KR910020252A - 세탁/건조 방법 및 그 장치 - Google Patents

세탁/건조 방법 및 그 장치 Download PDF

Info

Publication number
KR910020252A
KR910020252A KR1019910007041A KR910007041A KR910020252A KR 910020252 A KR910020252 A KR 910020252A KR 1019910007041 A KR1019910007041 A KR 1019910007041A KR 910007041 A KR910007041 A KR 910007041A KR 910020252 A KR910020252 A KR 910020252A
Authority
KR
South Korea
Prior art keywords
surfactant
laundry
container
drying
water
Prior art date
Application number
KR1019910007041A
Other languages
English (en)
Other versions
KR970003672B1 (ko
Inventor
이찌로 요시다
히로시 이이다
스조 가와시마
후꾸지 구로이와
이사무 이또
사또루 아사노메
도시지 후지모리
Original Assignee
세끼사와 요시
후지쓰 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 세끼사와 요시, 후지쓰 가부시끼가이샤 filed Critical 세끼사와 요시
Publication of KR910020252A publication Critical patent/KR910020252A/ko
Application granted granted Critical
Publication of KR970003672B1 publication Critical patent/KR970003672B1/ko

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0064—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes
    • B08B7/0071—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes by heating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/02—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by distortion, beating, or vibration of the surface to be cleaned
    • B08B7/026—Using sound waves
    • B08B7/028—Using ultrasounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/004—Surface-active compounds containing F
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/004—Surface-active compounds containing F
    • C11D1/006—Surface-active compounds containing fluorine and phosphorus
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/66—Non-ionic compounds
    • C11D1/82—Compounds containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/24—Cleaning or pickling metallic material with solutions or molten salts with neutral solutions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/12—Soft surfaces, e.g. textile
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/40—Specific cleaning or washing processes
    • C11D2111/44—Multi-step processes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/26—Cleaning or polishing of the conductive pattern
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Drying Of Solid Materials (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Accessory Of Washing/Drying Machine, Commercial Washing/Drying Machine, Other Washing/Drying Machine (AREA)
  • Detergent Compositions (AREA)

Abstract

내용 없음

Description

세탁/건조 방법 및 그 장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 의한 세탁방법 및 세탁후의 건조방법의 기본원리 및 단계를 나타내는 도, 제2도는 세탁 및 건조를 수행하기 위한 장치의 일예를 보인 단면도 및 단계도, 제3도는 방수 계면활성제인 수용액을 사용하지않고 본 발명의 세탁처리법을 수행하는 장치의 일예를 보인 단면도 및 단계도.

Claims (13)

