KR950702087A - 고성능 수평 확산로 시스템(high performance horizontal diffusion furnacs system) - Google Patents

고성능 수평 확산로 시스템(high performance horizontal diffusion furnacs system)

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Publication number
KR950702087A
KR950702087A KR1019940704560A KR19940704560A KR950702087A KR 950702087 A KR950702087 A KR 950702087A KR 1019940704560 A KR1019940704560 A KR 1019940704560A KR 19940704560 A KR19940704560 A KR 19940704560A KR 950702087 A KR950702087 A KR 950702087A
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Prior art keywords
heating
high temperature
furnace
chamber
temperature diffusion
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KR1019940704560A
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English (en)
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KR100316069B1 (ko
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케빈 비. 펙
로날드 이 에릭슨
스티벤 에이치. 매튜즈
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로날드이, 에릭슨
썸텍 인코포레이티드
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/10—Reaction chambers; Selection of materials therefor

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Metallurgy (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Furnace Details (AREA)
  • Tunnel Furnaces (AREA)
  • Meat, Egg Or Seafood Products (AREA)
  • Magnetic Resonance Imaging Apparatus (AREA)
  • Fuel Cell (AREA)
  • Resistance Heating (AREA)
  • Muffle Furnaces And Rotary Kilns (AREA)

Abstract

고온 확산로(10)의 실행은 개선된 복합로모듈 셀계(11)에 의해 향상된다. 노(10)는 조정가능한 수평화프레임 어셈블리(59)와 청정실 환경에 적합한 재료로 구성된다. 측면 어셈블리(31)와 가열부 호이스트구조(22)로 된 각각의 노모듈튜브의 가열부 배치구조(85)는 향상된 유지보수성을 허용한다. 열처리 실행은 각각의 노모듈 냉각시스템(15,16,30)을 갖춘 밀봉된 가열부(12)에 의해 개선된다. 개선된 열전쌍(107)은 열처리 공정제어와 가열부 유지보수성을 향상시키기 위하여 위치된다.

Description

고성능 수평 확산로 시스템(HIGH PERFORMANCE HORIZONATAL DIFFUSION FURNACS SYSTEM)
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제2도는 고성능 노의 로드단부를 도시한 도면,
제3도는 고성능 노의 평면도,
제5도는 수평화프레임 어셈블리의 일부분을 도시한 확대 단면도,
제6A도와 제6B도는 각각 제거된 노무듈을 갖춘 냉각시스템의 측면도와 각각의 노모듈을 위한 냉각시스템의 로드단부를 도시한 도면.

Claims (9)

