DE69132829D1 - Verfahren zum Waschen/Trocknen - Google Patents

Verfahren zum Waschen/Trocknen

Info

Publication number
DE69132829D1
DE69132829D1 DE69132829T DE69132829T DE69132829D1 DE 69132829 D1 DE69132829 D1 DE 69132829D1 DE 69132829 T DE69132829 T DE 69132829T DE 69132829 T DE69132829 T DE 69132829T DE 69132829 D1 DE69132829 D1 DE 69132829D1
Authority
DE
Germany
Prior art keywords
washing
drying process
drying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69132829T
Other languages
English (en)
Other versions
DE69132829T2 (de
Inventor
Ichiro Yoshida
Hiroshi Iida
Shuzo Kawashima
Isamu Ito
Fukuji Kuroiwa
Satoru Asanome
Tishiji Tujimori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Publication of DE69132829D1 publication Critical patent/DE69132829D1/de
Application granted granted Critical
Publication of DE69132829T2 publication Critical patent/DE69132829T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0064—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes
    • B08B7/0071—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes by heating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/02—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by distortion, beating, or vibration of the surface to be cleaned
    • B08B7/026—Using sound waves
    • B08B7/028—Using ultrasounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/004—Surface-active compounds containing F
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/004—Surface-active compounds containing F
    • C11D1/006—Surface-active compounds containing fluorine and phosphorus
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/66—Non-ionic compounds
    • C11D1/82—Compounds containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/24—Cleaning or pickling metallic material with solutions or molten salts with neutral solutions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • C11D2111/12—
    • C11D2111/22—
    • C11D2111/44—
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/26—Cleaning or polishing of the conductive pattern
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer
DE69132829T 1990-05-01 1991-04-30 Verfahren zum Waschen/Trocknen Expired - Fee Related DE69132829T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11643990 1990-05-01

Publications (2)

Publication Number Publication Date
DE69132829D1 true DE69132829D1 (de) 2002-01-10
DE69132829T2 DE69132829T2 (de) 2002-04-04

Family

ID=14687138

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69132829T Expired - Fee Related DE69132829T2 (de) 1990-05-01 1991-04-30 Verfahren zum Waschen/Trocknen

Country Status (7)

Country Link
US (3) US5203927A (de)
EP (1) EP0455465B1 (de)
KR (1) KR970003672B1 (de)
CN (1) CN1031980C (de)
CA (1) CA2040989A1 (de)
DE (1) DE69132829T2 (de)
SG (1) SG55009A1 (de)