  1. 한 분자층 이상의 방수 계면활성제가 세탁물의 표면에 부착되도록 방수성을 가지는 계면활성제를 함유하는 수용액에 세탁물을 담그는 단계와 그 다음 물질을 건조하는 단계로 이루어진 세탁/건조방법.
  2. 제1항에 있어서, 상기 방수성을 가지는 계면활성제가 C12-C18소수성 알킬기를 가지는 탄화수소형 계면활성제, C6-C12플루오르화된 알킬기를 가지는 불소형 계면활성, 소수형 규소형 계면활성제로 이루어진 그룹으로부터 선택된 하나 이상의 계면활성제인 세탁/건조방법.
  3. 제1항에 있어서, 세탁후 물질을 건조하기 전에 물의 끓는점이 100℃이하가 되도록 압력이 감소된 대기에서 100℃ 이하의 온도인 증기로 세탁물을 가열하는 단계로 이루어진 세탁/건조방법.
  4. 제3항에 있어서, 방수성을 가지는 상기 계면활성제가 C12-C18소수성 알킬기를 가지는 탄화수소형 계면활성제, C6-C12의 플루오르화된 알킬기를 가지는 불소형 계면활성제, 소수성 규소형 계면활성제로 이루어진 그룹으로부터 선택된 하나 이상의 계면활성제인 세탁/건조방법.
  5. 방수 계면활성제의 하나 이상의 분자층이 세탁물 표면에 부착되도록 방수성을 가지는 계면활성제를 함유하는 수용액에 세탁물을 담그는 단계, 물의 끓는점이 100℃이하가 되도록 압력을 감소한 대기에서 100℃ 이하의 온도를 가진 증기로 세탁물을 가열하는 단계 ; 가스로 물질을 부는 단계 ; 이후로 물질을 진공건조하는 단계로 이루어진 세탁/건조 방법.
  6. 제5항에 있어서, 방수성을 가지는 상기 계면활성제가 C12-C18의 소수성 알킬기로된 탄화수소형 게면활성제, C6-C12플루오르화된 알킬기를 가지는 불소형 계면활성제, 그리고 소수성 규소형 계면활성제로 이루어진 그룹으로부터 선택된 한 이상의 계면활성제인 세탁/건조방법.
  7. 진공 챔버안에 세탁물을 넣는 단계, 물의 끓는점이 100℃이하가 되도록 압력을 감소시킨 대기에서 100℃이하의 온도인 증기로 세탁을 가열하는 단계, 가스를 가지고 물질을 부는 단계, 물질을 진공 건조하는 단계로 이루어진 세탁/건조방법.
  8. 방수성을 가지는 계면활성제를 포함한 수용액을 담는 물용기, 물용기 안의 세탁물에 부착된 여분의 계면활성제를 제거하기 위한 하나 이상의 샤우어 세탁장치, 그리고 샤우어 세탁후 세탁물을 건조하기 위한 진공 챔버, 물의 끓는점이 100℃이하가 되도록 압력을 감소한 대기에서 100℃ 이하의 온도인증기를 분출시키는 수단을 가지는 상기 진공 챔버, 그리고 분출 가스에 의하여 물이 배수될 수 있기 위한 가스 분출 수단으로 이루어진 세탁/건조장치
  9. 제8항에 있어서, 상기 장치는 방수성을 지닌 계면활성제의 수용액을 함유하는 초음파 세탁용기, 첫째 샤우어 세탁용기, 물 담긴 거품용기, 두 번째 샤우어 세탁용기, 다수의 진공 건조용기, 감소된 압력하에서 증기가 가열되도록 정돈된 진공용기로 이루어졌으며 뜨거운 가스불과 진공건조가 각 진공용기에서 평행하게 수행되는 세탁/건조장치.
  10. 제8항에 있어서, 상기 장치가 방수성을 가지는 계면활성제의 수용액을 함유하는 초음파 세탁용기, 첫째 샤우어 세탁용기, 물담긴 거품용기, 두 번째 샤우어 세탁용기, 다수의 진공 건조용기, 감소된 압력하에서 증기가 가열되도록 정돈된 상기 진공용기로 이루어졌으며 뜨거운 가스불과 진공 건조가 다수의 진공용기에서 분리하여 순서있게 수행되는 세탁/건조장치.
  11. 물질에 부착된 습기를 가열하는 수단으로 전자기파 조사장치로 세탁물을 조사하는 장치 ; (ⅰ) 전자기판 주사 장치에 의하여 가열되는 동안 또는 후에 거하기 위하여 세탁물을 가스를 불게 하는 가스불 수단, (ⅱ) 물질에 부착된 습기가 제거되도록 물질에 응용된 압력을 비우거나 감소시키는; (ⅲ) 물질이 원심 작동에 의하여 탈수되도록 물질을 원심 회전시키는 수단으로 이루어진 그룹으로부터 선택된 하나 이상의 수단으로 이루어진 건조장치.
  12. 세탁장치의 세탁 순환 시스템에 정돈된 계면활성제를 함유하는 세탁용제를 담는 세탁용기로부터 유출을 받는 유출용기; 그리고 공기가 유출용기로부터 유출을 세탁용제에 빠지지 않게 유출용기의 액체 레벨을 조절하는 유출용기의 배출구에 설치된 벨브 수단으로 이루어진 기포억제장치.
  13. ※ 참고사항 : 최초출원 내용에 의하여 공개되는 것임.
KR1019910007041A 1990-05-01 1991-05-01 세정 및 건조방법과 거품억제장치를 포함하는 세정 및 건조장치 KR970003672B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP11643990 1990-05-01
JP02-116439 1990-05-01

