Application granted granted Critical
Publication of KR960005085B1 publication Critical patent/KR960005085B1/ko

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/12Polysiloxanes containing silicon bound to hydrogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/14Polysiloxanes containing silicon bound to oxygen-containing groups
    • C08G77/16Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxyl groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/14Polysiloxanes containing silicon bound to oxygen-containing groups
    • C08G77/18Polysiloxanes containing silicon bound to oxygen-containing groups to alkoxy or aryloxy groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/20Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/70Siloxanes defined by use of the MDTQ nomenclature

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Formation Of Insulating Films (AREA)
  • Silicon Polymers (AREA)

Abstract

내용 없음

Description

실리콘 수지 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (3)

  1. 일반식(I) :
    (식중, R1∼R4는 각각 수소원자 또는 저급알킬기, R5,R6은 각각 아릴기, 알킬기 또는 알게닐기이고 2n개의 R5및 R6중의 2%이상이 알케닐기, n은 5∼1600의 정수를 표시)로 표시되는 실리콘 라더포리마 해실리콘 라더포리마에 대해 0.2∼20.0중량%의 촉매 및 유기용매로 되는 270℃ 이하의 저온으로 열경화가 가능한 실리콘수지 조성물.
  2. 제1항에 있어서, 상기 일반식(I )중의 R5및 R6중의 10%이상이 알게닐기인 실리콘 라더모리마 및 유기용매로 되는 270℃ 이하의 저온으로 열경화가 가능한 실리콘수지 조성물.
  3. 제1항 또는 제2항에 있어서, 상기 실리콘 라더포리마에 함유되는 알칼리금속, 철, 연 동 및 할로겐화 수소가 각각 1ppm 이하이고 우란 및 토륨이 각각 1ppb 이하인 실리콘수지 조성물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019910018879A 1990-11-22 1991-10-25 실리콘 수지 조성물 KR960005085B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP90-318906 1990-11-22
JP31890690 1990-11-22
JP3027102A JP2991786B2 (ja) 1990-11-22 1991-02-21 シリコーン樹脂組成物
JP91-027102 1991-02-21

Publications (2)

Publication Number Publication Date
KR920009890A true KR920009890A (ko) 1992-06-25
KR960005085B1 KR960005085B1 (ko) 1996-04-20

Family

ID=26364990

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019910018879A KR960005085B1 (ko) 1990-11-22 1991-10-25 실리콘 수지 조성물

Country Status (5)

Country Link
US (1) US5236984A (ko)
JP (1) JP2991786B2 (ko)
KR (1) KR960005085B1 (ko)
CH (1) CH683264A5 (ko)
DE (1) DE4137513A1 (ko)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2923408B2 (ja) * 1992-12-21 1999-07-26 三菱電機株式会社 高純度シリコーンラダーポリマーの製造方法
DE4244517A1 (en) * 1992-12-30 1993-05-19 Kathrin Weise Photochemical crosslinking of persistent silicon carbide ceramic precursors - by UV-irradiation of poly-silane(s) in presence of special bis:azide(s), e.g. 2,6-bis-(4-azido:benzylidene)-4-methyl-cyclohexanone
US5491203A (en) * 1994-09-08 1996-02-13 Showa Denko K. K. Polyorganosiloxane and process for producing the same
JP3635156B2 (ja) * 1996-08-19 2005-04-06 ダウ コーニング アジア株式会社 硬化性ポリメチルシルセスキオキサン組成物
JP3679972B2 (ja) 2000-04-04 2005-08-03 三菱電機株式会社 高純度シリコーンラダーポリマーの製造方法
US7056989B2 (en) * 2001-05-01 2006-06-06 Korea Institute Of Science And Technology Polyalkylaromaticsilsesquioxane and preparation method thereof
US6599995B2 (en) * 2001-05-01 2003-07-29 Korea Institute Of Science And Technology Polyalkylaromaticsilsesquioxane and preparation method thereof
US8901268B2 (en) 2004-08-03 2014-12-02 Ahila Krishnamoorthy Compositions, layers and films for optoelectronic devices, methods of production and uses thereof
JP2007095785A (ja) * 2005-09-27 2007-04-12 Mitsubishi Electric Corp 電界効果型トランジスタ
KR100840782B1 (ko) 2007-01-16 2008-06-23 삼성전자주식회사 실록산 폴리머 조성물 및 이를 이용한 커패시터 제조 방법
JP5050710B2 (ja) * 2007-07-30 2012-10-17 日立電線株式会社 コーティング材及び高撥水・高しゅう動性製品
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
JP5726632B2 (ja) * 2011-05-19 2015-06-03 メルクパフォーマンスマテリアルズIp合同会社 感光性シロキサン樹脂組成物
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
KR101290260B1 (ko) * 2011-07-15 2013-07-26 주식회사 케이씨씨 알칼리 가용성 실리콘 수지, 이를 포함하는 실리콘 수지 조성물 및 그 제조방법
EP3194502A4 (en) 2015-04-13 2018-05-16 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
KR20180065185A (ko) * 2016-12-07 2018-06-18 한국과학기술연구원 자가-치유가 가능한 폴리실세스퀴옥산 및 이를 이용한 하이브리드 필름
JP2024043282A (ja) * 2022-09-16 2024-03-29 パナソニックIpマネジメント株式会社 電子部品

