KR970003672B1 - 세정 및 건조방법과 거품억제장치를 포함하는 세정 및 건조장치 - Google Patents
세정 및 건조방법과 거품억제장치를 포함하는 세정 및 건조장치 Download PDFInfo
- Publication number
- KR970003672B1 KR970003672B1 KR1019910007041A KR910007041A KR970003672B1 KR 970003672 B1 KR970003672 B1 KR 970003672B1 KR 1019910007041 A KR1019910007041 A KR 1019910007041A KR 910007041 A KR910007041 A KR 910007041A KR 970003672 B1 KR970003672 B1 KR 970003672B1
- Authority
- KR
- South Korea
- Prior art keywords
- laundry
- surfactant
- water
- drying
- washing
- Prior art date
Links
- 238000000034 method Methods 0.000 title description 23
- 238000004140 cleaning Methods 0.000 title description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 151
- 239000004094 surface-active agent Substances 0.000 claims description 134
- 238000005406 washing Methods 0.000 claims description 125
- 238000001035 drying Methods 0.000 claims description 104
- 239000000463 material Substances 0.000 claims description 62
- 239000002904 solvent Substances 0.000 claims description 57
- 238000007664 blowing Methods 0.000 claims description 53
- 239000007864 aqueous solution Substances 0.000 claims description 51
- 238000004078 waterproofing Methods 0.000 claims description 51
- 238000010438 heat treatment Methods 0.000 claims description 46
- 238000001291 vacuum drying Methods 0.000 claims description 36
- 238000009835 boiling Methods 0.000 claims description 22
- 239000002052 molecular layer Substances 0.000 claims description 22
- 230000001678 irradiating effect Effects 0.000 claims description 13
- 125000000217 alkyl group Chemical group 0.000 claims description 11
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 9
- 229910052731 fluorine Inorganic materials 0.000 claims description 9
- 239000011737 fluorine Substances 0.000 claims description 9
- 229930195733 hydrocarbon Natural products 0.000 claims description 8
- 150000002430 hydrocarbons Chemical class 0.000 claims description 8
- 239000007788 liquid Substances 0.000 claims description 8
- 239000004215 Carbon black (E152) Substances 0.000 claims description 7
- 239000012298 atmosphere Substances 0.000 claims description 7
- 239000006260 foam Substances 0.000 claims description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 230000005670 electromagnetic radiation Effects 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 230000002209 hydrophobic effect Effects 0.000 claims 6
- 230000000694 effects Effects 0.000 description 27
- 239000003921 oil Substances 0.000 description 17
- -1 perfluoroalkyl carboxylate Chemical class 0.000 description 16
- 230000002411 adverse Effects 0.000 description 13
- 239000000243 solution Substances 0.000 description 13
- 238000011282 treatment Methods 0.000 description 11
- 239000010410 layer Substances 0.000 description 10
- 230000018044 dehydration Effects 0.000 description 9
- 238000006297 dehydration reaction Methods 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- 239000000356 contaminant Substances 0.000 description 6
- 238000001704 evaporation Methods 0.000 description 6
- 229910052755 nonmetal Inorganic materials 0.000 description 6
- 238000011176 pooling Methods 0.000 description 6
- 230000009471 action Effects 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 5
- 238000002791 soaking Methods 0.000 description 5
