KR920009890A - 실리콘 수지 조성물 - Google Patents
실리콘 수지 조성물 Download PDFInfo
- Publication number
- KR920009890A KR920009890A KR1019910018879A KR910018879A KR920009890A KR 920009890 A KR920009890 A KR 920009890A KR 1019910018879 A KR1019910018879 A KR 1019910018879A KR 910018879 A KR910018879 A KR 910018879A KR 920009890 A KR920009890 A KR 920009890A
- Authority
- KR
- South Korea
- Prior art keywords
- resin composition
- silicone resin
- silicon
- less
- lather
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
- C08G77/16—Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
- C08G77/18—Polysiloxanes containing silicon bound to oxygen-containing groups to alkoxy or aryloxy groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/70—Siloxanes defined by use of the MDTQ nomenclature
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
- Formation Of Insulating Films (AREA)
- Silicon Polymers (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (3)
- 일반식(I) :(식중, R1∼R4는 각각 수소원자 또는 저급알킬기, R5,R6은 각각 아릴기, 알킬기 또는 알게닐기이고 2n개의 R5및 R6중의 2%이상이 알케닐기, n은 5∼1600의 정수를 표시)로 표시되는 실리콘 라더포리마 해실리콘 라더포리마에 대해 0.2∼20.0중량%의 촉매 및 유기용매로 되는 270℃ 이하의 저온으로 열경화가 가능한 실리콘수지 조성물.
- 제1항에 있어서, 상기 일반식(I )중의 R5및 R6중의 10%이상이 알게닐기인 실리콘 라더모리마 및 유기용매로 되는 270℃ 이하의 저온으로 열경화가 가능한 실리콘수지 조성물.
- 제1항 또는 제2항에 있어서, 상기 실리콘 라더포리마에 함유되는 알칼리금속, 철, 연 동 및 할로겐화 수소가 각각 1ppm 이하이고 우란 및 토륨이 각각 1ppb 이하인 실리콘수지 조성물.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31890690 | 1990-11-22 | ||
JP90-318906 | 1990-11-22 | ||
JP91-027102 | 1991-02-21 | ||
JP3027102A JP2991786B2 (ja) | 1990-11-22 | 1991-02-21 | シリコーン樹脂組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR920009890A true KR920009890A (ko) | 1992-06-25 |
KR960005085B1 KR960005085B1 (ko) | 1996-04-20 |
Family
ID=26364990
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019910018879A KR960005085B1 (ko) | 1990-11-22 | 1991-10-25 | 실리콘 수지 조성물 |
Country Status (5)
Country | Link |
---|---|
US (1) | US5236984A (ko) |
JP (1) | JP2991786B2 (ko) |
KR (1) | KR960005085B1 (ko) |
CH (1) | CH683264A5 (ko) |
DE (1) | DE4137513A1 (ko) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2923408B2 (ja) * | 1992-12-21 | 1999-07-26 | 三菱電機株式会社 | 高純度シリコーンラダーポリマーの製造方法 |
DE4244517A1 (en) * | 1992-12-30 | 1993-05-19 | Kathrin Weise | Photochemical crosslinking of persistent silicon carbide ceramic precursors - by UV-irradiation of poly-silane(s) in presence of special bis:azide(s), e.g. 2,6-bis-(4-azido:benzylidene)-4-methyl-cyclohexanone |
US5491203A (en) * | 1994-09-08 | 1996-02-13 | Showa Denko K. K. | Polyorganosiloxane and process for producing the same |
JP3635156B2 (ja) * | 1996-08-19 | 2005-04-06 | ダウ コーニング アジア株式会社 | 硬化性ポリメチルシルセスキオキサン組成物 |
JP3679972B2 (ja) | 2000-04-04 | 2005-08-03 | 三菱電機株式会社 | 高純度シリコーンラダーポリマーの製造方法 |
US7056989B2 (en) * | 2001-05-01 | 2006-06-06 | Korea Institute Of Science And Technology | Polyalkylaromaticsilsesquioxane and preparation method thereof |