Publications (2)

Publication Number Publication Date
KR910020252A true KR910020252A (ko) 1991-12-19
KR970003672B1 KR970003672B1 (ko) 1997-03-21

Family

ID=14687138

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019910007041A KR970003672B1 (ko) 1990-05-01 1991-05-01 세정 및 건조방법과 거품억제장치를 포함하는 세정 및 건조장치

Country Status (7)

Country Link
US (3) US5203927A (ko)
EP (1) EP0455465B1 (ko)
KR (1) KR970003672B1 (ko)
CN (1) CN1031980C (ko)
CA (1) CA2040989A1 (ko)
DE (1) DE69132829T2 (ko)
SG (1) SG55009A1 (ko)

Families Citing this family (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5409544A (en) * 1990-08-20 1995-04-25 Hitachi, Ltd. Method of controlling adhesion of fine particles to an object in liquid
JPH04132388U (ja) * 1991-05-24 1992-12-08 千住金属工業株式会社 真空乾燥装置
US5647143A (en) * 1992-10-30 1997-07-15 Japan Hayes Ltd. Vacuum-degreasing cleaning method
JP3347814B2 (ja) * 1993-05-17 2002-11-20 大日本スクリーン製造株式会社 基板の洗浄・乾燥処理方法並びにその処理装置
JP3341033B2 (ja) * 1993-06-22 2002-11-05 忠弘 大見 回転薬液洗浄方法及び洗浄装置
DE4324432C2 (de) * 1993-07-21 1996-04-25 Multimatic Oberflaechentechnik Verfahren zur Reinigung verschmutzter Teile
DE4326239C2 (de) * 1993-07-31 1997-06-05 Korsch Pressen Gmbh Tablettier-, Dragier- oder Granuliermaschine, insbesondere Rundlauf-Tablettenpresse
JPH07100441A (ja) * 1993-09-30 1995-04-18 Nippon Seiki Co Ltd 洗浄装置
FR2713521B1 (fr) * 1993-12-09 1996-03-22 Lenglen Jean Luc Procédé et machine pour le nettoyage de pièces.
JP2996334B2 (ja) * 1994-03-30 1999-12-27 東北日本電気株式会社 超音波脱脂装置
JPH07292488A (ja) * 1994-04-25 1995-11-07 Nippon Parkerizing Co Ltd 金属表面の乾燥性に優れた水系洗浄方法
US5556479A (en) * 1994-07-15 1996-09-17 Verteq, Inc. Method and apparatus for drying semiconductor wafers
DE19522525A1 (de) * 1994-10-04 1996-04-11 Kunze Concewitz Horst Dipl Phy Verfahren und Vorrichtung zum Feinstreinigen von Oberflächen
DE19517573C2 (de) * 1995-05-12 2000-11-02 Steag Micro Tech Gmbh Verfahren und Vorrichtung zur Naßbehandlung von Substraten in einem Behälter
JPH09199467A (ja) * 1996-01-17 1997-07-31 Mitsubishi Electric Corp 洗浄装置及びその方法
US5922138A (en) * 1996-08-12 1999-07-13 Tokyo Electron Limited Liquid treatment method and apparatus
KR19990010200A (ko) * 1997-07-15 1999-02-05 윤종용 감압식 건조 장치를 이용하는 반도체장치 건조방법
CA2325625A1 (en) * 1998-03-24 1999-09-30 Corning Incorporated External electrode driven discharge lamp
US5958143A (en) * 1998-04-28 1999-09-28 The Regents Of The University Of California Cleaning process for EUV optical substrates
CA2251208A1 (en) * 1998-11-12 2000-05-12 Claude Perreault Fully automatic plating wax collecting device and method thereof
JP3658257B2 (ja) * 1998-12-24 2005-06-08 キヤノン株式会社 洗浄方法及び洗浄装置及び電子写真感光体及び電子写真感光体の製造方法
JP2000301082A (ja) * 1999-04-20 2000-10-31 Tokyo Electron Ltd 処理装置
TW434668B (en) * 2000-01-27 2001-05-16 Ind Tech Res Inst Wafer rinse apparatus and rinse method of the same
CN1196388C (zh) * 2000-06-08 2005-04-06 松下电器产业株式会社 材料的干燥方法及其装置和使用该装置的线路板的制造方法