- 230000003254 anti-foaming effect Effects 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 230000009931 harmful effect Effects 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 125000000129 anionic group Chemical group 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 238000004900 laundering Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- AJDIZQLSFPQPEY-UHFFFAOYSA-N 1,1,2-Trichlorotrifluoroethane Chemical compound FC(F)(Cl)C(F)(Cl)Cl AJDIZQLSFPQPEY-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 239000003125 aqueous solvent Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 125000002091 cationic group Chemical group 0.000 description 2
- 238000005119 centrifugation Methods 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 230000003749 cleanliness Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000003599 detergent Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 238000005187 foaming Methods 0.000 description 2
- 125000001165 hydrophobic group Chemical group 0.000 description 2
- 230000002401 inhibitory effect Effects 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 238000010791 quenching Methods 0.000 description 2
- 230000000171 quenching effect Effects 0.000 description 2
- 230000002940 repellent Effects 0.000 description 2
- 239000005871 repellent Substances 0.000 description 2
- 230000001846 repelling effect Effects 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical class C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 2
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- 241001465754 Metazoa Species 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 244000309464 bull Species 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000010730 cutting oil Substances 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 239000013527 degreasing agent Substances 0.000 description 1
- 238000005237 degreasing agent Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000005338 heat storage Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002843 nonmetals Chemical class 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0064—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes
- B08B7/0071—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes by heating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/02—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by distortion, beating, or vibration of the surface to be cleaned
- B08B7/026—Using sound waves
- B08B7/028—Using ultrasounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/004—Surface-active compounds containing F
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/004—Surface-active compounds containing F
- C11D1/006—Surface-active compounds containing fluorine and phosphorus
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/66—Non-ionic compounds
- C11D1/82—Compounds containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/24—Cleaning or pickling metallic material with solutions or molten salts with neutral solutions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/12—Soft surfaces, e.g. textile
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/40—Specific cleaning or washing processes
- C11D2111/44—Multi-step processes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/26—Cleaning or polishing of the conductive pattern
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Drying Of Solid Materials (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Detergent Compositions (AREA)
- Accessory Of Washing/Drying Machine, Commercial Washing/Drying Machine, Other Washing/Drying Machine (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP02-116439 | 1990-05-01 | ||
JP11643990 | 1990-05-01 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR910020252A KR910020252A (ko) | 1991-12-19 |
KR970003672B1 true KR970003672B1 (ko) | 1997-03-21 |