US6599995B2 (en) * | 2001-05-01 | 2003-07-29 | Korea Institute Of Science And Technology | Polyalkylaromaticsilsesquioxane and preparation method thereof |
US8901268B2 (en) | 2004-08-03 | 2014-12-02 | Ahila Krishnamoorthy | Compositions, layers and films for optoelectronic devices, methods of production and uses thereof |
JP2007095785A (ja) * | 2005-09-27 | 2007-04-12 | Mitsubishi Electric Corp | 電界効果型トランジスタ |
KR100840782B1 (ko) | 2007-01-16 | 2008-06-23 | 삼성전자주식회사 | 실록산 폴리머 조성물 및 이를 이용한 커패시터 제조 방법 |
JP5050710B2 (ja) * | 2007-07-30 | 2012-10-17 | 日立電線株式会社 | コーティング材及び高撥水・高しゅう動性製品 |
US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
JP5726632B2 (ja) * | 2011-05-19 | 2015-06-03 | メルクパフォーマンスマテリアルズIp合同会社 | 感光性シロキサン樹脂組成物 |
US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
KR101290260B1 (ko) * | 2011-07-15 | 2013-07-26 | 주식회사 케이씨씨 | 알칼리 가용성 실리콘 수지, 이를 포함하는 실리콘 수지 조성물 및 그 제조방법 |
WO2016167892A1 (en) | 2015-04-13 | 2016-10-20 | Honeywell International Inc. | Polysiloxane formulations and coatings for optoelectronic applications |
KR20180065185A (ko) * | 2016-12-07 | 2018-06-18 | 한국과학기술연구원 | 자가-치유가 가능한 폴리실세스퀴옥산 및 이를 이용한 하이브리드 필름 |
JP2024043282A (ja) * | 2022-09-16 | 2024-03-29 | パナソニックIpマネジメント株式会社 | 電子部品 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5594955A (en) * | 1979-01-12 | 1980-07-18 | Hitachi Ltd | Film-forming coating solution |
DE3173441D1 (en) * | 1980-08-26 | 1986-02-20 | Japan Synthetic Rubber Co Ltd | Ladder-like lower alkylpolysilsesquioxanes and process for their preparation |
JPS58171416A (ja) * | 1982-04-02 | 1983-10-08 | Hitachi Ltd | 耐熱性重合体 |
US4678610A (en) * | 1985-06-03 | 1987-07-07 | General Electric Company | Siliconarylozides and siliconarylisocyanates |
EP0239108B1 (en) * | 1986-03-28 | 1992-06-24 | Daikin Industries, Limited | Mold release composition |
JPH01199678A (ja) * | 1988-02-03 | 1989-08-11 | Mitsubishi Electric Corp | 高純度SiO↓2薄膜の形成方法 |
US4906713A (en) * | 1989-01-31 | 1990-03-06 | E. I. Du Pont De Nemours And Company | "Acrylic" ladder polymers |
US5085938A (en) * | 1989-11-29 | 1992-02-04 | Ppg Industries, Inc. | Chemically treated fibers and method of preparing and method of using to reinforce polymers |
JP2928341B2 (ja) * | 1990-07-03 | 1999-08-03 | 三菱電機株式会社 | シリコーンラダー系樹脂塗布液組成物 |
JP2752786B2 (ja) * | 1990-11-19 | 1998-05-18 | 三菱電機株式会社 | カラーフィルターの表面保護膜 |
-
1991
- 1991-02-21 JP JP3027102A patent/JP2991786B2/ja not_active Expired - Fee Related
- 1991-10-25 KR KR1019910018879A patent/KR960005085B1/ko not_active IP Right Cessation
- 1991-11-14 DE DE4137513A patent/DE4137513A1/de not_active Withdrawn
- 1991-11-18 US US07/793,976 patent/US5236984A/en not_active Expired - Lifetime
- 1991-11-21 CH CH3415/91A patent/CH683264A5/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP2991786B2 (ja) | 1999-12-20 |
JPH04213364A (ja) | 1992-08-04 |
CH683264A5 (de) | 1994-02-15 |
US5236984A (en) | 1993-08-17 |
DE4137513A1 (de) | 1992-05-27 |
KR960005085B1 (ko) | 1996-04-20 |
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