CA2533501A1 (en) * 2003-07-24 2005-02-17 Eisenmann Maschinenbau Gmbh & Co. Kg Device for hardening the coating of an object, consisting of a material that hardens under electromagnetic radiation, more particularly an uv paint or a thermally hardening paint
KR100582202B1 (ko) * 2003-10-13 2006-05-23 엘지.필립스 엘시디 주식회사 박막트랜지스터 어레이 기판의 제조장치 및 방법
WO2006066115A2 (en) 2004-12-17 2006-06-22 The Procter & Gamble Company Process for extracting liquid from a fabric
CN1727080A (zh) * 2005-07-29 2006-02-01 北京中联科利技术股份有限公司 多流体清洗方法
FR2920046A1 (fr) * 2007-08-13 2009-02-20 Alcatel Lucent Sas Procede de post-traitement d'un support de transport pour le convoyage et le stockage atmospherique de substrats semi-conducteurs, et station de post-traitement pour la mise en oeuvre d'un tel procede
IT1395090B1 (it) * 2009-04-08 2012-09-05 Lasa Impianti Srl Apparecchiatura a basso impatto ambientale per il lavaggio di particolari metallici e non metallici che necessitano di un altro grado di pulizia
TWM374919U (en) * 2009-06-11 2010-03-01 Wen-Der Yang Supersonic drain cleaner for embedded water sink
DE102009053574A1 (de) * 2009-11-06 2011-05-12 Gebr. Schmid Gmbh & Co. Verfahren und Anlage zur Fertigung von Leiterplatten und Halbleiterprodukten
CN102553852A (zh) * 2010-12-28 2012-07-11 北京京东方光电科技有限公司 清洗装置
CN102764742A (zh) * 2011-05-03 2012-11-07 镇江仁德新能源科技有限公司 碎硅片漂洗设备
WO2014018564A1 (en) 2012-07-23 2014-01-30 Zieger Claus Dieter Multiple proportion delivery systems and methods
CN103480622B (zh) * 2013-09-18 2016-06-08 合肥京东方光电科技有限公司 基板清洗装置及其工作方法、基板清洗系统
CN104588356B (zh) * 2014-12-18 2017-04-19 吉安市优特利科技有限公司 一种铝壳锂电池清洗方法
CN105170556A (zh) * 2015-09-25 2015-12-23 无锡市博阳超声电器有限公司 一种带毛刷的超声波清洗机
CN105970244A (zh) * 2016-05-20 2016-09-28 深圳市鑫承诺环保产业股份有限公司 一种金银币母件高精清洗工艺
DK179189B1 (en) * 2016-07-06 2018-01-22 Techsave As Method for restoring damaged electronic devices by cleaning and apparatus
CN107354475B (zh) * 2017-07-10 2019-06-11 厦门金越电器有限公司 一种防铜氧化碳氢清洗方法及其设备
CN109273381A (zh) * 2017-07-18 2019-01-25 东莞市鸿村环保设备制造有限公司 一种带有清洗风干功能的玻璃基板蚀刻装置
CN107616765A (zh) * 2017-09-20 2018-01-23 宁波创健环保科技有限公司 无水洗碗机及其控制方法
CN108211969A (zh) * 2018-03-07 2018-06-29 深圳市海威达科技有限公司 泡沫自动混比装置及洗车机
CN108485831A (zh) * 2018-04-18 2018-09-04 安徽斯瑞尔阀门有限公司 一种阀门表面除油清洗剂及其清洗装置
CN109047109A (zh) * 2018-07-27 2018-12-21 成都品尚农电子商务有限公司 一种日用品清洁处理系统
CN109013517A (zh) * 2018-08-20 2018-12-18 六安名家汇光电科技有限公司 一种led投光灯塑料外壳的除尘方法
DE102018121915B3 (de) * 2018-09-07 2020-02-13 Dyemansion Gmbh Verfahren zur Oberflächenbehandlung von Formteilen
CN111842329B (zh) * 2020-07-30 2022-09-27 固安浩瀚光电科技有限公司 一种半导体零件表面清洗装置及其使用方法
CN114249897A (zh) * 2020-09-24 2022-03-29 深圳市鸿信顺电子材料有限公司 一种含浸液及其在片式元件的表面处理工艺方面的应用
CN112808681A (zh) * 2020-12-18 2021-05-18 华虹半导体(无锡)有限公司 硅片清洗供液装置
CN112547666A (zh) * 2020-12-22 2021-03-26 深圳市鑫承诺环保产业股份有限公司 一种汽车配件材料清洗工艺
CN112678759B (zh) * 2020-12-31 2023-08-01 浙江凯圣氟化学有限公司 一种超纯氢氟酸包装物清洗方法
CN114985385B (zh) * 2022-05-25 2023-08-25 广东美的厨房电器制造有限公司 饮品调制设备及其控制方法和装置、可读存储介质
CN116000006A (zh) * 2022-11-09 2023-04-25 浙江佰泰医疗科技有限公司 一种带自动控制型的多功能超声波清洗机