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JPH04132388U (ja) * 1991-05-24 1992-12-08 千住金属工業株式会社 真空乾燥装置
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JP3347814B2 (ja) * 1993-05-17 2002-11-20 大日本スクリーン製造株式会社 基板の洗浄・乾燥処理方法並びにその処理装置
JP3341033B2 (ja) * 1993-06-22 2002-11-05 忠弘 大見 回転薬液洗浄方法及び洗浄装置
DE4324432C2 (de) * 1993-07-21 1996-04-25 Multimatic Oberflaechentechnik Verfahren zur Reinigung verschmutzter Teile
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JPH07100441A (ja) * 1993-09-30 1995-04-18 Nippon Seiki Co Ltd 洗浄装置
FR2713521B1 (fr) * 1993-12-09 1996-03-22 Lenglen Jean Luc Procédé et machine pour le nettoyage de pièces.
JP2996334B2 (ja) * 1994-03-30 1999-12-27 東北日本電気株式会社 超音波脱脂装置
JPH07292488A (ja) * 1994-04-25 1995-11-07 Nippon Parkerizing Co Ltd 金属表面の乾燥性に優れた水系洗浄方法
US5556479A (en) * 1994-07-15 1996-09-17 Verteq, Inc. Method and apparatus for drying semiconductor wafers
DE19522525A1 (de) * 1994-10-04 1996-04-11 Kunze Concewitz Horst Dipl Phy Verfahren und Vorrichtung zum Feinstreinigen von Oberflächen
DE19517573C2 (de) * 1995-05-12 2000-11-02 Steag Micro Tech Gmbh Verfahren und Vorrichtung zur Naßbehandlung von Substraten in einem Behälter
JPH09199467A (ja) * 1996-01-17 1997-07-31 Mitsubishi Electric Corp 洗浄装置及びその方法
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US20060174421A1 (en) 2004-12-17 2006-08-10 Carter Daniel L Process for extracting liquid from a fabric
CN1727080A (zh) * 2005-07-29 2006-02-01 北京中联科利技术股份有限公司 多流体清洗方法
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IT1395090B1 (it) * 2009-04-08 2012-09-05 Lasa Impianti Srl Apparecchiatura a basso impatto ambientale per il lavaggio di particolari metallici e non metallici che necessitano di un altro grado di pulizia
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CN102553852A (zh) * 2010-12-28 2012-07-11 北京京东方光电科技有限公司 清洗装置
CN102764742A (zh) * 2011-05-03 2012-11-07 镇江仁德新能源科技有限公司 碎硅片漂洗设备
US9581255B2 (en) 2012-07-23 2017-02-28 Henning, Inc. Multiple proportion delivery systems and methods
CN103480622B (zh) * 2013-09-18 2016-06-08 合肥京东方光电科技有限公司 基板清洗装置及其工作方法、基板清洗系统
CN104588356B (zh) * 2014-12-18 2017-04-19 吉安市优特利科技有限公司 一种铝壳锂电池清洗方法
CN105170556A (zh) * 2015-09-25 2015-12-23 无锡市博阳超声电器有限公司 一种带毛刷的超声波清洗机
CN105970244A (zh) * 2016-05-20 2016-09-28 深圳市鑫承诺环保产业股份有限公司 一种金银币母件高精清洗工艺
DK179189B1 (en) * 2016-07-06 2018-01-22 Techsave As Method for restoring damaged electronic devices by cleaning and apparatus
CN107354475B (zh) * 2017-07-10 2019-06-11 厦门金越电器有限公司 一种防铜氧化碳氢清洗方法及其设备
CN109273381A (zh) * 2017-07-18 2019-01-25 东莞市鸿村环保设备制造有限公司 一种带有清洗风干功能的玻璃基板蚀刻装置
CN107616765A (zh) * 2017-09-20 2018-01-23 宁波创健环保科技有限公司 无水洗碗机及其控制方法
CN108211969A (zh) * 2018-03-07 2018-06-29 深圳市海威达科技有限公司 泡沫自动混比装置及洗车机
CN108485831A (zh) * 2018-04-18 2018-09-04 安徽斯瑞尔阀门有限公司 一种阀门表面除油清洗剂及其清洗装置
CN109047109A (zh) * 2018-07-27 2018-12-21 成都品尚农电子商务有限公司 一种日用品清洁处理系统
CN109013517A (zh) * 2018-08-20 2018-12-18 六安名家汇光电科技有限公司 一种led投光灯塑料外壳的除尘方法
DE102018121915B3 (de) * 2018-09-07 2020-02-13 Dyemansion Gmbh Verfahren zur Oberflächenbehandlung von Formteilen
CN111842329B (zh) * 2020-07-30 2022-09-27 固安浩瀚光电科技有限公司 一种半导体零件表面清洗装置及其使用方法
CN114249897A (zh) * 2020-09-24 2022-03-29 深圳市鸿信顺电子材料有限公司 一种含浸液及其在片式元件的表面处理工艺方面的应用
CN112808681A (zh) * 2020-12-18 2021-05-18 华虹半导体(无锡)有限公司 硅片清洗供液装置
CN112547666A (zh) * 2020-12-22 2021-03-26 深圳市鑫承诺环保产业股份有限公司 一种汽车配件材料清洗工艺
CN112678759B (zh) * 2020-12-31 2023-08-01 浙江凯圣氟化学有限公司 一种超纯氢氟酸包装物清洗方法
CN114985385B (zh) * 2022-05-25 2023-08-25 广东美的厨房电器制造有限公司 饮品调制设备及其控制方法和装置、可读存储介质
CN116000006A (zh) * 2022-11-09 2023-04-25 浙江佰泰医疗科技有限公司 一种带自动控制型的多功能超声波清洗机

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Also Published As

Publication number Publication date
CN1031980C (zh) 1996-06-12
EP0455465A2 (de) 1991-11-06
EP0455465B1 (de) 2001-11-28
EP0455465A3 (en) 1992-07-22
US5203927A (en) 1993-04-20
KR970003672B1 (ko) 1997-03-21
US5361789A (en) 1994-11-08
KR910020252A (ko) 1991-12-19
CN1057796A (zh) 1992-01-15
US5840126A (en) 1998-11-24
DE69132829T2 (de) 2002-04-04
CA2040989A1 (en) 1991-11-02
SG55009A1 (en) 1998-12-21

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