Family
ID=14687138
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019910007041A KR970003672B1 (ko) | 1990-05-01 | 1991-05-01 | 세정 및 건조방법과 거품억제장치를 포함하는 세정 및 건조장치 |
Country Status (7)
Country | Link |
---|---|
US (3) | US5203927A (zh) |
EP (1) | EP0455465B1 (zh) |
KR (1) | KR970003672B1 (zh) |
CN (1) | CN1031980C (zh) |
CA (1) | CA2040989A1 (zh) |
DE (1) | DE69132829T2 (zh) |
SG (1) | SG55009A1 (zh) |
Families Citing this family (55)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5409544A (en) * | 1990-08-20 | 1995-04-25 | Hitachi, Ltd. | Method of controlling adhesion of fine particles to an object in liquid |
JPH04132388U (ja) * | 1991-05-24 | 1992-12-08 | 千住金属工業株式会社 | 真空乾燥装置 |
US5647143A (en) * | 1992-10-30 | 1997-07-15 | Japan Hayes Ltd. | Vacuum-degreasing cleaning method |
JP3347814B2 (ja) * | 1993-05-17 | 2002-11-20 | 大日本スクリーン製造株式会社 | 基板の洗浄・乾燥処理方法並びにその処理装置 |
JP3341033B2 (ja) * | 1993-06-22 | 2002-11-05 | 忠弘 大見 | 回転薬液洗浄方法及び洗浄装置 |
DE4324432C2 (de) * | 1993-07-21 | 1996-04-25 | Multimatic Oberflaechentechnik | Verfahren zur Reinigung verschmutzter Teile |
DE4326239C2 (de) * | 1993-07-31 | 1997-06-05 | Korsch Pressen Gmbh | Tablettier-, Dragier- oder Granuliermaschine, insbesondere Rundlauf-Tablettenpresse |
JPH07100441A (ja) * | 1993-09-30 | 1995-04-18 | Nippon Seiki Co Ltd | 洗浄装置 |
FR2713521B1 (fr) * | 1993-12-09 | 1996-03-22 | Lenglen Jean Luc | Procédé et machine pour le nettoyage de pièces. |
JP2996334B2 (ja) * | 1994-03-30 | 1999-12-27 | 東北日本電気株式会社 | 超音波脱脂装置 |
JPH07292488A (ja) * | 1994-04-25 | 1995-11-07 | Nippon Parkerizing Co Ltd | 金属表面の乾燥性に優れた水系洗浄方法 |
US5556479A (en) * | 1994-07-15 | 1996-09-17 | Verteq, Inc. | Method and apparatus for drying semiconductor wafers |
DE19522525A1 (de) * | 1994-10-04 | 1996-04-11 | Kunze Concewitz Horst Dipl Phy | Verfahren und Vorrichtung zum Feinstreinigen von Oberflächen |
DE19517573C2 (de) * | 1995-05-12 | 2000-11-02 | Steag Micro Tech Gmbh | Verfahren und Vorrichtung zur Naßbehandlung von Substraten in einem Behälter |
JPH09199467A (ja) * | 1996-01-17 | 1997-07-31 | Mitsubishi Electric Corp | 洗浄装置及びその方法 |
US5922138A (en) * | 1996-08-12 | 1999-07-13 | Tokyo Electron Limited | Liquid treatment method and apparatus |
KR19990010200A (ko) * | 1997-07-15 | 1999-02-05 | 윤종용 | 감압식 건조 장치를 이용하는 반도체장치 건조방법 |
JP4278019B2 (ja) | 1998-03-24 | 2009-06-10 | コーニング インコーポレイテッド | 外部電極駆動放電ランプ |
US5958143A (en) * | 1998-04-28 | 1999-09-28 | The Regents Of The University Of California | Cleaning process for EUV optical substrates |
CA2251208A1 (en) * | 1998-11-12 | 2000-05-12 | Claude Perreault | Fully automatic plating wax collecting device and method thereof |
JP3658257B2 (ja) * | 1998-12-24 | 2005-06-08 | キヤノン株式会社 | 洗浄方法及び洗浄装置及び電子写真感光体及び電子写真感光体の製造方法 |
JP2000301082A (ja) * | 1999-04-20 | 2000-10-31 | Tokyo Electron Ltd | 処理装置 |
TW434668B (en) * | 2000-01-27 | 2001-05-16 | Ind Tech Res Inst | Wafer rinse apparatus and rinse method of the same |
CN1196388C (zh) * | 2000-06-08 | 2005-04-06 | 松下电器产业株式会社 | 材料的干燥方法及其装置和使用该装置的线路板的制造方法 |
WO2005015102A2 (de) * | 2003-07-24 | 2005-02-17 | Eisenmann Maschinenbau Gmbh & Co. Kg | Vorrichtung zur aushärtung einer aus einem material, das unter elektromagnetischer strahlung aushärtet, insbesondere aus einem uv-lack oder aus einem thermisch aushärtenden lack, bestehenden beschichtung eines gegenstandes |
KR100582202B1 (ko) * | 2003-10-13 | 2006-05-23 | 엘지.필립스 엘시디 주식회사 | 박막트랜지스터 어레이 기판의 제조장치 및 방법 |
WO2006066115A2 (en) | 2004-12-17 | 2006-06-22 | The Procter & Gamble Company | Process for extracting liquid from a fabric |