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5594955A (en) * 1979-01-12 1980-07-18 Hitachi Ltd Film-forming coating solution
DE3173441D1 (en) * 1980-08-26 1986-02-20 Japan Synthetic Rubber Co Ltd Ladder-like lower alkylpolysilsesquioxanes and process for their preparation
JPS58171416A (ja) * 1982-04-02 1983-10-08 Hitachi Ltd 耐熱性重合体
US4678610A (en) * 1985-06-03 1987-07-07 General Electric Company Siliconarylozides and siliconarylisocyanates
DE3779940T2 (de) * 1986-03-28 1993-02-18 Daikin Ind Ltd Zusammensetzung eines formtrennmittels.
JPH01199678A (ja) * 1988-02-03 1989-08-11 Mitsubishi Electric Corp 高純度SiO↓2薄膜の形成方法
US4906713A (en) * 1989-01-31 1990-03-06 E. I. Du Pont De Nemours And Company "Acrylic" ladder polymers
US5085938A (en) * 1989-11-29 1992-02-04 Ppg Industries, Inc. Chemically treated fibers and method of preparing and method of using to reinforce polymers
JP2928341B2 (ja) * 1990-07-03 1999-08-03 三菱電機株式会社 シリコーンラダー系樹脂塗布液組成物
JP2752786B2 (ja) * 1990-11-19 1998-05-18 三菱電機株式会社 カラーフィルターの表面保護膜

Also Published As

Publication number Publication date
CH683264A5 (de) 1994-02-15
DE4137513A1 (de) 1992-05-27
KR960005085B1 (ko) 1996-04-20
US5236984A (en) 1993-08-17
JPH04213364A (ja) 1992-08-04
JP2991786B2 (ja) 1999-12-20

Similar Documents

Publication Publication Date Title
KR920009890A (ko) 실리콘 수지 조성물
KR880001771A (ko) 이형용 실리콘 조성물
KR840000609A (ko) 저온성 실리콘 겔
KR910010239A (ko) 방사선 감응성 수지 조성물
KR830005286A (ko) 실라잔 폴리머의 제조방법
GB1344661A (en) Method for protecting non-porous substrates and for rendering them water repellent
KR910014434A (ko) 반도체용 말단 하이드록시페닐 래더 폴리실록산 및 고순도 말단 하이드록시페닐 래더 폴리실록산의 제조방법
KR860001104A (ko) 테트라히드로프탈이미드의 제조방법
KR880009094A (ko) 코팅용 조성물
KR950000714A (ko) 카비놀-작용성 실록산의 제조방법
KR830004353A (ko) 메르캅토오르가노 폴리실록산 및 이를 함유한 경화성 조성물
KR900016388A (ko) 실온 경화성 오르가노폴리실록산 조성물
KR920002721A (ko) 실리콘 레더계 수지 도포액 조성물
KR920018142A (ko) 에폭시 수지 조성물 및 반도체 장치
KR890000601A (ko) 실리콘 조성물
KR920012302A (ko) 일 액형 열 경화성 오르가노폴리실록산 조성물
KR910016867A (ko) 일 부분 경화성 오르가노실록산 조성물
KR900006448A (ko) 반도체 칩의 내부 피막용 수지 조성물
KR910020489A (ko) 감광성 수지조성물
GB1085703A (en) Polymeric cyclodisilazanes
KR900000447A (ko) 프라이머 조성물
KR860003201A (ko) 톨루엔디아민 조성물
KR860000675A (ko) Ptc세라믹 조성물
GB968204A (en) Epoxy organopolysiloxanes
JPS5491559A (en) Curable organopolysiloxane composition

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
AMND Amendment
E601 Decision to refuse application
J2X1 Appeal (before the patent court)

Free format text: APPEAL AGAINST DECISION TO DECLINE REFUSAL

G160 Decision to publish patent application
B701 Decision to grant
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20060410

Year of fee payment: 11

LAPS Lapse due to unpaid annual fee