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1333848A (en) * 1916-09-15 1920-03-16 Oscar E Jacobs Process for the drying and curing of lumber
US1250496A (en) * 1916-11-09 1917-12-18 Emil Passburg Process for drying grain and other coarse granular materials.
US3436262A (en) * 1964-09-25 1969-04-01 Dow Chemical Co Cleaning by foam contact,and foam regeneration method
US3615310A (en) * 1969-06-02 1971-10-26 Ppg Industries Inc Method for drying glass fiber forming packages
US3672067A (en) * 1970-10-30 1972-06-27 Envirotech Corp Method for steam drying filter cake
GB1321699A (en) * 1970-11-20 1973-06-27 Atomic Energy Authority Uk Methods of removing unwanted oxidisable substances from materials
US4156619A (en) * 1975-06-11 1979-05-29 Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh Process for cleaning semi-conductor discs
US4079522A (en) * 1976-09-23 1978-03-21 Rca Corporation Apparatus and method for cleaning and drying semiconductors
US4318749A (en) * 1980-06-23 1982-03-09 Rca Corporation Wettable carrier in gas drying system for wafers
US4605574A (en) * 1981-09-14 1986-08-12 Takashi Yonehara Method and apparatus for forming an extremely thin film on the surface of an object
US4569695A (en) * 1983-04-21 1986-02-11 Nec Corporation Method of cleaning a photo-mask
EP0131080B1 (fr) * 1983-07-06 1987-11-19 Snef Electro Mecanique Procédé et appareil de nettoyage de grosses pièces
US4693777A (en) * 1984-11-30 1987-09-15 Kabushiki Kaisha Toshiba Apparatus for producing semiconductor devices
US4736758A (en) * 1985-04-15 1988-04-12 Wacom Co., Ltd. Vapor drying apparatus
US4722355A (en) * 1985-08-19 1988-02-02 Rolf Moe Machine and method for stripping photoresist from wafers
GB2182585B (en) * 1985-11-07 1989-10-04 Sony Corp Removing coatings from cathode ray tubes or parts thereof
DE3611422A1 (de) * 1986-04-05 1987-10-15 Henkel Kgaa Verfahren zur reinigung verschmutzter fester formteile
US4832753A (en) * 1987-05-21 1989-05-23 Tempress Measurement & Control Corporation High-purity cleaning system, method, and apparatus
US4842687A (en) * 1987-07-16 1989-06-27 Texas Instruments Incorporated Method for etching tungsten
US4902350A (en) * 1987-09-09 1990-02-20 Robert F. Orr Method for rinsing, cleaning and drying silicon wafers
JPH073634Y2 (ja) * 1987-12-28 1995-01-30 株式会社トムコ ウェハ液洗乾燥装置
US5158616A (en) * 1988-07-22 1992-10-27 Tokyo Electron Limited Apparatus for cleaning a substrate
FI86944C (fi) * 1989-02-02 1992-10-26 Nokia Mobira Oy Foerfarande foer tvaettning av kretsplattor och en anordning foeg anvaendning i foerfarandet
US5039349A (en) * 1990-05-18 1991-08-13 Veriflo Corporation Method and apparatus for cleaning surfaces to absolute or near-absolute cleanliness
WO1992016314A1 (en) * 1991-03-12 1992-10-01 Haakansson Lars A device for cleaning objects, preferably of metal
DE4138432C1 (ko) * 1991-11-22 1993-02-18 Aichelin Gmbh, 7015 Korntal-Muenchingen, De