CN1727080A (zh) * | 2005-07-29 | 2006-02-01 | 北京中联科利技术股份有限公司 | 多流体清洗方法 |
FR2920046A1 (fr) | 2007-08-13 | 2009-02-20 | Alcatel Lucent Sas | Procede de post-traitement d'un support de transport pour le convoyage et le stockage atmospherique de substrats semi-conducteurs, et station de post-traitement pour la mise en oeuvre d'un tel procede |
IT1395090B1 (it) * | 2009-04-08 | 2012-09-05 | Lasa Impianti Srl | Apparecchiatura a basso impatto ambientale per il lavaggio di particolari metallici e non metallici che necessitano di un altro grado di pulizia |
TWM374919U (en) * | 2009-06-11 | 2010-03-01 | Wen-Der Yang | Supersonic drain cleaner for embedded water sink |
DE102009053574A1 (de) * | 2009-11-06 | 2011-05-12 | Gebr. Schmid Gmbh & Co. | Verfahren und Anlage zur Fertigung von Leiterplatten und Halbleiterprodukten |
CN102553852A (zh) * | 2010-12-28 | 2012-07-11 | 北京京东方光电科技有限公司 | 清洗装置 |
CN102764742A (zh) * | 2011-05-03 | 2012-11-07 | 镇江仁德新能源科技有限公司 | 碎硅片漂洗设备 |
US9581255B2 (en) | 2012-07-23 | 2017-02-28 | Henning, Inc. | Multiple proportion delivery systems and methods |
CN103480622B (zh) * | 2013-09-18 | 2016-06-08 | 合肥京东方光电科技有限公司 | 基板清洗装置及其工作方法、基板清洗系统 |
CN104588356B (zh) * | 2014-12-18 | 2017-04-19 | 吉安市优特利科技有限公司 | 一种铝壳锂电池清洗方法 |
CN105170556A (zh) * | 2015-09-25 | 2015-12-23 | 无锡市博阳超声电器有限公司 | 一种带毛刷的超声波清洗机 |
CN105970244A (zh) * | 2016-05-20 | 2016-09-28 | 深圳市鑫承诺环保产业股份有限公司 | 一种金银币母件高精清洗工艺 |
DK179189B1 (en) * | 2016-07-06 | 2018-01-22 | Techsave As | Method for restoring damaged electronic devices by cleaning and apparatus |
CN107354475B (zh) * | 2017-07-10 | 2019-06-11 | 厦门金越电器有限公司 | 一种防铜氧化碳氢清洗方法及其设备 |
CN109273381A (zh) * | 2017-07-18 | 2019-01-25 | 东莞市鸿村环保设备制造有限公司 | 一种带有清洗风干功能的玻璃基板蚀刻装置 |
CN107616765A (zh) * | 2017-09-20 | 2018-01-23 | 宁波创健环保科技有限公司 | 无水洗碗机及其控制方法 |
CN108211969A (zh) * | 2018-03-07 | 2018-06-29 | 深圳市海威达科技有限公司 | 泡沫自动混比装置及洗车机 |
CN108485831A (zh) * | 2018-04-18 | 2018-09-04 | 安徽斯瑞尔阀门有限公司 | 一种阀门表面除油清洗剂及其清洗装置 |
CN109047109A (zh) * | 2018-07-27 | 2018-12-21 | 成都品尚农电子商务有限公司 | 一种日用品清洁处理系统 |
CN109013517A (zh) * | 2018-08-20 | 2018-12-18 | 六安名家汇光电科技有限公司 | 一种led投光灯塑料外壳的除尘方法 |
DE102018121915B3 (de) * | 2018-09-07 | 2020-02-13 | Dyemansion Gmbh | Verfahren zur Oberflächenbehandlung von Formteilen |
CN111842329B (zh) * | 2020-07-30 | 2022-09-27 | 固安浩瀚光电科技有限公司 | 一种半导体零件表面清洗装置及其使用方法 |
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CN112808681A (zh) * | 2020-12-18 | 2021-05-18 | 华虹半导体(无锡)有限公司 | 硅片清洗供液装置 |
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CN112678759B (zh) * | 2020-12-31 | 2023-08-01 | 浙江凯圣氟化学有限公司 | 一种超纯氢氟酸包装物清洗方法 |
CN114985385B (zh) * | 2022-05-25 | 2023-08-25 | 广东美的厨房电器制造有限公司 | 饮品调制设备及其控制方法和装置、可读存储介质 |
CN116000006A (zh) * | 2022-11-09 | 2023-04-25 | 浙江佰泰医疗科技有限公司 | 一种带自动控制型的多功能超声波清洗机 |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1333848A (en) * | 1916-09-15 | 1920-03-16 | Oscar E Jacobs | Process for the drying and curing of lumber |
US1250496A (en) * | 1916-11-09 | 1917-12-18 | Emil Passburg | Process for drying grain and other coarse granular materials. |
US3436262A (en) * | 1964-09-25 | 1969-04-01 | Dow Chemical Co | Cleaning by foam contact,and foam regeneration method |
US3615310A (en) * | 1969-06-02 | 1971-10-26 | Ppg Industries Inc | Method for drying glass fiber forming packages |
US3672067A (en) * | 1970-10-30 | 1972-06-27 | Envirotech Corp | Method for steam drying filter cake |
GB1321699A (en) * | 1970-11-20 | 1973-06-27 | Atomic Energy Authority Uk | Methods of removing unwanted oxidisable substances from materials |