  1. 향상된 표면균일성을 가진 스테인레스강으로 이루어진 적어도 한 부분을 구비하는 프레임, 프레임에 연결되고, 알루미늄과 폴리에틸렌으로 이루어진 적어도 한 부분을 구비하는 다수의 패널 및, 프레임에 위치된, 패널과 일치하는 다수의 가열모듈로 이루어지는 것을 특징으로 하는 낮은 먼지의 대기에서 사용하는 고온 확산로.
  2. 베이스, 베이스에 연결되고, 표면위에 고온 확산로를 지지하는 프레임 및, 노프레임과 베이스에 연결된, 프레임과 베이스사이에서 거리를 조정하는 다수의 수평화프레임 어셈블리로 이루어지는 것을 특징으로 하는 장착표면에 대하여 고온 확산로의 위치를 조정하는 장치.
  3. 고온 확산로를 지지하며, 노모듈의 전, 후방측면과 일치하는 전방측면 및 후방측면을 가지고, 후방에서 전방측면을 향하여 확장하는 평행의 캔틸레버 부재를 가지늘 프레임, 캔틸레버 부재 각각에 연결된 서랍식 슬라이더 및, 서랍식 슬라이더를 캔틸레버 부재에 연결하고 가열부가 전방측면을 향하여 확장하도록 가열부의 단부에 연결하는 칸막이로 이루어지는 것을 특징으로 하는 로드단부, 반배단부 및 전, 후방측면을 갖춘 가열부를 포함하는, 고온 확산로내에 노모듈에 대한 접근을 허용하는 장치.
  4. 고온 확산로에 연결된 빔, 빔으로 부터 확장하는 다수의 케이블, 다수의 케이블을 가열부에 부착하는 다수의 케이블에 연결된 수단 및, 가열부가 위치되도록 케이블을 이동하는 수단등으로 이루어지는 것을 특징으로 하는 고온 확산로에 가열부를 위치시키는 장치.
  5. 낮은 마찰 표면부와 측면으로 된 부재챔버 플랫폼을 포함하는 부재챔버, 제1슬레드는 제2슬레드에 연결되고 제2슬레드로 부터 제1거리로 분리되는, 낮은 마찰 표면부상에 위치되고 가열부단부를 지지하며, 부재챔버측면으로 부터 제2거리로 분리되는 슬레드, 가열부가 부재챔버 플랫폼에 대하여 상승되거나 하향되도록 하기 위하여 슬레드사이에 제1거리를 조정하는 수단 및, 슬레드가 부재챔버측면에 대하여 가열부단부를 위치시키도록 하기 위하여 제2거리를 조정하는 수단등으로 이루어지는 것을 특징으로 하는 고온 확산로에서 가열부단부를 위치시키는 장치.
  6. 로드단부를 갖추고, 로드단부에 잇는 개구부로서 공정챔버를 둘러싼는 노챔버를 갖춘 원통형 가열부, 세라믹섬유와 탄화규소 혼합재료로 구성된 공정챔버에 있는 부재라이너, 로드단부에 있는 가열부에서의 콘센트 및, 콘센트에 연결된, 노챔버를 밀봉하는 수단으로 이루어지는 것을 특징으로 하는 고온 확산로에서 가열부단부를 위치시키는 장치.
  7. 흡입구를 포함하는 고온 확산로에서의 패널, 제1가열부의 열에너지를 공기의 흐름으로 전달하는 열에너지를 방사하는 제1가열부를 통해 에너지의 흐름을 발생하는 흡입구를 통해 공기소오스를 배출하는 수단 및, 제2가열부로 부터 제1가열부를 통해 공기의 흐름을 분리하는 수단등으로 이루어지는 것을 특징으로 하는 공기의 소오스를 사용하는 고온 확산로에서 가열부단부를 위치시키는 장치.
  8. 다수의 와이어리드, 와이어리드의 실질적인 부분을 둘러싸고, 열에너지에 대한 와이어리드의 적은 노출을 허용하는 세라믹 절연층 및, 세라믹의 적어도 일부를 덮어 무선주파수 간섭에너지를 제거하는 탄화규소층으로 이루어지는 것을 특징으로 하는 무선주파수 간섭에너지영역을 가지는 고온 확산로에서 열에너지를 측정하는 장치.
  9. 소오스단부에서 구멍을 갖춘 노챔버와 소오스단부를 갖춘 공정챔버를 포함하는 원통형 가열부 및, 노챔버의 정확한 측정을 가능하게 하도록 구멍안에 충분히 삽입되는 열전쌍등으로 이루어지는 것을 특징으로 하는 고온 확산로에 온도를 측정하는 장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019940704560A 1992-06-15 1993-06-09 고성능 수평 확산로 시스템 KR100316069B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US898,552 1986-08-21
US07/898,552 US5461214A (en) 1992-06-15 1992-06-15 High performance horizontal diffusion furnace system
US07/898,552 1992-06-15
PCT/US1993/005546 WO1993026137A1 (en) 1992-06-15 1993-06-09 High performance horizontal diffusion furnace system

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KR950702087A true KR950702087A (ko) 1995-05-17
KR100316069B1 KR100316069B1 (ko) 2005-05-18

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US (5) US5461214A (ko)
EP (1) EP0645072B1 (ko)
JP (3) JPH07509345A (ko)
KR (1) KR100316069B1 (ko)
AT (1) ATE231318T1 (ko)
DE (1) DE69332639T2 (ko)
ES (1) ES2191665T3 (ko)
WO (1) WO1993026137A1 (ko)

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US5481088A (en) 1996-01-02
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US5530222A (en) 1996-06-25
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US5483041A (en) 1996-01-09
US5517001A (en) 1996-05-14
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