Also Published As

Publication number Publication date
EP0455465B1 (en) 2001-11-28
CN1057796A (zh) 1992-01-15
CN1031980C (zh) 1996-06-12
US5203927A (en) 1993-04-20
CA2040989A1 (en) 1991-11-02
KR970003672B1 (ko) 1997-03-21
EP0455465A2 (en) 1991-11-06
EP0455465A3 (en) 1992-07-22
DE69132829T2 (de) 2002-04-04
SG55009A1 (en) 1998-12-21
US5840126A (en) 1998-11-24
US5361789A (en) 1994-11-08
DE69132829D1 (de) 2002-01-10

Similar Documents

Publication Publication Date Title
KR910020252A (ko) 세탁/건조 방법 및 그 장치
KR930010232A (ko) 철제부품의 세정방법 및 세정장치
KR950005364A (ko) 진공처리장치 및 그 세정방법
US5499642A (en) Washing apparatus
SE7812111L (sv) Forfarande for framstellning av slipmassa
SE0104272L (sv) Förfarande och arrangemang vid impregnering av flis
CN111713960A (zh) 蒸煮装置与蒸煮方法
JP2954367B2 (ja) 物品の乾燥装置
US5524652A (en) Apparatus for cleaning metallic workpieces
JPH0130946B2 (ko)
JPH0767552B2 (ja) 洗浄装置
JPS5937425B2 (ja) 木材の乾燥法
JPH03106485A (ja) 超音波洗浄乾燥方法およびその装置
US4667416A (en) Device for drying organic solids of high water content
US2539264A (en) Method of pasteurizing, sterilizing, and steam distilling potable liquids
JPH09213672A (ja) 半導体ウェハ処理装置および処理方法
JP3017033B2 (ja) 半導体ウエハ等の蒸気乾燥方法及びその蒸気乾燥装置
RU2144463C1 (ru) Устройство для нанесения защитного покрытия на резинотехнические изделия
JPH1044107A (ja) 木材内部の樹液等の流去方法とこの前処理を前提とした防腐剤の浸透処理方法
SU1011991A1 (ru) Способ удалени паровоздушной смеси из охладител смеси регенеративного подогревател паротурбинной установки
SU652250A1 (ru) Способ отделки ткани и устройство дл его осуществлени
JPS552769A (en) Washing method for metal
JPS60194162A (ja) 布帛の湿熱連続処理加工方法及び装置
CZ329896A3 (en) Sterilization process of porous lumpy material
RU98103716A (ru) Способ разделения смесей на фракции и устройство для его осуществления

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E902 Notification of reason for refusal
E902 Notification of reason for refusal
G160 Decision to publish patent application
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20060313

Year of fee payment: 10

LAPS Lapse due to unpaid annual fee