US4156619A (en) * | 1975-06-11 | 1979-05-29 | Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh | Process for cleaning semi-conductor discs |
US4079522A (en) * | 1976-09-23 | 1978-03-21 | Rca Corporation | Apparatus and method for cleaning and drying semiconductors |
US4318749A (en) * | 1980-06-23 | 1982-03-09 | Rca Corporation | Wettable carrier in gas drying system for wafers |
US4605574A (en) * | 1981-09-14 | 1986-08-12 | Takashi Yonehara | Method and apparatus for forming an extremely thin film on the surface of an object |
US4569695A (en) * | 1983-04-21 | 1986-02-11 | Nec Corporation | Method of cleaning a photo-mask |
DE3374526D1 (en) * | 1983-07-06 | 1987-12-23 | Snef Electro Mecanique | Method and apparatus for cleaning big work pieces |
US4693777A (en) * | 1984-11-30 | 1987-09-15 | Kabushiki Kaisha Toshiba | Apparatus for producing semiconductor devices |
US4736758A (en) * | 1985-04-15 | 1988-04-12 | Wacom Co., Ltd. | Vapor drying apparatus |
US4722355A (en) * | 1985-08-19 | 1988-02-02 | Rolf Moe | Machine and method for stripping photoresist from wafers |
GB2182585B (en) * | 1985-11-07 | 1989-10-04 | Sony Corp | Removing coatings from cathode ray tubes or parts thereof |
DE3611422A1 (de) * | 1986-04-05 | 1987-10-15 | Henkel Kgaa | Verfahren zur reinigung verschmutzter fester formteile |
US4832753A (en) * | 1987-05-21 | 1989-05-23 | Tempress Measurement & Control Corporation | High-purity cleaning system, method, and apparatus |
US4842687A (en) * | 1987-07-16 | 1989-06-27 | Texas Instruments Incorporated | Method for etching tungsten |
US4902350A (en) * | 1987-09-09 | 1990-02-20 | Robert F. Orr | Method for rinsing, cleaning and drying silicon wafers |
JPH073634Y2 (ja) * | 1987-12-28 | 1995-01-30 | 株式会社トムコ | ウェハ液洗乾燥装置 |
US5158616A (en) * | 1988-07-22 | 1992-10-27 | Tokyo Electron Limited | Apparatus for cleaning a substrate |
FI86944C (fi) * | 1989-02-02 | 1992-10-26 | Nokia Mobira Oy | Foerfarande foer tvaettning av kretsplattor och en anordning foeg anvaendning i foerfarandet |
US5039349A (en) * | 1990-05-18 | 1991-08-13 | Veriflo Corporation | Method and apparatus for cleaning surfaces to absolute or near-absolute cleanliness |
WO1992016314A1 (en) * | 1991-03-12 | 1992-10-01 | Haakansson Lars | A device for cleaning objects, preferably of metal |
DE4138432C1 (zh) * | 1991-11-22 | 1993-02-18 | Aichelin Gmbh, 7015 Korntal-Muenchingen, De |
-
1991
- 1991-04-23 CA CA002040989A patent/CA2040989A1/en not_active Abandoned
- 1991-04-26 US US07/691,915 patent/US5203927A/en not_active Expired - Lifetime
- 1991-04-30 EP EP91303898A patent/EP0455465B1/en not_active Expired - Lifetime
- 1991-04-30 CN CN91103337A patent/CN1031980C/zh not_active Expired - Fee Related
- 1991-04-30 DE DE69132829T patent/DE69132829T2/de not_active Expired - Fee Related
- 1991-04-30 SG SG1996001766A patent/SG55009A1/en unknown
- 1991-05-01 KR KR1019910007041A patent/KR970003672B1/ko not_active IP Right Cessation
-
1993
- 1993-01-15 US US08/005,329 patent/US5361789A/en not_active Expired - Lifetime
-
1994
- 1994-04-12 US US08/226,675 patent/US5840126A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
SG55009A1 (en) | 1998-12-21 |
CA2040989A1 (en) | 1991-11-02 |
CN1057796A (zh) | 1992-01-15 |
EP0455465A2 (en) | 1991-11-06 |
US5840126A (en) | 1998-11-24 |
US5361789A (en) | 1994-11-08 |
CN1031980C (zh) | 1996-06-12 |
KR910020252A (ko) | 1991-12-19 |
EP0455465B1 (en) | 2001-11-28 |
EP0455465A3 (en) | 1992-07-22 |
DE69132829T2 (de) | 2002-04-04 |
US5203927A (en) | 1993-04-20 |
DE69132829D1 (de) | 2002-01-10 |
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